BACKGROUND OF THE INVENTION
Field of the Invention
[0001] The present invention relates to a flat display having a flat screen capable of displaying
various pictures.
Description of the Prior Art
[0002] Various flat displays, namely, panel displays, have been proposed. Japanese Patent
Laid-open (Kokai) No. 1-173555 discloses a flat cathode-ray tube of a secondary-electron
multiplication type. It is desirable to apply the flat cathode-ray tube of a secondary-electron
multiplication type to a flat display with a large screen, such as a 40 in. screen.
[0003] A flat display, like the flat cathode-ray tube disclosed in Japanese Patent Laid-open
(Kokai) No. 1-173555, is provided with a plurality of cathodes or filaments, and makes
sections of a fluorescent screen emit visible light for desired display by striking
the fluorescent screen by thermions produced by the cathodes or the filaments and
modulated according to display signals. The assignment of the plurality of cathodes
or filaments to the sections of the fluorescent screen has a problem that the sections
of the fluorescent screen are not uniform in brightness due to difference between
the cathodes or filaments in their characteristics.
[0004] Japanese Patent Laid-open (Kokai) No. 60-115134 discloses a flat display employing
a single cathode instead of a plurality of cathodes or filaments to obviate such a
problem.
[0005] Single-cathode structures previously proposed by the applicant of the present patent
application in Japanese Patent Application Nos. 1-331593 and 1-331594 are intended
to avoid the variation of focusing conditions dependent on the position of a scanning
spot on the screen and to enable displaying pictures on a large display screen. A
single-cathode structure for a display having a large display screen, however, needs
a linear cathode having a large length of about 100 mm or above with respect to the
vertical scanning direction; and the linear cathode is liable to vibrate. The vibration
of the linear cathode affect the path of the electron beam significantly to deteriorate
the definition. Therefore, the linear cathode is provided with stays between the opposite
ends thereof to suppress vibration.
[0006] Fig. 11 shows a conventional single-cathode structure having a single linear cathode
81. The linear cathode 81 is formed by coating a tungsten wire with a ternary salt
and is stretched between anchors 82 fixed to an insulating base 80. Stays 83 provided
between the anchors 82 supports the linear cathode 81 to prevent the vibration of
the linear cathode 81. In Fig. 11, indicated at 84 is a back plate, and at G1 to G4
are first to fourth grids, respectively.
[0007] An electron beam of a desired acceleration can be obtained, for example, by applying
voltages of 30 V, -5 V, 350 V and 110 V to the first grid G1, the second grid G2,
the third grid G3 and the fourth grid G4, respectively, and a voltage of -10 V to
the back plate 84.
[0008] In producing an electron beam, the linear cathode 81 is heated at a high temperature
of 760°C or higher. However, heat flows from the linear cathode 81 through the stays
83 to the insulating base 80 to cause end cool, namely, local temperature drop in
the linear cathode 81 in regions of about 10 mm about the stays 83, to deteriorate
the thermion emission characteristics of the linear cathode 81. Thus, the stays 83
provided to prevent the vibration of the linear cathode 81 increases the ineffective
region of the linear cathode 81 and deteriorates the thermion emission characteristics
of the linear cathode 81.
[0009] Electrons emitted by the linear cathode 81 in a plane including the linear cathode
81 and traveling toward a fluorescent screen are divided into a plurality of groups
by, for example, a counter electrode. However, many electrons collide against the
counter electrode and become unavailable, and stray electrons produced by the collision
of the electrons against the counter electrode charges the exposed surface of the
insulating members, such as the surface of the tube entailing disturbance in the picture.
To reduce the unavailable electrons, namely, to reduce reactive current, sections
of the linear cathode 81 must be coated by the ternary salt so as to correspond respectively
to the beam dividing sections of the counter electrode, which requires a troublesome
work.
