A PHOTORESIST COMPOSITION INCLUDING A COPOLYMER FROM MALEIMIDE AND A VINYL-ETHER OR -ESTER - Patent 0350498

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EP 0 350 498 A1

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(43)	Date of publication:
	17.01.1990 Bulletin 1990/03

(21)	Application number: 88908099.0

(22)	Date of filing: 23.12.1987

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International Patent Classification (IPC):

G03F 7/ 023^{( . )}

(86)	International application number:
	PCT/US1987/003431

(87)	International publication number:
	WO 1989/005996 (29.06.1989 Gazette 1989/14)

(84)	Designated Contracting States:
	AT BE CH DE FR GB IT LI LU NL SE

(71)	Applicant: HOECHST CELANESE CORPORATION
	Short Hills, NJ 07078 (US)

(72)	Inventors:
	BRAHIM, Karime Langhorne, PA 19047 (US) McFARLAND, Michael, James Middlesex, NJ 08846 (US)

(74)	Representative: Fleck, Thomas, Dr., et al
	Raffay & Fleck Patentanwälte Postfach 32 32 17 D-20117 Hamburg D-20117 Hamburg (DE)

(54)	A PHOTORESIST COMPOSITION INCLUDING A COPOLYMER FROM MALEIMIDE AND A VINYL-ETHER OR -ESTER