(19)
(11) EP 0 173 465 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
24.02.1988 Bulletin 1988/08

(43) Date of publication A2:
05.03.1986 Bulletin 1986/10

(21) Application number: 85305438

(22) Date of filing: 30.07.1985
(84) Designated Contracting States:
DE FR GB NL

(30) Priority: 31.07.1984 US 636395

(71) Applicant: APPLIED ELECTRON CORPORATION
 ()

(72) Inventors:
  • Rocca,Jorge J.
     ()
  • Collins.George J.
     ()
  • Moore,Cameron A.
     ()

   


(54) Glow discharge electron beam method and apparatus for the surface recrystallization of solid substances


(57) The recrystallization of polycrystalline or amorphous materials commonly used as semiconductor substrates is accomplished by employing as a heat source a cold cathode, glow discharge electron beam gun (24) that emits a sharply focussed line electron beam (10) arranged to impinge on a moving substrate material (19). The method yields large surface areas that are substantially free from defects with minimum subsurface heating and rapid throughput.






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