BACKGROUND OF THE INVENTION
1. Field of the Invention:
[0001] The present invention relates to an ink jet head used for an ink jet printer which
prints information on a recording medium by way of an ink jet, and to a method for
fabricating the same.
2. Description of the Related Art:
[0002] Recently, with the development of computers, printers are becoming more and more
important as devices for outputting information from the computers. Specifically,
as computers become more compact and have higher performance, printers for printing
image or code information from the computer onto a sheet of paper or a transparent
polymer film for an OHP (over head projector), for example, are required to be more
compact and have higher performance and functions.
[0003] Among such printers, an ink jet printer for forming character information and images
on a paper sheet, a polymer film or the like by producing a jet of liquid ink has
been widely and actively developed recently because the ink jet printer is capable
of being reduced in size, having enhanced performance, and having reduced power consumption.
In an ink jet printer, structurally the most important component is an ink jet head
for jetting ink onto a medium (e.g., the paper sheet). Thus, it is important to fabricate
an ink jet head, which is small in size and reliable, and can be produced at low cost.
[0004] As methods for providing an ink jet in the ink jet printer, the following three methods
are conventionally known.
[0005] A first method uses a piezoelectric element. In this method, a high voltage is applied
to a piezoelectric element
1 so as to cause mechanical deformation in the piezoelectric element
1 (Figures
7A and
7B). Pressure is generated in an ink pressure cavity
2 by the mechanical deformation, thereby jetting ink
4 from a nozzle
3 in a particle form.
[0006] A second method is a so-called bubble jet method. According to the bubble jet method,
heaters
5 are provided in cavities as shown in Figure
8. By rapidly heating the heaters
5, ink is boiled to form bubbles. The ink is jetted out from nozzles
6 due to a change in pressure which is caused by generation of bubbles.
[0007] A third method uses a bimetal element which is provided in an ink cavity. The bimetal
element is heated so as to become deformed. Pressure is applied to ink by the deformation,
so that the ink is jetted out (see, e.g., Japanese Laid-Open Patent Publication No.
2-30543).
[0008] As a method for fabricating an ink jet head, a method using anisotropic etching of
single-crystalline silicon is known. As shown in Figure
9, a groove is formed by anisotropically etching a substrate made of Single-crystalline
silicon. Then, an upper plate is adhered onto the substrate, thereby forming an ink
cavity (see, K.E. Peterson, "Silicon as a Mechanical Material", Proc. IEEE, vol. 70,
no. 5, pp. 420 - 457, May 1982).
[0009] However, the ink jet heads utilized in the respective above-mentioned methods have
the following problems.
[0010] First, in the first method, the ink jet head is fabricated by mechanically processing
the piezoelectric element which is obtained by forming a piezoelectric material in
a multilayer form. Since it is necessary to perform a mechanical processing for forming
the piezoelectric element, the extent which a gap between ink cavities can be reduced
is disadvantageously limited. As a result, an interval between nozzles for jetting
ink cannot be reduced.
[0011] In the case of the second method which utilizes a bubble jet, since ink should be
boiled to form bubbles, it is necessary to immediately raise the temperature of the
heater to several hundreds of C°. Therefore, it is difficult to prevent the heater
from becoming deteriorated, resulting in a short lifetime of the ink jet head.
[0012] In the third method, the bimetal serving as a driving source for jetting out the
ink should have a layered structure consisting of different laminated materials. Thus,
this method is disadvantageous in that the structure is complicated.
[0013] Furthermore, regardless of the particular method, in the case where a driving source
for jetting out the ink is fabricated, it is necessary to fabricate a number of minute
driving sources at the same time. In the third method, in particular, components should
be separately fabricated and then assembled. Therefore, it is difficult to integrate
the ink jet head.
[0014] Thus, none of these methods is satisfactory since a highly integrated head with a
long lifetime cannot be obtained.
[0015] Moreover, in the case where ink cavities are formed utilizing anisotropic etching
of single-crystalline silicon, when a method for jetting out ink utilizing a deformation
phenomenon of the driving source caused by heat is adopted, the side of the driving
source opposite to the side in contact with ink comes in contact with air. Therefore,
since heat is hardly released, a cooling response speed is lowered. As a result, since
a response speed is lowered, the ink jet head cannot be operated at a high speed.
SUMMARY OF THE INVENTION
[0016] The ink jet head of this invention includes: a substrate; an orifice plate having
an opening, the orifice plate facing the substrate; an element provided on the substrate
so as to define an ink cavity provided between the substrate and the orifice plate,
the ink cavity being filled with liquid ink, and so as to form a gap between at least
a central portion of the element and the substrate, the element ejecting the liquid
ink filled in the ink cavity through the opening of the orifice plate; a main ink
supply groove provided on at least one of a surface of the substrate facing the orifice
plate and a surface of the orifice plate facing the substrate; an ink supply path
for connecting the ink cavity to the main ink supply groove; and a branch ink supply
groove for connecting the gap between the element and the substrate to the main ink
supplying groove.
