(19)
(11) EP 0 671 658 B8

(12) CORRECTED EUROPEAN PATENT SPECIFICATION
Note: Bibliography reflects the latest situation

(15) Correction information:
Corrected version no 1 (W1 B1)

(48) Corrigendum issued on:
11.12.2002 Bulletin 2002/50

(45) Mention of the grant of the patent:
12.06.2002 Bulletin 2002/24

(21) Application number: 95301087.3

(22) Date of filing: 21.02.1995
(51) International Patent Classification (IPC)7: G03F 1/14, G03F 7/20, G03F 1/00

(54)

Exposure apparatus and reflection type mask to be used in the same

Belichtungsgerät sowie dazu gehörende Reflexionsmaske

Appareil d'exposition ainsi que masque à réflexion

(84) Designated Contracting States:
FR GB NL

(30) Priority: 02.03.1994 JP 3171294

(43) Date of publication of application:
13.09.1995 Bulletin 1995/37

(73) Proprietor: CANON KABUSHIKI KAISHA
Tokyo (JP)

(72) Inventors:
  • Watanabe, Yutaka, c/o Canon K.K.
    Tokyo (JP)
  • Hayashida, Masami, c/o Canon K.K.
    Tokyo (JP)

(74) Representative: Beresford, Keith Denis Lewis et al
BERESFORD & Co. 2-5 Warwick Court, High Holborn
London WC1R 5DH
London WC1R 5DH (GB)


(56) References cited: : 
EP-A- 0 279 670
   
  • APPLIED OPTICS, vol. 32, no. 34, December 1993 WASHINGTON, US, pages 7012-7015, XP 000414605 A.M. HAWRYLUK ET AL. 'Reflection mask defect repair'
  • PATENT ABSTRACTS OF JAPAN vol. 017 no. 203 (E-1354) ,21 April 1993 & JP-A-04 346214 (NIKON CORP) 2 December 1992,
  • PATENT ABSTRACTS OF JAPAN vol. 017 no. 428 (P-1588) ,9 August 1993 & JP-A-05 088355 (CANON INC) 9 April 1993,
   
Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention).