Electromagnetically shielding bonding film

Description

TECHNICAL FIELD

[0001] The present invention relates to a method for making electromagnetic shielding bonding film for shielding electromagnetic radiation which may be produced from the front surfaces of CRT, PDP (plasma display panel), liquid crystal, EL and other display devices. The present invention also relates to bonding film which is capable of shielding electromagnetic radiation from the front surface of such display devices as CRT, PDP (plasma display), LCD, and EL, and a display device and an electromagnetic shielding assembly using such film.

BACKGROUND OF THE INVENTION

[0002] Recently, with the increase in the use of various electric and electronic appliances, problems of electromagnetic noises or interferences (EMI) have been on the increase. Such noises may be generally classified into conduction noises and emission or radiation noises. The use of noise filters is a typical measure against conduction noises. As for radiation noises, it is necessary to electromagnetically insulate a prescribed space. To this end, the appliance may be enclosed in a metallic or otherwise electroconductive casing, a metallic plate may be placed between the two circuit boards, or metallic foil may be wrapped around the cable. These measures may provide an adequate electromagnetic shield for the circuit or the power source block, but are unsuitable for shielding electromagnetic radiation which may be produced from the front surface of a display device such as a CRT or a PDP because such measures require an opaque material layer to be placed in front of the display device.

[0003] Methods for providing both an electromagnetic shielding effect and a transparency have been previously proposed (see Japanese patent laid open publications Nos. 1-278800 and 5-323101) which are based on forming electroconductive thin film over the surface of a transparent base member by vapor depositing metal or metal oxide.

[0004] There have also been proposed electromagnetic shielding materials having highly electroconductive fibers embedded in a transparent base material layer (see Japanese patent laid open publications Nos. 5-327274 and 5-269912), electromagnetic shielding materials having electroconductive resin material containing metallic powder or the like directly deposited or printed on a transparent base board (see Japanese patent laid open publications Nos. 62-57297 and 2-52499), and an electromagnetic shielding material having a transparent resin layer formed over a transparent base board such as a polycarbonate board having the thickness of approximately 2 mm, and a copper layer of a mesh pattern formed over the resin layer by electroless plating (see Japanese patent laid open publication No. 5-283889).

[0005] According to the methods of forming a thin electroconductive layer by vapor depositing metal or metal oxide onto a transparent base board which were proposed in Japanese patent laid open publications Nos. 1-278800 and 5-323101 and purported to achieve both an electromagnetic shielding capability and a transparency, if the thickness of the electroconductive layer is reduced to a sufficient level (a few hundred Å to 2,000 Å), the surface resistance of the electroconductive layer becomes so large that the shielding effect for the frequency range of 1MHz to 1GHz will be less than 20dB which is significantly lower than the required level of 30dB or more.

[0006] As for the electromagnetic shielding material consisting of a transparent base member having electroconductive fibers embedded therein such as those proposed in Japanese patent laid open publications Nos. 5-327274 and 5-269912, a sufficiently high electromagnetic shielding effect of 40 to 50 dB can be achieved for the frequency range of 1MHz to 1GHz, but the fiber diameter which is required for regularly arranging the electroconductive fibers so as to achieve such a shielding effect becomes as large as 35 µm, and the fibers are so visible (which is referred to as "visibility" hereinafter) that the shielding material is quite unfit for application to display devices. In the case of the electromagnetic shielding material made by directly printing electroconductive ink containing metallic powder or the like on a transparent base board, similarly, the line width is no less than 100 µm due to the limitation of printing precision so that the visibility makes the material unsuitable. As for the shielding material formed by forming a transparent resin layer over a transparent base board made of a polycarbonate plate or the like having a thickness in the order of 2 mm, and forming a copper mesh pattern thereon by electroless plating, the surface of the transparent base board is required to be roughened or made coarse so as to achieve a sufficient adhesive power for the electroless plating. This roughening process requires the use of toxic oxidants such as chromic acid and permanganate acid, and can produce a desired result only when the base board is made of ABS resin. According to this method, even when an electromagnetic shielding effect and a transparency are both achieved, the thickness of the transparent base board cannot be reduced to a sufficient level so that the material is not suited to be formed into a sufficiently thin film or web. If the transparent base board has a significant thickness, as it cannot be closely attached to the surface of the display device, there will be a leakage of electromagnetic radiation. Also, in regard to the manufacturing process, because the shielding material cannot be put into the form of rolls, the material tends to be undesirably bulky and the unsuitability of the material to automation causes an increase in the production cost.

[0007] The electromagnetic radiation from the front surface of the display device that needs to be shielded is not limited the electromagnetic radiation in the frequency range of 1 MHz to 1GHz that has to be reduced by 30dB or more, but the infrared radiation in the wavelength range of 900 to 1,100 nm is also required to be blocked as it interferes with VTR equipment.

[0008] In addition to a favorable transparency for visible light, the material is required to have a favorable bonding property which allows it to be closely attached to the display surface so as to effectively shut off electromagnetic radiation, and to achieve a invisibility which makes the presence of the shielding material unnoticeable to the viewer. The bonding property includes the capability of the material to be attached to the surface of any one of a number of widely used polymer plate materials as well as to the surface of glass at a relatively low temperature, and to continue to maintain the close contact with the material over extended periods of time. However, such desirable material that can be formed into web or a roll, and which can sufficiently meet the requirements of the electromagnetic shielding effect, the infrared radiation blocking effect, the transparency, the invisibility, and the bonding property has not been hitherto available.

[0009] The part of the surface of the transparent plastic base member from which the electroconductive material has been removed presents an irregular surface because the surface was deliberately formed into an irregular surface in order to increase the adhesion force or because the marks of the reverse surface of the electroconductive material were imprinted on the surface of the transparent plastic base member. Therefore, the irregular reflection on the surface may damage the transparency of the base member, but by evenly applying a resin material layer, having a refraction index close to that of the base member, over such an irregular surface, the irregular reflection is minimized so that the transparency of the base member may be restored. The electroconductive material geometrically patterned on the surface of the transparent plastic base member has such a fine line width that it is practically invisible to naked eyes. The large line spacing also contributes to the invisibility of the electroconductive material.

[0010] Also, it is believed that, because the pitch of the geometric pattern is sufficiently smaller than the wavelength of the electromagnetic radiation that is desired to be shielded, a superior shielding performance can be achieved.

[0011] Also, the PDP panel, which is one type of flat panel, requires its front surface to be free from any warping. To control such a warping, it is preferable to use a symmetric structure, and is conceivable to attach a pair of transparent plastic sheets onto either side of a bonding agent layer. However, because the front panel of a display device is normally required to have a thickness of 2 to 5 mm in view of the possibility of breaking the glass and the ease of handling, a pressing process is necessary in view of the thermal conduction to the bonding agent in order to produce such an assembly. Additionally, the front panel of the display requires an anti-glare processing or an anti-reflection processing, it is required to be carried out directly on the transparent plastic base sheet, and the production process must be carried out as a batch process. For these two reasons, the production of such an assembly involves the problem that a continuous production process is not possible, and hence the production cost would be undesirably high.

[0012] From JP 07 097238 A an electromagnetic shield soundproof glass is known. Further EP 0 834 898 A2 which has a prior right effect describes an electromagnetic radiation shield panel and method of producing the same. The method comprising the steps of
forming a transparent resin coating including a platin catalyst on at least one surface of a transparent film,
forming a desired resist pattern on the layer of plated metal,
removing portions of the layer of plated metal where no resist is present and blackened portions of the coating thereunder by selective etching, thereby obtaining an electromagnetic radiation shield film,
providing a transparent ahesive layer on the film, and
laminating the film to a display panel or a transparent substrate by the adhesive layer.

BRIEF SUMMARY OF THE INVENTION

[0013] In view of such problems of the prior art, a primary object of the present invention is to provide electromagnetic shielding bonding film which may be applied to a member or an area where electromagnetic shielding and optical transparency are both required.

[0014] A second object of the present invention is to provide electromagnetic shielding bonding film which is easy to handle and economical to manufacture.

[0015] A third object of the present invention is to provide electromagnetic shielding bonding film which has a favorable optical properties such as high visible light transparency, invisibility of electroconductive shielding material, and freedom from image distortion.

[0016] A fourth object of the present invention is to provide electromagnetic shielding bonding film which can be conveniently applied to a wide range of display devices and electromagnetic shielding assemblies.

[0017] A fifth object of the present invention is to provide an electromagnetic shielding assembly incorporating such electromagnetic shielding bonding film which is highly effective in shutting off electromagnetic radiation but highly transparent to visible light.

[0018] A sixth object of the present invention is to provide an electromagnetic shielding assembly which is capable of blocking infrared radiation as well.

[0019] A seventh object of the present invention is to provide an electromagnetic shielding assembly which is capable of controlling spurious reflection and glare on the surface of the assembly.

[0020] According to the present invention, these and other objects can be accomplished by providing a method for making electromagnetic shielding bonding film, comprising the steps defined in claim 1.

[0021] Thus, bonding film having a favorable electromagnetic shielding capability and a high visible light transparency can be produced in an efficient and economical manner. The production process may further comprise the step of forming an infrared blocking layer by using an infrared blocking composition having an absorption ratio of 50% or more for infrared light of 900 to 1,100 nm in wavelength at least on one side of the base film, and this process can also be implemented a a substantially continuous operation.

[0022] The geometric patterned electroconductive material may be formed in an economical and precise manner by etching. To achieve a favorable transparency of the produced bonding film, the bonding agent composition should have a refractive index of 1.45 to 1.60 which is similar to that of most widely used plastic or otherwise transparent material suitable for base film such as polyethylene-terephthalate. To the end of reducing the number of production steps, and simplify the structure of the bonding film, the infrared blocking layer may be incorporated in the coating of the bonding agent composition.

[0023] To achieve a desired electromagnetic shielding performance without impairing the visible light transparency and the view angle, the geometric patterned electroconductive material may have a line width 40 µm or less, a line spacing of 200 µm or more, and a line thickness of 40 µm or less. Preferably, the geometric patterned electroconductive material layer consists of a member selected from a group consisting of copper, aluminum and nickel layer, and the geometric patterned electroconductive material has a thickness of 3 to 40 µm. To achieve a favorable attachment between the electroconductive material and the base film, a surface of the transparent base film carrying the electroconductive material and/or the reverse surface of the electroconductive material layer may consist of a coarse surface having a surface roughness of 1 µm or more. To achieve a favorable electromagnetic shielding performance and a high contrast image transmission, the electroconductive material may consist of copper which has a darkened surface. To the end of even more effectively shielding a magnetic field, the electroconductive material may consist of paramagnetic metallic material.

[0024] The present invention provides bonding film which has a highly optically transparent and electromagnetically shielding property, by combining substantially transparent base film; geometrically patterned electroconductive material formed at least on one side of the transparent base film; a bonding layer placed at least partly at least on one side of the base film; wherein the geometric patterned electroconductive material has a line width of 40 µm or less, a line spacing of 200 µm or more, and a line thickness of 40 µm or less; and a difference in refraction index between the transparent base film and the bonding layer is 0.14 or less. When a bonding agent layer is interposed between the transparent base film and the bonding layer, and differences in refraction index between the bonding agent layer and the transparent base film, and between the bonding agent layer and the bonding layer should be 0.14 or less so that a desired transparency may be achieved.

[0025] The present invention additionally provides an electromagnetic shielding assembly, comprising: electromagnetic shielding film; and a pair of substantially transparent base sheets attached to either side of the transparent plastic film, the plastic base sheets having a substantially identical thickness. This assembly is particularly suitable for use on the front surface of a display device. In particular, because of the symmetrically laminated arrangement, the assembly is free from any warping. Alternatively, the electromagnetic shielding assembly may comprise a substantially transparent base sheet; substantially transparent base film placed on each side of the base sheet; the base film placed at least on one side of the base sheet consisting of electromagnetic shielding film. The transparent base sheet is preferably made of polymethylmethacrylate (PMMA). In such assemblies also, by controlling the difference between adjoining transparent members such as base sheet, base film, and bonding layers so as to be at least less than 0.14, it is possible to achieve a favorable visible light transparency.

[0026] When producing such assemblies, the temperature at which the lamination process should be carried out may be selected by taking into account Tg and the crosslinking/curing temperature of the bonding agent layer, and Tg of the transparent plastic base sheet. The temperature range of 100 °C to 300 °C is preferred. If the temperature is too low, the bonding may become insufficient. If the temperature is too high, the bonding agent may seep out, and the transparent plastic base sheet may deform.

[0027] The assembly of the present invention may be mounted on the front surface of a display device, or mounted on the cases for measuring instruments, measuring devices and manufacturing devices, and inspection windows for such cases as well as for protecting appliances and devices from electromagnetic radiation by being mounted on the cases for such appliances and devices, and windows for such cases that require to be transparent.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0028] Now the present invention is described in the following in more detail.

[0029] The plastic film as used in this application includes those made of polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate, polyolefins such as polyethylene, polypropylene, polystyrene and EVA, vinyl resins such as polyvinyl chloride and polyvinylidene chloride, polysulfone, polyethersulfone, polycarbonate, polyamide, polyimide, and acrylic resins which have a transmission factor of 70% or more for visible light. These materials may be used as a single layer or multi layers combining two or more layers. In view of transparency, heat-resistance, handling and cost, polyethylene terephthalate is particularly suitable. The thickness of the base material is preferably in the range of 5 to 200 µm If the thickness is less than 5 µm, the handling is impaired. If the thickness is greater than 200 µm, the transmission factor of visible light diminishes. The thickness range of 10 to 100 µm is particularly preferable, and the thickness range of 25 to 50 µm is even more preferable.

