Pattern forming method

Description

[0001] The present invention relates to a pattern forming method for forming fine-line patterns, and more particularly to a forming method suitable forming a cathode-ray tube anode.

[0002] In the conventional cathode-ray tube anode process of color television manufacture, the surface of the glass substrate composing the phosphor plane was properly treated, and patterned, exposed and developed in a polyvinyl alcoholammonium dichromate photosensitive fluid, then a black substance such as graphite was rolled on the developed pattern, and the black matrix was formed by peeling and processing. The phosphor patterning was a complicated process to form each layer of R, G, B after three repeated sequences of spreading, drying, exposing, developing and drying of the slurry having the phosphor pigment dispersed in the polyvinyl alcohol-ammonium dichromate photosensitive fluid. In addition, before forming the metal-backed layer, an organic film layer was formed on the phosphor film as an interlayer, and the metal-backed layer was subjected to vacuum deposition. Afterwards, the glass substrate was fired at about 450°C and formed.

[0003] The above cathode-ray tube anode forming process is very long and complicated in procedure, and requires a huge volume of water because it is a wet process, and discharges much waste water containing public nuisance materials. Besides, regarding the precision of the pattern formed by the wet process, since exposure and development were repeated, edge linearity, lack of hiding, lack and other defects occurred, and it was difficult to obtain patterns of high quality. Still worse, it required an enormous plant investment because of vacuum deposition of the metal-backed layer.

[0004] Recently, meanwhile, the development of liquid crystal color panel is intensive. The color filter used in this liquid crystal color panel is formed mostly by the technology of photolithography, and the process was very long, including the steps of color film forming, photoresist film forming, exposing and developing, and the yield was very low and the product was hence very expensive.

[0005] To eliminate such defects, various printing methods, that is, dry processes have been proposed. For example, as the ink composition for forming cathode-ray tube anode by screen printing or offset printing, a composition containing acrylic resin was disclosed in the Japanese Patent Publication No. 55-41671, but it was not commercially established yet. The reason is, among others, that a relatively large film thickness is required for the black matrix and the phosphor pattern while very fine-line patterns are needed. To add to the film thickness, the density of the ink layer must be raised, which necessitates a higher ratio of the pigment component in the ink than in the ordinary composition. As a result, however, the printability is extremely impaired, and it is difficult to satisfy the desired pattern precision. Or when the pigment content in the ink is lowered in consideration of printability, the luminance is lowered and other adverse effects are brought about. In other words, in the screen printing intended to print very fine-line patterns of thick film on a glass substrate, the precision is not sufficient, and satisfactory printing is not possible even by the gravure offset printing. Or in the graphite paste for black color printing using only acrylic resin, the adhesion strength to the glass surface was poor, the exfoliation of black matrix and phosphor layer was noted.

[0006] US-A-4209551 discloses a method of manufacturing a phosphor screen for a color picture tube in which an ink pattern contained on an intaglio is printed directly on to a glass substrate. That document is particularly concerned with the composition of the ink used and the relative movement of the various parts of the printing apparatus.

[0007] The present invention provides a method of forming a pattern of an ink layer on a glass substrate comprising the steps of:

forming a pattern of ink on a surface of a blanket whose surface is covered with an elastic materials mainly composed of silicon resin; and

transferring said pattern of the ink on said blanket onto said glass substrate,

   characterized by comprising the steps of:

forming a tacky layer on said glass substrate prior to the step of transferring said pattern of the ink on said blanket onto said glass substrate, said tacky layer being made of one of a resin having a glass transition point of 40°C or less, an ultraviolet setting resin, and a thermoplastic resin; and

transferring said pattern of the ink on said blanket onto said tacky layer formed on said glass substrate.

[0008] The present invention also provides a method of forming a cathode-ray tube anode comprising the steps of:

forming a black matrix layer on a glass substrate;

forming a phosphor layer on said glass substrate on which said black matrix layer has been formed;

forming a metal-back layer by covering said phosphor layer with an aluminium thin film; and

firing said glass substrate,

   characterized in that said step of forming the black matrix layer comprises the steps of:

forming a tacky layer on said glass substrate, said tacky layer being made of one of a resin having a glass transition point of 40°c or less, an ultraviolet setting resin, and a thermoplastic resin;

forming a pattern of a graphite ink on an intaglio;

transferring said pattern of the graphite ink onto a surface of a blanket whose surface is covered with an elastic material mainly composed of silicone resin; and

transferring said pattern of the graphite ink on said blanket onto said tacky layer formed on said glass substrate whereby to form said black matrix layer; and in that

said step of forming the phosphor layer comprises the steps of:

forming a pattern of a phosphor ink on an intaglio;

transferring said pattern of the phosphor ink onto a surface of a blanket whose surface is covered with an elastic material mainly composed of silicone resin;

transferring said pattern of the phosphor ink on said blanket onto said glass substrate on which said black matrix layer has been formed thereby to form said phosphor layer.

[0009] In the performing of these methods graphite ink and phosphor ink suited to this printing method are used, which are excellent in the scattering performance of organic binder even when the black matrix and the phosphor layer are coated with a thin aluminium film having multiple holes as the metal-backed layer after printing, capable of preventing lowering of degree of vacuum caused by deterioration of the scattering performance, strong in adhesion with the glass surface, and also capable of preventing exfoliation of the black matrix and phosphor layer.

[0010] The graphite ink used in preferred embodiments of the method comprises graphite powder, vehicle containing depolymerization type organic binder, and organic acid metal salt. The organic binder of the graphite ink is a resin composed of at least one of poly-α-methyl styrene, poly-iso-butyl methacrylate, polymethyl methacrylate, and poly-4-fluoroethylene. The weight average molecular weight of the organic binder is 100,000 to 1,000 or preferably 10,000 to 1,000. The organic acid metal salt comprises at least one of silicon octoate, aluminium octoate, tin octoate, and zinc octoate, or at least one of silicon neodecanoate, aluminium neodecanoate, tin neodecanoate and zinc neodecanoate. The content of the organic acid metal salt is preferably 10 to 2 wt.%, and most preferably 6 to 2 wt.%.

