[0001] The present invention relates to a novel oxygen-generating electrode and to a method
for the preparation thereof. More particularly, the invention relates to an electrode
which has an excellent durability and low oxygen overvoltage for generating oxygen
by the electrolytic oxidation of an aqueous solution at an anode, as well as to a
method for the preparation thereof.
[0002] Conventional metallic electrodes widely used in the electrolytic industry include
those prepared by providing a coating layer of a platinum group metal or an oxide
thereof on an electroconductive substrate made of titanium metal.
[0003] For example, known electrodes used as anodes for producing chlorine by the electrolysis
of brine include those prepared by providing a titanium substrate with a coating layer
formed from an oxide mixture of ruthenium and titanium, or an oxide mixture of ruthenium
and tin (see, for example, Japanese Patent Publications 46-21884, 48-3954 and 50-11330).
[0004] Besides the above mentioned process of electrolysis of brine in which chlorine is
produced as the electrolytic product, various processes are known in the electrolytic
industry in which oxygen is generated at the electrode. Examples of such oxygen-generating
electrolytic processes include the recovery of spent acids, alkalis or salts; electrolytic
metallurgy of copper, zinc, etc; metal plating and cathodic protection.
[0005] These oxygen-generating electrolytic processes require electrodes which are different
from the electrodes successfully used in the electrolytic processes accompanied by
the generation of chlorine. When an electrode for the chlorine-generating electrolysis,
such as the above mentioned titanium-based electrode having a coating layer of an
oxide mixture of ruthenium and titanium or ruthenium and tin, is used in an oxygen-generating
electrolytic process, the electrolysis must be discontinued due to the rapid corrosion
of the electrode. Thus, the electrodes must be specialized for the particular electrolytic
processes. The electrodes most widely used in oxygen-generating electrolysis are lead-based
electrodes and soluble zinc anodes, although other known and usable electrodes include
iridium oxide and platinum-based electrodes, iridium oxide and tin oxide-based electrodes
and platinum-plated titanium electrodes.
[0006] These conventional electrodes are not always satisfactory due to the problems which
may arise depending on the particular oxygen-generating electrolytic process. When
a soluble zinc anode is used in zinc plating, for example, the anode is consumed so
rapidly that adjustment of the electrode distance must be frequently performed. When
a lead-based insoluble electrode is used for the same purpose, a small amount of lead
in the electrode is dissolved in the electrolyte solution thus affecting the quality
of the plating layer. Platinum-plated titanium electrodes are also subject to rapid
consumption when used in a so-called high-speed zinc plating process at a high current
density of 100 A/dm² or higher.
[0007] Accordingly, it is an important technical problem in the technology of electrode
manufacture to develop an electrode useful in an oxygen-generating electrolytic processes
which can be used with versatility in various processes without the above mentioned
drawbacks.
[0008] When an oxygen-generating electrolytic process is performed using a titanium-based
electrode having a coating layer thereon, on the other hand, it is rather usual that
an intermediate layer of titanium oxide is formed between the substrate surface and
the coating layer thus causing a gradual increase in the anode potential which may
result in the coating layer falling from the substrate surface which is in a passive
state. Various attempts and proposals have been made to provide an appropriate intermediate
layer between the substrate surface and the coating layer in order to prevent the
subsequent formation of a layer of titanium oxide (see, for example, Japanese Patent
Publications 60-21232 and 60-22074 and Japanese Patent Kokai 57-116786 and 60-184690).
[0009] An electrode having an intermediate layer provided as mentioned above is not as effective
as desired when the electrode is used in an electrolytic process at a high current
density because the electroconductivity of the intermediate layer is usually lower
than the overcoating layer.
[0010] It has also been proposed to provide an intermediate layer formed by dispersing platinum
in a matrix of a non-precious metal oxide (see Japanese Patent Kokai 60-184691) or
to provide an intermediate layer formed from an oxide of a valve metal, e.g., titanium,
zirconium, tantalum and niobium, and a precious metal (see Japanese Patent Kokai 57-73193).
These electrodes also possess disadvantages because platinum does not have a very
high corrosion resistance in particular in the former type and, in the latter type,
the valve metal oxide and the compounding amount thereof are not without inherent
limitations.
