(19)
(11) EP 0 361 516 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
02.05.1991 Bulletin 1991/18

(43) Date of publication A2:
04.04.1990 Bulletin 1990/14

(21) Application number: 89118070.5

(22) Date of filing: 29.09.1989
(51) International Patent Classification (IPC)5: G03F 1/14
(84) Designated Contracting States:
DE FR GB NL

(30) Priority: 30.09.1988 JP 243912/88
30.09.1988 JP 243916/88
30.09.1988 JP 243918/88
31.08.1989 JP 223276/89

(71) Applicant: CANON KABUSHIKI KAISHA
Tokyo (JP)

(72) Inventors:
  • Miyachi, Takeshi
    Zama-shi Kanagawa-ken (JP)
  • Fukuda, Yasuaki
    Hadano-shi Kanagawa-ken (JP)
  • Chiba, Keiko
    Isehara-shi Kanagawa-ken (JP)

(74) Representative: Weser, Wolfgang 
Dres. Weser & Martin, Patentanwälte, Radeckestrasse 43
D-81245 München
D-81245 München (DE)


(56) References cited: : 
   
       


    (54) Method of making X-ray mask structure


    (57) A method of making an X-ray mask structure having an X-ray absorber in a desired pattern on the surface of a support film held by a frame comprises the step of patterning the X-ray absorber, including a drawing step that utlizes charged particles, and the step of thereafter providing the frame with a magnetic member. The frame and the support film are each comprised of a non-magnetic material.







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