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(11) | EP 0 178 596 A3 |
(12) | EUROPEAN PATENT APPLICATION |
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(54) | Silicon nozzle structures and method of manufacture |
(57) A nozzle structure in a crystallographically oriented, monocrystalline silicon includes
a pyramidal opening (11) anisotropically etched from the entrance side of the nozzle
and truncated in a membrane (12) having a smaller cross-section than the initial cross-section
of the entrance opening. The membrane (12) has extending therethrough a pyramidal
opening (13) etched anisotropically from the exit side. The vertical axes of both
openings are substantially concentric. |