[0030] The electroconductive metallic material as used in this application includes a material or an alloy of two or more selected from a group consisting of copper, aluminum, nickel, iron, gold, silver, stainless steel, tungsten, chromium and titanium or a combination thereof. In view of electroconductivity, suitability for circuit fabrication and cost, copper, aluminum and nickel are particularly suitable. The material preferably should be in the form of metallic foil having a thickness of 3 to 40 µm. If the thickness exceeds 40 µm, forming the fine lines becomes difficult, and the visible angle is reduced. If the thickness falls below 3 µm, the surface resistance increases to such an extent that the electromagnetic shielding effect may become inadequate. It is preferable if the electroconductive metallic material consists of copper having at least its surface darkened because a high contrast can be achieved. Also, the oxidization and fading of the electroconductive metallic material over time can be avoided. The darkening process can be carried outer either before or after the process of forming the geometric pattern, but is normally carried out after forming the geometric pattern in the manner well known in the art of printed circuit boards. For instance, the darkening process may consist of processing the metallic material in a water solution of sodium chlorite (31g/liter), sodium hydroxide (15 g/liter), and trisodium phosphate (12 g/liter) for 2 minute at 95 °C. It is desirable if the electroconductive metallic material consists of paramagnetic metal as it improves the magnetic shielding effect in addition to the shielding effect against an electric field.

[0031] Such electroconductive metallic material can be most easily brought into close contact with plastic film of the above described type by coating a bonding agent essentially consisting of acrylic or epoxy resin onto the electroconductive metallic material in the form of foil or the plastic film, and bonding these two material layers together via the bonding agent. When the thickness of the layer of the electroconductive metallic material is desired to be reduced, it can be achieved by one or a combination of two or more of the thin film forming methods selected from a group consisting of vacuum deposition, sputtering, ion plating, chemical vapor deposition, and electroless and electric plating. The film thickness of the electroconductive metallic material is preferably 40 µm or less. The film thickness is desired to be as small as possible for the performance of the electromagnetic shielding material because the visible angle becomes larger as the film thickness is reduced. It is therefore even more preferable if the film thickness is 18 µm or less. The plastic film layered by the electroconductive metallic material is required to be in the form of a continuous roll, and this means that both the foil of the electroconductive metallic material and the plastic film are preferably both in the form of continuous rolls. Bonding varnish or a bonding agent composition is evenly coated over the surface of the foil of the electroconductive metallic material, and after evaporating the solvent, the plastic film is laminated over the surface of the electroconductive metallic material by using a roller laminator to attach the plastic film to the foil of electroconductive metallic material. Alternatively, bonding varnish or a bonding agent composition is evenly coated over the surface of the plastic film, and after evaporating the solvent, the plastic film is laminated over the surface by using a roller laminator to attach the plastic film to the foil of electroconductive metallic material. The thus produced plastic film lined by the foil electroconductive metallic material is rolled onto a core tube which may be made of paper, plastic or metal.

[0032] The thus produced plastic film layered by the foil of the electroconductive metallic material is subjected to an etching process so as to form a geometric pattern and define an aperture ratio of 80% or more. The geometric pattern as used in this application may consist of a triangle such as right triangle, equilateral triangle and right-angled triangle, a rectangle such as square, oblong, parallelepiped and trapezoid, a polygon such as hexagon, octagon, dodecagon and icosahedron, a circle, an ellipsoid or a star shape, or a combination of these, and these individual patterns may repeat by themselves or two or more of these patterns may be combined. Triangles are most effective in terms of the electromagnetic shielding effect, but polygons having as many a side as possible are desirable in view of the transmission factor of visible light because of an increased aperture ratio.

[0033] The geometric pattern may be formed by the chemical etching process which is widely practiced in the field of printer circuit boards. This process comprises the step of applying resist ink over the surface of the electroconductive metallic material layer layered over the plastic film as a geometric pattern by screen printing. The application of resist ink may be carried out in a step-wise fashion, by sequentially shifting the area of resist ink application, and, if necessary, may be accompanied by a drying process. When the resist pattern is to be formed by using photosensitive resin film, the photosensitive resin film is layered over a layer of electroconductive metallic material which is in turn formed over the surface of plastic film, and photographically exposing the photosensitive resin film by placing a negative or positive photographic film, having the geometric pattern printed thereon, over the surface of the photosensitive resin film. The assembly is then photographically developed so as to form the geometrically patterned resist layer thereon, in a continuous manner. Thereafter, the plastic film having the layer of electroconductive metallic material carrying the geometrically patterned resist thereon is etched by passing it through a liquid etchant or by showering a liquid etchant. The assembly is then washed with water, and dried before it is finally wound into a continuous roll. Obviously, the process of forming the etching resist layer, and the etching process are desired to be carried out in a continuous manner in view of increasing the efficiency. It is effective, in view of increasing the processing efficiency, to make the assembly with a chemical etching process, and wind the assembly as web (or a roll). It is also possible to use a geometrically patterned mask to selectively, photographically expose and develop a layer of photosensitive resin which is placed over the surface of transparent plastic film. Additionally, combining electroless plating and electric plating is also possible.

[0034] The line width of the geometric pattern should be 40 µm or less, the line spacing should be 200 µm or more, and the line thickness should be 40 µm or less. In view of transmission factor for visible light, it is even more preferable if the line width is 25 µm or less, the line spacing is 250 µm or more, and the line thickness is 18 µm or less. As the line spacing increases, the aperture ratio becomes greater, and the transmission factor for visible light increases. When the assembly is applied to the front surface of a display device, the aperture ratio is required to be 80% or more, but an excessive aperture ratio leads to a reduction in the electromagnetic shielding performance, and the line spacing is desired to be 1 mm or less. When the geometric pattern is relatively complex, the line spacing may be defined by converting the open area of each repeating pattern unit into a square, and measuring the side of such a square.

[0035] The bonding agent layered over the geometric pattern should have a refraction index of 1.45 to 1.60. This is because the transmission factor of visible light diminishes when there is a large difference in refraction index between the plastic film and the bonding agent layer or between the bonding agent layer for attaching the electroconductive metallic layer to the plastic film and the surface bonding agent layer. If the refraction index is in the range of 1.45 to 1.60, the reduction in the transmission factor of visible light is insignificant, and a favorable result can be achieved. In particular, it is desirable if the difference in refractive index between the bonding agent layer for attaching the electroconductive metallic layer to the plastic film and the bonding agent layer applied to the surface of the patterned layer of the electroconductive metallic material is 0.14 or smaller. This is because if there is a significant difference between the plastic film and the surface bonding agent, or, when the plastic film is layered by a layer of electroconductive metallic material, between the plastic film and the bonding agent between the metallic layer and the plastic film, the transmission factor of visible light drops. Such a drop in the transmission factor can be favorably avoided if the difference in refraction index is 0.14 or less. The material for the bonding agent meeting such requirements includes bisphenol type A epoxy resin, bisphenol type F epoxy resin, tetrahydroxy-phenylmethane epoxy resin, novolac epoxy resin, resorcin epoxy resin, polyalcohol/polyglycohol epoxy resin, polyolefin epoxy resin, alicyclic epoxy resin and bisphenol halide epoxy resin (which have refractive indices in the range of 1.55 to 1.60) when the plastic film consists of polyethylene phthalate (n=1.575, refraction index). In addition to epoxy resins, dienes such as natural rubber (n=1.52), polyisoprene (n=1.521), poly-1,2-butadiene (n=1.50), polyisobutane (n=1.505 to 1.51), polybutane (n=1.5125), poly-2-heptyl-1,3-butadiene (n=1.50), poly-2-t-butyl-1,3-butadiene (n=1.506) and poly-1,3-butadiene (n=1.515), polyethers such as polyoxy-ethylene (n=1.4563), polyvinyl-ethylether (n=1.454), polyvinyl-hexylether (n=1.4591) and polyvinyl-butylether (n=1.4563), polyesters such as polyvinyl-acetate (n=1.4665), and polyvinyl-propionete (n=1.4665), polyurethane (n=1.5 to 1.6), ethylcellulose (n=1.479), polyvinyl-chloride (n=1.54 to 1.55), polyacrylonitrile (n=1.52), polymethacrylonitrile (n=1.52), polysulfide (n=1.6), phenoxy resin (n=1.5 to 1.6). These materials are suitable for achieving a favorable transmission factor for visible light.

[0036] When the plastic film is made of acrylic resin, in addition to the above listed materials, the bonding agent may consist of poly (metha) acrylic acid esters such as polyethyl-acrylate (n=1.469), polybutyl-acrylate (n=1.466), poly-2-ethylhexyl-acrylate (n=1.463), poly-t-butyl-acrylate (n=1.464), poly-3-ethoxypropyl-acrylate (n=1.465), polyoxycarbonyl-tetramethacrylate (n=1.465), polymethyl-acrylate (n=1.472 to 1.480), polyisopropyl-methacrylate (n=1.473), polydodecil-methacrylate (n=1.474), polytetradecil-methacrylate (n=1.475), poly-n-propyl-methacrylate (n=1.484), poly-3,3,5-trimethyl-cyclohexyl-methacrylate (n=1.484), polyethyl-methacrylate (n=1.485), poly-2-nitro-2-methylpropyl-methacrylate (n=1.487), poly-1,1-diethylpropyl-methacrylate (n=1.489), and polymethyl-methacrylate (n=1.489). Two or more these acrylic polymers may be copolymerized, or may be mixed together as required.

[0037] Copolymers of acrylic resin and other resin materials may also be used, and they inlcude epoxyacrylates, urethaneacrylates, polyetheracrylates, and polyesteracrylates. In terms of bonding property, epoxyacrylates and polyetheracrylates are particularly desirable. Such epoxyacrylates include (metha)acrylic acid derivatives such as 1,6-hexandiol-diglycidylether, neopenthylglycol-diglycidylether, arylalcohol-diglycidylether, resorcinol-diglycidylether, diglycidylester adipate, diglycidylester phthalate, polyethyleneglycol-diglycidylesther, trimethylolpropane-triglycidylether, glycerin- triglycidylether, pentaerythritol-tetraglycidylether, and sorbitol-tetraglycidylether. Epoxyacrylates are effective in improving bonding property as they contain hydroxyl groups in their molecules, and these copolymers can be used either individually or in combination. The weight-average molecular weight of the main polymer in the bonding agent should be 1,000 or greater. If the molecular weight is less than 1,000, the cohesive force of the composition is so small that a satisfactory attachment to the object may not be achieved.

[0038] The crosslinking/curing agent for the bonding agent may consist of amines such as triethylenetramine, xylenediamine, N-aminotetramine, and diaminodiphenylmethane, anhydrides such as anhydrous phtalate acid, anhydrous maleic acid, anhydrous dodecylsuccinic acid, anhydrous pyromellitic acid, and anhydrous benzophenontetracarboxylic acid, diaminodiphenylsulfone, tris(dimethylaminomethyl)phenol, polyamide resins, dicyandiamide, and ethylmethylimidazol. These materials may be used individually or in combination. The added amount of the crosslinking/curing agent should be in the range 0.1 to 50 weight parts, or more preferably should be in the range of 1 to 30 weight parts for 100 weight parts of the above mentioned polymer. If the added amount is less than 0.1 weight parts, the crosslinking and curing becomes insufficient. However, if the added amount exceeds 50 weight parts, the crosslinking may become excessive, and the bonding property may be impaired as a result.

[0039] Diluting agents, plasticizers, oxidization preventing agents, fillers and adhesion improving agents may be added to the resin composition of the present invention. The resin composition serving as the bonding agent is applied over the surface of the plastic film in the form of web or a roll so as to cover a part of the surface or the entire surface of the plastic film carrying the geometrically patterned electroconductive metallic layer and after subjecting the assembly to the processes of drying the solvent, heating, and partial crosslinking/curing, the assembly is wound into a roll of the electromagnetic shielding bonding film according to the present invention. The process of applying the bonding agent having a refraction index in the range of 1.45 to 1.60 over a part of the surface or the entire surface of the base material layer can be carried out by using a coating machine such as a roll coater, a curtain coater or a gravure coater so as to achieve a uniform thickness. The solvent components in the bonding agent composition is removed by heating or the like so as to form a layer of the bonding agent over a part of the surface or the entire surface of the base material layer including the geometrically patterned layer of electroconductive metallic material. If necessary, the bonding agent layer may also be coated over the surface of the assembly opposite to the surface over which the bonding agent composition has been applied.

[0040] The method for forming the bonding resin composition having an infrared absorption ratio of 50% or higher for the frequency range of 900 to 1,100 nm may consist of adding organic infrared absorbing agents in the bonding agent composition. Such organic infrared absorbing agents may include metal oxides such as iron oxide, cerium oxide, tin oxide and antimony oxide, indium-tin oxide (which is referred to as ITO hereinafter), tungsten hexachloride, tin chloride, copper (II) sulfide, chromium-cobalt complex salt, thiol-nickel complex compound, aminium compounds, diimonium compounds (marketed by Nihon Kayaku KK), antraquinone compounds (SIR-114), metallic complex compounds (SIR-128, SIR-130, SIR-132, SIR-159, SIR-152, and SIR-162), phthalocyanine (SIR-103) (these are marketed by Mitsui Toatsu Kagaku KK). Alternatively, these compounds may be dispersed in binder resin which is then over the surface of the bonding agent composition or the reverse surface of the assembly so as to define an infrared absorbing layer. The infrared radiation which may emit from the display device may interfere with the operation of remote controls for other TVs, VTRs, radios and personal computers using infrared, and providing such an Infrared Blocking layer prevents the remote control from failing to operate properly.

