(19)
(11) EP 0 459 481 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
05.02.1992 Bulletin 1992/06

(43) Date of publication A2:
04.12.1991 Bulletin 1991/49

(21) Application number: 91108862.3

(22) Date of filing: 29.05.1991
(51) International Patent Classification (IPC)5: B41J 2/335
(84) Designated Contracting States:
DE FR GB

(30) Priority: 01.06.1990 JP 143831/90

(71) Applicant: KABUSHIKI KAISHA TOSHIBA
Kawasaki-shi, Kanagawa-ken 210 (JP)

(72) Inventors:
  • Nikaido, Masaru, c/o Intellectual Property Div.
    Minato-ku, Tokyo 105 (JP)
  • Homma, Katsuhisa, c/o Intellectual Property Div.
    Minato-ku, Tokyo 105 (JP)
  • Takamura, Yasuhisa, c/o Intellectual Property Div.
    Minato-ku, Tokyo 105 (JP)

(74) Representative: Henkel, Feiler, Hänzel & Partner 
Möhlstrasse 37
81675 München
81675 München (DE)


(56) References cited: : 
   
       


    (54) Method of manufacturing thermal head


    (57) A method for manufacturing a thermal head comprising the steps of forming a heat resistant resin layer (12) on the surface of a substrate (11), removing a part of the heat resistant resin layer (12) by a photochemical reaction using an excimer laser beam having a wavelength of 150 to 400nm, thereby exposing a part of the substrate (11), forming a heat-generating resistive layer (14), an individual electrode (15) and a conductive layer (16) on the heat resistant resin layer and the exposed part of the substrate (11).






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