(19)
(11) EP 0 768 525 B8

(12) CORRECTED NEW EUROPEAN PATENT SPECIFICATION
Note: Bibliography reflects the latest situation

(15) Correction information:
Corrected version no 1 (W1 B2)

(48) Corrigendum issued on:
15.10.2008 Bulletin 2008/42

(45) Date of publication and mentionof the opposition decision:
06.08.2008 Bulletin 2008/32

(45) Mention of the grant of the patent:
11.06.2003 Bulletin 2003/24

(21) Application number: 96402130.7

(22) Date of filing: 07.10.1996
(51) International Patent Classification (IPC): 
G01N 21/39(2006.01)
G01J 3/433(2006.01)
G01N 21/35(2006.01)

(54)

Method of detecting a gas phase molecular species in the chamber effluent of a semiconductor processing chamber, and semiconductor processing system incorporating the same

Verfahren zur Detektion von gasförmigen, molekularen Spezien in den Kammerabgasen einer Halbleiterprozesskammer, und damit ausgerüstetes Halbleiterverarbeitungssystem

Procédé pour détecter d'espèces moléculaires en phase gazeuse des gaz de sortie d'une chambre de traitement d'un matériau semi-conducteur, et système de traitement d'un matériau semi-conducteur ainsi équipé


(84) Designated Contracting States:
BE DE FR GB IT NL

(30) Priority: 10.10.1995 US 5013
18.04.1996 US 634449
10.09.1996 US 711781

(43) Date of publication of application:
16.04.1997 Bulletin 1997/16

(73) Proprietor: L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
75007 Paris (FR)

(72) Inventors:
  • Mc Andrew, James J.F.
    Lockport, Illinois 60441 (US)
  • Wang, Hwa-Chi
    Naperville, Illinois 60540 (US)
  • Jurcik, Benjamin J.
    Lisle, Illinois 60532 (US)

(74) Representative: Vesin, Jacques et al
L'Air Liquide S.A. Service Propriété Industrielle, 75 Quai d'Orsay
75321 Paris Cedex 07
75321 Paris Cedex 07 (FR)


(56) References cited: : 
   
  • GRISAR R ET AL: "FAST SAMPLING DEVICES FOR DYNAMIC EXHAUST GAS ANALYSIS" PROCEEDINGS OF THE INTERNATIONAL SYMPOSIUM ON AUTOMOTIVE TECHNOLOGY AND AUTOMATION (ISATA), FLORENCE, MAY 20 - 24, 1991, no. SYMP. 24, 20 May 1991, NUCLEARE E DELLE ENERGIE ALTERNATIVE (ENEA), pages 283-287, XP000308622
  • FRIED A: "VERSATILE INTEGRATED TUNABLE DIODE LASER SYSTEM FOR HIGH PRECISION: APPLICATION FOR AMBIENT MEASUREMENTS OF OCS" APPLIED OPTICS, vol. 30, no. 15, 20 May 1991, pages 1916-32, XP000207533
  • JASINSKI ET AL: "DETECTION OF SIH2 IN SILANE AND DISILANE GLOW DISCHARGES BY FREQUENCY MODULATION ABSORPTION SPECTROSCOPY" APPLIED PHYSICS LETTERS, vol. 44, no. 12, June 1984, pages 1155-1157, XP002036448
  • DAVIES P B ET AL: "INFRARED LASER DIAGNOSTICS IN METHANE CHEMICAL-VAPOR-DEPOSITION PLASMAS" JOURNAL OF APPLIED PHYSICS, vol. 71, no. 12, 15 June 1992, pages 6125-6135, XP000301544
  • J.A.O'Neill u.a.; "Infraread absorption spectroscopy for monitoring condensible gases in chemical vapour deposition applications; J.Vac.Sci. Technol. A12(3) (1994, Seiten 839 bis 845
  • A.E. Gruber u.a.; "Online exhaust gas analytics during plasma cleaning of PECVD facilities"; Spie Vol. 2637 Sept. 1995), Seiten 147 bis 155
  • M.J.Goeckner u.a.; "Using Fourier transform infrared absorption spectrometry to probe the injected neutral gas in a plasma having a highionozation fraction"; J.Vac. Sci. Technol. A11(3);(1993), Seiten 689 bis 693
  • T.A.Cleland u.a.; "detection of dry etching product species with in situ Fourier transform infrared spectroscopy"; J.Vac. Sci. Technol. B7(1); (1989), Seiten 35 bis 40
  • R.Kästle u.a.; "Using diode laser spectroscopy to monitor process gas purity"; MICROCONTAMINATION (1991), Seiten 27 bis 31
  • D.C.Peters u.a. ; "Calibration techniques for FTIR process monitoring" in "Optical Methods for Chemical Process Control"; edited by S. Farquhason; SPIE Vol. 2069 (1993), Seiten 32 bias 41