[0041] The compounds which are particularly effective in absorbing infrared radiation include such infrared absorbing agents as copper (II) sulfide, ITO, aminium compounds, di-imonium compounds, and metallic complex compounds. In case of infrared absorbing agents other than organic infrared absorbing agents, it is important to properly select the diameter of the primary particles. If the particle diameter is substantially larger than the wavelength of the infrared radiation, the blocking efficiency may be high, but the transparency drops because the irregular reflection by the surfaces of the particles cause a hazy appearance. If the particle diameter is excessively small, the shielding efficiency drops. The preferable range of the particle diameter is 0.01 to 5 µm, and an even more preferable range is 0.1 to 3 µm. The infrared absorbing agent is evenly dispersed in binder resins which may comprise epoxy resins such as bisphenol type A epoxy resin, bisphenol type F epoxy resin, and novolac type epoxy resin, diene resins such as polyisoprene, poly-1,2-butadiene, polyisobutane, and polybutane, polyacrylic acid ester copolymers such as ethylacrylate, butylacrylate, 2-ethylhexylacrylate, and t-butylacrylate, polyester resins such as polyvinylacetate, polyvinylpropionate, and polyolefin resins such as polyethylene, polypropylene, polystyrene, and EVA. The mixture ratio of the infrared absorbing agent should be preferably 0.01 to 10 weight parts, and more preferably 0.1 to 5 weight parts for 100 weight parts of the binder. If the mixture ratio is less than 0.01 weight parts, a required infrared absorbing ratio cannot be achieved. If the mixture ratio is greater than 10 weight parts, a required transparency cannot be achieved. These compounds are applied over the surface of the bonding agent composition which is geometrically defined on the surface of the assembly including plastic film and a electroconductive metallic layer placed over it or the reverse surface of the assembly to a thickness in the range of 0.01 to 10 µm. The applied layer of the composition including infrared absorbing compounds may be cured by using heat or UV.

[0042] It is also possible to directly mix the infrared absorbing compounds with the bonding agent composition. In such a case, the added amount of the infrared absorbing agent should be in the range of 0.01 to 5 weight parts for 100 parts of the polymer which forms the bonding agent in view of shielding performance and transparency.

[0043] The anti-reflection process as used in this invention means a process for increasing the transmission factor of visible light by controlling the reflection of visible light. The wavelength of minimum reflection is determined by the thickness of the coating layer, and the refraction index of the coated material as given by the following equation (Equation 1).

   where n is the refraction index, d is the thickness of the coating, λ is the wavelength, and m is an integer 0, 1, 2, 3, ...)

[0044] Because n is determined by the property of the material, the wavelength of minimum reflection (maximum transmission) can be selected by changing the thickness of the coating layer. The anti-reflection process may include a single-layer and multi-layer structures of material having different refraction indices from that of the transparent plastic film. In the case of the single-layer structure, the material having a larger refractive index than the transparent plastic film is selected. When the multi-layer structure having a favorable anti-reflection effect is selected, it is desirable to provide a layer of material having a larger refractive index than the transparent plastic film on the transparent plastic film, and laminate a layer of material over another in such a manner that the outer layer may have a larger refractive index than the adjoining inner layer. The materials for achieving such an anti-reflection property may be selected from any know materials having such a property, and, for instance, may include such dielectric materials as CaF₂, MgF₂, NaAlF₆, Al₂O₃, SiOx (x=1 or 2), ThF₄, ZrO₂, Sb₂O₂, Nd₂O₂, SnO₂ and TiO₂. The refractive indices of these materials as well as the thickness of each layer are selected so that the above mentioned relation may hold. The anti-reflection layers may be formed by vacuum deposition, ion plating, sputtering and so on.

[0045] The anti-glare process as used in this invention means a process for preventing the flickering of the display, and the resulting fatigue of the viewer's eyes, and may be achieved by forming an anti-glare layer which is made of any known such materials, but preferably from inorganic silica. However, a hardened film of curable resin material containing inorganic silica dispersed and secured therein is preferred. Such curable resin material may include epoxy resins such as bisphenol type A epoxy resin, bisphenol type F epoxy resin, tetrahydroxy-phenylmethane epoxy resin, and novolac epoxy resin, diene resins such as polyisoprene, poly-1,2-butadiene, polyisobutane, and polybutane, polyacrylic acid ester copolymers such as ethyleneacrylate, butylacrylate, 2-ethyhexylacrylate, and t-butylacrylate, polyester resins such as polyvinyl-acetate, and polyvinyl-propionete, polyolefin resins such as polyethylene, polypropylene, polystyrene, and EVA, and silicone resins.

[0046] When forming such an anti-glare layer, first of all, silica particles are dispersed in crosslinking/curing resin material, and an anti-static agent, a polymerization initiator, a curing agent, a reaction promoting agent and other additives are added to the mixture as required. This mixture is dissolved in a solvent so as to achieve solid content of approximately 20 to 80 weight %. The silica particles are non-crystalline and porous, and typically consist of silica gel. The average particle diameter should be 30 µm or less, or more preferably in the range of 2 to 15 µm. Preferably, the content of the silica particles is 0.1 to 10 weight parts for 100 weight parts of the resin. If the silica content is too small, a desired anti-glare property may not be obtained. If the silica content is too large, the transmission factor of visible light and the film strength may be lost.

[0047] This compound may be applied to a surface of the transparent plastic film by any suitable means such as a gravure coater, a reverse coater, a spray coater or other known coating machines so that a dry film thickness of 5 to 30 µm may be achieved. The film, after drying with heat, may be cured and crosslinked by ultraviolet radiation, electron beam radiation or heating. The anti-glare layer consisting of film containing silica particles gives a favorable anti-glare property to the assembly when the transparent plastic film incorporated with this anti-glare layer is bonded on the surface of the transparent plastic base sheet. Also, because the anti-glare layer has such a high hardness that a favorable anti-scratch property is obtained, and the assembly is thereby made highly wear resistant.

[0048] Prior to the formation of such an anti-glare layer, the corresponding surface or the surface of the transparent plastic film may be subjected to such preliminary processing as corona discharge processing, plasma processing, sputter etching and other bonding facilitating measures so that the adhesive force between the transparent plastic film and the anti-glare layer may be increased.

[0049] According to the present invention, because the surface of the assembly from which the electroconductive metallic layer has been removed is deliberately turned into a coarse surface with the aim of improving the bonding property, and/or the marks of the reverse surface of the electroconductive metallic layer left on the surface of the assembly, the transparency is lost to a certain extent. However, by evenly applying a bonding agent, having a refraction index similar to that of the plastic film or that of the bonding agent for attaching the electromagnetic metallic material to the plastic film, onto such an irregular surface, irregular reflection can be minimized, and the transparency may be improved. Also, the geometric pattern of the electromagnetic metallic material layer placed over the plastic film has such a small line width that the geometric pattern would not be visible to naked eyes. The spacing between adjacent lines of the geometric pattern is so large that a virtually transparent appearance would be achieved. The pitch of the geometric pattern is so small in comparison to the wavelength of the electromagnetic radiation which is desired to be shielded that a favorable shielding capability would be achieved.

[0050] Thus, according to the method for making elelctromagnetic shielding bonding film, comprising the steps of: (a) removing electroconductive metallic material from plastic film, incorporated with an electroconductive metallic material layer, by etching so as to define a geometric pattern of the electroconductive metallic material layer, the geometric pattern providing an aperture ratio of 80% or more; (b) coating a bonding agent composition having a refractive index of 1.45 to 1.60 over a part or an entirety of a base material layer carrying the geometric pattern; and (c) coating a resin composition having an absorption ratio of 50% or more for infrared light of 900 to 1,100 nm in wavelength over the surface coated with the bonding agent composition or the opposite surface; the film being continually paid from a roll and wound back to a roll in each of the steps, because the manufacturing process can be carried out in a continuous manner in each step involving very little waste of material and energy, it is possible to manufacture a highly workable and high-quality electromagnetic shielding bonding film in a highly waste-free and efficient manner.

[0051] Also, according to the method for making electromagnetic shielding bonding film, comprising the steps of: (a) removing electroconductive metallic material from plastic film, incorporated with an electroconductive metallic material layer, by etching so as to define a geometric pattern of the electroconductive metallic material layer, the geometric pattern providing an aperture ratio of 80% or more; and (b) coating a resin composition having a refractive index of 1.45 to 1.60 and an absorption ratio of 50% or more for infrared light of 900 to 1,100 nm in wavelength over a part or an entirety of a base material layer carrying the geometric pattern; the film being continually paid from a roll and wound back to a roll in each of the steps, because the manufacturing process can be carried out in a continuous manner in each step involving very little waste of material and energy in a similar fashion, it is possible to manufacture a highly workable and high-quality electromagnetic shielding bonding film in a highly waste-free and efficient manner.

[0052] According to the present invention, the step of attaching the electroconductive metallic material to the plastic film, the step of geometrically patterning the electroconductive metallic material, and the step of forming the bonding agent layer by applying the bonding agent to the assembly can be carried either entirely continually, or in a partly continuos manner. The thus fabricated electromagnetic shielding bonding film may be attached to one side of a plastic base board such as acrylic plate or polyester plate, or may be laminated between a pair of such plastic base boards, and after being appropriately trimmed, the assembly may be used in a display device.

[0053] The thus obtained bonding film having an electromagnetic shielding and infrared blocking property can be directly attached to a display device such as CRT, PDP, LCD, and EL, by using the bonding agent included in the bonding film, or may be attached to a plate or a sheet such as an acrylic plate or a glass sheet for mounting the thus prepared assembly on a display device. The bonding film may also be used on the cases of measuring devices, measuring instruments and manufacturing devices, and inspection windows provided in such cases. The present invention may also be applied to windows of building and vehicles which may be exposed to electromagnetic interferences from radio towers and high tension electric cables. It is preferable to provide a grounding line in the geometrically patterned electroconductive material.

[0054] The electromagnetic shielding bonding film may be continuously laminated over the plastic base board by using a roller laminator and continually feeding the plastic base board.

[0055] The plastic base board preferably is colorless and transparent, but may also be tinted as long as it has a required transparency. Preferably, the thickness is in the range of 0.5 to 10 mm, and the transmission factor for all visible light range is 50% or more, or, more preferably, 80% or more. Typical materials for the plastic base board includes polycarbonate, polymethyl(metha)acrylate, polyethyleneterephthalate, polyether sulfone, polyetherketone, and acyronitrile-styrene copolymer.

[0056] An infrared absorption ratio of 50% or more in the wavelength range of 800 to 1,100 nm can be achieved in the bonding film by mixing organic infrared absorbing agents in the above mentioned bonding agent, or by applying a composition containing such organic infrared absorbing agents in a binder over the bonding agent layer surface or the reverse surface of the bonding film. Such organic infrared absorbing agents may include metal oxides such as iron oxide, cerium oxide, tin oxide and antimony oxide, indium-tin oxide (which is referred to as ITO hereinafter), tungsten hexachloride, tin chloride, copper (II) sulfide, chromium-cobalt complex salt, thiol-nickel complex compound, aminium compounds, and diimonium compounds (marketed by Nihon Kayaku KK). The compounds which are particularly effective in absorbing infrared radiation include such infrared absorbing agents as copper (II) sulfide, ITO, aminium compounds, di-imonium compounds, and metallic complex compounds. It is important to properly select the diameter of the primary particles. If the particle diameter is substantially larger than the wavelength of the infrared radiation, the blocking efficiency may be high, but the transparency drops because the irregular reflection by the surfaces of the particles cause a hazy appearance. If the particle diameter is excessively small, the shielding efficiency drops. The preferable range of the particle diameter is 0.01 to 5 µm, and an even more preferable range is 0.1 to 3 µm. The infrared absorbing agent is evenly dispersed in binder resins which may comprise epoxy resins such as bisphenol type A epoxy resin, bisphenol type F epoxy resin, and novolac type epoxy resin, diene resins such as polyisoprene, poly-1,2-butadiene, polyisobutane, and polybutane, polyacrylic acid ester copolymers such as ethylacrylate, butylacrylate, 2-ethylhexylacrylate, and t-butylacrylate, polyester resins such as polyvinylacetate, polyvinylpropionate, and polyolefin resins such as polyethylene, polypropylene, polystyrene, and EVA. The mixture ratio of the infrared absorbing agent should be preferably 0.01 to 10 weight parts, and more preferably 0.1 to 5 weight parts for 100 weight parts of the binder. If the mixture ratio is less than 0.01 weight parts, a required infrared absorbing ratio cannot be achieved. If the mixture ratio is greater than 10 weight parts, a required transparency cannot be achieved. These compounds are applied over the surface of the bonding agent layer of the bonding film or the reverse surface of the bonding film to a thickness in the range of 0.01 to 10 µm. The applied layer of the composition including infrared absorbing compounds may be cured by using heat or UV.

[0057] It is also possible to directly mix the infrared absorbing compounds with the bonding agent composition. In such a case, the added amount of the infrared absorbing agent should be in the range of 0.01 to 5 weight parts for 100 parts of the polymer which forms the bonding agent in view of shielding performance and transparency.

