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(11) | EP 0 878 558 B1 |
| (12) | EUROPEAN PATENT SPECIFICATION |
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COATED MATERIAL AND METHOD OF MANUFACTURING THE SAME BESCHICHTETES MATERIAL UND VERFAHREN ZU DESSEN HERSTELLUNG MATERIAU RECOUVERT ET SON PROCEDE DE FABRICATION |
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| Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention). |
Technical Field
[0001] The present invention relates to a covered member which is formed by covering a base material such as irons and steels with a hard film and which is improved in bond strength of the base material and the covering film, and to a method of producing the same.
Background Art
[0002] Widely used is a covered member which is produced by forming a metallic film, a ceramic film, a carbon-base film, or the like of several to tens of microns in thickness on a surface of irons, steels or the like by physical vapor deposition (PVD) or chemical vapor deposition (CVD), and which comprises the base material, and the covering film covering a surface of this base material. The bond strength of the base material and the covering film, which constitute this covered member, becomes a problem and in some cases the film is peeled off. For example, in the art of employing PVD and applying a hard film to a base material which has a low temperature of 600°C or less, the bond strength of the base material and the covering film is small because of low temperature, and the film is often peeled off.
[0003] In such a case, as means of increasing the bond strength of the base material and the covering film, there have so far been employed a method of cleaning a base material surface by sputtering the base material surface, a method of roughening a base material surface by blasting the base material surface, and so on.
[0004] In using a covered member as a sliding member, it is important that its covering film is smooth and bond strength of the covering film and a base material is high. When the covering film is not smooth, seizure resistance is low and a tendency to attack a mating member is increasing. When the bond strength of the covering film and the base material is insufficient, the film is peeled off and the covered member cannot be used as a sliding member.
[0005] However, in the sputtering method, although organic stains and oxides can be removed from the surface, it is often that a desired bond strength is not obtained in the case of low temperature film application. In the blasting method, the base material surface is greatly roughened into an uneven surface with projections and concaves of about several microns at the minimum, so a smooth film cannot be obtained. Hence, the surface roughness of a hard film thereafter formed deteriorates. For instance, when used as a sliding member, the covered member rather abrades a mating member and desired sliding characteristics cannot be obtained. Accordingly, when the covered member is used, for example, as a sliding member which needs to have a smooth surface, repolishing of the hard film is sometimes required.
[0006] It is an object of the present invention to provide a covered member which is free from those problems, possesses a high bond strength of a base material and a covering film, and has a smooth surface, and a method of producing the same.
[0007] EP 0 408 205 A1 refers to the adhesion of metal to polyimide substrates. On at least one surface of the polyimide a thin film of metal, such as copper, is deposited. The polyimide substrate is heated in air to cause the deposited metal to texturize that surface by producing asperities that are at least 0,05 µm in average height and average breadth. The resulting composite resists delamination even at soldering temperatures.
[0008] JP 08 311 652 A describe the coating of a cemented carbide susbtrate which is subjected to a lapping treatment with diamond abrasive grains before a coating is deposited.
Disclosure of the Invention
[0009] The present inventors have found and confirmed that by making a base material surface to be covered with a covering film into an uneven surface having projections with a predetermined extremely small height and a predetermined width, it becomes possible to obtain a covered member which possesses a high bond strength of the base material and the covering film and has a smooth surface. The present inventors have thus completed the present invention.
[0010] The covered member of the present invention is a covered member comprising a metallic base material and a covering film covering a surface of the base material, and is characterized in that the base material surface covered with the covering film is an uneven surface having projections with an average height in the range from 10 to 100 nm and an average width of not more than 300 nm.
[0011] The present inventive method of producing a covered member is characterized in comprising a first step of forming, on a metallic base material surface to be covered, projections with an average height in the range from 10 to 100 nm and an average width of not more than 300 nm by ion impacting beforehand, so as to make the base material surface into an uneven surface, and a second step of forming a covering film on the uneven surface.
[0012] Because an interface between the base material and the covering film are uneven surfaces having projections with a predetermined height and width, the bond between them is strong and a covered member with improved integrality is obtained.