SUMMARY OF THE INVENTION
[0010] Accordingly, it is an object of the present invention to improve the definition of
pictures displayed on a flat display of such a type having a large display screen,
and to improve the characteristics of the flat display by preventing the vibration
of the cathode, reducing the power consumption, and reducing the reactive current
to enhance the brightness and to reduce disturbance in the pictures.
[0011] In one aspect of the present invention, a flat display comprises a flat tube having
a front panel and a back panel facing the front panel, a fluorescent screen formed
on the inner surface of the front panel, an electron gun disposed outside a region
extending behind the fluorescent screen, a vertical deflecting electrode provided
on the inner surface of the back panel and comprising a plurality of parallel electrode
elements extending along the horizontal scanning direction and disposed opposite to
the fluorescent screen, and an electrode structure disposed between the vertical deflecting
electrode and the fluorescent screen so as to construct a vertical deflecting system
in combination with the vertical deflecting electrode and comprising at least a counter
electrode provided with electron beam transmitting apertures, a modulating electrode
and a horizontal deflecting electrode, wherein the electron gun has a cathode consisting
of a plurality of field emission cathode elements arranged on a line, and the electron
gun emits an electron beam into the space between the electrode structure and the
vertical deflecting electrode.
[0012] In this specification, the horizontal and vertical scanning directions are not necessarily
physically horizontal and vertical directions; they are two directions perpendicular
to each other on a screen.
[0013] The electron gun emits an electron beam into the space between the electrode structure
and the vertical deflecting electrode, and the cathode of the electron gun comprises
the plurality of field emission cathode elements arranged on a line.
[0014] The electron beam is a generally planar or linear beam. Desired voltages are applied
sequentially to the parallel electrode elements of the vertical deflecting electrode
in synchronism with a vertical scanning period to create a deflecting electric field
for deflecting the electron beam emitted by the electron gun toward the electrode
structure for vertical scanning. The electron beam thus vertically deflected is directed
toward the fluorescent screen by applying predetermined voltages to the counter electrode
and the vertical deflecting electrode.
[0015] Thus, in the flat display in accordance with the present invention, the electron
beam is produced by the plurality of field emission cathode elements. Therefore, the
cathode of the electron gun does not vibrate and hence the cathode can be formed in
a large length suitable for a large display screen without deteriorating its electron
emitting characteristics.
[0016] Furthermore, since the cathode of the electron gun consists of the field emission
cathode elements, the back plate and the accelerating electrode, which can be formed
accurately in desired shapes, respectively, difference in characteristics between
positions on the cathode is very small as compared with that on the conventional cathode
consisting of a plurality of filaments. Accordingly, the flat display of the present
invention is able to form pictures in uniform brightness.
[0017] The distribution of the field emission cathode elements according to the width and
pitch of the electron transmitting slits of the electrode structure suppresses the
emission of unavailable electrons and resultant charging up of the exposed insulating
members by secondary electrons and stray electrons to avoid the disturbance of pictures.
Reduction of reactive current enables the flat display to display pictures in high
brightness without requiring much power.
BRIEF DESCRIPTION OF THE DRAWINGS
[0018] The above and other objects, features and advantages of the present invention will
become more apparent from the following description taken in connection with the accompanying
drawings, in which:
Figure 1 is a front view of a flat display in a preferred embodiment according to
the present invention;
Figure 2 is atop plan view of the flat display of Fig. 1;
Figure 3 is a schematic sectional view of the flat display of Fig. 1 taken on a line
parallel to the vertical scanning direction;
Figure 4 is a front view of patterns of electrodes;
Figure 5 is a schematic sectional view of an essential portion of an electrode structure;
Figure 6 is a schematic sectional view of an electron gun;
Figure s 7A t 7D are sectional views of assistance in explaining a process of fabricating
a cathode having field emission cathode elements;
Figure 8 is an exploded perspective view of an essential portion of an electrode structure;
Figure 9 is a schematic sectional view of of a secondary-electron multiplier;
Figure 10 is a schematic sectional view of assistance in explaining the construction
of a horizontal deflecting electrode and the arrangement of electron beam transmitting
apertures; and
Figure 11 is a schematic sectional view of a conventional single-line cathode structure.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0019] A flat display in a preferred embodiment according to the present invention employs
a flat tube 1. The flat tube 1 has a light-transmissive front panel 1F, a back panel
1B and a circumferential wall 1S hermetically joined to the front panel 1F and the
back panel 1B. The flat tube 1 is evacuated through a chip-off tube 21, and then the
chip-off tube 21 is chipped off after hermetically sealing the flat tube 21. The front
panel 1F, the back panel 1B and the circumferential wall 1S are formed of glass plates
and are joined together by glass frit.