[0017] In one embodiment of the present invention, the element is deformed so as to increase
pressure inside the ink cavity, causing the liquid ink filled in the ink cavity to
eject through the opening of the orifice plate.
[0018] In another embodiment of the present invention, the liquid ink from the main ink
supply groove flows into the gap between the element and the substrate via the branch
ink supply groove so as to alleviate negative pressure generated in the gap between
the element and the substrate, the negative pressure being caused by increasing a
volume of the gap between the element and the substrate due to the deformation of
the element.
[0019] In still another embodiment of the present invention, the element includes a heater
circuit for heating the element, and the element is thermally deformed by heating
so as to increase pressure inside the ink cavity.
[0020] In sill another embodiment of the present invention, the element includes a piezoelectric
element for causing contraction in response to an application of a voltage, and the
element is deformed due to the contraction of the piezoelectric element so as to increase
pressure inside the ink cavity.
[0021] In still another embodiment of the present invention, the liquid ink filled in the
ink cavity has a higher thermal conductivity than that of air so as to quickly cool
the element.
[0022] In still another embodiment of the present invention, the ink jet head further includes
a wiring circuit for supplying a current to the element, wherein the wiring circuit
is provided within the main ink supplying groove.
[0023] In still another embodiment of the present invention, the substrate is made of single-crystalline
silicon, and walls of the main ink supplying groove and the branch ink supplying groove
are a 〈111〉 surface of the single-crystalline silicon.
[0024] A method for fabricating an ink jet head according to the present invention, the
ink jet head including: a substrate; an orifice plate having an opening, the orifice
plate facing the substrate; an element provided on the substrate so as to define an
ink cavity provided between the substrate and the orifice plate, the ink cavity being
filled with liquid ink, and so as to form a gap between at least a central portion
of the element and the substrate, the element ejecting the liquid ink filled in the
ink cavity through the opening of the orifice plate; a main ink supply groove provided
on at least one of a surface of the substrate facing the orifice plate and a surface
of the orifice plate facing the substrate; an ink supply path for connecting the ink
cavity to the main ink supply groove; and a branch ink supply groove for connecting
the gap between the element and the substrate to the main ink supplying groove, the
method includes the steps of: forming an oxide film on the substrate; removing at
least a portion corresponding to the branch ink supplying groove from the oxide film;
forming a sacrifice layer on the oxide film from which at least the portion corresponding
to the branch ink supplying groove has been removed; forming a plurality of laminated
layers constituting the element on the sacrifice layer so that the end of the sacrifice
layer is exposed apart from the laminated layers; removing the sacrifice layer; and
utilizing anisotropic etching of the substrate made of single-crystalline silicon
by introducing an anisotropic enchant into the gap formed as a result of removing
the sacrifice layer.
[0025] Thus, the invention described herein makes possible the advantages of: (1) providing
a highly integrated ink jet head with a long lifetime and which is capable of being
operated at a high speed; and (2) providing a method for fabricating the same.
[0026] These and other advantages of the present invention will become apparent to those
skilled in the art upon reading and understanding the following detailed description
with reference to the accompanying figures.
BRIEF DESCRIPTION OF THE DRAWINGS
[0027] Figure
1A is a plan view showing an ink jet head according to Example 1; and Figure
1B is a cross-sectional view of the ink jet head shown in Figure
1A.
[0028] Figure
2 is a cross-sectional view showing an example of an ink ejecting element which can
be used for the present invention.
[0029] Figure
3A is a plan view showing an ink jet head according to Example 2; and Figure
3B is a cross-sectional view of the ink jet head shown in Figure
3A.
[0030] Figure
4A is a plan view showing an ink jet head according to Example 3; and Figure
4B is a cross-sectional view of the ink jet head shown in Figure
4A.
[0031] Figure
5 is a cross-sectional view showing an ink jet head according to Example
4.
[0032] Figures
6A(i) to
6H(i) are cross-sectional views showing a fabrication process of the ink jet head according
to Example 1.
[0033] Figures
6A(ii) to
6G(ii) are plan view showing a fabrication process of the ink jet head according to Example
1.
[0034] Figures
7A and
7B each is a cross-sectional view showing a conventional ink jet head.
[0035] Figure
8 is a cross-sectional view showing another conventional ink jet head.
[0036] Figure
9 is a cross-sectional view showing still another conventional ink jet head during
its formation.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0037] Hereinafter, the present invention will be described by way of illustrative examples.