[0013] The covered member of the present invention comprises a base material and a covering film. The base material constitutes various components or parts of apparatus such as a substrate, a sliding member, and a structural member, and is formed of metal. On the other hand, the covering film is to cover at least part of a surface of this base material and to add such functions as corrosion resistance, abrasion resistance, and decoration to the surface. The covering film is a metallic film, a ceramic film, or a carbon-base film formed by various applying methods.
[0014] Examples of metal constituting the base material are iron-base metals such as steels, metals such as titanium, aluminum, copper, and magnesium, and alloys of these metals. Examples of a metallic film constituting the covering film are chromium, nickel, tungsten and the like. Examples of a ceramic film are a nitride film, a carbide film, and an oxide film, comprising one of the elements in group IV to group VI of the periodic table or composite elements containing one of these elements. Examples of a carbon-base film are diamond-like carbon (DLC) and diamond.
[0015] The base material surface to be covered with the covering film is an uneven surface having projections with an average height in the range from 10 to 100 nm and an average width of not more than 300 nm. The projections have a hemispherical shape. Note that the height of a projection means a distance from the bottom to the vertex of this hemispherical projection, and that the width of a projection means a horizontal distance corresponding to the maximum length of the bottom of the hemispherical projection (a diameter in the case where the projection bottom shape is a true circle, and a major axis length in the case where the projection bottom shape is an ellipse).
[0016] The reason why the average height should range from 10 to 100 nm is that when the average height is less than 10 nm, a mechanical anchoring effect cannot be obtained and bond strength becomes insufficient, and that, on the other hand, when the average height exceeds 100 nm, a smooth film cannot be obtained. It is more preferable that the average height ranges from 20 to 70 nm. In this range, bond strength is further improved.
[0017] The reason why the average width should be not more than 300 nm is that when the average width exceeds 300 nm, an anchoring effect cannot be obtained and bond strength decreases. Note that the size of projections cannot be measured by a conventional surface roughness tester (a tracer method). For this reason, here, projection size and width is measured by microshape measuring methods such as scanning electron microscope (SEM) observation and AFM.
[0018] If projection areas are small, no effect on the bond strength of the film can be exhibited despite of a predetermined projection size. The ratio of the projection areas to the whole area of an uneven surface is preferably not less than 30 % when the whole area of the uneven surface is assumed as 100%. When the projection areas are 30 % or more, the bond strength of the film is high.
[0019] The present inventive method of producing a covered member comprises a first step of making a base material surface into an uneven surface, and a second step of forming a covering film on this uneven surface.
[0020] As the method of forming an uneven surface in the first step, the ion impacting method can be employed. By this ion impacting method, projections with an average height in the range from 10 to 100 nm and an average width of not more than 300 nm are formed on a base material surface to be covered, so as to make the base material surface into an uneven surface.
[0021] For ion impacting, a base material to be treated is placed in an air-tight chamber and the pressure in the air-tight chamber is controlled to about 10-3 to 20 torr. When the pressure is less than 10-3 torr, the material to be treated cannot be heated sufficiently. When the pressure is more than 20 torr, the material to be treated can be heated but cannot attain ultrafine unevenness.
[0022] Next, ultrafine-unevenness pretreatment gas is introduced into the chamber. This ultrafine-unevenness pretreatment gas may be one or more rare gases of helium, neon, argon, krypton, xenon, and radon. Further, in the case of an iron-base base material, adding hydrogen to the ultrafine-unevenness pretreatment gas can prevent oxidation of the material surface to be treated.
[0023] Ion impacting is given under these conditions. As the means for giving ion impacting, glow discharge or ion beam can be employed. When ion impacting is carried out with a discharge voltage of 200 to 1000V, an electric current of 0.5 to 3.0A and a treating time of 30 to 60 minutes, uniform ultrafine unevenness on the nano order can be formed. If the material to be treated is heated to a temperature at which hardness is not lowered (at least 200°C is needed) while ion impacting is given, more uniform and more ultrafine unevenness on the nano order can be obtained.
[0024] In the case of an iron-base material, it is better to form before ion impacting a nitriding layer, a carburizing layer or a soft nitriding layer on a surface of the material to be treated, by carrying out any one of ordinary gas nitriding treatment, carburizing treatment, and gas soft nitriding treatment. Formation of the nitriding layer, the carburizing layer, or the soft nitriding layer makes it easy to form very uniform and ultrafine unevenness on the nano order by the ion impacting method. Note that unevenness can be formed by ion impacting subsequently after the nitriding layer, the carburizing layer, or the soft nitriding layer is formed in an ion impacting apparatus.
