[0001] This invention relates to the electrodeposition of chromium, using lead or lead-alloy
anodes, and, more particularly, to a chromium-plating bath apparatus and process,
in which the weight loss of such lead anodes is substantially reduced.
[0002] Chromium-plating baths using chromic-acid solutions as the source of chromium almost
invariably employ lead or lead-alloy anodes. However, as described in "The Electrochemistry
of Lead" by A.T. Kuhn, Academic Press (1979), pages 405-407, lead and lead-alloy anodes
corrode to a soluble species (leading to anode weight loss) in chromic-acid solutions.
This anode dissolution proceeds at a substantial rate, the rate being proportional
to the acidity of the solution. Because of this, there has been a need to find corrosion-resistant
alloys for this medium. For example, alloys containing 10% tin and 0.5% cobalt appear
to show good resistance. The addition of one to two grams per liter (g/l) of Co²⁺
ions also may reduce anode corrosion.
[0003] While this anode-corrosion problem is present in both conventional hexavalent chromium
plating baths and in the mixed-catalyst chromium baths, it is particularly acute in
high- energy-efficient baths, e.g. the so-called "HEEF-25" baths, as described in
European Parent 196053. "HEEF" is a registered trademark of M & T Chemicals, Inc.,
Rahway, New Jersey. HEEF-25 baths comprise chromic acid, sulfate and an alkyl sulfonic
acid, which, for functional chromium deposits, is preferably a non-substituted alkyl
sulfonic acid, or salt thereof, wherein the ratio of sulfur to carbon is ≧1/3. Typical
alkyl sulfonic acids are methyl sulfonic acid, ethyl sulfonic acid, propyl sulfonic
acid, methane disulfonic acid and 1,2-ethane disulfonic acid.
[0004] Other hexavalent chromium plating baths are described in, e.g., the following U.S.
Patents: 3,745,097 to Chessin et al., issued July 10, 1973; 3,654,101 to Aoun, issued
April 4, 1972; 4,450,050 to Chessin et al., issued May 22, 1984; and 4,472,249 to
Chessin, issued September 18, 1984. All of the foregoing patents are assigned to the
present applicant.
[0005] The present invention seeks to reduce the problem of anode corrosion.
[0006] Accordingly, the invention provides a chromium-plating system which significantly
reduces the conversion of a lead or lead-alloy anode used in that system to a soluble
species, comprising an anode-protection circuit for applying a protective potential
on said anode, the potential being less than the potential required for normal electrodeposition
of chromium on said anode. The electroplating bath of this invention may be the conventional
mixed-catalyst or alkyl sulfonic-acid-containing (HEEF-25) chromium-electroplating
type. In one embodiment, an auxiliary cathode is provided near the anode, and the
desired voltage is imposed on the anode.
[0007] Further explanation, a description of preferred features, and examples now follow
with reference to the drawing which is a schematic diagram of a chromium-electroplating
system embodying the present invention.
[0008] During electrodeposition of chromium, the surface of the lead or lead-alloy anode
used therein is oxidized to a film of lead dioxide on the anode, which stabilizes
the anode during the process. However, when the current is turned off, i.e. during
periods of non-plating, this protective lead dioxide film can be reduced to a lead
(II) oxide species by the lead anode, or by trivalent chromium in solution, producing
chromate ions. Subsequently, the lead (II) oxide may react with the chromate ions
to form insoluble lead chromate. If the lead oxide and lead chromate materials are
as adherent on the lead anode as the lead dioxide film, very little corrosion of the
anode will occur. However, if these species flake off the anode and fall into the
bath, fresh lead-anode surface is exposed, and further corrosion can occur.
[0009] Where an alkyl sulfonic acid, e.g. methane sulfonic acid, is present in the bath,
an additional solubilizing reaction can take place in which the lead (II) oxide forms
a soluble species directly. These reactions occur rapidly during periods of non-plating;
when the plating current is turned on, the lead (II) oxide on the anode can be reoxidized
to lead (IV) dioxide, and very little corrosion will occur. It is known in the art
that lead (II) species which are not in electrical contact with the anode cannot be
reoxidized, and are therefore lost from the anode.