Example 1
[0038] Figure
1A is a plan view showing an ink jet head according to Example 1. In Figure
1A, an orifice plate
104 is omitted to expose the various other elements described herein. Figure
1B is a cross-sectional view of the ink jet head of Figure
1A. The ink jet head includes a main ink supplying groove
101 and branch ink supplying grooves
107. The main ink supplying groove
101 and the branch ink supplying grooves
107 are formed on a surface of a substrate
100 facing the orifice plate
104. The substrate
100 is, for example, made of single-crystalline silicon. The cross-sectional view of
the main ink supplying groove
101 and the branch ink supplying grooves
107 each has a concave shape. Ink ejecting elements
102, an adhesive film
103 (in Figures
1A and
1B, shown as adhesive films
103a and
103b) and a wiring circuit
108 (in Figures
1A and
1B, shown as wiring circuits
108a, 108b, 108c and
108d) are provided on the substrate
100. The orifice plate
104 is provided so that these components are interposed between the orifice place
104 and the substrate
100. The space which is enclosed by the orifice plate
104, the ink ejecting element
102 and the adhesive layer
103 defines an ink cavity
105. The ink cavity
105 is filled with ink.
[0039] The periphery of the ink ejecting element
102 is fixed to the substrate
100. However, a gap
110 is provided between at least the central portion of the ink ejecting element
102 and the substrate
100. Since the central portion of the ink ejecting element
102 is kept apart from the substrate
100, the ink ejecting element
102 can be vertically deformed with respect to the orientation shown in Figure
1B. Ink supplying paths
106 for connecting the ink cavities
105 and the main ink supplying groove
101 are formed through the adhesive layer
103b. With the ink supplying paths
106, the ink delivered through the main ink supplying groove
101 can be supplied to the ink cavities
105. The gap
110 between the ink ejecting element
102 and the substrate
100 is connected to the main ink supplying groove
101 through the branch ink supplying groove
107. Since the periphery of the ink ejecting element
102 is fixed to the substrate
100 as described above, the ink cavity
105 and the main ink supplying groove
101 are connected to each other only through the ink supplying path
106, and the gap
110 and the main ink supplying groove
101 are connected to each other only through the branch ink supplying groove
107.
[0040] The ink ejecting element
102 is made of a thermally deformable material and contains a heater circuit (not shown).
The ink ejecting element
102 is heated by supplying a current to the heater circuit. A current for heating is
supplied to the heater circuit via the wiring circuit
108. The ink ejecting element
102 is controlled by selectively supplying a current to the wiring circuit
108. The ink ejecting element
102 is deformed into a dome-like shape in a direction perpendicular to the substrate
100 by heating. As a result, a volume of the ink cavity
105 is reduced to increase pressure inside the ink cavity
105, whereby ink is jetted out from a nozzle opening
109 provided through the orifice plate
104.
[0041] Due to the deformation of the ink ejecting element
102, a volume of the gap
110 between the ink ejecting element
102 and the substrate
100 is increased so as to generate negative pressure in the gap
110. However, this negative pressure is alleviated or eliminated because the liquid ink
from the main ink supplying groove
101 flows into the gap
110 via the branch ink supplying groove
107 in response to the deformation of the ink ejecting element
102. The alleviation of the negative pressure provides an advantage of effectively apply
pressure onto the ink cavity.
[0042] A method for constructing an ink jet head in accordance with Example 1 and the exemplary
materials associated therewith, together with the other examples of the invention
described herein, will be discussed in detail below with reference to Figures
6A(i) through
6H(i) and
6A(ii) through
6G(ii).
[0043] In the ink jet head thus configured, since the ink ejecting element
102 ejects the liquid ink filed in the ink cavity
105 through the opening
109 by utilizing thermal deformation of the ink ejecting element
102, ink ejecting element
102 can be driven at lower temperature than a bubble jet head. As a result, the lifetime
of the ink jet head of Example 1 can be prolonged compared with the bubble jet head.
Moreover, when the ink ejecting element
102 is thermally deformed, pressure is applied onto the ink cavity
105 to jet out ink. Since the gap
110 is provided between the ink ejecting element
102 and the substrate
100, and is filled with ink having a higher thermal conductivity than that of air, the
ink ejecting elements
102 are quickly cooled and can be operated at a high speed. Furthermore, since the ink
ejecting elements
102 do not require a mechanical processing such as that required by the piezoelectric
element, the ink ejecting elements
102 can be highly integrated.
