<?xml version="1.0" encoding="UTF-8"?><!DOCTYPE ep-patent-document PUBLIC "-//EPO//EP PATENT DOCUMENT 1.4//EN" "ep-patent-document-v1-4.dtd"><ep-patent-document id="EP0873435A1" file="EP97900996NWA1.xml" lang="de" doc-number="0873435" date-publ="19981028" kind="A1" country="EP" status="n" dtd-version="ep-patent-document-v1-4"><SDOBI lang="de"><B000><eptags><B001EP>AT....DE..ESFRGB..IT....NLSE........................................................................</B001EP><B003EP>*</B003EP><B007EP>EPregister to ST.36 EBD process v 1.0 kbaumeister@epo.org (15 Jan 2013)</B007EP></eptags></B000><B100><B110>0873435</B110><B130>A1</B130><B140><date>19981028</date></B140><B190>EP</B190></B100><B200><B210>97900996.0</B210><B220><date>19970110</date></B220><B240><B241><date>19980609</date></B241></B240><B250>de</B250><B251EP>de</B251EP><B260>de</B260></B200><B300><B310>19961000857</B310><B320><date>19960112</date></B320><B330><ctry>DE</ctry></B330></B300><B400><B405><date>19981028</date><bnum>199844</bnum></B405><B430><date>19981028</date><bnum>199844</bnum></B430></B400><B500><B510EP><classification-ipcr sequence="1"><text>C25D  21/    14            A I                    </text></classification-ipcr></B510EP><B540><B541>en</B541><B542>PROCESS FOR MAINTAINING A CONSTANT CONCENTRATION OF SUBSTANCES IN AN ELECTROPLATING BATH</B542><B541>fr</B541><B542>PROCEDE DE MAINTIEN DE CONCENTRATIONS CONSTANTES DE SUBSTANCES CONTENUES DANS UN BAIN DE TRAITEMENT GALVANOPLASTIQUE</B542><B541>de</B541><B542>VERFAHREN ZUR AUFRECHTERHALTUNG KONSTANTER KONZENTRATIONEN VON IN EINEM GALVANOTECHNISCHEN BEHANDLUNGSBAD ENTHALTENEN STOFFEN</B542></B540></B500><B700><B710><B711><snm>ATOTECH Deutschland GmbH</snm><adr><str>Erasmusstrasse 20-24</str><city>10553 Berlin</city><ctry>DE</ctry></adr></B711></B710><B720><B721><snm>KOPP, Lorenz</snm><adr><str>Zur Steinschneiderin 2</str><city>D-90518 Altdorf</city><ctry>DE</ctry></adr></B721></B720><B740><B741><snm>Effert, Bressel und Kollegen</snm><adr><str>Radickestrasse 48</str><city>D-12489 Berlin</city><ctry>DE</ctry></adr></B741></B740></B700><B800><B840><ctry>AT</ctry><ctry>DE</ctry><ctry>ES</ctry><ctry>FR</ctry><ctry>GB</ctry><ctry>IT</ctry><ctry>NL</ctry><ctry>SE</ctry></B840><B860><B861><dnum><anum>EP1997000097</anum></dnum><date>19970110</date></B861><B862>de</B862></B860><B870><B871><dnum><pnum>WO1997025456</pnum></dnum><date>19970717</date><bnum>199731</bnum></B871></B870></B800></SDOBI></ep-patent-document>