[0001] This invention relates generally to the fabrication of laminated structures having
improved structural properties especially useful in thermal ink jet print heads. More
particularly, the invention is directed to increasing the adhesive forces which bond
together adjacent laminated layers without degrading portions of the laminated structure
during the process.
[0002] In certain arts such as the manufacture of printheads for thermal ink jet printers,
diverse materials are often bonded together in the formation of a unitary composite
structure. In such bonding processes, a chosen adhesive material is frequently provided
between adjacent layers and thereafter subjected to a predetermined heat and pressure
for a time sufficient to produce a good adhesive bond between these layers. An example
of such construction is in the fabrication of a thin film resistor thermal ink jet
print head where typically a metal orifice plate is adhesively bonded atop a silicon
substrate including thermal heater resistors and corresponding ink reservoirs. However,
it quite often happens that non-uniform surface irregularities and contours exist
on the facing surfaces between which the adhesive is thermal compression bonded. These
irregularities and contours may also exist on the surface of the top layer in contact
with a member for applying heat and pressure and known in the art as a "heat staker".
When such non-uniform surface irregularities and contours are brought together under
predetermined conditions of heat and pressure, there are produced corresponding variations
in pressure and temperature across the surface areas of the laminated layers. These
pressure variations result in weak spots in the cured laminated structure and consequently
result in undesirable failures of the laminated structures under conditions of actual
use.
[0003] Accordingly, it is an object of this invention to provide a new and improved process
for fabricating laminated structures wherein the above problem of adhesion variation
with surface contour variation has been substantially eliminated. This object is
accomplished by the provision of a pressure equalizing member between the structure
undergoing adhesive bonding and lamination and the heat and pressure applicator ("heat
staker") therefor. The pressure equalizing member comprises a pair of thin outer
flexible foil layers between which is located a liquifiable material of a chosen volume.
The liquifiable material is wholly contained within the confines of the pair of thin
outer flexible foil layers which are effectively sealed around their outer edges by
the unmelted region of the liquifiable material.
[0004] When two adjacent members, such as a thin film resistor semiconductor substrate and
a metal orifice plate of the laminated device being constructed are to be adhesively
bonded, they are covered with the pressure equalizing member which then is positioned
to receive the heat staker on one surface thereof. Upon receiving heat and pressure
from the heat staker, the material within the thin flexible foil layers of the pressure
equalizing member will liquify and provide a hydrostatic force on the lower flexible
layer thereof which then conforms, for example, to the irregular surface contours
of the orifice plate and transmits equal pressure over the entire surface area of
the laminated structure. Thus, the pressure applied to the adhesive bond is applied
with substantial uniformity laterally across the laminated surfaces as compared with
known prior art processes. Thus, this invention is capable of producing a composite
laminated structure with greater bonding adherence strength.
[0005] The significant advance provided by the present invention will be better understood
with reference to the following description of the accompanying drawings.
Brief Description of the Drawings
[0006]
Figures 1a through 1e are schematic cross-sectional views illustrating the laminating
and adhesive bonding process according to the present invention.
Figures 2a - 2d illustrate various modes of adhesive failure including the cohesive
adhesive failure mode in accordance with the present invention.
Best Mode for Carrying Out the Invention
[0007] Referring now to Figures 1a through 1e, there is shown in Figure 1a a thin film resistor
silicon substrate 10 which will typically provide a support for the ink reservoirs
and thermal heater resistors (not shown) of well-known semiconductor device construction
for use in a thermal ink jet printer. Each of the resistors and reservoirs (not shown)
are associated with nozzle patterns in a nozzle plate 12, and the nozzle plate 12,
typically fabricated of nickel, as well as the silicon substrate 10 are generally
well-known in the thermal ink jet printing art and will not be described herein in
further detail. However, for reference to a thin film resistor print head construction
including a description of the various layer materials used therein, reference may
be made to the
Hewlett Packard Journal, Volume 36, Number 5, May 1985, incorporated herein by reference. This type of printhead
construction is also described in U.S. Patent 4,535,343 issued to Conrad L. Wright
et al and assigned to the present assignee and also incorporated herein by reference.
[0008] The metal nozzle plate 12 is bonded to the underlying silicon substrate 10 by means
of an ultraviolet-cured polymer 14 shown in Figure 1b and known generically as a parafilm.