[0025] As for the method of forming a covering film in the second step, the covering film can be formed by ion plating (an arc process, a hollow cathode process, etc.), sputtering, vacuum deposition, plasma CVD and so on. Since the base material surface is an uneven surface, the covering film thus formed adheres to the surface strongly. Besides, the obtained covering film has a smooth surface with little unevenness. In regard to CVD, because the treatment is carried out at high temperatures, relatively good bond strength is exhibited without forming microfine unevenness in the first step of the present invention. Therefore the formation of ultrafine unevenness in the first step has little effect.
[0026] After the second step is carried out and a covering film is formed, there is no need to apply aftertreatment such as polishing or lapping of the formed covering film. Taking the first step and the second step of the present invention appropriately enables formation of a smooth covering film which does not require polishing or lapping.
[0027] The covered member of the present invention can be used as a sliding member which requires abrasion resistance. For instance, the covered member of the present invention can be used as machine parts in sliding motion, e.g. sliding portions of engine parts (a piston, piston rings, a valve stem, etc.), compressor parts (vanes, shoes, etc.), a fuel-injection pump (a rotor, a plunger, etc.).
[0028] In the covered member of the present invention, the interface between the base material and the covering film is an uneven surface having projections with an average height in the range from 10 to 100 nm and an average width of not more than 300 nm. Owing to this micro unevenness of the interface, the bond area increases. In response to this increase in bond area, bond strength increases. In addition, since the base material surface has been cleaned and activated by forming this uneven surface, a strong covering film is formed. Moreover, owing to the mechanical anchoring effect of concaves formed at the boundary of projections, the base material and the covering film are mechanically combined, so stronger bond can be obtained.
[0029] Furthermore, since the unevenness of the uneven surface of the base material is as ultrafine as 10 to 100 nm, the unevenness of the base material is not reproduced on a covering film surface, and accordingly the covering film surface is smooth.
[0030] Note that by forming a nitriding layer, a carburizing layer, or a soft nitriding layer on the base material surface beforehand, projection formation by ion impacting becomes easy, and the projections become ultrafiner and the ratio of the area occupied by the projections per unit area becomes higher. This results in large increase in the contact area of the base material and the covering film, so the bond strength is further improved.
Brief Description of the Drawings
[0031]
Figure 1 is a SEM photograph showing the state of projections on Specimen No.11 of the preferred embodiments, obtained by ion impacting.
Figure 2 is a SEM photograph showing the state of projections on Specimen No. 12 of the preferred embodiments, obtained by ion impacting.
Best Modes for Carrying Out the Invention
[0032] In the following experiment, nitriding steel SACM645 was used as a base material and formed into test specimens of 50 x 10 x 7 mm in dimension. The base material had a surface roughness of Rz 0.1 µm.
(Examination on Unevenness-Forming Conditions)
[0033] Examination was conducted on conditions for forming unevenness on a base material surface. The aforementioned nitriding steel was employed as a base material and gas nitriding treatment in NH3 gas at 520°C for 35 hours was applied, whereby a nitriding diffusion layer of about 0.4 mm in thickness was formed on the base material surface. Then, the base material surface was polished so as to have a surface roughness of Rz 0.1 µm.
[0034] Argon gas was used as gas for ion impacting treatment for forming unevenness, and hydrogen was added as oxidation-preventing gas. The gas pressure was 4 torr, and the voltage and electric current were 100 V and 0.4A, and 200 V and 0.8A. The treatment time was 0, 5, and 50 minutes. This ion impacting treatment produced projections described in Table 1. Note that the surface roughness remained to be Rz 0.1 µm even after the ion impacting treatment.
[0035] Thereafter, a hard film of DLC-Si (silicon-contained diamond-like carbon) was formed on the base material surface by plasma CVD. The hard film had a thickness of 3 µm.
