IMPROVED METHOD AND MEANS FOR PRODUCING PHOTOMASKS - Patent 0513218

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EP 0 513 218 A1

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(43)	Date of publication:
	19.11.1992 Bulletin 1992/47

(21)	Application number: 91904609.0

(22)	Date of filing: 29.01.1991

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International Patent Classification (IPC):

G03F 1/ 00^{( . )}
H05K 3/ 00^{( . )}

G03F 1/ 14^{( . )}

(86)	International application number:
	PCT/US1991/000668

(87)	International publication number:
	WO 1991/011754 (08.08.1991 Gazette 1991/18)

(84)	Designated Contracting States:
	AT BE CH DE DK ES FR GB GR IT LI LU NL SE

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Priority:

31.01.1990 US 19900472756
22.02.1990 US 19900483359

(71)	Applicant: PRESSTEK, INC.
	Hudson, NH 03051 (US)

(72)	Inventors:
	NOWAK, Michael, T. Gardner, MA 01440 (US) LEWIS, Thomas, E. E. Hampstead, NH 03826 (US)

(74)	Representative: Hackett, Sean James, et al
	MARKS & CLERK, 57-60 Lincoln's Inn Fields London WC2A 3LS London WC2A 3LS (GB)

(54)	IMPROVED METHOD AND MEANS FOR PRODUCING PHOTOMASKS