[0010] In this invention, the formation of lead (II) species is slowed by anodic protection
during periods of non-plating, thereby slowing anodic solubilizing corrosion and anode-weight
loss. Anodic protection is preferably achieved in the electroplating system of the
invention by providing an auxiliary, or dummy, cathode positioned near the anode,
and imposing a predetermined low voltage between that cathode and the anode at a
low current. This voltage is less than the operational potential between the anode
and the substrate cathode, which would otherwise result in electrodeposition of chromium.
In this manner, an anodic or oxidizing potential is maintained around the beneficial
lead (IV) dioxide film on the anode, to prevent its reduction to a lead (II) species.
[0011] In the course of investigating the parameters of the present system, it has been
surprisingly discovered that anodic protection is obtained by applying a voltage of
less than the plating voltage to the anode. For instance, potentials of from about
1.8 to about 2.2 volts (v.) at currents of from about 0.01 to about 0.3% of normal
chromium electroplating currents were found to be useful in reducing solubilizing
corrosion of lead and lead-alloy anodes. Further, the protective current can be applied
both while the bath is in operation and while the plating current is off, such as
overnight.
[0012] Referring now to the drawing, there is shown a conventional electrodeposition system
including plating anode 1. It is seen that the auxiliary circuit of the embodiment
includes an auxiliary cathode 2, which can be a chromium-plated rod, positioned near
the anode 1 and connected in series therewith through an auxiliary power supply 5.
A rectifier or diode 6 is included in the auxiliary circuit to permit the auxiliary
circuit to be left on even during electroplating. A dummy cathode and plating rectifier,
in combination, can also be used.
[0013] In operation, an anodic protection voltage of less than the normal plating potential,
about 2.8 v. is applied between the auxiliary cathode and the anode. Preferably a
potential of at least 2 v. is applied, at less than 0.02% of the plating current.
For example, a voltage of 2.0 v. for 1500 amp-hr provides a 10-20% improvement in
Pb- 7% Sn anode corrosion, as determined by weight loss, while 2.15 v. at less than
0.1% of the plating current results in a 35-55% reduction in the anode corrosion (mass
loss) in a HEEF-25 chromium plating bath, as compared to 1500 amp-hr of plating without
the auxiliary protection circuit.
[0014] The presence of the diode in the auxiliary circuit prevents current flow to the
auxiliary cathode during the plating cycle. The following examples illustrate the
efficacy of the present invention.
EXAMPLE 1
[0015] The anode-protection circuit of Figure 1 was used and the auxiliary power supply
was kept on even when plating was not occurring. The diode was a three-ampere (amp)
50 peak-inverse-voltage epoxy type with a voltage drop of about 0.5 v. The power
supply was about 0.5 v higher than the voltage at the voltmeter indicated as V in
the drawing. A low-ripple rectifier was used for plating (Hewlett-Packard 6268B, 40
v, 30 amp) and for the auxiliary circuit (Hewlett-Packard, 6200B, 20 v, 1.5 amp).
[0016] The auxiliary voltage was controlled at 2.0 and 2.15 v. in two separate experiments.
Each test lasted for 1500 amp-hr (about one month), and the anodes were weighed four
times during the experiments after a plating cycle. A thin brown film wad rubbed off
the anodes prior to weighing. During the day, plating was cycled on and off every
30 minutes. Plating, heating and stirring were turned off at night. Chromic acid was
replenished during the tests. Seven liters of HEEF-25 plating solution (containing
250 grams/liter [g/l.] of chromic acid and 3.5 g/l. of methyl sulfonic acid and 2.5
g/l. of sulfate ion) were prepared at the start of each experiment, and the solution
divided into two 4-liter beakers. The anodes were 15 centimeter [cm] x 7.6 cm x 1
cm) Pb 7% Sn, With 12.7 cm x 7.6 cm x 1 cm in the solution. About 225 cm² of anode
were in the solution. The cathodes were 0.95-cm diameter drill rods. The auxiliary
cathode was a chromium-plated rod, and was not cleaned or changed during the test.
The results are shown in Tables 1 and 2.
