(19)
(11) EP 0 414 181 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
03.04.1991 Bulletin 1991/14

(43) Date of publication A2:
27.02.1991 Bulletin 1991/09

(21) Application number: 90115887.3

(22) Date of filing: 20.08.1990
(51) International Patent Classification (IPC)5: G03G 5/147
(84) Designated Contracting States:
DE FR NL

(30) Priority: 25.08.1989 JP 217362/89
19.03.1990 JP 67108/90

(71) Applicant: HITACHI, LTD.
Chiyoda-ku, Tokyo 101 (JP)

(72) Inventors:
  • Ishikawa, Fuminori
    Hitachiota-shi (JP)
  • Sato, Akira
    Takahagi-shi (JP)
  • Tamahashi, Kunihiro
    Mito-shi (JP)
  • Wakagi, Masatoshi
    Hitachi-shi (JP)
  • Tamura, Katsumi
    Hitachi-shi (JP)
  • Hanazono, Masanobu
    Mito-shi (JP)
  • Shoji, Mitsuyoshi
    Taga-gun, Ibaraki-ken (JP)
  • Nakakawaji, Takayuki
    Hitachi-shi (JP)
  • Ito, Yutaka
    Takahagi-shi (JP)
  • Komatsuzaki, Shigeki
    Mito-shi (JP)
  • Akagi, Motoo
    Nishitama-gun, Tokyo (JP)
  • Imamura, Masaaki
    Odawara-shi (JP)

(74) Representative: Patentanwälte Beetz - Timpe - Siegfried Schmitt-Fumian - Mayr 
Steinsdorfstrasse 10
80538 München
80538 München (DE)


(56) References cited: : 
   
       


    (54) An electrophotographic photoreceptor, a method for producing the same and electrophotographic apparatus


    (57) An electrophotographic photoreceptor comprising a photoconductive layer (103) comprising a photoconductor, a support (101, 102) for the photoconductive layer (103) and a surface layer (107) formed on the photoconductive layer (103) and comprising a curable resin film (105) and inorganic insulator pieces (106) having a size larger than the film thickness of the curable resin film (105). In order to prevent the image blurring of an a-Si:H photoreceptor, on the outermost surface of the photoreceptor was formed a surface layer having a structure in which inorganic insulator pieces (106) have protruded from the curable resin film (105). Since the curable resin (105) is of high resistance and shows no quality change by corona irradiation, and besides the protruding inorganic insulator pieces (106) prevent the abrasion of the resin, the surface layer (107) having a long life and excellent humidity resistance, durability for corona irradiation and abrasion resistance can be realized. Further, by covering the surface layer (107) with a fluorine-containing lubricant, the surface layer (107) having a low friction coefficient and excellent cleaning characteristics is obtained, and besides the resin constituting the surface layer (107) absorbs little moisture. As a result, it becomes possible to use the a-Si:H photoreceptors without a heater. Also, the surface layer (107) of the present invention can be removed and then re-formed.






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