[0036] The bond strength of the obtained hard film was evaluated by an indentation test and a scratch test. The indentation test was to evaluate bond strength of the hard film by pressing a Rockwell C-scale indenter against the film with a pressure of 150 kg and observing whether the film around an indented portion was peeled off or not. The scratch test is to scratch a surface with a conical diamond having a vertical angle of 120° and a point of 0.2 mm in radius with a given load. The load at the time when the film is peeled off is called critical load, and the bond strength of the hard film is evaluated by the value of that critical load. Evaluation results are shown in Table 1.
[0037] As apparent from Table 1, sufficient bond strength could not be obtained with an average projection height of 5 nm. It is clear that ion impacting treatment with a voltage of 200 V, an electric current of 0.8A and a treating time of 40 minutes was required as conditions for forming unevenness.
(Examination on Base Material Surface Hardening Conditions Affecting Unevenness Formation)
[0038] Projections were formed under the same ion impacting conditions as used for forming unevenness on Specimen No.3 in Table 1 by using three kinds of test specimens: one which underwent no hardening treatment, one which underwent the same nitriding treatment as the specimens in Table 1, and one which underwent carburizing treatment. Then, a hard DLC-Si film of 3 µm in thickness was formed on each base material surface by the same plasma-CVD as used for the specimens in Table 1. After that, bond strength of each obtained hard film was evaluated by an indentation test and a scratch test in the same way as the films of the specimens in Table 1 were evaluated. The results are shown together in Table 2.
[0039] Note that the carburizing treatment was carried out by using case hardening steel as a base material and placing that steel in a salt bath at 900 °C for one hour. The obtained carburizing layer had a thickness of 0.4 mm.
[0040] It is apparent from Table 2 that the base material surface is preferably subjecte to hardening treatment before ion-impacting treatment for forming unevenness. In the case of Specimen No.11 which underwent no surface hardening treatment, even the ion impacting treatment with a voltage of 200 V, an electric current of 0.8A and a treating time of 40 minutes did not form sufficient unevenness. Hence, bond strength was not sufficient.
[0041] It is clear that nitriding or carburizing the base material surface beforehand made it easy to form unevenness by ion impacting treatment.
[0042] For reference, SEM photographs of uneven surfaces of Specimen Nos.11 and 12 after the ion impacting treatment was applied and before hard films were formed are respectively shown in Figures 1 and 2. These figures demonstrate that hemispherical projections were formed by ion impacting. Less projections are formed on Specimen No.11 as shown in Figure 1. On the other hand, Figure 2 shows that the projections are formed all over the surface of Specimen No.12.
(TOTAL EVALUATION TEST)
[0043] Four kinds of specimens in total were prepared by employing TiN as hard covering films. As for surface hardening by nitriding, two kinds of specimens, i.e. untreated and treated ones were prepared. As for unevenness formation, two kinds of specimens, i.e. unevenness-formed and unformed ones were prepared. Thereafter, an indentation test and a scratch test were conducted in the same way as done to the specimens in Table 1, thereby evaluating bond strength of the hard film. The results are shown together in Table 3.
[0044] Nitriding treatment was carried out in the same way as done to the specimens in Table 1. Ion impacting treatment for forming unevenness was carried out with a voltage of 400 V, an electric current of 1.5A and a treating time of 1 hour. TiN covering films were formed by arc ion plating with a treating temperature of 400 °C and a treating time of 1 hour. Covering TiN films of 3 µm in thickness were thus formed.
1. A covered member, comprising a metallic base material and a covering film which covers
a surface of said base material, wherein the surface of said base member covered with
said covering film is an uneven surface having projections with an average height
in the range of from 10 to 100 nm and an average width of not more than 300nm, characterized in that said projections have a hemispherical shape.
2. A covered member according to claim 1, wherein said base material is formed of a metal
selected from iron-base metals, titanium, aluminum, copper magnesium, and alloys of
these metals.
3. A covered member according to claim 1 or claim 2, wherein said covering film is a
metallic film, a ceramic film, or a carbon-base film, preferably a metallic filmwhich
is a chromium film, a nickel film, or a tungsten film; or a ceramic filmwhich is a
nitride film, a carbide film, or an oxide film comprising one of the elements in group
IV to group VI of the periodic table, or composite elements containing one of these
elements; or a carbon-base film which is a DLC (diamond-like carbon) film or a diamond
film.