[0058] The part of the surface of the transparent plastic base member from which the electroconductive material has been removed presents an irregular surface because the surface was deliberately formed into an irregular surface in order to increase the adhesion force or because the marks of the reverse surface of the electroconductive material were imprinted on the surface of the transparent plastic base member. Therefore, the irregular reflection on the surface may damage the transparency of the base member, but by evenly applying a resin material layer, having a refraction index close to that of the base member, over such an irregular surface, the irregular reflection is minimized so that the transparency of the base member may be restored. The electroconductive material geometrically patterned on the surface of the transparent plastic base member has such a fine line width that it is practically invisible to naked eyes. The large line spacing also contributes to the invisibility of the electroconductive material. Also, it is believed that, because the pitch of the geometric pattern is sufficiently smaller than the wavelength of the electromagnetic radiation that is desired to be shielded, a superior shielding performance can be achieved.

<Example: Electromagnetic Shielding Bonding Film #A1>

[0059] The plastic film consisted of transparent PET film having the thickness of 50 µm and the roll length of 300 m (marketed by Toyo Boseki KK under the tradename of A-4100, refraction index n = 1,575). An electrolytic copper foil having the thickness of 18 µm was laminated thereover, by heating, under the condition of 180 °C and 2,94 x 10⁶ Pa (30 kgf/cm²), in continuous manner from the beginning to the end of the roll over the surface of the plastic film via an epoxy bonding film (marketed by Nikkan Kogyo KK under the tradename of Nikaflex, n=1.58, thickness 20 µm), serving as a bonding layer, with the coarse surface of the copper foil facing the epoxy bonding film.

[0060] The obtained roll of PET film laminated with copper foil is subjected to a photo-lithographic process (including the steps of resist film coating, photographic exposure, photographic development, chemical etching, and resist film removal), and a copper grid pattern having the line width of 25 µm and the line spacing of 500 µm was formed on the surface of the PET film by spraying ferrous chloride liquid etchant. After the resist was removed, the assembly was subjected to the steps of water washing, and drying, and a roll of Composition #A1 was obtained in a continuous manner from the beginning to the end of the roll. The obtained roll was free from creases or other visible defects. The transmission factor of Composition #A1 for visible light was 20 % or less. A bonding agent composition containing an infrared absorbing agent which is described hereinafter was continuously applied over the surface of Composition #A1 to the dry thickness of approximately 40 µm, and after a drying process, Electromagnetic Shielding Bonding Film #A1 having an electromagnetic shielding property and a transparency was obtained as a roll which is continuous from the beginning to the end. Thereafter, Electromagnetic Shielding Bonding Film #A1 was applied over the surface of commercially available acrylic plate (marketed by KK Kurare under the tradename of Komoglass, thickness 3 mm), as the acrylic plate is fed out, by using a roll laminator with the surface of the bonding agent facing the acrylic plate under the temperature and pressure condition of 110 °C and 1,96 x 10⁶ Pa (20 kgf/cm²). The material for display devices is thus made in a continuous manner, and is cut into the required size. The cut material was then properly trimmed, and used for the fabrication of a display device.

<Example: Electromagnetic Shielding Bonding Film #A2>

[0061] Aluminum foil having the thickness of 25 µm was bonded over the surface of PET film having the thickness of 25 µm and the roll length of 400 m via acrylic bonding film (marketed by DuPont under the tradename of Pyralux LF-0200, n=1.47, thickness 20 µm). This assembly consisting of PET film laminated with aluminum foil is subjected to a photo-lithographic process similar to that for Electromagnetic Shielding Bonding Film #A1, and an aluminum grid pattern having the line width of 25 µm and the line spacing of 250 µm was formed on the surface of the PET film by spraying a hydrochloric acid liquid etchant. After the resist film was removed, the assembly was subjected to the steps of water washing, and drying, and a roll of Composition #A2 was obtained in a continuous manner from the beginning to the end of the roll. The transmission factor of Composition #A2 for visible light was 20 % or less. A bonding agent composition containing an infrared absorbing agent which is described hereinafter, was continuously applied over the surface of Composition #A2 to the dry thickness of approximately 30 µm, and after a drying process, Electromagnetic Shielding Bonding Film #A2 having an electromagnetic shielding property and a transparency was obtained as a roll which is continuous from the beginning to the end. The obtained roll was free from creases or other visible defects. Thereafter, Electromagnetic Shielding Bonding Film #A2 was applied over the surface of commercially available acrylic plate (marketed by KK Kurare under the tradename of Komoglass, thickness 3 mm) by using a thermal press with the surface of the bonding agent facing the acrylic plate under the temperature and pressure condition of 110 °C, 2,94 x 10⁶ Pa (30 kgf/cm²), and 30 minutes. The material was then properly trimmed, and used for the fabrication of a display device.

<Example: Electromagnetic Shielding Bonding Film #A3>

[0062] Electroless nickel plating to the thickness of 2 µm was applied over the surface of PET film having the thickness of 50 µm and the roll length of 300 m via an additive bonding agent layer (n=1.57) having the thickness of 20 µm. This assembly is subjected to a photo-lithographic process similar to that for Electromagnetic Shielding Bonding Film #A1, and a nickel grid pattern having the line width of 12 µm, the line spacing of 500 µm, and the thickness of 2 µm was formed on the surface of the PET film by spraying ferrous chloride liquid etchant. After the resist film was removed, the assembly was subjected to the steps of water washing, and drying, and a roll of Composition #A3 was obtained in a continuous manner from the beginning to the end of the roll. The transmission factor of Composition #A3 for visible light was 20 % or less. A bonding agent which is described hereinafter was continuously applied over the surface of Composition #A3 carrying the geometric pattern to the dry thickness of approximately 70 µm, and after a drying process, an Infrared Blocking layer (1) which is described hereinafter was applied over the reverse surface of the PET film to the thickness of 3 µm in a continuous manner. After the final drying process, Electromagnetic Shielding Bonding Film #A3 having an electromagnetic shielding property and a transparency was obtained as a roll which is continuous from the beginning to the end. The obtained roll was free from creases or other visible defects.

[0063] Thereafter, Electromagnetic Shielding Bonding Film #A3 was applied over the surface of commercially available acrylic plate (marketed by KK Kurare under the tradename of Komoglass, thickness 3 mm) by using a roller laminator with the surface of the bonding agent facing the acrylic plate under the temperature and pressure condition of 110 °C and 1,96 x 10⁶ Pa (20 kgf/cm²). The material for display devices is thus made in a continuous manner, and is cut into the required size. The cut material was then properly trimmed, and used for the fabrication of a display device.

<Bonding Agent Composition #A1>

[0064] 

TBA-HME (Hitachi Kasei Kogyo KK; high polymer epoxy resin, Mw=300,000)	100 weight parts
YD-8125 (Toto Kasei Kogyo KK; bisphenol type A epoxy resin)	25 weight parts
IPDI (Hitachi Kasei Kogyo KK; mask isophorone-di-isocyanate)	12.5 weight parts
2-ethyl-4-methylimidazole	0.3 weight parts
SIR-159 (Mitsui Toatsu Kagaku KK, infrared absorbing agent)	1.4 weight parts
MEK (methyl-ethyl-ketone)	330 weight parts
cyclohexanone	15 weight parts

[0065] The refraction index of Bonding Agent Composition #A1 after drying the solvent was 1.57.

<Bonding Agent Composition #A2>

[0066] 

YP-30 (Toto Kasei KK, phenoxy resin, Mw=60,000)	100 weight parts
YD-8125 (Toto Kasei Kogyo KK; bisphenol type A epoxy resin)	10 weight parts
IPDI (Hitachi Kasei Kogyo KK; mask-isophorone-di-isocyanate)	5 weight parts
2-ethyl-4-methylimidazole	0.3 weight parts
IRG-022 (Nihon Kayaku KK, di-imonium compound, infrared absorbing agent)	1.2 weight parts
MEK	285 weight parts
cyclohexanone	5 weight parts

[0067] The refraction index of Bonding Agent Composition #A2 after drying the solvent was 1.55.

<Bonding Agent Composition #A3>

[0068] 

HTR-600LB (Teikoku Kagaku Sangyo KK, polyacrylic acid ester, Mw=700,000)	100 weight parts
Colonate L (Nihon Polyurethane Kogyo KK, 3-functional isocyanate)	4.5 weight parts
dibutyl-tin laurate	0.4 weight parts
toluen	450 weight parts
ethylacetate	10 weight parts

[0069] The refraction index of Bonding Agent Composition #A3 was 1.47.

<Infrared Blocking Layer Composition #A1>

[0070] 

HTR-280 (Teikoku Kagaku Sangyo KK, polyacrylic acid ester copolymer, Mw=700,000)	100 weight parts
UFP-HX (Sumitomo Kinzoku Kozan KK, ITO, average particle diameter 0.1 µm)	0.5 weight parts
Colonate L (Nihon Polyurethane Kogyo KK, 3-functional isocyanate)	5 weight parts
dibutyl-tin laurate	0.4 weight parts
toluen	450 weight parts
ethylacetate	10 weight parts

[0071] The composition was applied by using a roll coater, and was cured at 90 °C for 20 minutes, and the cured layer had a refraction index of 1.49.

<Infrared Blocking Layer Composition #A2>

[0072] Infrared Blocking Layer Composition #A2 was used in a similar manner except for that one weight part of copper (II) sulfide (Wako Junyaku KK; crushed to the average particle diameter of 0.5 µm by using a Henschel mixer) instead of UFP-HX of Infrared Blocking Layer Composition #A2. The obtained composition had a refraction index of 1.50.

<Example #A1>

[0073] Example #A1 consists of a display device which was formed according to the method of making Electromagnetic Shielding Bonding Film #A1 by using Bonding Agent Composition #A1.

<Example #A2>

[0074] Example #A2 consists of a display device which was formed according to the method of making Electromagnetic Shielding Bonding Film #A2 by using Bonding Agent Composition #A2.

<Example #A3>

[0075] Example #A3 consists of a display device which was formed according to the method of making Electromagnetic Shielding Bonding Film #A1 by using Bonding agent Composition #A3 and Infrared Blocking Layer Composition #A1.

<Example #A4>

[0076] A display device which was prepared identically as the display device of Example #A1 except for that the line width was 35 µm instead of 25 µm.

<Example #A5>

[0077] A display device which was prepared identically as the display device of Example #A2 except for that the line width was 12 µm instead of 25 µm.

<Example #A6>

[0078] A display device which was prepared identically as the display device of Example #A3 except for that the line spacing was 800 µm instead of 500 µm, and Infrared Blocking Layer Composition #A2 was used instead of Infrared Blocking Layer Composition #A1.

<Example #A7>

[0079] A display device which was prepared identically as the display device of Example #A1 except for that the line spacing was 250 µm instead of 500 µm.

<Example #A8>

[0080] A display device which was prepared identically as the display device of Example #A2 except for that the line thickness was 35 µm instead of 25 µm.

<Example #A9>

[0081] A display device which was prepared identically as the display device of Example #A1 except for that the electroconductive metallic material consisted of darkened copper.

<Example #A10>

[0082] A display device which was prepared identically as the display device of Example #A1 except for that the geometric pattern consisted of a repetition of a right triangle instead of the grid pattern of Example #A1.

<Example #A11>

[0083] A display device which was prepared identically as the display device of Example #A1 except for that the geometric pattern consisted of a repetition of a right hexagon instead of the grid pattern of Example #A1.

<Example #A12>

[0084] A display device which was prepared identically as the display device of Example #A1 except for that the geometric pattern consisted of a repetition of a right octagon and a square instead of the grid pattern of Example #A1.

<Comparative Example #A1>

[0085] Bonding Agent Composition #A1 was directly applied over the surface of PET film over which ITO film was deposited to the thickness of 2,000 Å by vapor deposition, instead of the patterned copper foil. The assembly was used for preparing a display device in the same way as Example #A1.

<Comparative Example #A2>

[0086] Similarly as Comparative Example #A1, Bonding Agent Composition #A2 was directly applied over the surface of PET film over which ITO film was deposited to the thickness of 2,000 Å by vapor deposition, instead of the patterned copper foil. The assembly was used for preparing a display device in the same way as Comparative Example #A1.

<Comparative Example #A3>

[0087] Comparative Example #A3 consisted of a display device which was prepared identically as the display device of Example #A1 except for that the line width was 50 µm instead of 25 µm.

<Comparative Example #A4>

[0088] Comparative Example #A4 consisted of a display device which was prepared identically as the display device of Example #A2 except for that the line spacing was 150 µm instead of 250 µm.

<Comparative Example #A5>

[0089] Comparative Example #A5 consisted of a display device which was prepared identically as the display device of Example #A2 except for that the line thickness was 70 µm instead of 25 µm.

[0090] The infrared blocking ratio, electromagnetic shielding performance, visible light transmission factor, invisibility, bonding property before and after curing, fading property, and roll appearance of the electromagnetic shielding bonding films and the display devices were actually measured, and the measured results are summarized in Tables 1 and 2.

[0091] The infrared blocking ratio was measured as an average value of the infrared absorption ratio for the wavelength range of 900 to 1,000 nm by using a spectrophotometer (marketed by KK Hitachi Seisakusho under the tradename of U-3410).

[0092] The electromagnetic shielding performance was measured by placing the specimen between two flanges of a coaxial waveguide converter (marketed by Nihon Koshuha KK under the tradename of TWC-S-024), and using a spectro-analyzer (marketed by YHP under the tradename of 8510B Vector Network Analyzer) at the frequency of 1 GHz.

[0093] The visible light transmission factor was measured as an average value of the transmission factor over the wavelength range of 400 to 800 nm by using a double beam spectro-photoanalyzer (marketed by KK Hitachi under the tradename of Type 200-10).