[0011] The phosphor ink used in preferred embodiments of the method comprises phosphor powder and vehicle containing depolymerization type organic binder. The organic binder of the phosphor ink is a resin composed of at least one of poly-α-methyl styrene, poly-iso-butyl methacrylate, polymethyl methacrylate and poly-4-fluoroethylene. The weight average molecular weight of the organic binder is 100,000 to 1,000, or preferably 40,000 to 1,000. The organic solvent in the ink comprises at least one of α-terpineol, n-butylcarbitol, n-butylcarbitol acetate, 2,2,4-trimethyl-1,3-hydroxypentyl-iso-butylate, linseed oil, and ethylene glycol monophenyl ether. Considering the linearity of print pattern, the content of this organic solvent is preferably 12:10 to 16:10 by weight of the graphite powder content in the graphite ink, and 1.5:10 to 3.0:10 by weight of the phosphor powder content in the phosphor ink.

[0012] In the constitution of the invention as described herein, the ink characteristics such as fluidity and tackiness necessary for transfer from blanket to substrate are not limited, and a wide range of materials may be used as the pattern forming material. That is, very fine-line thick film patterns may be formed easily on the substrate, and when this method is employed in formation of phosphor plane for CRT or plasma display, very fine-line graphite pattern and phosphor pattern may be easily formed on the substrate. This method is also free from problems experienced in the conventional wet process, that is, use of large volume of water and discharge of waste water containing public nuisance materials. Still more, vacuum deposition is not needed. Therefore, the manufacturing cost may be reduced greatly. From the viewpoint of precision, patterns of high quality are obtained. Furthermore, the black matrix and phosphor layer having a strong adhesive strength with the glass surface are formed, and a cathode-ray tube of high reliability may be presented.

[0013] It is also effective to apply in formation of color filters and pattern formation of circuit substrates.

[0014] As clear from the description herein, the method provides the formation of fine-line thick film patterns by transferring the patterns formed on the blanket the surface of which is coated with an elastic material mainly composed of silicone resin onto a substrate on which a tack layer is formed. By simplifying the process, the cost may be notably reduced. When this technique is applied in cathode-ray tube, plasma display or other phosphor products, or liquid crystal color filter and other pattern products, inexpensive products of high quality may be obtained without requiring any large manufacturing equipment.

Fig. 1 is an explanatory drawing of pattern forming method of the invention,

Fig. 2 is a sectional view of a color cathode-ray tube anode,

Fig. 3 is a diagram of the amount of exhaust gas expressing the exhaust gas amount curve 301 from the cathode-ray tube anode being formed with respect to the ratio of polymerization of iso-butyl methacrylate and α-methyl styrene,

Fig. 4 is a transfer amount diagram expressing the transfer amount curve 401 of the phosphor ink to the transfer object, together with the organic solvent/phosphor powder ratio (by weight), and

Fig. 5 is a weight loss diagram expressing the weight loss curve 501 showing the relation between the weight loss right after firing by cleaning and drying the cathode-ray tube anode (25 cm²), and the content of silicon octoate in the graphite ink.

[0015] Referring now to the drawings, an embodiment of the pattern forming method of the invention is described in detail below. Fig. 1 is an explanatory drawing of the pattern forming method of the invention. In Fig. 1, numeral 101 is a substrate. Numeral 102 is a tack or adhesive layer formed in order to enhance the printability when forming patterns, which may be either a tacky adhesive material at ordinary temperature or a thermoplastic resin to be used in tacky adhesive state by heating and melting. Alternatively by using a tacky adhesive material which is cured by ultraviolet rays, the pattern of a specific part may be solidified. Numeral 103 is a blanket the surface of which is coated with a rubber-like elastic body with a favorable parting property, and among silicone resins, fluoroplastics and polyethylene resins, what is preferably used is an elastic material with JIS rubber hardness of 30 to 60 degrees, mainly composed of silicone resin, with the surface being covered in a thickness of about 5 mm. Numeral 104 is a pattern formed on the blanket, in which ink is dropped into the gravure intaglio, the entire surface of the gravure intaglio is scraped by a scraper to leave the ink only in the groove, and the blanket is pressed against the surface to transfer the pattern. Numeral 105 is a desired pattern obtained by pressing and transferring the pattern on the blanket onto the substrate on which the tack layer has been formed. The pattern 104 on the blanket may be formed by using a letterpress or by screen printing, as well as by transfer from the intaglio.

[0016] As a product requiring a pattern (hereinafter called a pattern product), an example of anode formation of a color cathode-ray tube is presented and a forming method of a cathode-ray tube anode according to the invention as well as different types of graphite ink and phosphor ink used in the performing of the methods, are described below while referring to the accompanying drawings. Fig. 2 is a sectional view of a color cathode-ray tube anode, in which a black matrix 202 made of a black substance and a phosphor layer 203 are formed inside a glass-made face plate 201, and on which a metal-backed layer 204 is disposed. The metal-backed layer 204 is intended to enhance the luminance by reflecting the light emitted from the phosphor plane by the mirror action of the metal film. In the invention, instead of vacuum deposition, the aluminum thin film having multiple pores is transferred and formed before firing.

Example 1

[0017] Using a three roll mill, the mill base in the composition specified below was passed six times to mix, and a graphite ink for black stripe was prepared. At this time, the resin was preliminarily stirred and dissolved in the solvent.

