(19)
(11) EP 0 210 616 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
06.04.1988 Bulletin 1988/14

(43) Date of publication A2:
04.02.1987 Bulletin 1987/06

(21) Application number: 86110329

(22) Date of filing: 24.07.1986
(84) Designated Contracting States:
DE FR GB NL

(30) Priority: 26.07.1985 JP 16400285
13.09.1985 JP 20154385

(71) Applicant: HITACHI, LTD.
 ()

(72) Inventors:
  • Chinone, Naoki
     ()
  • Uomi, Kazuhisa
     ()
  • Fukuzawa, Tadashi
     ()
  • Matsueda, Hideaki
     ()
  • Kajimura, Takashi
     ()

   


(54) Semiconductor laser


(57) In a semiconductor laser, a multiple quantum well type active layer consisting of barrier layers (15,16,17) and active layers of well layers (11), each of which has a thickness less than the de Broglie wavelength of electons, is doped with an impurity, and the impurity density is made higher in the barrier layer (15, 16, 17) than in the well layer (11). Where the multiple quantum well active layer is held between p-type and n-type cladding layers (14,13), the well layer (11) is undoped, the part (15) of the barrier layer lying in contact with the well layer (11) is undoped, and the other part (17) of the barrier layer close to the p-type cladding layer (14) is put into the n-conductivity type while that (16) of the barrier layer close to the n-type cladding layer (13) is put into the p-conductivity type.







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