(19)
(11) EP 0 198 908 A1

(12)

(43) Date of publication:
29.10.1986 Bulletin 1986/44

(21) Application number: 85905575.0

(22) Date of filing: 25.10.1985
(51) International Patent Classification (IPC): 
G03F 1/ 00( . )
H01J 37/ 317( . )
(86) International application number:
PCT/US1985/002109
(87) International publication number:
WO 1986/002774 (09.05.1986 Gazette 1986/10)
(84) Designated Contracting States:
AT BE CH DE FR GB IT LI LU NL SE

(30) Priority: 26.10.1984 US 19840665251
26.08.1985 US 19850769370

(71) Applicants:
  • ION BEAM SYSTEMS, INC.
    Beverly, MA 01915 (US)
  • MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    Cambridge, MA 02139 (US)

(72) Inventors:
  • KELLOGG, Edwin, M.
    Lexington, MA 02173 (US)
  • MELNGAILIS, John
    Newton, MA 02160 (US)

(74) Representative: Heidrich, Udo, Dr. jur., Dipl.-Phys. 
Rechtsanwalt & Patentanwalt Dipl.-Phys. Dr. jur. U. HEIDRICH Franziskanerstrasse 30
D-81669 München
D-81669 München (DE)

   


(54) FOCUSED SUBSTRATE ALTERATION