<?xml version="1.0" encoding="UTF-8"?><!DOCTYPE ep-patent-document PUBLIC "-//EPO//EP PATENT DOCUMENT 1.4//EN" "ep-patent-document-v1-4.dtd"><!-- Disclaimer: This ST.36 XML data has been generated from A2/A1 XML data enriched with the publication date of the A3 document - March 2013 - EPO - Directorate Publication - kbaumeister@epo.org --><ep-patent-document id="EP91113057A3" file="EP91113057NWA3.xml" lang="en" doc-number="0469631" date-publ="19920701" kind="A3" country="EP" status="N" dtd-version="ep-patent-document-v1-4"><SDOBI lang="en"><B000><eptags><B001EP>ATBECHDEDKESFRGBGRITLILUNLSE......................</B001EP><B005EP>R</B005EP></eptags></B000><B100><B110>0469631</B110><B120><B121>EUROPEAN PATENT APPLICATION</B121></B120><B130>A3</B130><B140><date>19920701</date></B140><B190>EP</B190></B100><B200><B210>91113057.3</B210><B220><date>19910802</date></B220><B240 /><B250>en</B250><B251EP>en</B251EP><B260>en</B260></B200><B300><B310>205224/90</B310><B320><date>19900803</date></B320><B330><ctry>JP</ctry></B330></B300><B400><B405><date>19920701</date><bnum>199227</bnum></B405><B430><date>19920205</date><bnum>199206</bnum></B430></B400><B500><B510><B516>5</B516><B511> 5H 01J  41/14   A</B511></B510><B540><B541>de</B541><B542>Ionenpumpe und Vakuumpumpanlage dafür</B542><B541>en</B541><B542>Ion pump and vacuum pumping unit using the same</B542><B541>fr</B541><B542>Pompe ionique et unité de pompage à vide utilisant celle-ci</B542></B540><B560 /><B590><B598>NONE</B598></B590></B500><B700><B710><B711><snm>EBARA CORPORATION</snm><iid>00300692</iid><irf>Y-E-12122</irf><adr><str>11-1, Haneda Asahi-cho</str><city>Ohta-ku,
Tokyo</city><ctry>JP</ctry></adr></B711></B710><B720><B721><snm>Nagai, Kazutoshi</snm><adr><str>12-22, Sekimachi-Minami 4-chome,
Nerima-ku</str><city>Tokyo</city><ctry>JP</ctry></adr></B721></B720><B740><B741><snm>Geyer, Ulrich F., Dr. Dipl.-Phys.</snm><iid>00004121</iid><adr><str>WAGNER &amp; GEYER,
Patentanwälte,
Gewürzmühlstrasse 5</str><city>80538 München</city><ctry>DE</ctry></adr></B741></B740></B700><B800><B840><ctry>AT</ctry><ctry>BE</ctry><ctry>CH</ctry><ctry>DE</ctry><ctry>DK</ctry><ctry>ES</ctry><ctry>FR</ctry><ctry>GB</ctry><ctry>GR</ctry><ctry>IT</ctry><ctry>LI</ctry><ctry>LU</ctry><ctry>NL</ctry><ctry>SE</ctry></B840><B880><date>19920701</date><bnum>199227</bnum></B880></B800></SDOBI><abstract id="abst" lang="en"><p id="pa01" num="0001"><sub>5</sub>n7 An exhaust apparatus and a vacuum pumping unit using the exhaust apparatus are disclosed. The exhaust apparatus comprises a thermionic emission source, an electron accelerating grid surrounding the thermionic emission source, an outer electrode surrounding the electron accelerating grid, an ion accelerating grid intersecting an axis of the outer electrode and installed apart from the outer electrode, a vessel containing the thermionic emission source, the electron accelerating grid, the outer electrode, and the ion accelerating grid therein, a magnet disposed outside of the vessel and generating a magnetic field almost parallel to the axis of the outer electrode, a power supply for heating the thermionic emission source, a first DC power supply for applying a voltage between the electron accelerating grid, the outer electrode and the thermionic emission source, a second DC power supply for applying a voltage between the outer electrode and the ion accelerating grid so as to get the outer electrode positive. The vacuum pumping unit is constituted by interposing the exhaust apparatus between a vacuum vessel to be evacuated and an auxiliary vacuum pump. By this, gas molecules in the vacuum vessel are ionized by electron bombardment and accelerated toward the auxiliary vacuum pump to be exhausted.</p></abstract><search-report-data id="srep" srep-office="EP" date-produced="" lang=""><doc-page id="srep0001" file="srep0001.tif" type="tif" orientation="portrait" he="297" wi="210" /></search-report-data></ep-patent-document>