• Graphite (Hitachi Powder Metal Co., GP-60S)    26 (parts by weight)
     Mean particle size 0.4 µm
• i-BMA, α-MeSt resin (Sekisui Chemical Co., IBS-6)    34
     Weight average molecular weight 4750
• Solvent (Kanto Chemical Co., n-butylcarbitol acetate)    34
• Adhesive agent (silicon octoate)    3
• Dispersing agent (Toho Chemical Co., Dispant EN-120A)     3

[0018] The one-minute flow value of the prepared ink on a spread meter was 13 mm, and by using this graphite ink, a stripe of 65 µm in width and 4 µm in height was printed on a glass plate. The printing method is shown below. The tacky adhesive material (isodecylmethacrylate, glass transition point -60°C, 30% toluene solution) was applied on the glass plate by spin coating to have a thickness of 2 µm, and dried to obtain the transfer object. The tacky adhesive material should be preferably a material that is adhesive at ordinary temperature and is completely pyrolyzed in the binder removal process at the final step, and an acrylic resin with the glass transition point of 40°C or less was favorable. The intaglio was a stainless steel plate having stripe etching of 70 µm in width and 15 µm in depth. The graphite ink was dropped on the intaglio, and the whole surface of the intaglio was scraped off by a ceramic scraper to leave the graphite ink only in a groove of the intaglio. The blanket having its surface coated with silicone rubber (JIS rubber hardness 35 degrees) having a thickness of 5 mm was pressed and rotated to transfer the pattern on the transfer object. The pattern obtained was excellent in linearity, and had a high quality, being free from lack of hiding, lack or other defects.

[0019] If the hardness of the silicone rubber covering the surface of the blanket is very low (less than 10 degrees) such as in the case of Pad printing, the deformation of the rubber-like elastic material becomes very large, and the intaglio pattern cannot be reproduced reliably. If the hardness is too high, the contact between the blanket and ink is poor, and the pattern cannot be reproduced reliably, too. Hence, the proper hardness of the elastic material for covering the surface was 30 degrees or more than the JIS rubber hardness, and preferably in a range of 35 to 60 degrees.

[0020] Next, using a ceramic three roll mill, the mill base of the following composition was passed six times to mix, and a phosphor ink was prepared. The resin was, as in the case of graphite ink, preliminarily stirred and dissolved in the solvent.

• Green phosphor (ZnS:Cu, Al)   73 (parts by weight)
     Mean particle size 5.2 µm
• α-BMA, MMA, a-MeSt resin (Sekisui, IBM7L-3)   10
     Weight average molecular weight 32070
• Solvent (Kanto, α-terpineol)   15
• Dispersing agent (Toho, Dispant EN-120A)   2

[0021] Similarly, using Y₂O₂S:Eu as red luminescent phosphor, and ZnS:Ag as blue luminescent phosphor, red phosphor ink and blue phosphor ink were prepared. As the intaglio, a stainless steel etching plate of 145 µm in width and 40 µm in depth was used, and a green phosphor pattern was printed on a glass plate in a same gravure offset method as in the preceding example. Sequentially, the red phosphor ink and blue phosphor ink were printed in specified positions, and a three-color phosphor pattern of red, green and blue was obtained. The printed pattern satisfied all of stripe uniformity, linearity and film thickness precision.

[0022] As the metal-backed layer, in the next step, multiple fine pores were opened in an aluminum thin film of 150 nm (1500 angstroms) thickness being evaporated on a polyethyleneterephthalate (PET) film, and it was pressed with a pressure of 3 kg/mm² and was transferred on the black matrix and phosphor pattern. When this substrate was fired at 450°C, the organic matter was burnt out, and a sufficient optical characterization was obtained as the color cathode-ray tube anode.

Example 2

[0023] Using a three roll mill, the mill base of the following composition was passed six times to mix, and a graphite ink for black stripe was prepared in the same procedure as in Example 1.

• Graphite (Hitachi Powder Metal Co., GP-60S)   24 (parts by weight)
     Mean particle size 0.4 µm
• i-BMA, α-MeSt resin (Sekisui Chemical Co., IBS-6)  32
     Weight average molecular weight 4750
• Solvent (Kanto Chemical Co., n-butylcarbitol acetate)   32
• Adhesive agent (silicon octoate)   5
• Dispersing agent (Tcho Chemical Co., Dispant EN-120A)   3
• Linseed oil   4

[0024] An acrylic tacky adhesive material with the glass transition point of -2°c (a copolymer of isobutylmethacrylate and glycidyl methacrylate) was applied on a glass substrate and dried, and a tack layer of 3 µm was formed. Using the ink for black stripe in the above composition, a black stripe pattern was printed on the glass substrate on which the tack layer was formed, using an intaglio (60 µm in width, 20 µm in depth) and blanket (rubber hardness 45 degrees, silicone rubber, rubber thickness 6 mm). The printed black stripe pattern was 55 µm in width and 5 µm in thickness, and a favorable linearity was confirmed.

[0025] Subsequently, as in Example 1, using a ceramic three roll mill, the mill base of the following composition was passed six times to mix, and a phosphor ink was prepared.

• Blue phosphor (ZnS:Ag)   73 (parts by weight)
     Mean particle size 5.2 µm
     With cobalt blue pigment
• i-BMA, α-MeSt resin (Sekisui, IBS-3)   10
     Weight average molecular weight 98300
• Solvent (Kanto, α-terpineol)   15
• Dispersing agent (Toho, Dispant EN-120A)   2

[0026] Likewise, using Y₂O₂S:Eu phosphor as red luminescent phosphor and ZnS:Ag as blue luminescent phosphor, a red phosphor ink and a blue phosphor ink were prepared. As the intaglio, a stainless steel etching plate of 145 µm in width and 40 µm in depth was used, and the green phosphor pattern was printed on the glass plate by the same offset gravure method as in Example 1. Successively, the red phosphor ink and blue phosphor ink were printed at specified positions, and a three-color phosphor pattern of red, green and blue was obtained. The printed pattern satisfied all of the stripe uniformity, linearity and film thickness precision.

