(19)
(11) EP 0 725 420 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
04.12.1996 Bulletin 1996/49

(43) Date of publication A2:
07.08.1996 Bulletin 1996/32

(21) Application number: 96300688.7

(22) Date of filing: 31.01.1996
(51) International Patent Classification (IPC)6: H01J 31/12
(84) Designated Contracting States:
DE FR GB IT NL

(30) Priority: 03.02.1995 JP 16780/95
14.03.1995 JP 54133/95
23.01.1996 JP 9555/96

(71) Applicant: CANON KABUSHIKI KAISHA
Tokyo (JP)

(72) Inventors:
  • Fushimi, Masahiro
    Ohta-ku, Tokyo (JP)
  • Mitsutake, Hideaki
    Ohta-ku, Tokyo (JP)
  • Sanou, Yoshihisa
    Ohta-ku, Tokyo (JP)

(74) Representative: Beresford, Keith Denis Lewis et al
BERESFORD & Co. 2-5 Warwick Court High Holborn
London WC1R 5DJ
London WC1R 5DJ (GB)

   


(54) Electron-beam generating apparatus and image forming apparatus using electron-beam generating apparatus


(57) An image forming apparatus using an electron source which has matrix-wired electron-emitting devices connected with wiring electrodes of conductive material, and a fluorescent member as an image forming member with an accelerating electrode on its inner surface side, opposite to the electron-emitting devices. The wiring electrodes includes a wiring electrode where a semiconductive support member (spacer) is provided via a conductive connection member and a wiring electrode where the semiconductive support member is not provided. The height of the upper surface of the conductive connection member on which the semiconductive support member is provided and that of the upper surface of the wiring electrode where the semiconductive support member is not provided are the same, to prevent shift of electron-beam trajectories around the semiconductive support member, due to disturbance of electric-field distribution.






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