PHOTOLITHOGRAPHY PROCESS USING POSITIVE PHOTORESIST CONTAINING UNBLEACHABLE LIGHT ABSORBING AGENT - Patent 0193603

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EP 0 193 603 A1

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(43)	Date of publication:
	10.09.1986 Bulletin 1986/37

(21)	Application number: 85904900.0

(22)	Date of filing: 12.09.1985

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International Patent Classification (IPC):

G03C 1/ 00^{( . )}
G03F 7/ 09^{( . )}
G03F 7/ 26^{( . )}

G03F 7/ 004^{( . )}
G03F 7/ 20^{( . )}
H01L 21/ 30^{( . )}

(86)	International application number:
	PCT/US1985/001745

(87)	International publication number:
	WO 1986/001914 (27.03.1986 Gazette 1986/07)

(84)	Designated Contracting States:
	AT BE CH DE FR GB IT LI LU NL SE

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Priority:

13.09.1984 US 19840650957

(71)	Applicant: ADVANCED MICRO DEVICES, INC.
	Sunnyvale, CA 94088 (US)

(72)	Inventors:
	KNIGHT, Colin, W., T. Los Altos Hills, CA 94022 (US) ARNOLD, William, H., III Sunnyvale, CA 94086 (US) BROWN, Andrew, Victor San Jose, CA 95123 (US)

(74)	Representative: Wright, Hugh Ronald, et al
	Brookes & Martin 52/54 High Holborn London WC1V 6SE London WC1V 6SE (GB)

(54)	PHOTOLITHOGRAPHY PROCESS USING POSITIVE PHOTORESIST CONTAINING UNBLEACHABLE LIGHT ABSORBING AGENT