[0027] Next, as the metal-backed layer, multiple fine pores were opened in an aluminum thin film of 150 nm (1500 angstrom) thickness evaporated on a PET film, and it was pressed with a pressure of 3 kg/mm² to transfer on the black matrix and phosphor pattern. This substrate was fired at 450°C, and the organic matter was burnt out, and a sufficient optical characterization was obtained as a color cathode-ray tube anode.

[0028] Thus obtained phosphor plane was free from dropout of phosphor, lack of hiding, lack and other defects because exposure and development were not repeated as in the conventional wet process, and the phosphor plane of high quality was obtained. Besides, by forming the phosphor plane by continuous printing of black matrix and phosphor pattern, and also by transferring of aluminum thin film having multiple pores before firing, instead of forming vacuum deposition film as metal-backed layer, the procedure is simplified, and the number of steps is decreased. Still more, the phosphor is free from deterioration due to chrome ions such as ammonium dichromate, and a pattern of uniform thickness of 10 to 12 µm which is said to be an ideal film thickness for the phosphor is obtained, so that a cathode-ray tube about 10% brighter as compared with the prior art is realized. The phosphor plane obtained in this manner was satisfactory as the anode for cathode-ray tube or plasma display.

[0029] It is a feature of the ink used when performing the methods that deterioration of degree of vacuum due to worsening of the scattering performance may be prevented even if fired by covering the black matrix and phosphor layer with aluminum thin film possessing multiple pores before firing, instead of forming the vacuum deposition film as metal-backed layer after ink printing and firing, so that the process may be further simplified.

[0030] Fig. 3 shows a curve 201 of the amount of exhaust gas (40°C, 1 hour) from the formed cathode-ray tube anode, in terms of the ratio of polymerization of iso-butyl methacrylate and α-methyl styrene. Generally, the degree of vacuum applicable as the cathode-ray tube anode is in the order to 10^-7 to 10^-6, and as known from the diagram, α-methyl styrene was 5 to 20 wt.% in the region where the amount of the exhaust gas was in the order of 10^-6.

[0031] Fig.4 is a transfer amount diagram showing the transfer amount curve 301 of the phosphor ink to the transfer object, together with the organic solvent/phosphor powder amount ratio (by weight) when the phosphor powder and organic solvent in Example 2 are used. At this time, the region of the largest transfer amount was the region of the organic solvent/phosphor powder ratio (by weight) of 0.15 to 0.30. Similarly, the organic solvent/graphite powder amount ratio (by weight) of the graphite ink was 1.2 to 1.6.

[0032] Fig. 5 shows the weight loss curve 401 showing the relation between the weight loss immediately after firing and the content of silicon octoate in the graphite ink in the case of washing and drying of cathode-ray tube anode (25 cm²) in running water with water pressure of 0.1 kg/cm² and water flow of 1200 ml/min. As known from Fig. 5, the weight loss was less with the silicon octoate content between 10 and 2 wt.%, and it is known that the adhesive strength is markedly increased. The most preferable content of silicon octoate was 6 to 2 wt.%.

[0033] As the resin, meanwhile, in Example 1 and Example 2, a copolymer of iso-butyl methacrylate (iBA) and poly-α-methyl styrene (α-MeSt), and a copolymer of poly-iso-butyl methacrylate (iBMA), polymethyl methacrylate and poly-α-methyl styrene (α-MeSt) were used, but individual monomers may be also used.

[0034] In general acrylic resin (for example, n-butyl methacrylate), however, the scattering performance was poor, and it was not practicable. In addition, it is also possible to use polytetrafluoroethylene or polybutene. This is possible, of course, in consideration of the miscibility of resins and dissolution amount into the solvent. Furthermore, to improve the dispersion of the pigment, glycidyl methacrylate or the like may be copolymerized within 5%. In the resin, however, it is required to contain α-methyl styrene by at least 5 to 20 wt.%, and out of this range or with the acrylic resin alone, the scattering performance of the resin is poor, and the degree of vacuum of the formed cathode-ray tube deteriorates. Incidentally, if the average molecular weight of the resin is more than 100,000, the ink viscosity becomes high, which is not suited to printing, or if less than 1000, the scattering performance in firing is worse. That is, the average molecular weight of the resin should be preferably at 100,000 to 1,000 or more preferably 10,000 to 1,000.

[0035] As the organic solvent, in Example 1 and Example 3, butylcarbitol acetate was used, and α-terpineol in Example 2, but these are not limitative, and butylcarbitol, 2,2,4-trimethyl-1-3-hydroxybentyl isobutylate, and ethyleneglycol monophenyl ether may be used either alone or in combination, which may be selected depending on the printing condition and drying condition.

[0036] As the organic acid metal salt in the graphite ink, silicon octoate was used in Example 1 and Example 2, but it is not limitative, and as the organic acid metal salt, at least one of silicon octoate, aluminum octoate, tin octoate and zinc octoate, or at least one of silicon neodecanoate, aluminum neodecanoate, tin neodecanoate and zinc neodecanoate may be used, and the contents of these organic acid metal salts may be preferably 10 to 2 wt.% in consideration of the scattering performance of the resin, and the most preferable content is 6 to 2 wt.%. As the graphite powder, in Example 1 and Example 2, powder with average particle size of 0.4 µm was used, but the average particle size may be sufficient in a range of 0.2 to 1.0 µm. As the phosphor powder, in Example 1 and Example 2, the average particle size of 5.2 µm is used, but this value is not limitative, and the average particle size of 2.0 to 15.0 µm is applicable. In Example 2, red, green and blue phosphor powders were used, but as the blue luminescent phosphor, either the pigmented phosphor combined with blue pigment, such as cobalt blue pigment, or the phosphor alone may be used. Likewise as the green luminescent phosphor, either the pigmented phosphor combined with green pigment, such as chromium oxide pigment, or the phosphor alone may be used. As the phosphor powder, as far as it is applicable to phosphor for television, display, projection tube and special tube or the like, for example, not only Y₂O₂S:Eu phosphor stated above, but also Y₂O₃:Eu, YVO₄:Eu, CaS:Eu or the like may be used as the red luminescent phosphor, Zn₂SiO₄:Mn, As, (Y, Gd)₂O₂S:Tb, InBO₃:Tb, Y₂SiO₅:Tb, LaOCl:Tb or the like as the green luminescent phosphor, Y₂SiO₅:Ce, (SrcaBa)₅ (PO₄)₃Cl:Eu or the like as the blue luminescent phosphor, and InBO₃:Eu or the like as the orange luminescent phosphor.

