ELECTRON BEAM-OPTICAL HYBRID LITHOGRAPHIC RESIST PROCESS - Patent 0104235

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EP 0 104 235 A1

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(43)	Date of publication:
	04.04.1984 Bulletin 1984/14

(21)	Application number: 83901447.0

(22)	Date of filing: 01.03.1983

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International Patent Classification (IPC):

G03F 7/ 00^{( . )}
G03F 7/ 075^{( . )}
H01J 37/ 317^{( . )}

G03C 1/ 91^{( . )}
G03F 7/ 20^{( . )}

(86)	International application number:
	PCT/US1983/000273

(87)	International publication number:
	WO 1983/003485 (13.10.1983 Gazette 1983/24)

(84)	Designated Contracting States:
	CH DE FR LI NL

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Priority:

29.03.1982 US 19820363324

(71)	Applicant: MOTOROLA, INC.
	Schaumburg, IL 60196 (US)

(72)	Inventor:
	HELBERT, John N. Scottsdale, AZ 85254 (US)

(74)	Representative: Ibbotson, Harold
	Motorola European Intellectual Property Midpoint Alencon Link Basingstoke Hampshire RG21 1PL Basingstoke Hampshire RG21 1PL (GB)

(54)	ELECTRON BEAM-OPTICAL HYBRID LITHOGRAPHIC RESIST PROCESS