(19)
(11) EP 0 232 117 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
19.07.1989 Bulletin 1989/29

(43) Date of publication A2:
12.08.1987 Bulletin 1987/33

(21) Application number: 87300722.3

(22) Date of filing: 28.01.1987
(51) International Patent Classification (IPC)4H01L 29/93
(84) Designated Contracting States:
DE FR GB

(30) Priority: 31.01.1986 JP 19622/86

(71) Applicant: SEIKO INSTRUMENTS INC.
Tokyo 136 (JP)

(72) Inventor:
  • Hattori, Yoshio Seiko InstrumentS & Elec. Ltd.
    Koto-ku Tokyo (JP)

(74) Representative: Miller, Joseph et al
J. MILLER & CO. 34 Bedford Row, Holborn
London WC1R 4JH
London WC1R 4JH (GB)


(56) References cited: : 
   
       


    (54) Semiconductor variable capacitance element


    (57) A semiconductor variable capacitance element (1) comprises a floating electrode (23) on the surface of a semiconductor substrate (21) for controlling the capacitance of the element, an insulator film (25) covering the floating electrode to insulate the latter from the exterior, a bias terminal 3 for applying a bias voltage to a capacitance electrode (12) and a bias cut-­off capacitor (4) for cutting off voltage applied to the capacitance electrode and for connecting the element to external circuitry. The bias cut-off capacitance is connected to the capacitance electrode (12).







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