[0094] The invisibility was measured by placing the display device at the distance of 0.5 m, and evaluating if the geometric pattern of the electroconductive metallic material is visible or not. The specimens were graded into "very good", and "good" depending on the degree of invisibility, and "NG" when the pattern was visible.

[0095] The bonding property was measured by using a tensile strength testing machine (marketed by Toyo Baldwin KK under the tradename of Tensilon UTM-4-100) with the width of 10 mm, 90 degree direction and peeling speed of 50 mm/minute.

[0096] The refraction index was measured by using a refraction meter (marketed by KK Atago Kogaku Kikai Seisakusho under the tradename of Abbe refraction meter) at the temperature of 25 °C.

[0097] Comparative Examples #A1 and #A2 involve vapor deposition of ITO and A1, respectively, but ITO lacks the desired electromagnetic shielding property, and A1 lacks the desired visible light transmission factor. Comparative Example #A3 has a low visible light transmission factor with the broad line width of 50 µm, and a poor invisibility whereas the present invention features an aperture ratio of 80% or better, and a line width of 40 µm or less. Comparative Example #A4 has a low visible light transmission factor with the narrow line spacing of 150 µm similarly as Comparative Example #A3, and a poor invisibility whereas the present invention features an aperture ratio of 80% or better, and a line spacing of 200 µm or wider. Comparative Example #A5 has a poor invisibility with the line thickness of 70 µm whereas the present invention features an aperture ratio of 80% or better, and a line thickness of 40 µm or less. On the other hand, Examples #A1 to #A12 according to the present invention all demonstrate favorable electromagnetic shielding properties of 30 dB or better. The present invention also provides a visible light transmission factor of 68% or better, and a favorable invisibility. The initial bonding force and the bonding force after 1,000 hours of an aging test at 80 °C are sufficiently high, and the web appearance is also favorable.

[0098] As can be appreciated from the description of the above examples, the electromagnetic shielding bonding film of the present application can provide a favorable infrared blocking property, and its capability to closely attach to the object allows a high electromagnetic shielding performance without involving substantially any electromagnetic leakage. The present invention further provides favorable optical properties such as a high visible light transmission factor, and a favorable invisibility. The bonding film according to the present invention can maintain a superior bonding force even at high temperatures over an extended time period, and can be made available as web (or as a roll) without involving any visible defects such as creases. By using polyethylnene-terephthalate film for the plastic film, a highly transparent, heat-resistance, economical and easy handling electromagnetic shielding bonding film can be obtained. By using a layer of copper, aluminum or nickel having a thickness of 3 to 40 µm for the electroconductive metallic material layer, and making the surface of the layer facing the transparent plastic film into a coarse surface, a highly workable and economical electromagnetic shielding bonding film obtained. By using copper having at least its outer surface darkened, a fade-resistant and high-contrast electromagnetic shielding bonding film can be obtained. By using paramagnetic metal for the electroconductive metallic material, an electromagnetic shielding bonding film having a high electromagnetic shielding property can be obtained. When this electromagnetic shielding bonding film is applied to a display device, a display device having a favorable electromagnetic shielding property, a high visible light transmission factor, and a favorable invisibility, and capable of displaying clear images can be obtained.

< Example: Bonding Film #B1>

[0099] The plastic film consisted of transparent PET film having the thickness of 50 µm (refraction index n = 1,575). An electrolytic copper foil having the thickness of 18 µm was laminated thereover, by heating, under the condition of 180 °C and 2,94 x 10⁶ Pa (30 kgf/cm²), via an epoxy bonding sheet (marketed by Nikkan Kogyo KK under the tradename of Nikaflex, n=1.58), serving as a bonding layer, with the coarse surface of the copper foil facing the epoxy bonding sheet.

[0100] The obtained PET film laminated with copper foil is subjected to a photo-lithographic process (including the steps of resist film coating, photographic exposure, photographic development, chemical etching, and resist film removal), and a copper grid pattern having the line width of 25 µm and the line spacing of 500 µm was formed on the surface of the PET film to obtain Composition #B1. The visible light transmission factor of Composition #B1 was 20% or less. A bonding agent which is described hereinafter was applied over the surface of Composition #B1 carrying the geometric pattern to the dry thickness of approximately 40 µm, and after a drying process, Bonding Film #B1 having an electromagnetic shielding property and an optical transparency was obtained. An infrared blocking layer which is described hereinafter was applied to the surface of Bonding Film #B1 opposite to the surface carrying the bonding agent layer, to the dry thickness of approximately 5 µm. Thereafter, Bonding Film #B1 was applied over the surface of commercially available acrylic plate (marketed by KK Kurare under the tradename of Komoglass, thickness 3 mm) by using a roll laminator under the temperature and pressure condition of 110 °C and 1,96 x 10⁶ Pa 20 (kgf/cm²).

<Example: Bonding Film #B2>

[0101] Aluminum foil having the thickness of 25 µm was bonded over the surface of PET film having the thickness of 25 µm serving as the transparent base material via acrylic bonding film (marketed by DuPont under the tradename of Pyralux LF-0200, n=1.47). This assembly consisting of PET film laminated with aluminum foil is subjected to a photo-lithographic process similar to that for Bonding Film #B1, and an aluminum grid pattern having the line width of 25 µm and the line spacing of 250 µm was formed on the surface of the PET film to obtain. The visible light transmission factor of this assembly was 20% or less. A bonding agent which is described hereinafter was applied over the surface of this assembly carrying the geometric pattern to the dry thickness of approximately 30 µm, and after a drying process, Bonding Film #B2 having an electromagnetic shielding property and an optical transparency was obtained. An infrared blocking layer which is described hereinafter was applied to the surface of Bonding Film #B2 opposite to the surface carrying the bonding agent layer, to the dry thickness of approximately 1 µm. Thereafter, Bonding Film #B2 was applied over the surface of commercially available acrylic plate by using a thermal press under the temperature and pressure condition of 110 °C2,94 x 10⁶ Pa (30 kgf/cm²) and 30 minutes.

<Example: Bonding Film #B3>

[0102] Electroless nickel plating was applied over the surface of PET film having the thickness of 50 µm by using a mask so as to form a nickel grid pattern having the line width of 12 µm, the line spacing of 500 µm, and the thickness of 2 µm. The visible light transmission factor of this assembly was 20% or less. A bonding agent which is described hereinafter was applied over the surface of this assembly carrying the geometric pattern to the dry thickness of approximately 70 µm. An infrared blocking layer which is described hereinafter was applied to the surface of Bonding Film #B3 opposite to the surface carrying the bonding agent layer, to the dry thickness of approximately 3 µm Thereafter, Bonding Film #B3 was applied over the surface of commercially available acrylic plate by using a roll laminator under the temperature and pressure condition of 110 °C, 1,96 x 10⁶ Pa (20 kgf/cm²).

<Bonding Agent Composition #B1>

[0103] 

TBA-HME (Hitachi Kasei Kogyo KK; high polymer epoxy resin, Mw=300,000)	100 weight parts
YD-8125 (Toto Kasei Kogyo KK; bisphenol type A epoxy resin)	25 weight parts
IPDI (Hitachi Kasei Kogyo KK; mask isophorone-di-isocyanate)	12.5 weight parts
2-ethyl-4-methylimidazole	0.3 weight parts
MEK (methyl-ethyl-ketone)	330 weight parts
cyclohexanone	15 weight parts

[0104] The refraction index of this composition after drying the solvents was 1.57.

<Bonding Agent Composition #B2>

[0105] 

YP-30 (Toto Kasei KK, phenoxy resin, Mw=60,000)	100 weight parts
YD-8125 (Toto Kasei Kogyo KK; bisphenol type A epoxy resin)	10 weight parts
IPDI (Hitachi Kasei Kogyo KK; mask-isocyanate)	5 weight parts
2-ethyl-4-methylimidazole	0.3 weight parts
MEK	285 weight parts
cyclohexanone	5 weight parts

[0106] The refraction index of this composition after drying the solvents was 1.55.

<Bonding Agent Composition #B3>

[0107] 

HTR-600LB (Teikoku Kagaku Sangyo KK, polyacrylic acid ester, Mw=700,000)	100 weight parts
Colonate L (Nihon Polyurethane Kogyo KK, 3-functional isocyanate)	4.5 weight parts
dibutyl-tin laurate	0.4 weight parts
toluen	450 weight parts
ethylacetate	10 weight parts

[0108] The refraction index of this composition after drying the solvents was 1.47.

<Infrared Blocking Layer Composition #B1>

[0109] 

YD-8125 (Toto Kasei Kogyo KK; bisphenol type A epoxy resin)	100 weight parts
copper (II) sulfide (Wako Junyaku KK, crushed to an average particle diameter of 0.5 µm by using a Henschel mixer)	4 weight parts
2-ethyl-3-methylimidazol	0.5 weight parts
dicyandiamide	5 weight parts
MEK	200 weight parts
etyleneglycol-monomethyether	20 weight parts

[0110] The compound was applied with an applicator at room temperature, and was cured by heating at 90 °C for 30 minutes.

<Infrared Blocking Layer Composition #B2>

[0111] 

HTR-280 (Teikoku Kagaku Sangyo KK, polyacrylic acid ester copolymer, Mw=700,000)	100 weight parts
UFP-HX (Sumitomo Kinzoku Kozan KK, ITO, average particle diameter 0.1 µm)	0.5 weight parts
Colonate L	5 weight parts
dibutyl-tin laurate	0.4 weight parts
toluen	450 weight parts
ethylacetate	10 weight parts

[0112] The compound was applied with an applicator at room temperature, and was cured by heating at 90 °C for 20 minutes.

<Infrared Blocking Layer Composition #B3>

[0113] 

copper (II) sulfide (Wako Junyaku KK; crushed to the average particle diameter of 0.5 µm by using a Henschel mixer)

1 weight part

<Example #B1>

[0114] Example #B1 consists of shield plate which was prepared according to the procedure for preparing Bonding Film Composition #B1 by using Bonding Agent Composition #B1 and Infrared Blocking Layer Composition #B1.

<Example #B2>

[0115] Example #B2 consists of shield plate which was prepared according to the procedure for preparing Bonding Film Composition #B2 by using Bonding Agent Composition #B2 and Infrared Blocking Layer Composition #B1.

<Example #B3>

[0116] Example #B3 consists of shield plate which was prepared according to the procedure for preparing Bonding Film Composition #B3 by using Bonding Agent Composition #B3 and Infrared Blocking Layer Composition #B1.

<Example #B4>

[0117] Example #B4 consists of shielding plate which was identically prepared as Example #B1 except for that the line width was 35 µm instead of 25 µm and Infrared Blocking Layer Composition #B2 was used instead of #B1.

<Example #B5>

[0118] Example #B5 consists of shielding plate which was identically prepared as Example #B2 except for that the line width was 12 µm instead of 25 µm and Infrared Blocking Layer Composition #B2 was used instead of #B1.

<Example #B6>

[0119] Example #B6 consists of shielding plate which was identically prepared as Example #B3 except for that the line spacing was 800 µm instead of 500 µm and Infrared Blocking Layer Composition #B2 was used instead of #B1.

<Example #B7>

[0120] Example #B7 consists of shielding plate which was identically prepared as Example #B1 except for that the line spacing was 250 µm instead of 500 µm.

<Example #B8>

[0121] Example #B8 consists of shielding plate which was identically prepared as Example #B2 except for that the line thickness was 35 µm instead of 25 µm.

<Example #B9>

[0122] Example #B9 consists of shielding plate which was identically prepared as Example #B1 except for that the electroconductive material consisted of darkened copper and Infrared Blocking Layer Composition #B2 was used instead of #B1.

<Example #B10>

[0123] Example #B10 consists of shielding plate which was identically prepared as Example #B1 except for that the geometric pattern consisted of a repetition of a right triangle instead of the grid pattern of Example #B1 and Infrared Blocking Layer Composition #B2 was used instead of #B1.

<Example #B11>

[0124] Example #B11 consists of shielding plate which was identically prepared as Example #B1 except for that the geometric pattern consisted of a repetition of a right hexagon instead of the grid pattern of Example #B1 and one weight part of Infrared Blocking Layer Composition #B3 was dispersed in 100 weight parts of the bonding agent.

<Example #B12>

[0125] Example #B11 consists of shielding plate which was identically prepared as Example #B1 except for that the geometric pattern consisted of a repetition of a right octagon and a square instead of the grid pattern of Example #B1 and one weight part of Infrared Blocking Layer Composition #B3 was dispersed in 100 weight parts of the bonding agent.

<Comparative Example #B1>

[0126] PET film over which ITO film was vapor deposited to the thickness of 2,000 Å by vapor deposition, instead of the patterned copper foil, was used. Bonding Agent Composition #B1 was directly applied over the assembly without geometrically patterning the ITO film. Thereafter, shielding plate was prepared therefrom in the same way as Example #B1 without forming an infrared blocking layer to obtain Comparative Example #B1.

<Comparative Example #B2>

[0127] Transparent PET film serving as the transparent plastic base member, over which aluminum film was vapor deposited, was used. Bonding Agent Composition #B2 was directly applied over the surface of the assembly without geometrically patterning the aluminum film. Thereafter, shielding plate was prepared therefrom in the same way as Example #B1 to obtain Comparative Example #B2.

<Comparative Example #B3>

[0128] Comparative Example #B3 consisted of shielding plate which was prepared identically as the shielding plate of Example #B1 except for that the line width was 50 µm instead of 25 µm, and no infrared blocking layer was formed.

<Comparative Example #B4>

[0129] Comparative Example #B4 consisted of shielding plate which was prepared identically as the shielding plate of Example #B2 except for that the line spacing was 150 µm instead of 250 µm, and no infrared blocking layer was formed.