[0020] A fluorescent material is applied directly to the inner surface of the front panel
1F or a transparent plate coated with a fluorescent material is applied to the inner
surface of the front panel 1F to form a fluorescent screen 2. The fluorescent screen
2 is a metal-backed fluorescent screen formed by coating a fluorescent film with a
metal film, such as an aluminum film, by vapor deposition.
[0021] A vertical deflecting electrode 3 is attached directly to or through a substrate
to the inner surface of the back panel 1B. An electrode structure 7 is disposed between
the fluorescent screen 2 and the vertical deflecting electrode 3 with a predetermined
interval between the vertical deflecting electrode 3 and the electrode structure 7.
As shown in Figs. 3, 4 and 5, the vertical deflecting electrode 3 has a plurality
of parallel electrode strips 3a having a predetermined width and arranged at predetermined
intervals so as to extend in the horizontal scanning direction, the number of the
parallel electrode strips 3a being, for example, in a range of 480 to 525 corresponding
to the number of the vertical scanning lines. The electrode strips 3a are metal thin
films formed by etching a thin film of 426 alloy or chromium, metal thin films formed
by vapor deposition or carbon thin films formed by screen printing.
[0022] As shown in Figs. 1 and 3, an electron gun 10 is disposed outside a region extending
behind the fluorescent screen 2, for example, at a position separated from the region
extending behind the fluorescent screen 2 in the vertical scanning direction. As shown
in Fig. 6, the electron gun 10 comprises a cathode 1K having a plurality of field
emission cathode elements K arranged on a line, and four grid electrodes G1 to G4
disposed opposite to the cathode 1K and provided with slits extending along the horizontal
scanning direction. The cathode 1K is, for example, a Spindt field emission cathode
consisting of a back plate 41 to which a predetermined negative voltage is applied,
the plurality of field emission cathode elements K arranged on a line on the inner
surface of the back plate 41, an insulator 42, and an accelerating electrode 43 to
which a predetermined positive voltage is applied to accelerate electrons. The back
plate 41, the insulator 42 and the accelerating electrode 43 are stacked in layers.
The back plate 41 has the shape of a band or strip having a predetermined width and
a predetermined length.
[0023] A process of fabricating the cathode 1K will be described with reference to Figs.
7A to 7D. As shown in Fig. 7A, an insulating layer 42A having an appropriate thickness,
for example, 1.5 µm, is formed over the entire surface of the back plate 41 by depositing
an insulating material, such as SiO₂, by a CVD process (chemical vapor deposition
process), and then the insulating layer 42A is coated with a metal layer 43A having
an appropriate thickness, for example, 0.4 µm, by a vapor deposition process or the
like.
[0024] Then, as shown in Fig. 7B, circular holes 44 of an appropriate diameter, for example,
1.2 µm, are formed at a longitudinal pitch p on the order of 5 µm in the metal layer
43A by anisotropic etching process, such as a RIE process (reactive ion etching process)
to form the accelerating electrode 43. Holes 45 of a diameter greater than that of
the circular holes 44 are formed in the insulating layer 42A by etching the insulating
layer 42A through the circular holes 44 by an isotropic etching process.