[0044] In addition, since the main ink supplying groove
101 and the branch ink supplying grooves
107 are provided on the surface of the substrate
100 facing the orifice plate
104, it is possible to fabricate the ink jet head from the side of the surface of the
substrate
100 facing the orifice plate
104. As a result, the fabrication process can be simplified. Moreover, since no opening
is provided through the substrate
100, there is no possibility of lowering the strength of the substrate
100. This function is particularly useful in the case where a number of elements and nozzles
are placed on the substrate
100; since it is not necessary to bore a number of openings through the substrate
100, the strength of the substrate
100 is not lowered.
[0045] While Figures
1A and
1B show the case where four ink ejecting elements
102 are arranged on the substrate
100, a larger number of elements may be arranged in the actual embodiments. By arranging
a large number of elements, a highly integrated head can be configured. Furthermore,
when a large number of elements, which are arranged in a column in Figures
1A and
1B, are arranged in a plurality of columns, a larger number of elements can be arranged
on a single head having a limited area. As a result, it is possible to enhance the
degree of integration of the ink jet head. According to the present invention, even
in such a case, since it is not necessary to form openings through the substrate
100, the strength of the substrate
100 is not lowered. Therefore, it is possible to arrange a large number of elements.
[0046] Moreover, when a (110) single-crystalline silicon substrate is used as the substrate
100, anisotropic etching can be used for fabricating the main ink supplying groove
101 and the branch ink supplying grooves
107. As a result, walls of the main ink supplying groove
101 and branch ink supplying grooves
107 can be constituted utilizing 〈111〉 crystal planes. Thus, it is possible to form precise
walls. In addition, the cost can be intended to be lowered.
[0047] In Example 1, the main ink supplying groove
101 and the branch ink supplying grooves
107 for alleviating negative pressure are formed only on the front surface of the silicon
substrate
100. On the other hand, it is possible to form these supplying grooves from the back surface
in such a manner that the grooves are bored through the substrate. In such a case,
however, a three-dimensional processing is required. In particular, it is required
to form a location hole for aligning the position of the pattern of the front surface
with that of the back surface, or a specific exposure apparatus for exposing the silicon
substrate to light while observing both front and back surfaces of the substrate.
Thus, the fabrication process becomes complicated, resulting in increased cost.
[0048] According to Example 1, it is sufficient to form the grooves only on the surface
of the silicon substrate. Therefore, Example 1 is advantageous in that the ink jet
head can be fabricated by a simple process. Since no openings leading to the back
surface of the substrate are required, the strength of the substrate is not lowered
even in the case where a number of elements are integrated on the substrate. Thus,
Example 1 is advantageous in that a head including a number of integrally formed elements
can be obtained.
[0049] It is possible to adopt, for example, the structure as shown in Figure
2 as the structure of an ink ejecting element
102 used in Example 1. The ink ejecting element
102 includes: a buckling element
501; a first insulating layer
502; a heater layer
503; a second insulating layer
504; and a diaphragm
505. The first insulating layer
502, the heater layer
503 and the second insulating layer
504 are formed below the buckling element
501. The diaphragm
505 and the buckling element
501 are connected to each other only through the central portion of the buckling element
501. When a current flows though the buckling element
501 so as to heat the buckling element
501, the buckling element
501 is thermally expanded. When compressive stress due to the thermal expansion exceeds
a buckling limitation of the buckling element
501, buckling is caused to deform the buckling element
501 in a direction perpendicular to the substrate
100, thereby deforming the diaphragm
505. In this structure, the heater layer
503 and the buckling element
501 are located apart from the ink cavity. Therefore, since ink, the heater layer
503 and the buckling element
501 are not in direct contact with each other, it is possible to inhibit ink from being
deteriorated.
Example 2
[0050] Figure
3A is a plan view showing an ink jet head according to Example 2, and Figure
3B is a cross-sectional view thereof. Again, in Figure
3A, an orifice plate
204 is omitted for ease of viewing. In this ink jet head, a main ink supplying groove
201 is provided on the surface of the orifice plate
204 facing the substrate
200.
[0051] On the surface of the substrate
200, ink ejecting elements
202, an adhesive layer
203 (in Figures
3A and
3B, shown as
203a and
203b) and a wiring circuit
208 are provided. The orifice plate
204 is provided above the substrate
200 so as to face the substrate
200. An ink cavity
205 is defined as a space enclosed by the orifice plate
204, the ink ejecting element
202, and the adhesive layers
203. The ink cavity
205 is filled with ink.
[0052] The periphery of the ink ejecting element
202 is fixed to a substrate
200. However, a gap
210 is provided between at least the central portion of the ink ejecting element
202 and the substrate
200. Since the central portion of the ink ejecting element
202 is kept apart from the substrate
200, the ink ejecting element
202 can be vertically deformed. Ink supplying paths
206 for connecting the ink cavities
205 with the main ink supplying groove
201 are formed through the adhesive layer
203b. The gap
210 between the ink ejecting element
202 and the substrate
200 is connected to the main ink supplying groove
201 through the branch ink supplying groove
207.