<Comparative Example #B5>

[0130] Comparative Example #B5 consisted of shielding plate which was prepared identically as the shielding plate of Example #B2 except for that the line thickness was 70 µm instead of 25 µm, and no infrared blocking layer was formed.

<Comparative Example #B6>

[0131] Comparative Example #B6 consisted of shielding plate which was prepared identically as the shielding plate of Example #B1 except for that phenol-formaldehyde (Mw=50,000, n=1.73) was used as the bonding agent, and no infrared blocking layer was formed.

<Comparative Example #B7>

[0132] Comparative Example #B7 consisted of shielding plate which was prepared identically as the shielding plate of Example #B3 except for that polydimethylsiloxane (Mw=45,000, n=1.43) was used as the bonding agent, and no infrared blocking layer was formed.

<Comparative Example #B8>

[0133] Comparative Example #B8 consisted of shielding plate which was prepared identically as the shielding plate of Example #B3 except for that polyvinylidenefluoride (Mw=120,000, n=1.42) was used as the bonding agent, and no infrared blocking layer was formed.

<Comparative Example #B9>

[0134] Comparative Example #B9 consisted of shielding plate which was prepared identically as the shielding plate of Example #B1 except for that polyethylene film containing a filler and having a thickness of 60 µm (with a visible light transmission factor of 20% or less) was used as the transparent plastic base member, and no infrared blocking layer was formed.

<Comparative Example #B10>

[0135] Comparative Example #B10 consisted of shielding plate which was prepared identically as the shielding plate of Example #B1 except for that the thickness of Infrared Blocking Layer Composition #B2 was 0.05 µm instead of 5 µm.

[0136] The infrared blocking ratio, EMI shielding performance, visible light transmission factor, invisibility, bonding property before and after heating, and fading property were actually measured, and the measured results are summarized in Tables 3 and 4.

[0137] The infrared blocking ratio was measured as an average value of the infrared absorption ratio for the wavelength range of 900 to 1,000 nm by using a spectrophotometer (marketed by KK Hitachi Seisakusho under the tradename of U-3410).

[0138] The EMI shielding performance was measured by placing the specimen between two flanges of a coaxial waveguide converter (marketed by Nihon Koshuha KK under the tradename of TWC-S-024), and using a spectro-analyzer (marketed by YHP under the tradename of 8510B Vector Network Analyzer) at the frequency of 1 GHz.

[0139] The visible light transmission factor was measured as an average value of the transmission factor over the wavelength range of 400 to 800 nm by using a double beam spectro-photoanalyzer (marketed by KK Hitachi under the tradename of Type 200-10).

[0140] The invisibility was measured by placing the display device at the distance of 0.5 m, and evaluating if the geometric pattern of the electroconductive metallic material is visible or not. The specimens were graded into "very good", and "good" depending on the degree of invisibility, and "NG" when the pattern was visible.

[0141] The bonding property was measured by using a tensile strength testing machine (marketed by Toyo Baldwin KK under the tradename of Tensilon UTM-4-100) with the width of 10 mm, 90 degree direction and peeling speed of 50 mm/minute.

[0142] The refraction index was measured by using a refraction meter (marketed by KK Atago Kogaku Kikai Seisakusho under the tradename of Abbe refraction meter) at the temperature of 25 °C.

[0143] As can be appreciated from the description of the examples, the bonding film having an electromagnetic shielding and infrared blocking property according to the present invention can have a superior infrared blocking capability, and can be applied very closely to the object so that a favorable EMI shielding performance can be achieved substantially without any electromagnetic leakage. The present invention can provide superior bonding film which has favorable optical properties in terms of visible light transmission factor and invisibility, and involves very little change in the bonding properties at high temperatures over an extended period of time. By using polyethylene-terephthalate film for the transparent plastic member, a highly transparent, heat-resistant, economical and easy handling bonding film having an electromagnetically shielding and infrared blocking property can be obtained.

[0144] By using a layer of copper, aluminum or nickel having a thickness of 3 to 40 µm for the electroconductive material layer, and making the surface of the layer facing the transparent plastic base member into a coarse surface, a highly workable and economical bonding film which has an electromagnetically shielding and infrared blocking property can be obtained.

[0145] By using copper having at least its outer surface darkened, a fade-resistant and high-contrast bonding film which has an electromagnetically shielding and infrared blocking property can be obtained. By geometrically patterning the electroconductive material over the transparent plastic base member with a chemical etching process, a highly workable bonding film which has an electromagnetically shielding and infrared blocking property can be obtained.

[0146] By using paramagnetic metal for the electroconductive material, a bonding film having a high EMI shielding and infrared blocking property which is effective in shielding a magnetic field can be obtained.

[0147] When this bonding film is applied to a display device and an electromagnetic shielding assembly, a high EMI shielding effect can be obtained, and it becomes possible to allow the display device to be viewed as if no such bonding film were used without increasing the display intensity by virtue of the high visible light transmission factor. Also, it is possible to avoid any faulty operation of electronic equipment which uses an infrared remote control such as VTR, CD and radio sets. Furthermore, because the geometric pattern of the electroconductive material is virtually invisible, the display device can be viewed without any unfamiliar impression.

< Example: Bonding Film #C1>

[0148] The plastic film consisted of transparent PET film having the thickness of 50 µm (refraction index n = 1,575). An electrolytic copper foil having the thickness of 18 µm was laminated thereover, by heating, under the condition of 180 °C and 30 kgf/cm², via an epoxy bonding sheet (marketed by Nikkan Kogyo KK under the tradename of Nikaflex, n=1.58), serving as a bonding layer, with the coarse surface of the copper foil facing the epoxy bonding sheet.

[0149] The obtained PET film laminated with copper foil is subjected to a photo-lithographic process (including the steps of resist film coating, photographic exposure, photographic development, chemical etching, and resist film removal), and a copper grid pattern having the line width of 25 µm and the line spacing of 500 µm was formed on the surface of the PET film to obtain Composition #C1. A bonding agent which is described hereinafter was applied over the surface of Composition #C1 to the dry thickness of approximately 40 µm, and after a drying process, Bonding Film #C1 having an electromagnetic shielding property and an optical transparency was obtained. Thereafter, Bonding Film #C1 was applied over the surface of commercially available acrylic plate (marketed by KK Kurare under the tradename of Komoglass, thickness 3 mm) by using a roll laminator under the temperature and pressure condition of 110 °C and 1,96 x 10⁶ Pa (20 kgf/cm²).

<Example: Bonding Film #C2>

[0150] Aluminum foil having the thickness of 25 µm was bonded over the surface of PET film having the thickness of 25 µm serving as the transparent base material via acrylic bonding film (marketed by DuPont under the tradename of Pyralux LF-0200, n=1.47) by using a roll laminator under the temperature and pressure condition of 170 °C and 1,96 x 10⁶ Pa (20 kgf/cm²). This assembly consisting of PET film laminated with aluminum foil is subjected to a photo-lithographic process similar to that for Bonding Film #C1, and an aluminum grid pattern having the line width of 25 µm and the line spacing of 250 µm was formed on the surface of the PET film to obtain Composition #C2. A bonding agent which is described hereinafter was applied over the surface of Composition #C2 to the dry thickness of approximately 30 µm, and after a drying process, Bonding Film #C2 having an electromagnetic shielding property and an optical transparency was obtained. Thereafter, Bonding Film #C2 was applied over the surface of commercially available acrylic plate by using a thermal press under the temperature and pressure condition of 110 °C, 2,94 x 10⁶ Pa (30 kgf/cm²) and 30 minutes.

<Example: Bonding Film #C3>

[0151] Electroless nickel plating serving as electroconductive material was applied over the surface of PET film having the thickness of 50 µm by using a mask so as to form a nickel grid pattern having the line width of 12 µm, the line spacing of 500 µm, and the thickness of 2 µm to obtain Composition #C3. A bonding agent which is described hereinafter was applied over the surface of Composition #C3 to the dry thickness of approximately 70 µm, and after a drying process, Bonding Film #C3 having an electromagnetic shielding property and an optical transparency was obtained. Thereafter, Bonding Film #C3 was applied over the surface of commercially available acrylic plate by using a roll laminator under the temperature and pressure condition of 110 °C, 1,96 x 10⁶ Pa (20 kgf/cm²) and 30 minutes.

<Bonding Agent Composition #C1>

[0152] 

TBA-HME (Hitachi Kasei Kogyo KK; high polymer epoxy resin, Mw=300,000)	100 weight parts
YD-8125 (Toto Kasei Kogyo KK; bisphenol type A epoxy resin)	25 weight parts
IPDI (Hitachi Kasei Kogyo KK; mask isophorone-di-isocyanate)	12.5 weight parts
2-ethyl-4-methylimidazole	0.3 weight parts
MEK (methyl-ethyl-ketone)	330 weight parts
cyclohexanone	15 weight parts

[0153] The bonding agent composition was dissolved in MEK and cyclohexanone to obtain a varnish of Bonding Agent Composition #C1.

[0154] The bonding agent composition was dissolved in MEK and cyclohexanone to obtain a varnish of Bonding Agent Composition #C1. This varnish was allowed to freely extend over the surface of a glass sheet, and the film obtained after heating and drying had a refraction index of 1.57.

<Bonding Agent Composition #C2>

[0155] 

YP-30 (Toto Kasei KK, phenoxy resin, Mw=60,000)	100 weight parts
YD-8125 (Toto Kasei Kogyo KK; bisphenol type A epoxy resin)	10 weight parts
IPDI (Hitachi Kasei Kogyo KK; mask-isophorone-di-isocyanate)	5 weight parts
2-ethyl-4-methylimidazole	0.3 weight parts
MEK	285 weight parts
cyclohexanone	5 weight parts

[0156] The bonding agent composition was dissolved in MEK and cyclohexanone to obtain a varnish of Bonding Agent Composition #C2. This varnish was allowed to freely extend over the surface of a glass sheet, and the film obtained after heating and drying had a refraction index of 1.55.

<Bonding Agent Composition #C3>

[0157] 

HTR-600LB (Teikoku Kagaku Sangyo KK, polyacrylic acid ester, Mw=700,000)	100 weight parts
Colonate L (Nihon Polyurethane Kogyo KK, 3-functional isocyanate)	4.5 weight parts
dibutyl-tin laurate	0.4 weight parts
toluen	450 weight parts
ethylacetate	10 weight parts

[0158] The bonding agent composition was dissolved in tolune and ethylacetate to obtain a varnish of Bonding Agent Composition #C3. This varnish was allowed to freely extend over the surface of a glass sheet, and the film obtained after heating and drying had a refraction index of 1.47.

<Example #C1>

[0159] Example #C1 consists of bonding film which was prepared according to the procedure for preparing Bonding Film Composition #C1 by using Bonding Agent Composition #C1.

<Example #C2>

[0160] Example #C2 consists of bonding film which was prepared according to the procedure for preparing Bonding Film Composition #C2 by using Bonding Agent Composition #C2.

<Example #C3>

[0161] Example #C3 consists of bonding film which was prepared according to the procedure for preparing Bonding Film Composition #C3 by using Bonding Agent Composition #C3.

<Example #C4>

[0162] Example #C4 consists of bonding film which was identically prepared as Example #C1 except for that the line width was 35 µm instead of 25 µm.

<Example #C5>

[0163] Example #C5 consists of bonding film which was identically prepared as Example #C2 except for that the line width was 12 µm instead of 25 µm.

<Example #C6>

[0164] Example #C6 consists of bonding film which was identically prepared as Example #C3 except for that the line spacing was 800 µm instead of 500 µm.

<Example #C7>

[0165] Example #C7 consists of bonding film which was identically prepared as Example #C1 except for that the line spacing was 250 µm instead of 500 µm.

<Example #C8>

[0166] Example #C8 consists of bonding film which was identically prepared as Example #C2 except for that the line thickness was 35 µm instead of 25 µm.

<Example #C9>

[0167] Example #C9 consists of bonding film which was identically prepared as Example #C1 except for that the electroconductive material consisted of darkened copper.

<Example #C10>

[0168] Example #C10 consists of bonding film which was identically prepared as Example #C1 except for that the geometric pattern consisted of a repetition of a right triangle instead of the grid pattern of Example #C1.

<Example #C11>

[0169] Example #C11 consists of bonding film which was identically prepared as Example #C1 except for that the geometric pattern consisted of a repetition of a right hexagon instead of the grid pattern of Example #C1.

<Example #C12>

[0170] Example #C11 consists of bonding film which was identically prepared as Example #C1 except for that the geometric pattern consisted of a repetition of a right octagon and a square instead of the grid pattern of Example #C1.

<Comparative Example #C1>

[0171] PET film over which ITO film was vapor deposited to the thickness of 2,000 Å by vapor deposition, instead of the patterned copper foil, was used. A bonding agent was directly applied over the assembly without geometrically patterning the ITO film. Thereafter, bonding film was prepared therefrom in the same way as Example #C1 to obtain Comparative Example #C1.

<Comparative Example #C2>

[0172] Transparent PET film serving as the transparent plastic base member, over which aluminum film serving as the electroconductive material was vapor deposited to the thickness of 2,000 Å, was used. Bonding Agent Composition #C2 was directly applied over the surface of the assembly without geometrically patterning the aluminum film. Thereafter, bonding film was prepared therefrom in the same way as Example #C1 to obtain Comparative Example #C2.

<Comparative Example #C3>

[0173] Comparative Example #C3 consisted of bonding film which was prepared identically as the bonding film of Example #C1 except for that the line width was 50 µm instead of 25 µm.