[0025] Then, as shown in Fig. 7C, a metal layer 46, such as a Ni layer, is formed over the
accelerating electrode 43 by an oblique vapor deposition process. During the oblique
vapor deposition process, the back plate 41 is rotated to form holes 46A having the
shape of a frustum of circular cone in the metal layer 46 over the circular holes
44, respectively. The oblique vapor deposition of the metal layer 46 is performed
so that any metal layer is not deposited in the holes 45. Then, an electrode layer
47, such as a Mo layer, is formed over the metal layer 46 by a vapor deposition process.
Even if the direction of vapor deposition is vertical to the back plate 41, holes
each having a conical surface merging into the conical surface of the circular hole
44 are formed in the electrode layer 47, and the circular holes 44 are closed when
the thickness of the electrode layer 47 exceeds a certain thickness. During the vapor
deposition process for forming the electrode layer 47, the field emission cathode
elements
K are formed respectively in the holes 45. Each field emission cathode element
K has the shape of a circular cone having a circular bottom of a diameter substantially
equal to that of the lower circle of the hole formed in the metal layer 46.
[0026] Then, as shown in Fig. 7D, the metal layer 46 and the electrode layer 47 formed over
the accelerating electrode 43 are removed to complete the cathode 1K of the electron
gun 10. The pitch of the field emission cathode elements
K is substantially equal to the pitch
p of the circular holes 44, and the distance ℓ with respect to the longitudinal direction
of the cathode 1K between the tip of the field emission element K and the edge of
the corresponding circular hole 44 of the accelerating electrode 43 is on the order
of 0.6 µm.
[0027] Electrons emitted by the minute field emission cathode elements
K of a size in the range of 5 to 6 µm form an electron beam
b. Since the field emission cathode elements
K are fixed, the cathode 1K does not vibrate.
[0028] The field emission cathode elements
K formed by the foregoing process are more uniform in characteristics than the plurality
of filaments employed in the conventional flat display. Accordingly, the field emission
cathode elements
K, similarly to the single-line cathode, enables displaying pictures in uniform brightness.
[0029] A predetermined voltage is applied across the back plate 41 and accelerating electrode
43 of the electron gun 10 to make the field emission cathode elements
K electrons having predetermined energy, and predetermined voltages are applied to
the first grid electrode G1 comprising a meshed metal plate provided with circular
through holes at positions corresponding respectively to the field emission cathode
elements
K, and the second grid electrode G2, the third electrode G3 and the fourth electrode
G4 having a shape resembling a frame as shown in Fig. 6 to produce the electron beam
b having the shape of a band or a strip.
[0030] As shown in Fig. 3, the electron beam
b spreading in the horizontal scanning direction, namely a laminar flow of the electrons
emitted by the field emission cathode elements
K, is introduced into the space between the electrode structure 7 and the vertical
deflecting electrode 3.
[0031] As shown in Figs. 4, 5 and 8, the counter electrode 4 comprises an electrode plate
provided with a plurality of parallel slits SL extending along the vertical scanning
direction and arranged at a predetermined pitch P
SL, for example, a pitch of 2 mm.
[0032] The modulating electrode 5 comprises an insulating plate S
M provided with electron beam transmission slits h
M corresponding respectively to the slits SL of the counter electrode 4, and conductive
layers 5a formed along the edges of the electron beam transmitting slits h
M.
[0033] The horizontal deflecting electrode 6 comprises two superposed electrode plates 6a
and 6b. The electrode plates 6a and 6b have insulating plates S
H1 and S
H2 provided with electron beam transmitting slits h
H1 and h
H2 corresponding to the slits SL of the counter electrode 4 and the electron beam transmitting
slits h
M of the modulating electrode 5, respectively. Conductive layers 6a₁ and 6a₂ are formed
on the edges of the electron beam transmitting slits h
H1, and conductive layers 6b₁ and 6b₂ are formed on the edges of the electron beam transmitting
slits h
H2.
