(19)
(11) EP 0 389 593 A1

(12)

(43) Date of publication:
03.10.1990 Bulletin 1990/40

(21) Application number: 89910018.0

(22) Date of filing: 18.08.1989
(51) International Patent Classification (IPC): 
G03F 7/ 38( . )
G03F 7/ 16( . )
G03F 7/ 004( . )
H01L 21/ 027( . )
(86) International application number:
PCT/US1989/003524
(87) International publication number:
WO 1990/003597 (05.04.1990 Gazette 1990/08)
(84) Designated Contracting States:
DE FR GB IT NL

(30) Priority: 30.09.1988 US 19880252269

(71) Applicant: MACDERMID, INCORPORATED
Waterbury, CT 06720 (US)

(72) Inventors:
  • JOHN, J., Grunwald
    52 100 Ramat Gan (IL)
  • GAL, Chava
    45 930 Ramot Ha-Shavim (IL)
  • ARONHIME, Marc, T.
    91 999 Jerusalem (IL)

(74) Representative: Pendlebury, Anthony, et al 
PAGE, WHITE & FARRER 54 Doughty Street
London WC1N 2LS
London WC1N 2LS (GB)

   


(54) SOFT-BAKE TREATMENT OF PHOTORESISTS