(19)
(11) EP 0 657 943 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
19.05.1999 Bulletin 1999/20

(43) Date of publication A2:
14.06.1995 Bulletin 1995/24

(21) Application number: 94119528.1

(22) Date of filing: 09.12.1994
(51) International Patent Classification (IPC)6H01L 29/739, H01L 29/74
(84) Designated Contracting States:
DE FR GB

(30) Priority: 10.12.1993 JP 309964/93

(71) Applicant: FUJI ELECTRIC CO., LTD.
Kawasaki-shi Kanagawa 210 (JP)

(72) Inventors:
  • Ohtsuki, Masahito, c/o Fuji Electric Co., Ltd.
    Kawasaki-shi, Kanagawa 210 (JP)
  • Ueno, Katsunori, c/o Fuji Electric Co., Ltd.
    Kawasaki-shi, Kanagawa 210 (JP)

(74) Representative: Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät 
Maximilianstrasse 58
80538 München
80538 München (DE)

   


(54) Semiconductor device having a thyristor structure


(57) A semiconductor device having a thyristor structure including a first semiconductor region of a first conductivity type, a second semiconductor region of a second conductivity type, a third semiconductor region of the first conductivity type and a fourth semiconductor region of the second conductivity type; a first MISFET capable of injecting majority carriers from the fourth semiconductor region into the second semiconductor region; and a second MISFET capable of being turned on and off independently of the first MISFET and extracting majority carriers from the third semiconductor region into the fourth semiconductor region, wherein the fourth semiconductor region is divided into the source region of the first MISFET and the source region of the second MISFET, the latter being formed in a portion isolated from the former, characterized in that the depth of the source region of the second MISFET is different from that of the drain region thereof.







Search report