[0011] Furthermore, Japanese Patent Kokai 56-123388 and 56-123389 disclose an electrode
having an undercoating layer containing iridium oxide and tantalum oxide on an electroconductive
metal substrate and an overcoating layer of lead dioxide. The undercoating layer in
this electrode, however, serves merely to improve the adhesion between the substrate
surface and the overcoating layer of lead dioxide to exhibit some effectiveness in
preventing corrosion due to pin holes. When such an electrode is used in an oxygen-generating
electrolytic process, disadvantages are caused because of the insufficient effect
of preventing formation of titanium oxide and the unavoidable contamination of the
electrolyte solution with lead.
[0012] We have now developed a novel and improved electrode suitable for use in an oxygen-generating
electrolytic process which is free from the above described problems and disadvantages
in the prior art electrodes.
[0013] The electrode of the present invention suitable for use in an oxygen-generating electrolytic
process is an integral body composed of:
(A) an electroconductive substrate made of a metal which is preferably titanium;
(B) an undercoating layer on the substrate surface formed of a binary mixture of iridium
oxide and tantalum oxide each in a molar proportion in the range from 50% to 90% and
from 50% to 10%, respectively, calculated as iridium metal and tantalum metal; and
(C) an overcoating layer of iridium oxide in an amount in the range from 0.05 to 3
mg/cm², calculated as iridium metal.
[0014] As is described above, the electrode of the invention has a basic structure in which
an electroconductive substrate of a metal such as titanium is provided with an undercoating
layer formed of a binary oxide mixture composed of iridium oxide and tantalum oxide
and an overcoating layer of iridium oxide. Such an undercoating layer of a mixed oxide
can be formed by coating the substrate surface with a coating solution containing
an iridium compound and a tantalum compound each of which decomposes on heating to
form the respective oxides, followed by a heat treatment in an oxidizing atmosphere
to convert the thermally decomposable compounds into the respective metal oxides.
[0015] Examples of the metal from which the electroconductive substrate is formed include
so-called valve metals such as titanium, tantalum, zirconium and niobium as well as
alloys of these metals, of which titanium is preferred in the invention. The substrate
shaped from these metals or alloys in an appropriate form of electrode is first provided
as mentioned above with an undercoating layer of the binary oxide mixture. Examples
of suitable thermally decomposable compounds of iridium and tantalum include chloroiridic
acid H₂IrCl₆.6H₂O and tantalum halides and tantalum alkoxides, e. g., tantalum pentaethoxide
Ta(OC₂H₅)₅, tantalum pentapropoxide Ta(OC₃H₇)₅ and tantalum pentabutoxide Ta(OC₄H₉)₅,
respectively, convertible into the respective oxides. The coating solution can be
prepared by dissolving these compounds in a suitable organic solvent such as butyl
alcohol in a proportion to give a mixed-oxide coating layer in which the molar proportions
of iridium and tantalum calculated as metals are in the ranges from 50% to 90% for
iridium and from 50% to 10% for tantalum or preferably, from 50% to 70% for iridium
and from 50% to 30% for tantalum. When the proportion of the tantalum oxide is too
large, the undercoating layer is less effective in providing protection of the substrate
surface and adhesion between the substrate surface and the undercoating layer may
be somewhat decreased in addition to the disadvantage of a decreased electroconductivity
of the coating layer
per se. The substrate coated with the coating solution is dried and subjected to heat treatment
at a temperature in the range from 400 to 500°C in an oxidizing atmosphere containing
oxygen, such as air, for a length of time of 1 to 30 minutes. When the atmosphere
for the heat treatment is not fully oxidizing, the metal compounds can be oxidized
into the respective oxides only incompletely to leave an amount of metallic constituents
badly influencing the durability of the electrode. The thickness or coating amount
of the undercoating layer is not particularly limited but it should be at least 0.2
mg/cm² calculated as iridium metal. When the coating amount is too small, insufficient
protection of the substrate surface is obtained. If necessary, the cycle of coating
with the coating solution and heat treatment to effect thermal oxidative decomposition
of the metal compounds is repeated several times until the coating amount of the oxide
mixture has reached the above mentioned preferred range.
