(19)
(11) EP 0 698 230 A1

(12)

(43) Date of publication:
28.02.1996 Bulletin 1996/09

(21) Application number: 94900495.0

(22) Date of filing: 29.10.1993
(51) International Patent Classification (IPC): 
G03F 7/ 004( . )
H01L 21/ 027( . )
G03F 7/ 039( . )
(86) International application number:
PCT/US1993/010512
(87) International publication number:
WO 1994/010608 (11.05.1994 Gazette 1994/11)
(84) Designated Contracting States:
DE FR GB

(30) Priority: 29.10.1992 US 19920968120

(71) Applicant: International Business Machines Corporation
Armonk, N.Y. 10504 (US)

(72) Inventors:
  • BRUNSVOLD, William, Ross
    Poughkeepsie, NY 12603 (US)
  • BREYTA, Gregory
    San Jose, CA 95120 (US)
  • DIPIETRO, Richard, Anthony
    San Jose, CA 95120 (US)
  • ITO, Hiroshi
    San Jose, CA 95120 (US)
  • KNORS, Christopher, John
    Bound Brook, NJ 08805 (US)
  • KWONG, Ranee, Wai-Ling
    Wappingers Falls, NY 12590 (US)
  • MIURA, Steve, Seiichi
    Poughkeepsie, NY 12603 (US)
  • MONTGOMERY, Melvin, Warren
    New Windsor, NY 12550 (US)
  • MOREAU, Wayne, Martin
    Wappingers Falls, NY 12590 (US)
  • SACHDEV, Harbans, Singh
    Wappingers Falls, NY 12590 (US)
  • WELSH, Kevin, Michael
    Fishkill, NY 12524 (US)

(74) Representative: Schuffenecker, Thierry, et al 
Compagnie IBM France, Département de Propriété Intellectuelle
F-06610 La Gaude
F-06610 La Gaude (FR)

   


(54) CHEMICALLY AMPLIFIED PHOTORESIST