[0034] The insulating plates S
M of the modulating electrode 5, and the insulating plates S
H1 and S
H2 of the horizontal deflecting electrode 6 are formed of for example, a photosenstive
glass, and the electron beam transmitting slits h
M, h
H1 and h
H2 are formed by an optical process, i.e., a photographic process. The conductive layers
5a, 6a₁, 6a₂, 6b₁ and 6b₂ are, for example, Ni layers formed by electroless plating
or electroplating.
[0035] As shown in Fig. 5, if necessary, the electrode structure 7 may be provided with
a shield electrode 12 disposed between the fluorescent screen 2 and the horizontal
deflecting electrode 6 of the electrode structure 7. The shield electrode 12 comprises
a plurality of metal plates, for example, four metal plates 12A, 12B, 12C and 12D
provided with electron beam transmitting slits h
SA, h
SB, h
SC and h
SD, respectively, corresponding to the electron beam transmitting slits h
H2.
[0036] The adjacent electrodes, i.e., the counter electrode 4, the modulating electrode
5, the horizontal deflecting electrode 6, the electrode plates 12A, 12B, 12C and 12D
of the shield electrode 12 are isolated from each other for insulation with insulating
balls 11, such as glass beads. The electrode structure 7 is set apart from the front
panel 1F by a predetermined interval with insulating balls 11.
[0037] Vertical fluorescent triplets each consisting of red, green and blue fluorescent
stripes are formed on the fluorescent screen 2 so that a plurality of fluorescent
triplets correspond to each electron beam transmitting slit h
SD.
[0038] Suppose that the distance ℓ between the tip of the field emission cathode element
K and the edge of the corresponding circular hole 44 of the accelerating electrode
43 is 0.6 µm in the cathode 1K of the electron gun 10. Then, the field emission cathode
elements
K can be made to emit electrons of predetermined energy by applying a voltage of 0
V to the back plate 41 and applying a voltage of 80 V to the accelerating electrode
43. Voltages of 30 V, -5 V, 350 V and 100 V are applied respectively to the first
grid electrode G1, the second grid electrode G2, the third grid electrode G3 and the
fourth electrode grid G4. Predetermined voltages are applied to the counter electrode
4 and the parallel electrode stripes 3a. The vertical deflecting electrode 3 and the
counter electrode 4 constitute a vertical deflecting system 34. The adjacent electrode
strips 3a₁ and 3a₂ of the parallel electrode stripes 3 on the opposite sides of a
predetermined vertical scanning position
V are charged so that a potential difference is produced between the adjacent electrode
strips 3a₁ and 3a₂, namely, a voltage of 100 V, which is equal to the voltage applied
to the counter electrode 4, is applied to all the electrode strips 3a including the
electrode strip 3a₁ on the side of the electron gun 10 with respect to the predetermined
vertical scanning position
V, and a voltage of 0 V is applied to all the electrode strips 3a including the electrode
strip 3a₂ on the opposite side with respect to the predetermined vertical scanning
position
V, and then the predetermined vertical scanning position
V is shifted in the vertical scanning direction in synchronism with the scanning speed
and the scanning period. Consequently, the electron beam
b is deflected in the vicinity of the electrode strips 3a₁ and 3a₂ toward the slits
SL of the counter electrode 4 as shown in Fig. 3. Thus, the electron beam
b are divided into a plurality of fractional electron beams. The number of the fractional
electron beams is equal to that of the slits SL.
[0039] A voltage of 200 V, for instance, is applied to the modulating electrode 5 to focus
the fractional electron beams, and a pulse width modulating voltage corresponding
to a display signal is applied to the conductive layers 5a formed on the edges of
the electron transmitting slits h
M.
