| (19) |
 |
|
(11) |
EP 0 319 920 A3 |
| (12) |
EUROPEAN PATENT APPLICATION |
| (88) |
Date of publication A3: |
|
05.12.1990 Bulletin 1990/49 |
| (43) |
Date of publication A2: |
|
14.06.1989 Bulletin 1989/24 |
| (22) |
Date of filing: 06.12.1988 |
|
| (51) |
International Patent Classification (IPC)4: G03C 1/04 |
|
| (84) |
Designated Contracting States: |
|
DE GB NL |
| (30) |
Priority: |
11.12.1987 JP 313205/87
|
| (71) |
Applicant: KONICA CORPORATION |
|
Tokyo 160 (JP) |
|
| (72) |
Inventors: |
|
- Metoki, Iku
Hino-shi
Tokyo (JP)
- Honda, Chika
Hino-shi
Tokyo (JP)
|
| (74) |
Representative: Henkel, Feiler, Hänzel & Partner |
|
Möhlstrasse 37
81675 München
81675 München (DE) |
|
| |
|
| (54) |
Light-sensitive silver halide photographic material |
(57) A light-sensitive silver halide photographic material suitable for super rapid processing
is disclosed. The photographic material comprisses a support and, provided on at least
one side thereof, a light-sensitive silver halide emulsion layer containing a silver
halide emulsion obtained by a method comprising steps of
adding an aqueous solution of water-soluble silver salt and an aqueous solution of
a water soluble halide into an aqueous solution containing a protective colloid to
precipitate silver halide grains,
coagulating said silver halide grains together with said protective colloid by the
use of a polymer coagulant, and removing a supernatant liquid containing dissolved
metrials.