Example 3

[0037] An embodiment of color filter of liquid crystal is demonstrated below as a pattern product.

[0038] In the following composition, by passing five times in a three roll mill to mix, a red ink of color filter for liquid crystal was prepared.

• Oligoester acrylate (Toa Gosei Co.)    50 (parts by weight)
• Vinyl ester (Showa Polymer Co.)     30
• Dispersing agnet (ICI, Japan)     2
• Pigment, red (Ciba Geigy)     11
• Pigment, yellow (Sanyo Pigment Co.)     2
• Hardening agent (Mark Co.)     5

[0039] In the same manner as above, blue ink and green ink were also prepared by using different pigments.

[0040] On a glass substrate, an ultraviolet setting resin (Goselac, Nippon Gosei Kagaku Co.) was formed. Using the inks for color filter in the composition above, after printing in the conditions of gravure intaglio (width 120 µm, depth 15 µm) and blanket (silicone rubber hardness 45 degrees, rubber thickness 8 mm), ultraviolet rays were emitted to cure, and a pattern with excellent lincarity of 100 µm was obtained. These patterns of three colors were excellent as the color filter for liquid crystal.

Claims

1. A method of forming a pattern (105) of an ink layer on a glass substrate (101,201) comprising the steps of:

forming a pattern of ink on a surface of a blanket (103) whose surface is covered with an elastic material mainly composed of silicone resin; and

transferring said pattern of the ink on said blanket onto said glass substrate,

   characterized by comprising the steps of:

forming a tacky layer (102) on said glass substrate prior to the step of transferring said pattern of the ink on said blanket (103) onto said glass substrate (101,201), said tacky layer being made of one of a resin having a glass transition point of 40°C or less, an ultraviolet setting resin, and a thermoplastic resin; and

transferring said pattern of the ink on said blanket (103) onto said tacky layer (102) formed on said glass substrate (101,201).

2. The method according to claim 1, wherein said tacky layer (102) is thermoplastic resin, said thermoplastic resin being heated in the step of transferring said pattern on said blanket onto said tacky layer.

3. The method according to claim 1, further comprising a step of firing the substrate (101,201) having thereon said tacky layer (102) onto which said pattern of the ink has been transferred.

4. The method according to claim 1, wherein the step of forming a pattern of an ink on the surface of said blanket (103) comprises the steps of:

forming a pattern of an ink on an intaglio by filling a pattern of grooves formed on said intaglio; and

transferring the pattern of the ink on said intaglio onto the surface of said blanket (103).

5. The method according to claim 1, wherein the step of forming a pattern of an ink on the surface of said blanket (103) comprises the step of:

filling a pattern of grooves formed on an intaglio with a mixture of at least a phosphor powder and an ink mainly composed of a resin which is removable by pyrolysis or combustion to form a pattern of the mixture on said intaglio; and

transferring said pattern of the mixture on said intaglio onto the surface of said blanket (103) to form a pattern of the mixture on said blanket (103).

6. The method according to claim 1, wherein the step of forming a pattern of an ink on the surface of said blanket (103) comprises the steps of:

filling a pattern of grooves formed on an intaglio with a mixture of at least a photo-absorbent powder and an ink mainly composed of a resin which is removable by pyrolysis or combustion to form a pattern of the mixture on said intaglio; and

transferring said pattern of the mixture on said intaglio onto the surface of said blanket (103) to form a photo-absorbing pattern on said blanket (103), and

wherein said method further comprises a step of forming a phosphor layer on said photo-absorbing pattern.

7. The method according to claim 1, wherein the step of forming a pattern of an ink on the surface of said blanket (103) comprises the steps of:

forming a pattern of a graphite ink on an intaglio by filling a pattern of grooves formed on said intaglio; and

transferring the pattern of the graphite ink on said intaglio onto the surface of said blanket (103) to form a pattern of the graphite ink on said blanket (103).

8. A method of forming a cathode-ray tube anode comprising the steps of:

forming a black matrix layer (202) on a glass substrate (101,201);

forming a phosphor layer (203) on said glass substrate on which said black matrix layer has been formed;

forming a metal-back layer (204) by covering said phosphor (203) layer with an aluminium thin film; and

firing said glass substrate,

   characterized in that said step of forming the black matrix layer (202) comprises the steps of:

forming a tacky layer (102) on said glass substrate, said tacky layer being made of one of a resin having a glass transition point of 40°c or less, an ultraviolet setting resin, and a thermoplastic resin;

forming a pattern of a graphite ink on an intaglio;

transferring said pattern of the qraphite ink onto a surface of a blanket (103) whose surface is covered with an elastic material mainly composed of silicone resin; and

transferring said pattern of the graphite ink on said blanket (103) onto said tacky layer (102) formed on said glass substrate thereby to form said black matrix layer (202); and in that

said step of forming the phosphor layer (203) comprises the steps of:

forming a pattern of a phosphor ink on an intaglio;

transferring said pattern of the phosphor ink onto a surface of a blanket (103) whose surface is covered with an elastic material mainly composed of silicone resin ;

transferring said pattern of the phosphor ink on said blanket onto said glass substrate (201) on which said black matrix layer (202) has been formed thereby to form said phosphor layer (203).

9. The method according to claim 8, wherein the step of forming said metal-back layer (204) comprises the steps of:

forming an aluminium thin film on a base film;

forming a plurality of pores on said aluminium thin film formed on said base film; and

transferring said aluminium thin film having the plurality of pores from said base film onto said phosphor layer.

