(57) An automated wet process station which provides for simultaneous batch processing
of multiple wafer carriers without operator interaction through a unique robotic system
transfer which processes the product from the rear of the automated wet processing
station. A computer monitors and controls all aspects of the wet station and the automated
robotic station. The following component support equipment are provided including
a wet process station with process tanks, input staging area, output stating area,
robot transfer arm, and a control zone. Other components and support equipment include
a braker panel, recirculation/filteration cabinet, a chemical mixing/recirculation/filteration
cabinet, circulator/heat exchange unit, a capacitance level sensor controller, a vapor
dryer unit, an ozone generator, an ozone filter box, and a fire control system, some
of which are optional components.
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