(19)
(11) EP 0 256 820 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
07.06.1989 Bulletin 1989/23

(43) Date of publication A2:
24.02.1988 Bulletin 1988/08

(21) Application number: 87307044.5

(22) Date of filing: 07.08.1987
(51) International Patent Classification (IPC)4: G03C 1/00
(84) Designated Contracting States:
DE FR GB IT NL

(30) Priority: 08.08.1986 JP 187089/86
20.07.1987 JP 180856/87

(71) Applicant: KONICA CORPORATION
Tokyo 163 (JP)

(72) Inventors:
  • Kohno, Junichi
    Hino-shi Tokyo (JP)
  • Komamura, Tawara
    Hino-shi Tokyo (JP)
  • Okauchi, Ken
    Hino-shi Tokyo (JP)

(74) Representative: Wood, Anthony Charles et al
Urquhart-Dykes & Lord 91 Wimpole Street
London W1M 8AH
London W1M 8AH (GB)


(56) References cited: : 
   
       


    (54) Thermal developing light-sensitive material


    (57) There is disclosed a thermal developing light-sensitive material comprising a support and, provided thereon, photographic structural layers comprising at least one layer containing light-sensitive silver halide, said photographic structural layer comprising a compound represented by general formula (1); Formula (1) X1-L1-A
    wherein X, represents a residual group of a photographic restrainer, Li is a mere bonding hand or a divalent group and A is selected from the group consisting of a hydrogen atom, an amino group, a hydroxyl group, a carboxyl group or a salt thereof, a sulfo group or a salt thereof and a sulfin group or a salt thereof; and a a compound represented by general formula (2): Formula (2) X2-L2- B wherein X2 represents a residual group of a photographic restrainer, L2 is a divalent group and B is a ballast group.






    Search report