(19)
(11) EP 0 746 874 A1

(12)

(43) Date of publication:
11.12.1996 Bulletin 1996/50

(21) Application number: 95911831.0

(22) Date of filing: 21.02.1995
(51) International Patent Classification (IPC): 
C23C 16/ 44( . )
C23C 16/ 458( . )
H01L 21/ 285( . )
 C23C 16/ 455( . )
H01L 21/ 205( . )
(86) International application number:
PCT/US1995/002138
(87) International publication number:
WO 1995/023428 (31.08.1995 Gazette 1995/37)
(84) Designated Contracting States:
AT BE CH DE ES FR GB GR IE IT LI NL SE

(30) Priority: 23.02.1994 US 19940200862
23.02.1994 US 19940200079

(71) Applicant: APPLIED MATERIALS, INC.
Santa Clara, California 95052-8039 (US)

(72) Inventors:
  • SINHA, Ashok
    Palo Alto, CA 94306 (US)
  • CHANG, Mei
    Cuppertino, CA 95014 (US)
  • PERLOV, Ilya
    Santa Clara, CA 95051 (US)
  • LITTAU, Karl
    Sunnyvale, CA 94086 (US)
  • MORRISON, Alan
    San Jose, CA 95124 (US)
  • LEI, Lawrence, Chung-Lai
    Milpitas, CA 95035 (US)

(74) Representative: Bayliss, Geoffrey Cyril, et al 
BOULT, WADE & TENNANT 27 Furnival Street
London EC4A 1PQ
London EC4A 1PQ (GB)

   


(54) CHEMICAL VAPOR DEPOSITION CHAMBER