[0053] Since the periphery of the ink ejecting element
202 is connected to the substrate
200 as described above, the ink cavities
205 and the main ink supplying groove
201 are connected to each other only through the ink supplying paths
206, and the gaps
210 and the main ink supplying groove
201 are connected to each other only through the branch ink supplying grooves
207. Each branch ink supplying groove
207 is formed on the substrate
200. The sectional view of the branch ink supplying groove
207 has a concave shape. Similarly to Example 1, in the case where single-crystalline
silicon is used as the substrate
200, the branch ink supplying grooves
207 can be formed using anisotropic etching so that walls thereof are constituted by
〈111〉 planes.
[0054] The ink ejecting element
202 contains a heater circuit (not shown). When a current flows through the heater circuit,
the heater circuit is heated. A current for heating is supplied via a wiring circuit
208. The ink ejecting element
202 is controlled by selectively supplying a current to the wiring circuit
208. The ink ejecting element
202 is made of a thermally deformable material and is deformed into a dome-like shape
in a direction perpendicular to the substrate
200 by heating. As a result, a volume of the ink cavity
205 is reduced so as to increase pressure inside the ink cavity
205. In response, ink is jetted out from a nozzle opening
209 provided through the orifice plate
204. The structure of the ink ejecting element
202 can be the same as that shown in Figure
2.
[0055] According to Example 2, since a thermally deformable ink ejecting element
202 is used, a lifetime of the ink jet head can be prolonged. When the ink ejecting element
202 is thermally deformed, pressure is applied on the ink cavity
205 to jet out ink. Since the gap
210 is provided between the ink ejecting element
202 and the substrate
200, the gap
210 is filled with ink having a higher thermal conductivity than that of air. Thus, the
ink ejecting elements
202 are quickly cooled and can be operated at a high speed. Furthermore, since the ink
ejecting elements
202 do not require mechanical processing such as that required by the piezoelectric element,
the ink ejecting elements
202 can be highly integrated.
[0056] In Example 2, the main ink supplying groove
201 for alleviating negative pressure is formed only on the back surface of the orifice
plate
204. It is possible to form this supplying groove from the back surface through the substrate
200. In such a case, however, a three-dimensional processing is required. In particular,
it is required to form a location hole for aligning the position of the pattern of
the front surface with that of the back surface, or to use a specific exposure apparatus
for exposing the silicon substrate to light while observing both surfaces. Thus, the
fabrication process becomes complicated, resulting in increased manufacturing costs.
[0057] Moreover, according to Example 2, it is sufficient to form grooves on the back surface
of the orifice plate
204, and the grooves can be formed by a process which differs from the process for fabricating
the silicon substrate side. Therefore, Example 2 is advantageous in that the number
of steps of fabricating the silicon substrate side can be reduced to lower the fabrication
cost.
[0058] Furthermore, Example 2 is advantageous in that the size of the main ink supplying
groove (a cross-sectional area of a flow path of ink) can be increased, thereby smoothly
supplying ink. In particular, ink can be smoothly supplied by reducing resistance
of the main ink supplying groove against ink.
[0059] Furthermore, since there are no openings leading to the back surface of the substrate
200, the strength of the substrate is not lowered even in the case where a number of elements
are integrated on the substrate. Therefore, an ink jet head including a large number
of integrated elements can be obtained. Although four ink ejecting elements are arranged
in the example shown in Figures
3A and
3B, a highly integrated head can be obtained by placing a large number of elements.
Example 3
[0060] Figure
4A is a plan view showing an ink jet head according to Example 3 (in Figure
4A, an orifice plate
304 is omitted). Figure
4B is a cross-sectional view of the ink jet head of Example 3. In this ink jet head,
a main ink supplying groove
301 is formed on the surface of the orifice plate
304 facing the substrate
300. An ink ejecting element
302, an adhesive layer
303 (in Figures
4A and
4B, denoted by
303a and
303b) and a wiring circuit
308 are provided on the surface of a substrate
300. The wiring circuit
308 is provided inside the main ink supplying groove
301.
[0061] The orifice plate
304 and the substrate
300 are oriented to face each other. The space enclosed by the orifice plate
304, the ink ejecting element
302 and the adhesive layer
303 defines an ink cavity
305. The ink cavity
305 is filled with ink. The periphery of the ink ejecting element
302 is fixed to the substrate
300. A gap
310 is provided between the ink ejecting element
302 and the substrate
300. The gap
310 is kept apart from the substrate
300 so that the ink ejecting element
302 can be vertically deformed.