10. The method according to claim 9, wherein said aluminium thin film has a porosity of 3 to 15%.

11. The method according to any of claim 8 to 10, wherein the step of forming the pattern of the graphite ink on the intaglio comprises a step of filling a pattern of grooves formed on said intaglio with the graphite ink, and the step of forming the pattern of the phosphor ink on the intaglio comprises a step of filling a pattern of grooves formed on said intaglio with the phosphor ink.

12. The method according to any of claims 8 to 11, wherein said blanket (103) is pressed at a pressure of 2 to 10 kg/cm² onto said intaglio in each of the steps of transferring the pattern of the graphite ink onto said blanket and transferring the pattern of the phosphor ink onto said blanket, and pressed at a pressure of 2 to 10 kg/cm² onto said substrate in each of the steps of transferring the pattern of the graphite ink on said blanket onto said tacky layer and transferring the pattern of the phosphor ink on said blanket (103) onto said glass substrate.

13. The method according to any of claims 8 to 12, wherein said elastic material comprises a silicone resin and has a hardness of 30 to 60 degrees.

14. The method according to any of claims 8 to 13, wherein the firing step is carried out at a firing temperature of 430 to 480°c.

15. The method according to any of claims 8 to 14, wherein said tacky layer (102) has a thickness of 1 to 3 µm.

Ansprüche

1. Verfahren zum Herstellen eines Musters (105) einer Tintenschicht auf einem Glassubstrat (101, 201), das die Schritte aufweist:

Bilden eines Musters aus Tinte auf einer Oberfläche eines Preßkissens (103), dessen Oberfläche mit einem elastischen Material, das hauptsächlich aus Silikonharz zusammengesetzt ist, abgedeckt ist; und

Übertragen des Musters der Tinte auf dem Preßkissen auf das Glassubstrat,

gekennzeichnet dadurch, daß es die Schritte aufweist:

Bilden einer haftenden Schicht (102) auf dem Glassubstrat vor dem Schritt eines Übertragens des Musters der Tinte auf dem Preßkissen (103) auf das Glassubstrat (101, 201), wobei die haftende Schicht aus einem von einem Kunstharz, das einen Vitrifizierungspunkt von 40°C oder geringer besitzt, einem ultraviolett-härtenden Kunstharz und einem thermoplastischen Kunstharz hergestellt ist; und

Übertragen des Musters der Tinte auf dem Preßkissen (103) auf die haftende Schicht (102), die auf dem Glassubstrat (101, 201) gebildet ist.

2. Verfahren nach Anspruch 1, wobei die haftende Schicht (102) ein thermoplastisches Kunstharz ist, wobei das thermoplastische Kunstharz in dem Schritt einer Übertragung des Musters auf dem Preßkissen auf die haftende Schicht aufgeheizt wird.

3. Verfahren nach Anspruch 1, das weiterhin einen Schritt eines Brennens des Substrats (101, 201), das darauf die haftende Schicht (102) besitzt, auf den das Muster der Tinte übertragen worden ist, aufweist.

4. Verfahren nach Anspruch 1, wobei der Schritt eines Bildens eines Musters einer Tinte auf der Oberfläche des Preßkissens (103) die Schritte aufweist:

Bilden eines Musters einer Tinte auf einem Intaglio durch Auffüllen eines Musters aus Nuten, die auf dem Intaglio gebildet sind; und

Übertragen der Tinte auf dem Intaglio auf die Oberfläche des Preßkissens (103).

5. Verfahren nach Anspruch 1, wobei der Schritt eines Bildens eines Musters einer Tinte auf der Oberfläche des Preßkissens (103) den Schritt aufweist:

Füllen eines Musters aus Nuten, das auf einem Intaglio gebildet ist, mit einer Mischung mindestens eines Phosphorpulvers und einer Tinte, die hauptsächlich aus einem Kunstharz zusammengesetzt ist, das durch Pyrolyse oder Verbrennung entfernbar ist, um ein Muster der Mischung auf dem Intaglio zu bilden; und

Übertragen des Musters der Mischung auf dem Intaglio auf die Oberfläche des Preßkissens (103), um ein Muster der Mischung auf dem Preßkissen (103) zu bilden.

6. Verfahren nach Anspruch 1, wobei der Schritt eines Bildens eines Musters einer Tinte auf der Oberfläche des Preßkissens (103) die Schritte aufweist:

Füllen eines Musters aus Nuten, das auf einem Intaglio gebildet ist, mit einer Mischung mindestens eines photoabsorbierenden Pulvers und einer Tinte, die hauptsächlich aus einem Kunstharz zusammengesetzt ist, das durch Pyrolyse oder Verbrennung entfernbar ist, um ein Muster der Mischung auf dem Intaglio zu bilden; und

Übertragen des Musters der Mischung auf dem Intaglio auf die Oberfläche des Preßkissens (103), um ein photoabsorbierendes Muster auf dem Preßkissen (103) zu bilden, und

wobei das Verfahren weiterhin einen Schritt eines Bildens einer Phosphor-Schicht auf dem photoabsorbierenden Muster aufweist.

7. Verfahren nach Anspruch 1, wobei der Schritt eines Bildens eines Musters einer Tinte auf der Oberfläche des Preßkissens (103) die Schritte aufweist:

Bilden eines Musters einer Graphit-Tinte auf einem Intaglio durch Füllen eines Musters aus Nuten, das auf dem Intaglio gebildet ist; und

Übertragen des Musters der Graphit-Tinte auf dem Intaglio auf die Oberfläche des Preßkissens (103), um ein Muster aus Graphit-Tinte auf dem Preßkissen (103) zu bilden.

