(19)
(11) EP 0 702 775 A1

(12)

(43) Date of publication:
27.03.1996 Bulletin 1996/13

(21) Application number: 95911781.0

(22) Date of filing: 15.02.1995
(51) International Patent Classification (IPC): 
C30B 25/ 12( . )
C30B 35/ 00( . )
C30B 31/ 14( . )
H01L 21/ 00( . )
(86) International application number:
PCT/US1995/002008
(87) International publication number:
WO 1995/023427 (31.08.1995 Gazette 1995/37)
(84) Designated Contracting States:
CH DE GB LI NL

(30) Priority: 17.02.1994 KR 19940002820

(71) Applicant: VARIAN ASSOCIATES, INC.
Palo Alto, California 94304-1030 (US)

(72) Inventors:
  • KYUNG, Hyun-Su
    Kyungki-Do (KR)
  • CHOI, Won-Song
    Kyungki-Do (KR)
  • SHIN, Jung-Ho
    Kyungki-Do (KR)

(74) Representative: Cline, Roger Ledlie 
EDWARD EVANS & CO. Chancery House 53-64 Chancery Lane
London WC2A 1SD
London WC2A 1SD (GB)

   


(54) APPARATUS FOR THERMAL TREATMENT OF THIN FILM WAFER