This parafilm is sold by the DuPont Company of Wilmington, Delaware under the tradename
VACREL. The VACREL layer 14 will undergo thermal curing by the application of heat
and pressure thereto in a manner to be further described.
[0009] With the nozzle plate 12 positioned in place as shown in Figure 1c, a pressure equalizing
composite member 16 is placed on the upper surface of the nozzle plate 12 and includes
a pair of outer aluminum foil layers 18 and 20 between which is encapsulated an uncured
VACREL or parafilm material 22. This parafilm material 22 will liquefy when brought
to a predetermined elevated temperature of about 115° - 120°C. The pressure equalizing
composite structure 16 has also been referred to as a "waterbed sandwich" in that
the liquefiable material 22 will conform to the contours of and pressures on the
materials 10 and 12 being bonded together.
[0010] This thermal compression bonding is accomplished by first placing the silicon substrate
10 on a steel holder 24 as shown in Figure 1e. In operation, the heat staker top element
30 is brought into contact with the composite structure 16 under predetermined conditions
of heat and pressure and for a time sufficient to provide thermal compression bonding
of the VACREL layer 14 between the nozzle plate 12 and the underlying silicon substrate
10. We have found that a pressure in the range of 200 - 225 psi applied for between
15 - 20 seconds at a temperature between 115° - 120°C works exceptionally well in
practicing this invention. However, the pressure range may if necessary be extended
to 20 to 2000 psi, the time extended from 5 to 60 seconds and the temperature extended
from 90°C to 160°C.
[0011] Referring now to figures 2a - 2d, there is shown in Figure 2a an adhesive failure
where the VACREL adhesive is torn away from the nozzle plate. In Figure 2b the VACREL
adhesive is torn away from the underlying silicon substrate, and in Figure 2c there
is shown a mixed mode failure where the VACREL is torn partially away from the nozzle
plate and partially away from the underlying silicon substrate.
[0012] However, in Figure 2d there is shown the optimum and desired cohesive failure of
the VACREL made possible by this invention. Here the VACREL is torn from neither the
nozzle plate nor the underlying silicon substrate, but rather becomes torn internally
across the lateral dimension of the adhesive, indicating the strongest bond possible
using this type of adhesive bonding.
[0013] Various modifications may be made in the above described embodiment without departing
from the scope of this invention. For example, this invention is not limited to the
lamination of printhead devices or to the specific number of layer-members being laminated.
1. A process for precisely aligning an orifice plate with an ink jet printhead and
then securely bonding the orifice plate and printhead one to another, characterized in that cohesive failure mode bonding between the orifice plate (12) and the ink
jet printhead substrate (10) is achieved by providing an adhesive layer (14) on one
surface of the substrate (10), aligning the orifice plate (12) with the substrate
(10) and atop the adhesive layer (14), providing a liquid layer (22) on the structure
defined above, and applying predetermined heat and pressure through the liquid layer
(22) and to the adhesive layer (14) for a predetermined time.
2. The process defined in claim 1, characterized in that the adhesive layer (14) is a thermally curable polymer.
3. The process defined in claims 1 or 2, characterized by applying heat and pressure to a sandwich structure (16) disposed on the orifice
plate (12) and enclosing a liquefiable material (22) therein, thereby translating
hydro-static forces through said liquefiable material (22) and to the plane of the
major bonding forces of said substrate (10) and orifice plate (12) respectively, whereby
substantially uniform bonding forces are applied across said major surfaces without
regard to contours and irregularities in said surfaces to thereby enhance the adhesive
bonding therebetween.
4. The process defined in claim 3, characterized in that said sandwich structure (16) includes a pair of outer flexible foil layers
(18,20) enclosing a liquefiable material (22).
5. The process defined in claims 3 or 4, characterized in that said substrate (10) is a silicon die including a thin film resistor structure
for a thermal ink jet printhead, and said orifice plate (12) has nozzles therein for
receiving ink from reservoirs in the silicon substrate (10).
6. The process defined in one of claims 3,4 or 5, characterized in that the pressure is applied to the sandwich structure (16) over a range of 1.3
- 130 bar (20 - 2000 PSI) and for the time of 5 to 60 seconds at a predetermined elevated
temperature from 90°C to 160°C.