8. Verfahren zum Bilden einer Kathodenstrahlröhrenanode, das die Schritte aufweist:

Bilden einer schwarzen Matrixschicht (202) auf einem Glassubstrat (101, 201);

Bilden einer Phosphor-Schicht (203) auf dem Glassubstrat, auf dem die schwarze Matrixschicht gebildet worden ist;

Bilden einer Metall-Unterlageschicht (204) durch Abdecken der Phosphor-Schicht (203) mit einem Aluminium-Dünnfilm; und

Brennen des Glassubstrats,

gekennzeichnet dadurch, daß der Schritt eines Bildens der schwarzen Matrixschicht (202) die Schritte aufweist:

Bilden einer haftenden Schicht (102) auf dem Glassubstrat, wobei die haftende Schicht aus einem von einem Kunstharz, das einen Vitrifizierungspunkt von 40°C oder geringer besitzt, einem ultraviolett-härtenden Kunstharz und einem thermoplastischen Kunstharz gebildet ist;

Bilden eines Musters einer Graphit-Tinte auf einem Intaglio;

Übertragen des Musters der Graphit-Tinte auf ein Substrat eines Preßkissens (103), dessen Oberfläche mit einem elastischen Material, das hauptsächlich aus Silikon-Kunstharz zusammengesetzt ist, abgedeckt ist; und

Übertragen des Musters der Graphit-Tinte auf dem Preßkissen (103) auf die haftende Schicht (102), die auf dem Glassubstrat gebildet ist, um dadurch die schwarze Matrixschicht (202) zu bilden; und daß

der Schritt eines Bildens der Phosphor-Schicht (203) die Schritte aufweist:

Bilden eines Musters aus Phosphor-Tinte auf einem Intaglio;

Übertragen des Musters der Phosphor-Tinte auf eine Oberfläche eines Preßkissens (103), dessen Oberfläche mit einem elastischen Material, das hauptsächlich aus Silikon-Kunstharz zusammengesetzt ist, abgedeckt ist;

Übertragen des Musters der Phosphor-Tinte auf dem Preßkissen auf das Glassubstrat (201), auf dem die schwarze Matrixschicht (202) gebildet worden ist, um dadurch die Phosphor-Schicht (203) zu bilden.

9. Verfahren nach Anspruch 8, wobei der Schritt eines Bildens der mit Metall gestützten Schicht (204) die Schritte aufweist:

Bilden eines Aluminium-Dünnfilms auf einem Basisfilm;

Bilden einer Vielzahl von Poren auf dem Aluminium-Dünnfilm, der auf dem Basisfilm gebildet ist; und

Übertragen des Aluminium-Dünnfilms, der die Vielzahl der Poren besitzt, von dem Basisfilm auf die Phosphor-Schicht.

10. Verfahren nach Anspruch 9, wobei der Aluminium-Dünnfilm eine Porosität von 3 bis 15% besitzt.

11. Verfahren nach einem der Ansprüche 8 bis 10, wobei der Schritt eines Bildens des Musters der Graphit-Tinte auf dem Intaglio einen Schritt eines Auffüllens eines Musters aus Nuten, das auf dem Intaglio gebildet ist, mit der Graphit-Tinte aufweist und der Schritt eines Bildens des Musters der Phosphor-Tinte auf dem Intaglio einen Schritt eines Auffüllens eines Musters der Nuten, das auf dem Intaglio gebildet ist, mit der Phosphor-Tinte aufweist.

12. Verfahren nach einem der Ansprüche 8 bis 11, wobei das Preßkissen (103) unter einem Druck von 2 bis 10 kg/cm² auf das Intaglio in jedem der Schritte eines Übertragens des Musters der Graphit-Tinte auf das Preßkissen und des Übertragens des Musters der Phosphor-Tinte auf das Preßkissen gepreßt wird und bei einem Druck von 2 bis 10 kg/cm² auf das Substrat in jedem der Schritte eines Übertragens des Musters der Graphit-Tinte auf dem Preßkissen auf die haftende Schicht und Übertragen des Musters der Phosphor-Tinte auf dem Preßkissen (103) auf das Glassubstrat gepreßt wird.

13. Verfahren nach einem der Ansprüche 8 bis 12, wobei das elastische Material ein Silikon-Kunstharz aufweist und eine Härte von 30 bis 60 Grad besitzt.

14. Verfahren nach einem der Ansprüche 8 bis 13, wobei der Brennschritt bei einer Brenntemperatur von 430 bis 480°C ausgeführt wird.

15. Verfahren nach einem der Ansprüche 8 bis 14, wobei die haftende Schicht (102) eine Dicke von 1 bis 3 µm besitzt.

Revendications

1. Procédé de formation d'un motif (105) d'une couche d'encre sur un substrat de verre (101, 201), comprenant les étapes consistant à :

- former un motif d'encre sur une surface d'un blanchet (103), dont la surface est recouverte par une matière élastique, principalement composée de résine silicone ; et

- transférer sur ledit substrat de verre ledit motif de l'encre se trouvant sur ledit blanchet,

caractérisé par le fait qu'il comprend les étapes consistant à :

- former une couche collante (102) sur ledit substrat de verre avant l'étape de transfert sur ledit substrat de verre (101, 201) dudit motif de l'encre se trouvant sur ledit blanchet (103), ladite couche collante étant faite de l'une parmi une résine ayant un point de transition vitreuse de 40°C ou au-dessous, une résine durcissable par rayonnement ultraviolet et une résine thermoplastique ; et

- transférer sur ladite couche collante (102) formée sur ledit substrat de verre (101, 201) ledit motif de l'encre se trouvant sur ledit blanchet (103).

2. Procédé selon la revendication 1, dans lequel ladite couche collante (102) est une résine thermoplastique, ladite résine thermoplastique étant chauffée à l'étape de transfert sur ladite couche collante dudit motif se trouvant sur ledit blanchet.

3. Procédé selon la revendication 1, comprenant en outre une étape de cuisson du substrat (101, 201) sur lequel se trouve ladite couche collante (102) sur laquelle ledit motif de l'encre a été transféré.

