METHOD OF ENHANCING THE PERFORMANCE OF A MAGNETRON SPUTTERING TARGET - Patent 0546052

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EP 0 546 052 A1

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(43)	Date of publication:
	16.06.1993 Bulletin 1993/24

(21)	Application number: 91916025.0

(22)	Date of filing: 22.08.1991

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International Patent Classification (IPC):

C23C 14/ 34^{( . )}
H01J 37/ 34^{( . )}

C23C 14/ 35^{( . )}

(86)	International application number:
	PCT/US1991/006000

(87)	International publication number:
	WO 1992/004483 (19.03.1992 Gazette 1992/07)

(84)	Designated Contracting States:
	BE CH DE FR GB IT LI LU NL SE

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Priority:

29.08.1990 US 19900575561

(71)	Applicant: MATERIALS RESEARCH CORPORATION
	Orangeburg New York 10962 (US)

(72)	Inventors:
	HURWITT, Steven, D. Park Ridge, NJ 07656 (US) ARONSON, Arnold, J. Pomona, NY 10970 (US) VAN NUTT, Charles Monroe, NY 10950 (US)

(74)	Representative: Findlay, Alice Rosemary, et al
	Lloyd Wise, Tregear & Co. Norman House 105-109 Strand London WC2R 0AE London WC2R 0AE (GB)

(54)	METHOD OF ENHANCING THE PERFORMANCE OF A MAGNETRON SPUTTERING TARGET