<?xml version="1.0" encoding="UTF-8"?><!DOCTYPE ep-patent-document PUBLIC "-//EPO//EP PATENT DOCUMENT 1.4//EN" "ep-patent-document-v1-4.dtd"><!-- Disclaimer: This ST.36 XML data has been generated from A2/A1 XML data enriched with the publication date of the A3 document - March 2013 - EPO - Directorate Publication - kbaumeister@epo.org --><ep-patent-document id="EP94120409A3" file="EP94120409NWA3.xml" lang="en" doc-number="0660337" date-publ="19951108" kind="A3" country="EP" status="N" dtd-version="ep-patent-document-v1-4"><SDOBI lang="en"><B000><eptags><B001EP>......DE....FRGB..................................</B001EP><B005EP>R</B005EP></eptags></B000><B100><B110>0660337</B110><B120><B121>EUROPEAN PATENT APPLICATION</B121></B120><B130>A3</B130><B140><date>19951108</date></B140><B190>EP</B190></B100><B200><B210>94120409.1</B210><B220><date>19941222</date></B220><B240 /><B250>en</B250><B251EP>en</B251EP><B260>en</B260></B200><B300><B310>326588/93</B310><B320><date>19931224</date></B320><B330><ctry>JP</ctry></B330><B310>20209/94</B310><B320><date>19940217</date></B320><B330><ctry>JP</ctry></B330></B300><B400><B405><date>19951108</date><bnum>199545</bnum></B405><B430><date>19950628</date><bnum>199526</bnum></B430></B400><B500><B510><B516>6</B516><B511> 6H 01C   7/112  A</B511><B512> 6H 01C  17/06   B</B512></B510><B540><B541>de</B541><B542>Metalloxid-Dünnschichtwiderstand und Herstellungsverfahren</B542><B541>en</B541><B542>Metal oxide film resistor and method for producing the same</B542><B541>fr</B541><B542>Résistance en film mince d'oxyde de métal et méthode de fabrication</B542></B540><B560 /><B590><B598>1</B598></B590></B500><B700><B710><B711><snm>MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.</snm><iid>00216883</iid><irf>X 171 M</irf><adr><str>1006, Oaza Kadoma</str><city>Kadoma-shi,
Osaka-fu, 571</city><ctry>JP</ctry></adr></B711></B710><B720><B721><snm>Hattori, Akiyoshi</snm><adr><str>3-A17-104, Otokoyama-takezono</str><city>Yawata City, 614</city><ctry>JP</ctry></adr></B721><B721><snm>Hori, Yoshihiro</snm><adr><str>46-3-402, Yamadaike-higashimachi</str><city>Hirakata City, 573-01</city><ctry>JP</ctry></adr></B721><B721><snm>Yoshida, Akihiko</snm><adr><str>19-13, Korien Yamanote-cho</str><city>Hirakata City, 573</city><ctry>JP</ctry></adr></B721></B720><B740><B741><snm>Jung, Elisabeth, Dr.</snm><sfx>et al</sfx><iid>00006103</iid><adr><str>Patentanwälte,
Dr. Elisabeth Jung,
Dr. Jürgen Schirdewahn,
Claus Gernhardt,
Postfach 40 14 68</str><city>D-80714 München</city><ctry>DE</ctry></adr></B741></B740></B700><B800><B840><ctry>DE</ctry><ctry>FR</ctry><ctry>GB</ctry></B840><B880><date>19951108</date><bnum>199545</bnum></B880></B800></SDOBI><abstract id="abst" lang="en"><p id="pa01" num="0001">A metal oxide film resistor comprises mainly zinc oxide and an auxiliary oxide of at least one metal added as an activator for covering a wide range of resistance of from 1 kΩ to 10 MΩ. A method of producing such a metal oxide film resistor comprises the steps of preparing a solution composed of at least a zinc salt, and forming a zinc oxide film (2) on an insulating substrate (1) by supplying a vapor of the solution to the insulating substrate (1) heated to a temperature at which the zinc salt thermally decomposes and by thermally decomposing the zinc salt on the surface of the insulating substrate (1).<img id="iaf01" file="imgaf001.tif" wi="74" he="60" img-content="drawing" img-format="tif" /></p></abstract><search-report-data id="srep" srep-office="EP" date-produced="" lang=""><doc-page id="srep0001" file="srep0001.tif" type="tif" orientation="portrait" he="297" wi="210" /></search-report-data></ep-patent-document>