(19)
(11) EP 0 864 171 A1

(12)

(43) Date of publication:
16.09.1998 Bulletin 1998/38

(21) Application number: 96941641.0

(22) Date of filing: 26.11.1996
(51) International Patent Classification (IPC): 
G01T 1/ 24( . )
H01L 21/ 8234( . )
H01L 27/ 146( . )
H01L 31/ 0264( . )
H01L 21/ 28( . )
H01L 27/ 14( . )
H01L 31/ 0224( . )
(86) International application number:
PCT/EP1996/005348
(87) International publication number:
WO 1997/020342 (05.06.1997 Gazette 1997/24)
(84) Designated Contracting States:
AT BE CH DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
Designated Extension States:
AL LT LV RO SI

(30) Priority: 29.11.1995 GB 19950024387

(60) Divisional application:
99124797.4 / 1001469

(71) Applicant: SIMAGE OY
02150 Espoo (FI)

(72) Inventors:
  • ORAVA, Risto, Olavi
    FIN-00730 Helsinki (FI)
  • PYYHTIA, Jouni, Ilari
    FIN-01360 Vantaa (FI)
  • SCHULMAN, Tom, Gunnar
    FIN-02430 Masala (FI)
  • SARAKINOS, Miltiadis, Evangelos
    CH-1205 Geneva (CH)
  • SPARTIOTIS, Konstantinos, Evangelos
    FIN-00170 Helsinki (FI)
  • JALAS, Panu, Yrjänä
    FIN-00200 Helsinki (FI)

(74) Representative: Potter, Julian Mark, et al 
D. Young & Co., 21 New Fetter Lane
London EC4A 1DA
London EC4A 1DA (GB)

   


(54) FORMING CONTACTS ON SEMICONDUCTOR SUBSTRATES FOR RADIATION DETECTORS AND IMAGING DEVICES