SILICON DIOXIDE FILMS ON DIAMOND - Patent 0417190

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EP 0 417 190 A1

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(43)	Date of publication:
	20.03.1991 Bulletin 1991/12

(21)	Application number: 89906913.0

(22)	Date of filing: 02.06.1989

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International Patent Classification (IPC):

C30B 28/ 14^{( . )}
C23C 16/ 02^{( . )}
C30B 25/ 02^{( . )}
C30B 29/ 04^{( . )}
H01L 21/ 84^{( . )}

B01D 9/ 02^{( . )}
C30B 7/ 00^{( . )}
C30B 25/ 18^{( . )}
H01L 21/ 205^{( . )}

(86)	International application number:
	PCT/US1989/002412

(87)	International publication number:
	WO 1989/011897 (14.12.1989 Gazette 1989/29)

(84)	Designated Contracting States:
	DE GB

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Priority:

03.06.1988 US 19880202877

(71)	Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
	Cambridge, MA 02139 (US)

(72)	Inventors:
	GEIS, Michael, W. Acton, MA 01720 (US) EFREMOW, Nikolay, N. Melrose, MA 02176 (US) SMITH, Henry, I. Sudbury, MA 01776 (US)

(74)	Representative: Deans, Michael John Percy, et al
	Lloyd Wise, Tregear & CO. Norman House 105-109 Strand London WC2R OAE London WC2R OAE (GB)

(54)	SILICON DIOXIDE FILMS ON DIAMOND