| (19) |
 |
|
(11) |
EP 0 268 301 A3 |
| (12) |
EUROPEAN PATENT APPLICATION |
| (88) |
Date of publication A3: |
|
13.12.1989 Bulletin 1989/50 |
| (43) |
Date of publication A2: |
|
25.05.1988 Bulletin 1988/21 |
| (22) |
Date of filing: 19.11.1987 |
|
|
| (84) |
Designated Contracting States: |
|
DE GB NL |
| (30) |
Priority: |
20.11.1986 JP 275234/86
25.11.1986 JP 280995/86
|
| (71) |
Applicant: NEC CORPORATION |
|
Tokyo (JP) |
|
| (72) |
Inventors: |
|
- Uesugi, Fumihiko
c/o NEC Corporation
Minato-ku
Tokyo (JP)
- Morishige, Yukio
c/o NEC Corporation
Minato-ku
Tokyo (JP)
|
| (74) |
Representative: Pätzold, Herbert, Dr.-Ing. |
|
Steubstrasse 10
82166 Gräfelfing
82166 Gräfelfing (DE) |
|
| |
|
| (54) |
Method and apparatus for writing a line on a patterned substrate |
(57) Method and apparatus for writing a line on a patterned substrate in which a direct
writing of a CVD line is performed on at least two of patterned films on a substrate
in accordance with the thermal decomposition of a CVD raw material gas which is resulted
from the radiation of a laser beam. The laser beam is controlled in its power dependent
on the difference between thermal conductivities of the at least two of patterned
films to avoid a disconnection of the CVD line, the occurence of thinner portion thereof
and so on.