4. A covered member according to any of claims 1 to 3, wherein said projections, have
an average height in the range from 20 to 70nm.
5. A covering member according to any of claims 1 to 4, wherein the area occupied by
said projections is 30 % or more when the whole area of said uneven surface is assumed
as 100 %.
6. A covered member according to any of claims 1 to 5, wherein said base material is
an iron-base material having a nitriding layer, a carburizing layer, or a soft nitriding
layer on its surface.
7. A method of producing a covered member, which method comprises
- a first step of forming, on a metallic base material surface to be covered, projections with an average height in the range of from 10 to 100 nm and an average width of not more than 300 nm by ion impacting beforehand, so as to make said base material surface into an uneven surface; and
- a second step of forming a covering film on said uneven surface.
8. A method of producing a covered member according to claim 7, wherein said ion impacting
is carried out under a pressure of 10-3 to 20 Torr and/or wherein said ion impacting is carried out in the atmosphere of
one or more rare gases selected from the group consisting of helium, neon, argon,
krypton, xenon and radon, said atmosphere of one or more rare gases optionally containing
hydrogen.
9. A method of producing a covered member according to claim 7, wherein said ion impacting
is carried out by a glow discharge or an ion beam.
10. A method of producing a covered member according to claim 9, wherein said glow discharge
is carried out at a discharge voltage in the range of from 200 to 1,000 V, at an electric
current in the range from 0.5 to 3.0 A, for a treating time in the range from 30 to
60 minutes.
11. A method of producing a covered member according to any of claims 7 to 10, wherein
said ion impacting is carried out at a temperature which does not decrease the hardness
of said material to be treated.
12. A method of producing a covered member according to any of claims 7 to 11, wherein
said base material is an iron-base metal, and a nitriding layer, a carburizing layer,
or a soft nitriding layer is formed on a surface of said iron-base metal by gas nitriding
treatment, carburizing treatment, or gas soft nitriding treatment, before said base
material is subjected to said ion impacting.
13. A method of producing a covered member according to claim 12, wherein said ion impacting
follows said gas nitriding treatment, said carburizing treatment, or said gas soft
nitriding treatment continuously in one apparatus.
14. A method of producing a covered member according to any of claims 7 to 13, wherein
said step of forming a covering film is a step of ion plating, sputtering, vacuum
evaporation, or plasma CVD.
1. Beschichtetes Element, das ein metallisches Basismaterial und einen Beschichtungsfilm
enthält, der eine Oberfläche des Basismaterials bedeckt, wobei die Oberfläche des
Basiselements, die mit dem Beschichtungsfilm bedeckt ist, eine ungleichmäßige Oberfläche
ist, die Vorsprünge mit einer durchschnittlichen Höhe im Bereich von 10 bis 100 nm
und einer durchschnittlichen Breite von nicht mehr als 300 nm aufweist, dadurch gekennzeichnet, dass die Vorsprünge eine halbkugelförmige Gestalt aufweisen.
2. Beschichtetes Element nach Anspruch 1, wobei das Basismaterial aus einem Metall gebildet
ist, das ausgewählt ist aus Metallen auf Eisenbasis, Titan, Aluminium, Kupfer, Magnesium
und Legierungen dieser Metalle.
3. Beschichtetes Element nach Anspruch 1 oder Anspruch 2, wobei der Beschichtungsfilm
ist: ein metallischer Film, ein keramischer Film, ein Film auf Kohlenstoffbasis, vorzugsweise
ein metallischer Film, der ein Chromfilm, ein Nickelfilm oder ein Tungstenfilm ist;
oder ein keramischer Film, der ein Nitridfilm, ein Karbidfilm oder ein Oxidfilm ist,
der eines der Elemente in Gruppe IV bis Gruppe VI des Periodensystems oder Verbundelemente,
die eines dieser Elemente enthalten, enthält; oder ein Film auf Kohlenstoffbasis,
der ein DLC (diamantartiger Kohlenstoff) Film oder ein Diamantfilm ist.
4. Beschichtetes Element nach einem der Ansprüche 1 bis 3, wobei die Vorsprünge eine
durchschnittliche Höhe im Bereich von 20 bis 70 nm aufweisen.
