(19) |
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(11) |
EP 0 439 181 A3 |
(12) |
EUROPEAN PATENT APPLICATION |
(88) |
Date of publication A3: |
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07.01.1993 Bulletin 1993/01 |
(43) |
Date of publication A2: |
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31.07.1991 Bulletin 1991/31 |
(22) |
Date of filing: 25.01.1991 |
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(84) |
Designated Contracting States: |
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BE CH DE DK ES FR GB IT LI LU NL SE |
(30) |
Priority: |
26.01.1990 US 471145 21.09.1990 US 586114
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(71) |
Applicant: E.I. DU PONT DE NEMOURS AND COMPANY |
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Wilmington
Delaware 19898 (US) |
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(72) |
Inventors: |
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- Beisswenger, Rudolf Wilhelm
W-6078 Neu Isenburg 2 (DE)
- Gundlach, Kurt Blaine
Rochester,
New York 14564 (US)
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(74) |
Representative: Werner, Hans-Karsten, Dr.Dipl.-Chem. et al |
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Patentanwälte
Von Kreisler-Selting-Werner
Postfach 10 22 41 50462 Köln 50462 Köln (DE) |
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(54) |
Element having improved adhesion of auxiliary layers to film supports containing antistatic
layers |
(57) A film support having an auxiliary layer coated over an antistatic layer coated on
one side thereof is described. This element, which is particularly useful for the
application of subsequently applied photosensitive layers on side opposite said auxiliary
layer, comprises gelatin, a crosslinking agent, optionally a conductive polymer and
an adhesion promoting amount of an adhesion agent, said adhesion agent selected from
the group consisting of: compounds containing at least one -NH₂ group and compounds
containing at least two -NH groups, wherein said adhesion agent is sufficiently soluble
in water that said adhesion promoting amount of adhesion agent may be dissolved in
the dispersion used to coat said auxiliary layer, with the proviso that said adhesion
agent is not malonamide. Preferred adhesion agents are urea, thiourea and 2-imidazolidone.
Improved adhesion of the auxiliary layer to the antistatic layer is achieved.