[0062] Ink supplying paths
306 connecting the ink cavities
305 to the main ink supplying groove
301 are formed in the adhesive layer
303b. The gap
310 between the ink ejecting element
302 and the substrate
300 is connected to the main ink supplying groove
301 through the branch ink supplying groove
307. The periphery of the ink ejecting element
302 is fixed to the substrate
300. The ink cavity
305 is connected to the main ink supplying groove
301 only via the ink supplying path
306, and the gap
310 is connected to the main ink supplying groove
301 only via the branch ink supplying groove
307. Example 3 is the same as Example 1 in that the branch ink supplying groove
307 is formed on the surface of the substrate
300 facing the orifice plate
304. The cross-sectional view of the branch ink supplying groove
307 has a concave shape, and such a shape can be formed, for example, using a 〈111〉 single-crystalline
silicon plane.
[0063] The ink ejecting element
302 contains a heater circuit (not shown). The ink ejecting element
302 is heated by flowing a current through the heater circuit. The current for heating
is supplied via the wiring circuit
308. The ink ejecting element
302 is controlled by selectively supplying a current to the wiring circuit
308. The ink ejecting element
302 is deformed in a dome-shape in a direction perpendicular to the substrate
300 by heating. As a result, a volume of the ink cavity is reduced to increase pressure
inside the ink cavity
305, whereby ink is jetted out from a nozzle opening
309 formed through the orifice plate
304.
[0064] In Example 3, since a thermally deformable ink ejecting element
302 is used, the lifetime of the ink jet head can be prolonged. Moreover, when the ink
ejecting element
302 is thermally deformed, pressure is applied onto the ink cavity
305 to jet out the ink. In this case, the gap
310 is provided between the ink ejecting element
302 and the substrate
300. Since the gap
310 is filled with ink having a higher thermal conductivity than that of air, the ink
ejecting element
302 is quickly cooled. Therefore, the ink ejecting element
302 can be operated at high speed. Since the ink ejecting element
302 does not require a mechanical processing as that required by the piezoelectric element,
the ink jet head can be highly integrated.
[0065] Furthermore, since the main ink supplying groove
301 is configured so as to be positioned above the wiring circuit
308 connected to the heater circuit, the area required for the wiring circuit
308 and the area required for the main ink supplying groove
301 can be commonly used. Therefore, the total area of the ink jet head can be reduced.
[0066] Although a structure including four elements is shown in Figures
4A and
4B, a highly integrated head can be configured by placing a larger number of elements.
The structure of the ink ejecting element
302 can be the same as that shown in Figure
2.
Example 4
[0067] In Examples 1 through 3, the ink ejecting element utilizes thermal expansion by heating
as a mechanism of ejecting ink. However, the present invention is not limited to the
use of such type of the ink ejecting element. For example, a piezoelectric element
can be used as the ink ejecting element.
[0068] Figure
5 shows a structure of an ink jet head including a piezoelectric element in Example
4 according to the present invention.
[0069] The piezoelectric element is obtained by forming a piezoelectric material in multilayer
form. For example, the piezoelectric element is obtained by forming a gap
510 on a silicon substrate
500 using a sacrifice layer; forming a lower electrode
512, an insulating layer
514, a piezoelectric layer
516 and a nickel layer
518 on the gap
510 in this order; and forming an ink supplying groove
520 by utilizing anisotropic etching of single-crystal-line silicon.
[0070] Thus, an ink jet head having the same structure as Example 1 through 3 except the
ink ejecting element can be obtained.
[0071] The nickel layer
518 is used as a common electrode which is commonly used by all elements, and the lower
electrode
512 is used as a selection electrode. When a voltage is applied to the selection electrode,
the piezoelectric layer
516 is contracted. As the result of the contraction of the piezoelectric layer
516, the nickel layer
518 is deformed in a direction perpendicular to the substrate
500, for example, along a dotted line shown in Figure
5.
[0072] This deformation of the nickel layer
518 serves the same function as the deformation of the above described thermally deformable
ink ejecting elements
102, 202 and
302 caused by heating the ink ejecting elements.
(Fabrication Process)
[0073] Next, a method for fabricating the ink jet head according to the present invention
will be described.
[0074] Figures
6A(i) through
6H(i) and
6A(ii) through
6G(ii) show a fabrication process of the ink jet head according to Example 1. Figure
6A(ii) shows a plan view, and Figure
6A(i) shows a cross-sectional view taken along a line
A-A' of Figure
6A(ii). Similarly, Figures
6B(ii) to
6G(ii) are plan views showing the ink jet head, and Figures
6B(i) through
6G(i) are respective cross-sectional views thereof.