5. Beschichtetes Element nach einem der Ansprüche 1 bis 4, wobei die durch die Vorsprünge
eingenommene Fläche 30 % oder mehr ist, wenn die Gesamtfläche der ungleichmäßigen
Oberfläche als 100 % angenommen wird.
6. Beschichtetes Element nach einem der Ansprüche 1 bis 5, wobei das Basismaterial ein
Material auf Eisenbasis ist, das eine Nitrierungsschicht, eine Aufkohlungsschicht
oder eine Weichnitrierungsschicht auf seiner Oberfläche aufweist.
7. Verfahren zum Erzeugen eines beschichteten Elements, wobei das Verfahren enthält:
- einen ersten Schritt des Ausbildens von Vorsprüngen mit einer durchschnittlichen Höhe im Bereich 10 bis 100 nm und einer durchschnittlichen Breite von nicht mehr als 300 nm auf einer zu beschichtenden metallischen Oberfläche eines Basismaterials durch Ionenbeaufschlagen im Voraus, so dass die Basismaterialoberfläche zu einer ungleichmäßigen Oberfläche geformt wird; und
- einen zweiten Schritt des Ausbildens eines beschichtenden Films auf der ungleichmäßigen Oberfläche.
8. Verfahren zum Erzeugen eines beschichteten Elements nach Anspruch 7, wobei das Ionenbeaufschlagen
unter einem Druck von 10-3 bis 20 Torr ausgeführt wird und/oder wobei das Ionenbeaufschlagen in der Atmosphäre
von einem oder mehreren seltenen Gasen ausgeführt wird, die ausgewählt sind aus der
Gruppe, die enthält: Helium, Neon, Argon, Krypton, Xenon und Radon, wobei die Atmosphäre
aus einem oder mehreren seltenen Gasen optional Wasserstoff enthält.
9. Verfahren zum Erzeugen eines beschichteten Elements nach Anspruch 7, wobei das Ionenbeaufschlagen
durch eine Glühentladung oder einen Ionenstrahl durchgeführt wird.
10. Verfahren zum Erzeugen eines beschichteten Elements nach Anspruch 9, wobei die Glühentladung
bei einer Entladungsspannung im Bereich von 200 bis 1000 V ausgeführt wird bei einem
elektrischen Strom im Bereich von 0,5 bis 3,0 A während einer Behandlungszeit im Bereich
von 30 bis 60 Minuten.
11. Verfahren zum Erzeugen eines beschichteten Elements nach einem der Ansprüche 7 bis
10, wobei das Ionenbeaufschlagen bei einer Temperatur durchgeführt wird, die die Härte
des zu behandelnden Materials nicht verringert.
12. Verfahren zum Erzeugen eines beschichteten Elements nach einem der Ansprüche 7 bis
11, wobei das Basismaterial ein Metall auf Eisenbasis ist, und eine Nitrierungsschicht,
eine Aufkohlschicht oder eine Weichnitrierungsschicht auf einer Oberfläche des Metalls
auf Eisenbasis durch eine Gasnitrierbehandlung, eine Aufkohlbehandlung oder eine Gasweichnitrierbehandlung
gebildet ist, ehe das Basismaterial der Ionenbeaufschlagung unterworfen wird.
13. Verfahren zum Erzeugen eines beschichteten Elements nach Anspruch 12, wobei das Ionenbeaufschlagen
der Gasnitrierungsbehandlung, der Aufkohlbehandlung oder der Gasweichnitrierbehandlung
kontinuierlich in einer Vorrichtung folgt.
14. Verfahren zum Erzeugen eines beschichteten Elements nach einem der Ansprüche 7 bis
13, wobei der Schritt des Ausbildens eines beschichtenden Films ein Schritt des Ionenplattierens,
des Sputterns, der Vakuumverdampfung oder von Plasma-CVD ist.
1. Elément revêtu, comprenant un matériau métallique de base et une pellicule de revêtement
qui revêt une surface du matériau de base, la surface de l'élément de base revêtue
de la pellicule de revêtement étant une surface inégale ayant des saillies d'une hauteur
moyenne de l'ordre de 10 à 100 nm et d'une largeur moyenne qui n'est pas supérieure
à 300 nm, caractérisé en ce que les saillies ont une forme hémisphérique.
