(19)
(11) EP 0 313 369 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
16.08.1990 Bulletin 1990/33

(43) Date of publication A2:
26.04.1989 Bulletin 1989/17

(21) Application number: 88309894.9

(22) Date of filing: 20.10.1988
(51) International Patent Classification (IPC)4B24B 9/16, G05B 19/18
(84) Designated Contracting States:
AT BE CH DE ES FR GB GR IT LI LU NL SE

(30) Priority: 20.10.1987 ZA 877876
28.07.1988 ZA 885545

(71) Applicant: Prodiamatic International Limited
St. Peter Port Guernsey Channel Islands (GB)

(72) Inventors:
  • Herson, David Trevor
    Florida Park Transvaal (ZA)
  • Abraham, Michael Craig
    Oliverdale Ext 2 Randburg Transvaal (ZA)
  • Lerner, Moshe Bezalel
    Johannesburg Transvaal (ZA)

(74) Representative: Rooney, Paul Blaise et al
D.Young & Co. 10 Staple Inn
London WC1V 7RD
London WC1V 7RD (GB)


(56) References cited: : 
   
       


    (54) A polishing machine for polishing a gemstone


    (57) A polishing machine (70) for polishing a gemstone (32) includes a support arrangement (76) movably mountable relative to a polishing means (14). A holding means (102) for holding the gemstone to be polished is rotatably mounted on the support arrangement (76) and is movable together with the support arrangement (76) to move the gemstone into and out of contact with the polishing means. A drive means (112) is provided for rotatably driving the holding means relative to the support arrangement. The machine (70) includes a control means (130) for controlling operation of the said drive means (112) and thus the rotation of the holding means (102) relative to the support arrangement (76). A monitoring means (126) monitors a polishing rate of the gemstone at each of a plurality of predetermined positions of a revolution of the holding means (102) about the support arrangement (76) and sends data representa­tive of the polishing rate at the said positions of the holding means (102) to the control means, the control means (130) controlling the drive means (112) to position the holding means (102) at that position at which the said optimum polishing rate is achieved.







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