| (19) |
 |
|
(11) |
EP 0 417 951 A3 |
| (12) |
EUROPEAN PATENT APPLICATION |
| (88) |
Date of publication A3: |
|
22.01.1992 Bulletin 1992/04 |
| (43) |
Date of publication A2: |
|
20.03.1991 Bulletin 1991/12 |
| (22) |
Date of filing: 03.09.1990 |
|
|
| (84) |
Designated Contracting States: |
|
DE FR GB |
| (30) |
Priority: |
12.09.1989 JP 236624/89
02.03.1990 JP 49527/90
30.05.1990 JP 140261/90
|
| (71) |
Applicant: JAPAN ENERGY CORPORATION |
|
Minato-ku,
Tokyo (JP) |
|
| (72) |
Inventors: |
|
- Saito, Kazuhiro,
c/o Nippon Mining Co., Ltd.
Toda-shi,
Saitama-ken (JP)
- Yashima, Yukihiko,
c/o Nippon Mining Co., Ltd.
Toda-shi,
Saitama-ken (JP)
- Yachi, Hisakazu,
c/o Nippon Mining Co., Ltd.
Toda-shi,
Saitama-ken (JP)
|
| (74) |
Representative: Harvey, David Gareth et al |
|
Graham Watt & Co.
Riverhead
Sevenoaks
Kent TN13 2BN
Sevenoaks
Kent TN13 2BN (GB) |
|
| |
|
|
|
Remarks: |
|
A request for correction has been filed pursuant to Rule 88 EPC. A decision on the
request will be taken during the proceedings before the Examining Division (Guidelines
for Examination in the EPO, A-V, 2.2). |
|
| (54) |
Fe-Si-Al alloy magnetic thin film and method of manufacturing the same |
(57) A Fe-Si-Aℓ alloy magnetic thin film contains a limited oxygen content in the range
0.17 to 0.46 wt % and has excellent magnetic and mechanical properties.
The film is made by sputtering in an inert gas atmosphere containing a controlled
concentration of oxygen amounting to 400 to 1500 volumetric ppm if the sputtering
target is a cast film, while the oxygen content is reduced by an amount dependent
on the initial concentration of oxygen in the sputtering target when the target is
a sintered target containing oxygen.