2. Elément revêtu suivant la revendication 1, dans lequel la matière de base est en un
métal choisi parmi des métaux à base de fer, le titane, l'aluminium, le cuivre, le
magnésium et des alliages de ces métaux.
3. Elément revêtu suivant la revendication 1 ou la revendication 2, dans lequel la pellicule
de revêtement est une pellicule métallique, une pellicule céramique ou une pellicule
à base de carbone, de préférence une pellicule métallique qui est une pellicule de
chrome, une pellicule de nickel ou une pellicule de tungstène ; ou une pellicule céramique
qui est une pellicule de nitrure, une pellicule de carbure ou une pellicule d'oxyde
comprenant l'un des éléments du Groupe IV au Groupe VI de la classification périodique
des éléments ou des éléments composites contenant l'un de ces éléments ; ou une pellicule
à base de carbone qui est une pellicule DLC (carbone de type diamant) ou une pellicule
de diamant.
4. Elément revêtu suivant l'une quelconque des revendications 1 à 3, dans lequel les
saillies ont une hauteur moyenne de l'ordre de 20 à 70 nm.
5. Elément revêtu suivant l'une quelconque des revendications 1 à 4, dans lequel la superficie
occupée par les saillies est supérieure ou égale à 30 % lorsque l'on fait l'hypothèse
que la superficie de la surface inégale est de 100 %.
6. Elément revêtu suivant l'une quelconque des revendications 1 à 5, dans lequel la matière
de base est une matière à base de fer ayant une couche de nitruration, une couche
de carburation ou une couche de nitruration tendre sur sa surface.
7. Procédé de production d'un élément revêtu, ce procédé comprenant
- un premier stade de formation, sur une surface en matière métallique de base à revêtir, de saillies d'une hauteur moyenne de l'ordre de 10 à 100 nm et d'une largeur moyenne qui n'est pas supérieure à 300 nm par bombardement par des ions auparavant, de manière à rendre la surface de la matière de base inégale ;
- un deuxième stade de formation d'une pellicule de recouvrement sur la surface inégale.
8. Procédé de production d'un élément revêtu suivant la revendication 7, dans lequel
on effectue le bombardement par des ions sous une pression de 10-3 à 20 torrs et/ou dans lequel on effectue le bombardement par des ions dans l'atmosphère
d'un ou de plusieurs gaz rares choisis dans le groupe consistant en l'hélium, le néon,
l'argon, le krypton, le xénon et le radon, l'atmosphère de l'un ou de plusieurs des
gaz rares contenant éventuellement de l'hydrogène.
9. Procédé de production d'un élément revêtu suivant la revendication 7, dans lequel
on effectue le bombardement par des ions par une décharge incandescente ou par un
faisceau d'ions.
10. Procédé de production d'un élément revêtu suivant la revendication 9, dans lequel
on effectue la décharge incandescente à une tension de décharge de l'ordre de 200
à 1000 V, à un courant électrique de l'ordre de 0,5 à 3,0 A, pendant une durée de
traitement de l'ordre de 30 à 60 minutes.
11. Procédé de production d'un élément revêtu suivant l'une quelconque des revendications
7 à 10, dans lequel on effectue le bombardement par des ions à une température qui
n'abaisse pas la dureté de la matière à traiter.
12. Procédé de production d'un élément revêtu suivant l'une quelconque des revendications
7 à 11, dans lequel la matière de base est un métal à base de fer et une couche de
nitruration, une couche de carburation ou une couche de nitruration tendre est formée
sur la surface du métal à base de fer par un traitement gazeux de nitruration, par
un traitement de carburation, par un traitement gazeux de nitruration tendre avant
que la matière de base soit soumise au bombardement par des ions.
13. Procédé de production d'un élément revêtu suivant la revendication 12, dans lequel
le bombardement par des ions suit le traitement gazeux de nitruration, le traitement
de carburation ou le traitement gazeux de nitruration tendre continuellement dans
une seule installation.
14. Procédé de production d'un élément revêtu suivant l'une quelconque des revendications
7 à 13, dans lequel le stade de formation d'une pellicule de revêtement est un stade
de placage d'ions, de pulvérisation cathodique, d'évaporation sous vide ou de CVD
au plasma.