| (19) |
 |
|
(11) |
EP 0 277 644 A3 |
| (12) |
EUROPEAN PATENT APPLICATION |
| (88) |
Date of publication A3: |
|
06.09.1989 Bulletin 1989/36 |
| (43) |
Date of publication A2: |
|
10.08.1988 Bulletin 1988/32 |
| (22) |
Date of filing: 02.02.1988 |
|
|
| (84) |
Designated Contracting States: |
|
GB |
| (30) |
Priority: |
05.02.1987 JP 23573/87
14.05.1987 JP 117921/87
02.07.1987 JP 166158/87
|
| (71) |
Applicant: KONICA CORPORATION |
|
Tokyo 160 (JP) |
|
| (72) |
Inventors: |
|
- Komatsu, Hajime
Hachioji-shi
Tokyo (JP)
- Tosaka, Yasuo
Odawara-shi
Kanagawa-ken (JP)
- Kuramoto, Kazuya
Odawara-shi
Kanagawa-ken (JP)
|
| (74) |
Representative: Henkel, Feiler, Hänzel & Partner |
|
Möhlstrasse 37
81675 München
81675 München (DE) |
|
| |
|
| (54) |
Method for exposing a light-sensitive color photographic material |
(57) A method for exposing a light-sensitive photographic material comprising at least
two spectrally different but partly overapping light-sensitive phases which is advantageous
for obtaining a color photographic image with color purity, said method comprising
a step of exposing said photographic material to light through a filter which absorbs
at least a part of said spectrally overapped region.