............FRGB........NL......................................................JDIM350 (Ver 2.1 Jan 2001) 2999001/00671658CORRECTED EUROPEAN PATENT SPECIFICATIONB8B120021211W172DEBibliographieENBibliographyFRBibliographieEP95301087.3199502211996072419980403enenen317129419940302JP20021211200250199509131995372002061220022420010713200212112002507 7G 03F 1/14 A 7G 03F 7/20 B 7G 03F 1/00 BdeBelichtungsgerät sowie dazu gehörende ReflexionsmaskeenExposure apparatus and reflection type mask to be used in the samefrAppareil d'exposition ainsi que masque à réflexionEP-A- 0 279 670APPLIED OPTICS, vol. 32, no. 34, December 1993 WASHINGTON, US, pages 7012-7015, XP 000414605 A.M. HAWRYLUK ET AL. 'Reflection mask defect repair'PATENT ABSTRACTS OF JAPAN vol. 017 no. 203 (E-1354) ,21 April 1993 & JP-A-04 346214 (NIKON CORP) 2 December 1992,PATENT ABSTRACTS OF JAPAN vol. 017 no. 428 (P-1588) ,9 August 1993 & JP-A-05 088355 (CANON INC) 9 April 1993,1Watanabe, Yutaka, c/o Canon K.K.30-2, 3-chome, Shimomaruko, Ohta-kuTokyoJPHayashida, Masami, c/o Canon K.K.30-2, 3-chome, Shimomaruko, Ohta-kuTokyoJPCANON KABUSHIKI KAISHA00542361GFM/235453030-2, 3-chome, Shimomaruko, Ohta-kuTokyoJPBeresford, Keith Denis Lewiset al00028273BERESFORD & Co. 2-5 Warwick Court, High HolbornLondon WC1R 5DHGBFRGBNL19960313199611