[0075] First, as shown in Figures
6A(i) and
6A(ii), oxide films
402 are formed on both faces of a substrate
401 made of single-crystalline silicon. The oxide films
402 may be formed by adhering silicon oxide by means of evaporation or sputtering. Normally
it is preferable to use thermal oxide films which are formed by heating the substrate
401 in an oxygen atmosphere so as to oxidize the surfaces of the substrate
401.
[0076] Next, a pattern is formed on the oxide film
402 by lithography. Then, processing by etching or ion milling is performed, thereby
forming an anisotropic etching window
403. The anisotropic etching window
403 can be separated into two parts: a part
403A on which a branch ink supplying groove is formed and a part
403B on which a main ink supplying groove is formed in a later step, respectively.
[0077] Next, as shown in Figures
6B(i) and
6B(ii), a first sacrifice layer
404 is formed, and then a pattern is formed on the first sacrifice layer
404. As a material of the first sacrifice layer
404, it is possible to use a photoresist, aluminum (Al), a polyimide resin or the like.
Since a diaphragm is formed on the first sacrifice layer
404, the first sacrifice layer
404 is made to have a shape corresponding to the diaphragm.
[0078] Next, as shown in Figures
6C(i) and
6C(ii), a lower insulating layer
405A, a heater layer
406 and an upper insulating layer
405B are successively laminated. Then, these layers are subjected to patterning. A window
is provided in the region of an upper insulating layer
405B corresponding to pad portions
420A, 420B and
420C for supplying a current so as to be electrically conducted to a wiring layer and
a buckling layer which are laminated by plating in a later step. One end of the heater
layer
406 is connected to the wiring layer, and the other end is connected to the buckling
layer so as to serve as a common line among all elements. Since the buckling layer
and the heater layer
406 are insulated by the insulating layer
405, the wiring is not shorted. Materials such as SiO, SiO₂, SiN, AlN or Al₂O₃ can be
used as the insulating film
405.
[0079] Next, as shown in Figures
6D(i) and
6D(ii), a conductive layer
407 is formed. Subsequently, the conductive layer
407 is patterned so as to remove a conductive layer
407A on the region corresponding to the periphery of the buckling element of the resist
frame which is formed in a later step.
[0080] Next, a resist frame
408 (in Figures
6D(i) and
6D(ii), indicated with regions hatched with righthand-upwardly inclined lines) for plating
the buckling element is formed with a photoresist. Then, plating is performed by using
the conductive layer
407 as a cathode, thereby forming a buckling element
409. Materials such as Ni, Al, Ta, Cr, Co or the like can be used for the conductive layer
407. As a material of the buckling element
409, Ni, Cu, Fe, Co or an alloy thereof can be used. If the buckling element
409 is formed in this way, a wiring layer
421 can be simultaneously formed. The wiring layer
421 is formed by plating as is the buckling element
409, and is connected to the heater layer
406 through the pad
420A formed in the previous process. The other end of the heater layer
406 is connected to the buckling element
409 through the pads
420B and
420C so as to serve as a common line.
[0081] Next, as shown in Figures
6E(i) and
6E(ii), a second sacrifice layer
410 is formed. After the second sacrifice layer
410 is subjected to patterning, the diaphragm
411 (corresponding to
505 in Figure
2) is formed by plating. As a material of the second sacrifice layer
410, the same material as that of the first sacrifice layer
404 can be used. Moreover, as a material of the diaphragm
411, the same material as that of the buckling element
409 can be used.
[0082] The pattern to be formed on the first sacrifice layer
404 is formed so that an end
414 of the first sacrifice layer
404 is exposed apart from the end of the buckling element
409 at its completion. Such a configuration is adopted so as to make an etchant enter
from the end
414 in such a manner that the first sacrifice layer
404 can be removed. The patterns are arranged so that the branch ink supplying groove
formed in the later step is isolated from an ink cavity by the region
403A where the branch ink supplying groove is formed, and the ink cavity and the main
ink supplying groove are connected to each other through the branch ink supplying
groove alone.
[0083] Next, as shown in Figures
6F(i) and
6F(ii), the resist frame
408 which is externally exposed is removed. Then, since the conductive layer
407, which is placed under the resist frame
408, is exposed, the conductive layer
407 is removed. It is possible to use ion milling for removing the conductive layer
407.
[0084] Next, the first sacrifice layer
404 is removed with an etchant. The etchant gradually proceeds in a horizontal direction
while removing the exposed end
414 of the first sacrifice layer
404. The etchant enters inside the first sacrifice layer
404, and then completely removes the first sacrifice layer
404 at last.