[0040] A voltage of 300 V ± 100 V, for instance, is applied across a pair of conductive
layers 6a₁ and 6b₁ and a pair of conductive layers 6a₂ and 6b₂ formed on the edges
of each electron beam transmitting slit, in synchronism with the horizontal scanning
action of the horizontal deflecting electrode 6, for the minute horizontal deflection
of the fractional electron beams divided by the slits SL of the counter electrode
4 in areas on the fluorescent screen 2 corresponding to the electron beam transmitting
slits, namely, in areas each including the plurality of vertical fluorescent triplets
each of red, green and blue fluorescent stripes and corresponding to the electron
beam transmitting slit.
[0041] A voltage of 10 kV, for instance is applied to the fluorescent screen 2, and voltages
of 2 kV, 4 kV, 6 kV and 8 kV are applied respectively to the electrode plates 12A,
12B, 12C and 12D of the shield electrode 12 to shield the horizontal deflecting electrode
6 and the modulating electrode 5 from the influence of the high voltage applied to
the fluorescent screen 2.
[0042] Thus, according to the present invention, the single laminar electron beam
b activates the entire area of the fluorescent screen 2. If the density of the electron
beam
b is insufficient to produce a sufficient anode current, a secondary-electron multiplier
22 as shown in Fig. 9 may be provided between the modulating electrode 5 and the horizontal
deflecting electrode 6.
[0043] Referring to Fig. 9, the secondary-electron multiplier 22 comprises electrode plates
22A, 22B and 22C arranged one after the other between the modulating electrode 5 and
the horizontal deflecting electrode 6. The electrode plates 22A, 22B and 22C are provided
respectively with electron beam transmitting slits h
MA, h
MB and h
MC corresponding to the slits SL. The inner surfaces of the electron beam transmitting
slits h
MA, h
MB and h
MC are coated with a material having a high secondary-emission ratio, such as Mg, to
emit a large number of secondary electrons for secondary emission upon the bombardment
of the electrons thereon so that the electron beam traveling toward the fluorescent
screen 2 builds up in strength. It is desirable to apply higher voltages to the electrode
plates 22A, 22B and 22C nearer to the fluorescent screen 2. The electrode plates 22A,
22B and 22c, like the electrode plates of the electrode structure 7, may be isolated
from each other with insulating balls 11, such as glass beads.
[0044] It is also possible to employ a horizontal deflecting electrode 6 comprising three
electrically isolated electrode plates 6A, 6B and 6C provided respectively with electron
beam transmitting slits h
HA, h
HB and h
HC as shown in Fig. 10. The slit h
HB of the electrode plate 6B is shifted in one direction relative to the corresponding
slit h
HA of the electrode plate 6A, and the slit h
HC of the electrode plate 6C is shifted in the opposite direction relative to the corresponding
slit h
HA of the electrode plate 6A to deflect a fractional electron beam b
S horizontally for minute horizontal deflection at a high definition.
[0045] The field emission cathode elements
K may be disposed in an arrangement other than that shown in Fig. 6 in which the back
plate 41 and the accelerating electrode 43 are common to all the field emission cathode
elements
K. A plurality of back plates and a plurality of accelerating electrodes may be provided
respectively for the plurality of field emission cathode elements
K.
[0046] In the foregoing embodiment, the field emission cathode elements
K of the cathode 1K correspond respectively to the slits SL of the counter electrode
4. Each field emission cathode element
K corresponding to each slit SL may be a multiple cathode element. The cathode 1K comprising
the plurality of field emission cathode elements
K or a plurality of multiple cathode elements corresponding respectively to the slits
SL reduces the production of unavailable electrons resulting from the impingement
of electrons on portions of the electrode structure 7 other than the slits SL, as
compared with a cathode provided with the conventional cathode provided with a single
cathode element having the shape of a band, so that reactive current can be reduced.
[0047] Although the invention has been described in its preferred forms with a certain degree
of particularity, obviously many changes and variations are possible therein. It is
therefore to be understood that the present invention may be practiced otherwise than
as specifically described herein without departing from the scope and spirit thereof.