[0016] When the undercoating layer composed of the binary oxide mixture of iridium oxide
and tantalum oxide is formed in the above described manner, the undercoating layer
is further coated with an overcoating layer of iridium oxide. Such a coating layer
of iridium oxide can be formed by coating the surface with a coating solution prepared
by dissolving a thermally decomposable iridium compound in an organic solvent followed
by a heat treatment in an oxidizing atmosphere. The coating amount of the overcoating
layer should be in the range from 0.05 to 3 mg/cm² calculated as iridium metal. When
the coating amount of the overcoating layer is too small, a disadvantage is that the
consumption of the electrode in the electrolytic process is increased to effect the
durability of the electrode. When the coating amount of the overcoating layer is too
large, on the other hand, an adverse influence is that the adhesive strength of the
active electrode film is decreased together with an eventual increase in the anode
potential within a short time in the course of the electrolytic process.
[0017] The procedure for providing the overcoating layer of iridium oxide is similar to
the process for forming the binary mixed-oxide undercoating layer of iridium and tantalum
oxides. Thus, a thermally decomposable iridium compound such as chloroiridic acid
is dissolved in an organic solvent and the substrate provided with the undercoating
layer of iridium and tantalum oxides is coated with the solution, dried and subjected
to a heat treatment at a temperature in the range from 400 to 550°C in an oxidizing
atmosphere. The cycle of coating with the solution of the iridium compound and heat
treatment may be repeated several times until the coating amount has reached the desired
range mentioned above.
[0018] In the following, the electrode suitable for use in an oxygen-generating electrolytic
process according to the invention is described in more detail by way of examples
and comparative examples which should not be construed as limiting the scope of the
present invention in any way.
Example 1.
[0019] A first coating solution was prepared by dissolving chloroiridic acid H₂IrCl₆·6H₂O
and tantalum pentabutoxide Ta(OC₄H₉)₅ in n-butyl alcohol each in such an amount that
the molar ratio of iridium to tantalum as metals was 60:40 and the total concentration
thereof corresponded to 80 g of the metals per liter.
[0020] An electrode substrate made of titanium metal after an etching treatment using a
hot aqueous solution of oxalic acid was coated by brushing with the coating solution
prepared above and, after drying, subjected to a heat treatment at 450 °C in an electric
oven into which air was blown. The coating layer of mixed oxide thus formed on the
substrate surface had a thickness corresponding to a coating amount of about 0.1 mg/cm²
calculated as metals. This procedure of coating with the coating solution, drying
and a heat treatment in air was repeated 2 to 10 times to prepare five undercoated
electrode bodies having different coating amounts of the mixed oxides of iridium and
tantalum.
[0021] A second coating solution was prepared by dissolving chloroiridic acid in n-butyl
alcohol in such an amount that the concentration of the compound as iridium metal
was 60 g/liter. Each of the electrode bodies having an undercoating layer of a mixture
of iridium and tantalum oxides formed by twice to 8 times repetition of the procedure
of coating with the first coating solution, drying and a heat treatment as well as
a fresh titanium-made electrode substrate was coated with the second coating solution
by brushing and, after drying, subjected to a heat treatment at 450 °C in an electric
oven into which air was blown. This procedure of coating with the second coating solution,
drying and a heat treatment was repeated several times in such a number of repetition
that the total number of the repeated procedures of coating with either the first
or the second coating solution, drying and heat treatment was always 10. In this manner,
six coated electrodes No. 1 to No. 6 were prepared, of which No. 1 was prepared without
undercoating with the first coating solution but 10 times repeated coating with the
second coating solution and No. 6 was prepared with 10 times repeated coating with
the first coating solution but without coating with the second coating solution, No.
2, No. 3, No. 4 and No. 5 being prepared with 2, 4, 6 and 8 times repeated coating
with the first coating solution, respectively, and with 8, 6, 4 and 2 times repeated
coating with the second coating solution, respectively.
[0022] Each of the thus prepared coated electrodes No. 1 to No. 6 was used as the anode
for electrolysis of a 1 mole/liter aqueous solution of sulfuric acid at 60 °C with
a platinum electrode as the cathode at a current density of 150 A/dm² continuously
over a length of time up to 3000 hours under monitoring of the cell voltage. The figure
of the accompanying drawing is a graph showing the change in the cell voltage for
each electrode in the lapse of time. As is clear from this figure, the single-coated
electrodes, i.e. No. 1 and No. 6, failed to serve for continued electrolysis already
after about 1500 hours due to the increase of the cell voltage, which was initially
about 5 volts, to exceed 10 volts. In contrast thereto, the dually coated electrodes,
i.e. No. 2 to No. 5, could serve to continue the electrolysis even after about 3000
hours with little increase in the cell voltage.