TABLE I
0.02% OF PLATING CURRENT at 2.0 VOLTS |
Amp.Hr. |
Anode Mass, g. |
Mass Loss, g. |
Corrosion Difference, Per Cent |
|
Control |
Test |
Control |
Test |
|
0 |
1144.1 |
1142.8 |
-- |
-- |
-- |
572 |
1134.6 |
1135.1 |
9.5 |
7.7 |
18.9 |
896 |
1128.1 |
1129.4 |
16.0 |
13.4 |
12.3 |
1477 |
1115.6 |
1118.0 |
28.5 |
24.8 |
11.4 |
TABLE 2
0.1% OF PLATING CURRENT at 2.15 VOLTS |
Amp/Hr. |
Anode Mass, g. |
Mass Loss, g. |
Corrosion Difference, Per Cent |
|
Control |
Test |
Control |
Test |
|
0 |
1107.0 |
1109.2 |
-- |
-- |
-- |
508 |
1098.8 |
1103.9 |
8.2 |
5.3 |
35 |
1014 |
1088.5 |
1098.0 |
18.5 |
11.2 |
43 |
1688 |
1076.0 |
1092.4 |
31.0 |
16.8 |
55 |
[0017] Table 1 demonstrates that with anodic protection of 2.0 v. less than 0.02% of the
plating current, the test anode corroded 10 to 20% less than the control anode. Table
2 shows that at 2.15 v. less than 0.1% of the plating current, the test anode corroded
35 to 55% less than the control anode. It is seen, therefore, that anodes with protection
showed a mass loss of up to about half that found with anodes used without protection.
In both determinations, the control anodes corroded at the same rate within 1%.
[0018] Having described preferred embodiments of the invention, those skilled in the art
will realize that the present invention should not be limited only thereto.
1. Apparatus for chromium electroplating comprising a lead or lead-alloy anode (1),
a cathode (3), and means (4) for applying an electroplating potential and current
to an article to be plated, characterised in that it has anode protection means comprising a circuit (2,5,6) for applying a protective
potential, less than the normal electroplating potential, on said anode (1) to inhibit
corrosion thereof.
2. Apparatus according to claim 1 wherein the anode protection means are adapted to
apply the protective potential at a low current.
3. Apparatus according to claim 2 wherein said low current is from about 0.01 to about
0.3% of the electroplating current.
4. Apparatus according to claim 3 wherein said low current is about 0.02% of the electroplating
current.
5. Apparatus according to any one of the preceding claims, wherein the anode protection
circuit is adapted to apply the protective potential when electroplating is not taking
place.
6. Apparatus according to any one of the preceding claims wherein the anode protection
circuit comprises a rectifier.
7. Apparatus according to claim 6 wherein the rectifier comprises a diode.
8. Apparatus according to any one of the preceding claims wherein the anode protection
circuit was adapted to apply a protective potential of from about 1.8 to about 2.2
volts.
9. Apparatus according to claim 8 wherein the anode protection circuit is adapted
to apply a protective potential of from about 2.0 to about 2.15 volts.
10. Apparatus according to any one of the preceding claims wherein the anode protection
circuit is an auxiliary circuit.
11. Apparatus according to any one of the preceding claims wherein the anode protection
circuit comprises an auxiliary cathode (2).
12. Apparatus according to claim 11 wherein the anode protection circuit comprises
an auxiliary power supply (5) operable at low voltage and current.
13. A method of inhibiting corrosion of a lead or lead-alloy anode (2) in a chromium
electroplating system, characterised by applying a protective potential, less than the normal plating potential, on the anode.
14. A method according to claim 13 in which the protective potential is supplied at
a low current.
15. A method according to claim 14 in which the current is from about 0.01 to about
0.3% of the normal electroplating current.
16. A method according to any one of claims 13 to 15 in which the protective potential
is from about 1.8 to about 2.2 volts.
17. A method according to any one of claims 13 to 16 wherein the protective potential
is applied when electroplating is not taking place.
18. A method according to any one of claims 13 to 17 wherein the protective potential
is applied between the anode (1) and an auxiliary cathode (2).