4. Procédé selon la revendication 1, dans lequel l'étape de formation d'un motif d'une encre sur la surface dudit blanchet (103) comprend les étapes consistant à :

- former un motif d'une encre sur une intaille par remplissage d'un motif de rainures formé sur ladite intaille ; et

- transférer sur la surface dudit blanchet (103) le motif de l'encre se trouvant sur ladite intaille.

5. Procédé selon la revendication 1, dans lequel l'étape de formation d'un motif d'une encre sur la surface dudit blanchet (103) comprend les étapes consistant à :

- remplir un motif de rainures formé sur une intaille par un mélange d'au moins une poudre luminescente et d'une encre principalement composée d'une résine qui est éliminable par pyrolyse ou combustion afin de former un motif du mélange sur ladite intaille ; et

- transférer sur la surface dudit blanchet (103) ledit motif du mélange se trouvant sur ladite intaille, afin de former un motif du mélange sur ledit blanchet (103).

6. Procédé selon la revendication 1, dans lequel l'étape de formation d'un motif d'une encre sur la surface de dudit blanchet (103) comprend les étapes consistant à :

- remplir un motif de rainures formé sur une intaille par un mélange d'au moins une poudre photo-absorbante et d'une encre principalement composée d'une résine qui est éliminable par pyrolyse ou combustion afin de former un motif du mélange sur ladite intaille ; et

- transférer sur la surface dudit blanchet (103) ledit motif du mélange se trouvant sur ladite intaille, afin de former un motif photo-absorbant sur ledit blanchet (103) ; ct

dans lequel ledit procédé comprend en outre une étape de formation d'une couche luminescente sur ledit motif photo-absorbant.

7. Procédé selon la revendication 1, dans lequel l'étape de formation d'un motif d'une encre sur la surface dudit blanchet (103) comprend les étapes consistant à :

- former un motif d'une encre au graphite sur une intaille par remplissage d'un motif de rainures formé sur ladite intaille ; et

- transférer sur la surface dudit blanchet (103) le motif de l'encre au graphite se trouvant sur ladite intaille, afin de former un motif de l'encre au graphite sur ledit blanchet (103).

8. Procédé de formation d'une anode de tube cathodique, comprenant les étapes consistant à :

- former une couche de matrice noire (202) sur un substrat de verre (101, 201) ;

- former une couche luminescente (203) sur ledit substrat de verre sur lequel ladite couche de matrice noire a été formée ;

- former une contre-couche métallique (204) par recouvrement de ladite couche luminescente (203) par un film mince d'aluminium ; et

- soumettre ledit substrat de verre à une cuisson,

caractérisé par le fait que ladite étape de formation de la couche de matrice noire (202) comprend les étapes consistant à :

- former une couche collante (102) sur ledit substrat de verre, ladite couche collante étant faite de l'une parmi une résine ayant un point de transition vitreuse de 40°C ou au-dessous, une résine durcissable par rayonnement ultraviolet et une résine thermoplastique ;

- former un motif d'une encre au graphite sur une intaille ;

- transférer ledit motif de l'encre au graphite sur une surface d'un blanchet (103), dont la surface est recouverte par une matière élastique, principalement composée de résine silicone ; et

- transférer sur ladite couche collante (102) formée sur ledit substrat de verre ledit motif de l'encre de graphite se trouvant sur ledit blanchet (103), pour former ainsi ladite couche de matrice noire (202) ;

et par le fait que ladite étape de formation de la couche luminescente (203) comprend les étapes consistant à :

- former un motif d'une encre luminescente sur une intaille ;

- transférer ledit motif de l'encre luminescente sur une surface d'un blanchet (103), dont la surface est recouverte par une matière élastique principalement composée de résine silicone ;

- transférer sur ledit substrat de verre (201) sur lequel ladite couche de matrice noire (202) a été formée, ledit motif de l'encre luminescente se trouvant sur ledit blanchet, pour former ainsi ladite couche luminescente (203).

9. Procédé selon la revendication 8, dans lequel l'étape de formation de ladite contre-couche métallique (204) comprend les étapes consistant à :

- former un film mince d'aluminium sur un film de base ;

- former une pluralité de pores sur ledit film mince d'aluminium formé sur ledit film de base ; et

- transférer ledit film mince d'aluminium ayant la pluralité de pores, dudit film de base sur ladite couche luminescente.

10. Procédé selon la revendication 9, dans lequel ledit film mince d'aluminium a une porosité de 3 à 15%.

11. Procédé selon l'une quelconque des revendications 8 à 10, dans lequel l'étape de formation du motif de l'encre au graphite sur l'intaille comprend une étape de remplissage d'un motif de rainures formé sur ladite intaille par l'encre au graphite, et l'étape de formation du motif de l'encre luminescente sur l'intaille comprend une étape de remplissage d'un motif de rainures formé sur ladite intaille par l'encre luminescente.

12. Procédé selon l'une quelconque des revendications 8 à 11, dans lequel ledit blanchet (103) est mis en appui à une pression de 2 à 10 kg/cm² sur ladite intaille dans chacune des étapes de transfert du motif de l'encre au graphite sur ledit blanchet et de transfert du motif de l'encre luminescente sur ledit blanchet, et mis en appui à une pression de 2 à 10 kg/cm² sur ledit substrat dans chacune des étapes de transfert sur ladite couche collante du motif de l'encre au graphite se trouvant sur ledit blanchet et de transfert sur ledit substrat de verre du motif de l'encre luminescente se trouvant sur ledit blanchet (103).

13. Procédé selon l'une quelconque des revendications 8 à 12, dans lequel ladite matière élastique comprend une résine silicone et a une dureté de 30 à 60 degrés.

14. Procédé selon l'une quelconque des revendications 8 à 13, dans lequel l'étape de cuisson est effectuée à une température de cuisson de 430 à 480°C.

15. Procédé selon l'une quelconque des revendications 8 à 14, dans lequel ladite couche collante (102) a une épaisseur de 1 à 3 µm.

Drawing