[0085] Next, as shown in Figures
6G(i) and
6G(ii), the substrate
401 is anisotropically etched from the anisotropic etching window
403 using an anisotropic etchant, thereby forming a main ink supplying groove
412 (corresponding to
101 in Figures
1A and
1B) and a branch ink supplying groove
413 (corresponding to
107 in Figures
1A and
1B). At this time, the anisotropic etchant enters a gap, which is formed by removing
first sacrifice layer, so as to etch the branch ink supplying groove
413 of the substrate
401. If a (100) plane single-crystalline silicon substrate is used as the substrate
401 and a potassium hydroxide (KHO) solution is used as the anisotropic etchant, walls
constituted by 〈111〉 planes remain.
[0086] If the branch ink supplying groove
413 and the main ink supplying groove
412 are formed by anisotropic etching, dimensionally precise and deep grooves can be
easily formed. Therefore, as shown in Figures
1A and
1B, when the main ink supplying groove
101 is deeply and widely formed, a resistance against a flow path of ink is reduced.
Thus, this configuration is effective in that ink can be supplied smoothly. Moveover,
when the branch ink supplying grove
107 can be deeply and widely formed, ink easily flows to the bottom face of the ink ejecting
element
102. Therefore, the function for alleviating negative pressure, which is generated in
the gap
110 under the ink ejecting element
102 when the ink ejecting element
102 is deformed, increase. Thus, resistance upon moving the ink ejecting element
102 can be reduced.
[0087] Next, as shown in Figure
6H(i), an etchant is introduced from the gap of the first sacrifice layer
404 so as to remove the resist frame
408 and the second sacrifice layer
410.
[0088] Thereafter, an orifice plate is attached onto the thus fabricated substrate, thereby
completing the ink jet head. The orifice plate is attached after applying an adhesive
layer on the orifice substrate and then patterning the ink supplying paths on the
orifice substrate.
[0089] Also in Examples 2 and 3, the same fabrication process as that of Example 1 can be
applied except that the pattern to be fabricated differs from each other depending
on whether or not there is the main ink supplying groove.
[0090] A photosensitive glass plate, a polysalfon (PS) resin plate, a polyethelsalfon (PES)
resin plate or the like can be used as the orifice plate.
[0091] According to the present invention, since the thermally deformable ink ejecting element
is used, the lifetime can be prolonged. When the ink ejecting element is thermally
deformed, pressure is applied onto the ink cavity so that ink is jetted out. Moreover,
since a gap is provided between the ink ejecting element and the substrate, and is
filled with ink having a higher thermal conductivity than that of air, the ink ejecting
element is quickly cooled and can be operated at high speed. Furthermore, since the
ink ejecting element does not require a mechanical processing as that required by
the piezoelectric element, the ink jet head can be highly integrated.
[0092] Since the gap is connected to the main ink supplying grove via the branch ink supplying
groove, negative pressure which is generated in the gap between the ink ejecting element
and the substrate is alleviated or eliminated when the ink ejecting element applies
pressure on the ink cavity. Therefore, it is possible to effectively apply pressure
onto the ink cavity. Moreover, since the ink cavity is connected to the main ink supplying
groove via the ink supplying groove, ink can be supplemented at a time by supplementing
ink to the ink jet head.
[0093] With the configuration in which a wiring pattern is provided inside the main ink
supplying groove, even in the case where a large number of elements are placed, the
required area is reduced. As a result, the total size of the substrate can be reduced.
[0094] In the case where the ink supplying paths are constituted by single-crystalline silicon
〈111〉 planes, accurate flowing paths can be formed at the same time by photolithography
and anisotropic etching. Thus, not only processing precision can be improved, but
also the cost can be reduced.
[0095] In the case where the piezoelectric element is used as the ink ejecting element,
this type of element can be fabricated by fine processing technique because of using
piezoelectric material as a thin film, thereby forming an integrated element with
high density. As a result, the number of the elements (nozzles) mounted to a single
ink head increases, resulting in improving the printing speed or the printing resolution.
Further, piezoelectric material has a high capability of converting electric energy
into mechanical energy, thereby reducing power consumption. As a result, it is possible
to fabricate an ink jet head having a small size and weight.
[0096] Furthermore, according to the method of the present invention, when the main ink
supplying groove and the branch ink supplying grooves are formed by anisotropic etching,
dimensionally precise deep grooves can be easily formed. At this time, when the main
ink supplying groove is deeply and widely formed, ink can be smoothly supplied. Furthermore,
when the branch ink supplying grooves can be deeply and widely formed, ink easily
flows toward the back surface of the ink ejecting element. Thus, the function for
alleviating negative pressure which is generated in the gap between the ink ejecting
element and the substrate when the ink ejecting element is deformed, increases.
[0097] Various other modifications will be apparent to and can be readily made by those
skilled in the art without departing from the scope and spirit of this invention.
Accordingly, it is not intended that the scope of the claims appended hereto be limited
to the description as set forth herein, but rather that the claims be broadly construed.