[0023] The electrodes No. 1 to No. 5 were subjected to the measurement of the oxygen overvoltage
by the potential scanning method in a 1 mole/liter aqueous solution of sulfuric acid
at 30 °C with a current density of 20 A/dm². The results were: 440 mV, 430 mV, 430
mV, 410 mV and 380 mV for the electrodes No. 1 to No. 5, respectively.
Example 2.
[0024] Four coating solutions for undercoating were prepared each by dissolving chloroiridic
acid H₂IrCl₆·6H₂O and tantalum pentabutoxide Ta(OC₄H₉)₅ in n-butyl alcohol each in
such an amount that the total concentration thereof corresponded to 80 g of the metals
per liter but with varied molar proportions of iridium to tantalum as metals of 20:80,
50:50, 60:40 and 70:30.
[0025] Five titanium-made electrode substrates were coated each with the second coating
solution of tantalum pentabutoxide alone prepared in Example 1 (electrode No. 7)
or one of the above prepared coating solutions of iridium:tantalum molar ratio of
20:80 (electrode No. 8), 50:50 (electrode No. 9) 60:40 (electrode No. 10) and 70:30
(electrode No. 11) followed by drying and a heat treatment at 500 °C in an electric
oven into which air was blown. This procedure of coating with the coating solution,
drying and heat treatment was repeated five times.
[0026] Each of the electrode bodies No. 7 to No. 11 was further coated with the second coating
solution prepared in Example 1 followed by drying and a heat treatment at 500 °C in
an electric oven into which air was blown. This procedure of coating with the second
coating solution, drying and a heat treatment was repeated five times.
[0027] Each of the thus prepared coated electrodes No. 7 to No. 11 was used as the anode
for electrolysis of a 1 mole/liter aqueous solution of sulfuric acid at 60 °C with
a platinum electrode as the cathode at a current density of 200 A/dm² continuously
over a length of time up to 1000 hours under monitoring of the cell voltage. The results
were that the electrodes No. 9, No. 10 and No. 11 could serve to continue the electrolysis
over 1000 hours while the electrolysis could no longer be continued after 200 hours
and 400 hours of continued electrolysis with the electrodes No. 7 and No. 8, respectively.
1. An electrode for use in an oxygen-generating electrolytic process which is an integral
body comprising:
(A) an electroconductive substrate made of a metal;
(B) an undercoating layer formed on the surface of the substrate and composed of a
mixture of an iridium oxide and a tantalum oxide each in a molar proportion in the
range from 50% to 90% and from 50% to 10% respectively, calculated as iridium metal
and tantalum metal; and
(C) an overcoating layer formed on the undercoating layer and composed of iridium
oxide in an amount in the range from 0.05 to 3 mg/cm², calculated as iridium metal.
2. An electrode as claimed in claim 1 wherein the metal forming the electroconductive
substrate is titanium.
3. An electrode as claimed in claim 1 or claim 2 wherein the undercoating layer comprises
at least 0.2 mg/cm² of iridium.
4. An electrode as claimed in any one of the preceding claims wherein the overcoating
layer comprises from 0.05 to 3 mg/cm² of iridium.
5. A method for the preparation of an electrode as claimed in any one of the preceding
claims which comprises the successive steps of:
(a) coating the surface of the substrate with a solution of a thermally decomposable
iridium compound and a thermally decomposable tantalum compound;
(b) subjecting the thus coated substrate to heat treatment in an oxidizing atmosphere
to convert the thermally decomposable iridium compound and the thermally decomposable
tantalum compound into oxides of the respective metals;
(c) coating the surface of the substrate after step (b) with a solution of a thermally
decomposable iridium compound; and
(d) subjecting the thus coated substrate to heat treatment in an oxidizing atmosphere
to convert the thermally decomposable iridium compound into an iridium oxide.
6. A method as claimed in claim 5 wherein the decomposable compound of iridium is
chloroiridic acid.
7. A method as claimed in claim 5 or claim 6 wherein the decomposable compound of
tantalum is a tantalum halide or a tantalum alkoxide.
8. A method as claimed in any one of claims 5 to 7 wherein the heat treatment in steps
(b) and (d) is carried out at a temperature in the range of from 400 to 550°C.