(19)
(11)
EP 0 757 598 A1
(12)
(43)
Date of publication:
12.02.1997
Bulletin 1997/07
(21)
Application number:
96906197.0
(22)
Date of filing:
23.01.1996
(51)
International Patent Classification (IPC):
B23K
15/
00
( . )
C23C
14/
58
( . )
H01J
27/
14
( . )
H01L
21/
203
( . )
C23C
14/
22
( . )
C23C
26/
02
( . )
H01J
37/
317
( . )
(86)
International application number:
PCT/US1996/001000
(87)
International publication number:
WO 1996/022841
(
01.08.1996
Gazette 1996/35)
(84)
Designated Contracting States:
BE CH DE DK FR GB IT LI NL
(30)
Priority:
23.01.1995
US 19950376702
(71)
Applicant:
SANDIA CORPORATION
Albuquerque, New Mexico 87185 (US)
(72)
Inventor:
STINNETT, Regan, W.
Albuquerque, NM 87122 (US)
(74)
Representative:
UEXKÜLL & STOLBERG
Patentanwälte Beselerstrasse 4
22607 Hamburg
22607 Hamburg (DE)
(54)
PULSED ION BEAM ASSISTED DEPOSITION