<Comparative Example #C4>

[0174] Comparative Example #C4 consisted of bonding film which was prepared identically as the bonding film of Example #C2 except for that the line spacing was 150 µm instead of 250 µm.

<Comparative Example #C5>

[0175] Comparative Example #C5 consisted of bonding film which was prepared identically as the bonding film of Example #C2 except for that the line thickness was 70 µm instead of 25 µm.

<Comparative Example #C6>

[0176] Comparative Example #C6 consisted of bonding film which was prepared identically as the bonding film of Example #C1 except for that phenol-formaldehyde (Mw=50,000, n=1.73) was used as the bonding agent.

<Comparative Example #C7>

[0177] Comparative Example #C7 consisted of bonding film which was prepared identically as the bonding film of Example #C3 except for that polydimethylsiloxane (Mw=45,000, n=1.43) was used as the bonding agent.

<Comparative Example #C8>

[0178] Comparative Example #C8 consisted of bonding film which was prepared identically as the bonding film of Example #C3 except for that polyvinylidenefluoride (Mw=120,000, n=1.42) was used as the bonding agent.

<Comparative Example #C9>

[0179] Comparative Example #C9 consisted of bonding film which was prepared identically as the bonding film of Example #C1 except for that polyethylene film containing a filler and having a thickness of 60 µm (with a visible light transmission factor of 20% or less) was used as the transparent plastic base member.

[0180] The EMI shielding performance, visible light transmission factor, invisibility, bonding property before and after heating, and fading property were actually measured, and the measured results are summarized in Tables 5 and 6.

[0181] The EMI shielding performance was measured by placing the specimen between two flanges of a coaxial waveguide converter (marketed by Nihon Koshuha KK under the tradename of TWC-S-024), and using a spectro-analyzer (marketed by YHP under the tradename of 8510B Vector Network Analyzer) at the frequency of 1 GHz.

[0182] The visible light transmission factor was measured as an average value of the transmission factor over the wavelength range of 400 to 800 nm by using a double beam spectro-photoanalyzer (marketed by KK Hitachi under the tradename of Type 200-10).

[0183] The invisibility was measured by placing the display device at the distance of 0.5 m, and evaluating if the geometric pattern of the electroconductive metallic material is visible or not. The specimens were graded into "very good", and "good" depending on the degree of invisibility, and "NG" when the pattern was visible.

[0184] The bonding property was measured by using a tensile strength testing machine (marketed by Toyo Baldwin KK under the tradename of Tensilon UTM-4-100) with the width of 10 mm, 90 degree direction and peeling speed of 50 mm/minute.

[0185] The refraction index was measured by using a refraction meter (marketed by KK Atago Kogaku Kikai Seisakusho under the tradename of Abbe refraction meter) at the temperature of 25 °C.

[0186] As can be appreciated from the description of the examples, the bonding film having an electromagnetic shielding and optically transparent property according to the present invention can be applied very closely to the object so that a favorable EMI shielding performance can be achieved substantially without any electromagnetic leakage. The present invention can provide superior bonding film which has favorable optical properties in terms of visible light transmission factor and invisibility, and involves very little change in the bonding properties at high temperatures over an extended period of time. By using polyethylene-terephthalate film for the transparent plastic member, a highly transparent, heat-resistant, economical and easy handling bonding film having an electromagnetically shielding and optically transparent property can be obtained.

[0187] By using a layer of copper, aluminum or nickel having a thickness of 3 to 40 µm for the electroconductive material layer, and making the surface of the layer facing the transparent plastic base member into a coarse surface, a highly workable and economical bonding film which has an electromagnetically shielding and optically transparent property can be obtained.

[0188] By using copper having at least its outer surface darkened, a fade-resistant and high-contrast bonding film which has an electromagnetically shielding and optically transparent property can be obtained. By geometrically patterning the electroconductive material over the transparent plastic base member with a chemical etching process, a highly workable bonding film which has an electromagnetically shielding and optically transparent property can be obtained.

[0189] By using paramagnetic metal for the electroconductive material, a bonding film having a high EMI shielding and infrared blocking property which is effective in shielding a magnetic field can be obtained.

[0190] When this bonding film is applied to a display device and an electromagnetic shielding assembly, a high EMI shielding effect can be obtained, and it becomes possible to allow the display device to be viewed as if no such bonding film were used without increasing the display intensity by virtue of the high visible light transmission factor. Furthermore, because the geometric pattern of the electroconductive material is virtually invisible, the display device can be viewed without any unfamiliar impression.

< Example: Bonding Film #D1>

[0191] The transparent plastic base sheet consisted of transparent PET film having the thickness of 50 µm (refraction index n = 1,575). An electrolytic copper foil having the thickness of 12 µm was laminated thereover, by heating, under the condition of 180 °C and 2,94 x 10⁶ Pa (30 kgf/cm²), via an epoxy bonding film (marketed by Nikkan Kogyo KK under the tradename of Nikaflex, n=1.58), serving as a bonding layer, with the coarse surface of the copper foil facing the epoxy bonding film.

[0192] The obtained PET film laminated with copper foil is subjected to a photo-lithographic process (including the steps of resist film coating, photographic exposure, photographic development, chemical etching, and resist film removal), and a copper grid pattern having the line width of 25 µm and the line spacing of 1 mm was formed on the surface of the PET film to obtain Composition #D1. The visible light transmission factor of Composition #D1 was 20% or less. A bonding agent which is described hereinafter was applied over the surface of Composition #D1 to the dry thickness of approximately 20 µm, and after a drying process, Bonding Film #D1 was obtained. Thereafter, a pair commercially available acrylic plates (marketed by KK Kurare under the tradename of Komoglass, thickness 1 mm) were laminated over either side of Bonding Film #D1 by using a roll laminator under the temperature and pressure condition of 110 °C and 1,96 x 10⁶ Pa (20 kgf/cm²) to obtain electromagnetic shielding material.

<Example: Bonding Film #D2>

[0193] Copper foil having the thickness of 12 µm was bonded over the surface of PET film having the thickness of 25 µm serving as the transparent base material via acrylic bonding film (marketed by DuPont under the tradename of Pyralux LF-0200, n=1.47, thickness 20 µm). This assembly consisting of PET film laminated with copper foil is subjected to a photo-lithographic process similar to that for Bonding Film #D1, and an copper grid pattern having the line width of 15 µm and the line spacing of 2.0 mm was formed on the surface of the PET film to obtain Composition #D2. The visible light transmission factor of Composition #D2 was 20% or less. A bonding agent which is described hereinafter was applied over the surface of Composition #D2 carrying the geometric pattern to the dry thickness of approximately 30 µm, and was dried. Then, the bonding agent which is described hereinafter was applied to the other surface of the Composition #D2 to the dry thickness of approximately 20 µm to obtain Bonding Film #D2. Thereafter, a pair of commercially available acrylic plates (marketed by KK Kurare under the tradename of Komoglass, thickness 1.5 mm) were laminated over either side of Bonding Film #D2 by using a press under the temperature and pressure condition of 110 °C and 2,94 x 10⁶ Pa (30 kgf/cm²) to obtain electromagnetic shielding material.

<Example: Bonding Film #D3>

[0194] Electroless nickel plating was applied over the surface of PET film having the thickness of 50 µm by using a mask so as to form a nickel grid pattern having the line width of 10 µm, the line spacing of 1.0 mm, and the thickness of 3 µm to obtain Composition #D3. The visible light transmission factor of Composition #D3 was 20% or less. A bonding agent which is described hereinafter was applied over the surface of Composition #D3 carrying the gemeotrically patterned nickel layer to the dry thickness of approximately 30 µm, and was dried. Then, the bonding agent which is described hereinafter was applied to the other surface of the Composition #D2 to the dry thickness of approximately 20 µm to obtain Bonding Film #D3. Thereafter, a pair of commercially available acrylic plates (marketed by KK Kurare under the tradename of Komoglass, thickness 1.5 mm) were laminated over either side of Bonding Film #D3 by using a press under the temperature and pressure condition of 110 °C and 1,96 x 10⁶ Pa (20 kgf/cm²) to obtain electromagnetic shielding material.

<Bonding Agent Composition #D1>

[0195] 

TBA-HME (Hitachi Kasei Kogyo KK; high polymer epoxy resin, Mw=300,000)	100 weight parts
YD-8125 (Toto Kasei Kogyo KK; bisphenol type A epoxy resin)	25 weight parts
IPDI (Hitachi Kasei Kogyo KK; mask isophorone-di-isocyanate)	12.5 weight parts
2-ethyl-4-methylimidazole	0.3 weight parts
MEK (methyl-ethyl-ketone)	330 weight parts
cyclohexanone	15 weight parts

[0196] The refraction index of Bonding Agent Composition #D1 after drying the solvents was 1.57.

<Bonding Agent Composition #D2>

[0197] 

YP-30 (Toto Kasei KK, phenoxy resin, Mw=60,000)	100 weight parts
YD-8125 (Toto Kasei Kogyo KK; bisphenol type A epoxy resin)	10 weight parts
IPDI (Hitachi Kasei Kogyo KK; mask-isophorone-di-isocyanate)	5 weight parts
2-ethyl-4-methylimidazole	0.3 weight parts
MEK	285 weight parts
cyclohexanone	5 weight parts

[0198] The refraction index of Bonding Agent Composition #D2 after drying the solvents was 1.55.

<Bonding Agent Composition #D3>

[0199] 

HTR-600LB (Teikoku Kagaku Sangyo KK, polyacrylic acid ester, Mw=700,000)	100 weight parts
Colonate L (Nihon Polyurethane Kogyo KK, 3-functional isocyanate)	4.5 weight parts
dibutyl-tin laurate	0.4 weight parts
toluen	450 weight parts
ethylacetate	10 weight parts

[0200] The refraction index of Bonding Agent Composition #D2 after drying the solvents was 1.47.

<Example #D1>

[0201] Example #D1 consists of electromagnetic shielding material which was prepared according to the procedure for preparing Bonding Film #D1 by using Bonding Agent Composition #D1.

<Example #D2>

[0202] Example #D2 consists of electromagnetic shielding material which was prepared according to the procedure for preparing Bonding Film #D2 by using Bonding Agent Composition #D2.

<Example #D3>

[0203] Example #D3 consists of electromagnetic shielding material which was prepared according to the procedure for preparing Bonding Film #D3 by using Bonding Agent Composition #D3.

<Example #D4>

[0204] Example #D4 consists of electromagnetic shielding material which was identically prepared as Example #D1 except for that the line width was 9 µm instead of 20 µm.

<Example #D5>

[0205] Example #D5 consists of electromagnetic shielding material which was identically prepared as Example #D2 except for that the line width was 12 µm instead of 15 µm.

<Example #D6>

[0206] Example #D6 consists of electromagnetic shielding material which was identically prepared as Example #D3 except for that the line spacing was 0.5 µm instead of 1.0 mm.

<Example #D7>

[0207] Example #D7 consists of electromagnetic shielding material which was identically prepared as Example #D1 except for that the line spacing was 5.0 mm instead of 1.0 mm.

<Example #D8>

[0208] Example #D8 consists of electromagnetic shielding material which was identically prepared as Example #D2 except for that the line thickness was 18 µm instead of 12 µm.

<Example #D9>

[0209] Example #D9 consists of electromagnetic shielding material which was identically prepared as Example #D1 except for that the electroconductive material consisted of darkened copper.

<Example #D10>

[0210] Example #D10 consists of electromagnetic shielding material which was identically prepared as Example #D1 except for that the geometric pattern of copper foil consisted of a repetition of a right triangle instead of the grid pattern of Example #D1.

<Example #D11>

[0211] Example #D11 consists of electromagnetic shielding material which was identically prepared as Example #D2 except for that the geometric pattern consisted of a repetition of a right hexagon instead of the copper grid pattern of Example #D2.

<Example #D12>

[0212] Example #D12 consists of electromagnetic shielding material which was identically prepared as Example #D3 except for that the geometric pattern consisted of a repetition of a right octagon and a square instead of the nickel grid pattern of Example #D3.

<Example #D13>

[0213] Example #D13 consists of electromagnetic shielding material which was identically prepared as Example #D1 except for that the plastic base member consisted of polysulfone (50 µm, n=1.633) instead of PET.

<Comparative Example #D1>

[0214] PET film over which ITO film was vapor deposited to the thickness of 2,000 Å by vapor deposition, instead of the patterned copper foil, was used. Bonding Agent Composition #D1 was directly applied over the two sides of the assembly without geometrically patterning the ITO film. Thereafter, electromagnetic shielding material was prepared therefrom in the same way as Example #D1 to obtain Comparative Example #D1.

<Comparative Example #D2>

[0215] Transparent PET film having aluminum film entirely vapor deposited on one surface thereof was used without any geometric patterning. Bonding Agent Composition #D2 was directly applied over the two sides of the assembly. Thereafter, electromagnetic shielding material was prepared therefrom in the same way as Example #D1 to obtain Comparative Example #D2.

<Comparative Example #D3>

[0216] Comparative Example #D3 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #D1 except for that the line width was 50 µm instead of 20 µm.

<Comparative Example #D4>

[0217] Comparative Example #D4 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #D2 except for that the line spacing was 0.25 mm instead of 2.0 mm.

<Comparative Example #D5>

[0218] Comparative Example #D5 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #D2 except for that the line thickness was 70 µm instead of 12 µm.

<Comparative Example #D6>

[0219] Comparative Example #D6 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #D2 except for that polyethylene film containing a filler (with a visible transmission factor of 20% or less) was used for the transparent plastic film.

<Comparative Example #D7>

[0220] An assembly was prepared by applying Bonding Agent Composition #D1 only on the surface of the Composition #D1 carrying the electroconductive material according to the procedure for preparing Example 1 to the dry thickness of 30 µm, and, after drying Bonding Agent Composition #D1, was attached to an acrylic plate having the thickness of 2.0 mm instead of the acrylic plate of Example #D1.

<Comparative Example #D8>

[0221] A pair of acrylic plates were used instead of the acrylic plates of Example 2, and the thickness of the upper plate was 1.5 mm while that of the lower plate was 1.0 mm.

<Reference Example #D1>

[0222] Reference Example #D1 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #D1 except for that phenol-formaldehyde resin (Mw=50,000, n=1.73) was used as the bonding agent

< Reference Example #D2>

[0223] Reference Example #D2 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #D3 except for that polydimethylsiloxane (Mw=45,000, n=1.43) was used as the bonding agent.

< Reference Example #D3>

[0224] Reference Example #D3 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #D3 except for that polyvinylidenefluoride (Mw=120,000, n=1.42) was used as the bonding agent.

[0225] The EMI shielding performance, visible light transmission factor, warp-resistance, invisibility, optical distorsion, bonding property before and after heating, and fading property of the thus obtained electromagnetic shielding material were actually measured, and the measured results are summarized in Tables 7 and 8.

[0226] The EMI shielding performance was measured by placing the specimen between two flanges of a coaxial waveguide converter (marketed by Nihon Koshuha KK under the tradename of TWC-S-024), and using a spectro-analyzer (marketed by YHP under the tradename of 8510B Vector Network Analyzer) at the frequency of 1 GHz.

[0227] The visible light transmission factor was measured as an average value of the transmission factor over the wavelength range of 400 to 800 nm by using a double beam spectro-photoanalyzer (marketed by KK Hitachi under the tradename of Type 200-10).

[0228] The invisibility and optical distorsion were measured by placing the display device at the distance of 0.5 m, and evaluating if the geometric pattern of the electroconductive metallic material is visible or not, and if the image is distorted or not. The specimens were graded into "very good", and "good" depending on the degree of invisibility, and "NG" when the pattern was visible, and into "NG" and "good" depending on the presence of any detectable image distorsion.

[0229] The bonding property was measured by using a tensile strength testing machine (marketed by Toyo Baldwin KK under the tradename of Tensilon UTM-4-100) with the width of 10 mm, 90 degree direction and peeling speed of 50 mm/minute.

[0230] The refraction index was measured by using a refraction meter (marketed by KK Atago Kogaku Kikai Seisakusho under the tradename of Abbe refraction meter) at the temperature of 25 °C.

[0231] Comparative Examples #D1 and #D2 used vapor deposited ITO and Al, respectively, as the electroconductive material. ITO lacks a favorable electromagnetic shielding property, and Al lacks a favorable visible light transmission factor. Comparative Example #D3 lacked a favorable visible light transmission factor and invisibility because the line width was 50 µm which is substantially larger than the upper limit of 25 µm which is required by the present invention. Similarly as Comparative Example #D3, Comparative Example #D4 lacked a favorable visible light transmission factor and invisibility because the line spacing was 250 µm which is substantially narrower than the lower limit of 500 µm which is required by the present invention. Comparative Example #D5 lacked a favorable invisibility because the line thickness was 70 µm which is substantially larger than the upper limit of 18 µm which is required by the present invention. Comparative Example #D6 had a poor visible light transmission factor of 20% or less because fairly opaque polyethylene film containing a filler (having a visible light transmission factor of 20% or less) was used instead of the transparent plastic film. Comparative Example #D7 had an undesired tendency to warp because the transparent plastic film was attached only to one side of the transparent plastic base sheet instead of attaching a pair of transparent plastic base sheet onto either side of the transparent plastic film each via a bonding agent layer. Comparative Example #D8 had an undesired tendency to warp because a pair of transparent plastic base sheets having unequal thicknesses were attached to either side of the transparent plastic film each via a bonding agent layer. On the other hand, the electromagnetic shielding material of Examples #D1 to #D13 according to the present invention features a pair of transparent plastic base sheets attached to either side of the transparent plastic film each via a bonding agent layer and has a favorable electromagnetic shielding performance of 33 dB or more. According to the present invention, the visible transmission factor is 66% or better, and a favorable invisibility can be achieved. Also, the initial bonding force is large and the bonding force drops very little even after 1,000 hours of aging test at 80 °C. Also, the electromagnetic shielding material according to the present invention does not tend to warp. If the difference in refraction index between the bonding agent and the transparent plastic film or between the two bonding agents exceeds 0.14 as was the case with Reference Examples #D1 to #D3.

[0232] As can be appreciated from the description of the examples, the electromagnetic shielding material according to the present invention can have a high electromagnetic shielding property, free from leakage of electromagnetic radiation, and favorable optical properties in terms of visible light transmission factor, invisibility, and absence of distortion. It also is free from warping, and involves very little change in the optical properties at high temperatures over an extended period of time. By using polyethylene-terephthalate film for the transparent plastic film, a highly transparent, heat-resistant, economical and easy handling electromagnetic shielding material can be obtained.

[0233] By using a layer of copper, aluminum or nickel having a thickness of 3 to 18 µm for the electroconductive material layer, a highly workable and economical electromagnetic shielding material which additionally provides a wide viewing angle can be obtained.

[0234] By using copper having at least its outer surface darkened, a fade-resistant and high-contrast electromagnetic shielding material can be obtained. By geometrically patterning the electroconductive material over the transparent plastic base member with a chemical etching process, a highly workable electromagnetic shielding material can be obtained.

[0235] By using paramagnetic metal for the electroconductive material, a electromagnetic shielding material which is effective in shielding a magnetic field can be obtained. By using PMMA for the transparent plastic base sheet, a highly transparent and workable electromagnetic shielding material can be obtained. By selecting the materials such that the difference in refraction index between the transparent plastic base sheet and the bonding layer is 0.14 or less, a highly transparent electromagnetic shielding material can be obtained. When this electromagnetic shielding material is applied to a display device, a high EMI shielding effect can be obtained, and it becomes possible to allow the display device to be viewed comfortably with a high visible light transmission factor and a favorable invisibility.

< Surface Processed Film #E1>

[0236] ZrO₂ was vacuum deposited with the electron beam heating method, under the vacuum condition of 133,32 to 266,64 x 10^-4 Pa (1 to 2 × 10^-4 Torr), onto the surface of polyethylene-terephthalate (PET) film having the thickness of 50 µm and the refraction index of 1.575, and ZrO₂ thin film having the thickness of approximately 650 Å and the refraction index of 2.05 was obtained. Additionally, SiO₄ thin film having the thickness of approximately 940 Å and the refraction index of 1.46 was formed over the ZrO₂ thin film with the electron beam heating method under the same condition to obtain Surface Processed Film #E1.

< Surface Processed Film #E2>

[0237] A bonding composition, consisting of 100 weight parts of YP-30 (marketed by Toto Kasei KK, Mw=60,000) consisting of phenoxy resin, 10 weight parts of YD-8125 (marketed by Toto Kasei Kogyo KK) consisting of bisphenol type A epoxy resin, 5 weight parts of IPDI (marketed by Hitachi Kasei Kogyo KK, mask-iisophorone-di-isocyanate; mask-isocyanate), 0.3 weight parts of a curing promoting agent consisting of 2-ethyl-4-methylimidazole, and 285 weight parts of methylethylketone (MEK) serving as a solvent, was mixed well with 20 weight parts of MEK dispersed coloidal silicasol (marketed by Nissan Kagaku Kogyo KK) and 0.05 weight parts of a silicone surface reactant by using a homogenizer. This composition was applied over the surface of tranparent PET film having the thickness of 25 µm to the dry thickness of 2 µm by using an applicator to obtain Surface Processed Film #E2.

<Electromagnetic Shielding Film #E1>

[0238] By using Surface Processed Film #E1 for the transparent plastic film, an electrolytic copper foil having the thickness of 12 µm was laminated the transparent plastic film, by heating, under the condition of 180 °C and 2,94 x 10⁶ Pa (30 kgf/cm²), via an epoxy bonding film (marketed by Nikkan Kogyo KK under the tradename of Nikaflex, n=1.58, thickness 20 µm), serving as a bonding layer, with the coarse surface of the copper foil facing the epoxy bonding film under the temperature and pressure condition of 180 °C and 2,94 x 10⁶ Pa (30 kgf/cm²). The obtained PET film laminated with copper foil is subjected to a photo-lithographic process (including the steps of resist film coating, photographic exposure, photographic development, chemical etching, and resist film removal), and a copper grid pattern having the line width of 20 µm and the line spacing of 1.0 mm was formed on the surface of the PET film to obtain Electromagnetic Shielding Film #E1.

<Electromagnetic Shielding Film #E2>

[0239] By using Surface Processed Film #E2 for the transparent plastic film, copper foil having the thickness of 12 µm was bonded over the surface of the transparent plastic film via acrylic bonding film (marketed by DuPont under the tradename of Pyralux LF-0200, n=1.47, thickness 20 µm). This assembly consisting of PET film laminated with copper foil is subjected to a photo-lithographic process similar to that for Electromagnetic Shielding Film #E1, and an copper grid pattern having the line width of 15 µm and the line spacing of 2.0 mm was formed on the surface of the PET film to obtain Electromagnetic Shielding Film #E2.

<Electromagnetic Shielding Film #E3>

[0240] By using Surface Processed Film #E2 for the transparent plastic film, electroless nickel plating was applied over the surface of the transparent plastic film by using a mask so as to form a nickel grid pattern having the line width of 10 µm, the line spacing of 1.0 mm, and the thickness of 3 µm to obtain Electromagnetic Shielding Film #E3

<Electromagnetic Shielding Film #E4>

[0241] The geometrically electroconductive material formed on Electromagnetic Shielding Film #E1 was covered by a bonding agent composition which is described hereinafter to the dry thickness of 30 µm.

<Bonding Agent Composition #E1>

[0242] 

TBA-HME (Hitachi Kasei Kogyo KK; high polymer epoxy resin, Mw=300,000)	100 weight parts
YD-8125 (Toto Kasei Kogyo KK; bisphenol type A epoxy resin)	25 weight parts
IPDI (Hitachi Kasei Kogyo KK; mask-isocyanate)	12.5 weight parts
2-ethyl-4-methylimidazole	0.3 weight parts
MEK (methyl-ethyl-ketone)	330 weight parts
cyclohexanone	15 weight parts

[0243] The refraction index of Bonding Agent Composition #E1 after drying the solvents was 1.57.

<Bonding Agent Composition #E2>

[0244] 

YP-30 (Toto Kasei KK, phenoxy resin, Mw=60,000)	100 weight parts
YD-8125 (Toto Kasei Kogyo KK; bisphenol type A epoxy resin)	10 weight parts
IPDI (Hitachi Kasei Kogyo KK; mask-isophorone-di-isocyanate)	5 weight parts
2-ethyl-4-methylimidazole	0.3 weight parts
MEK	285 weight parts
cyclohexanone	5 weight parts

[0245] The refraction index of Bonding Agent Composition #E2 after drying the solvents was 1.55.

<Bonding Agent Composition #E3>

[0246] 

HTR-600LB (Teikoku Kagaku Sangyo KK, polyacrylic acid ester, Mw=700,000)	100 weight parts
Colonate L (Nihon Polyurethane Kogyo KK, 3-functional isocyanate)	4.5 weight parts
dibutyl-tin laurate	0.4 weight parts
toluen	450 weight parts
ethylacetate	10 weight parts

[0247] The refraction index of Bonding Agent Composition #E2 after drying the solvents was 1.47.

<Infrared Blocking Layer Composition #E1>

[0248] 

YD-8125 (Toto Kasei Kogyo KK; bisphenol type A epoxy resin)	100 weight parts
copper (II) sulfide (Wako Junyaku KK, crushed to an average particle diameter of 0.5µm by using a Henschel mixer)	4 weight parts
2-ethyl-3-methylimidazol	0.5 weight parts
dicyandiamide	5 weight parts
MEK	200 weight parts
etyleneglycol-monomethyether	20 weight parts

[0249] The compound was applied with an applicator at room temperature, and was cured by heating at 90 °C for 30 minutes.

<Infrared Blocking Layer Composition #E2>

[0250] 

HTR-280 (Teikoku Kagaku Sangyo KK, polyacrylic acid ester copolymer, Mw=700,000)	100 weight parts
UFP-HX (Sumitomo Kinzoku Kozan KK, ITO, average particle diameter 0.1 µm)	0.5 weight parts
Colonate L (Nihon Polyurethane Kogyo KK, 3-functional isocyanate)	5 weight parts
dibutyl-tin laurate	0.4 weight parts
toluen	450 weight parts
ethylacetate	10 weight parts

[0251] The compound was applied with an applicator at room temperature, and was cured by heating at 90 °C for 30 minutes.

<Infrared Blocking Layer Composition #E3>

[0252] 

YP-30 (Toto Kasei KK, phenoxy resin, Mw=60,000)	100 weight parts
YD-8125 (Toto Kasei Kogyo KK; bisphenol type A epoxy resin)	10 weight parts
IPDI (Hitachi Kasei Kogyo KK; mask-isocyanate)	5 weight parts
MEK	285 weight parts
IRG-022 (Nihon Kayaku KK, aromatic di-imonium salt)	1 weight part

[0253] The compound was applied with an applicator at room temperature, and was cured by heating at 90 °C for 30 minutes.

<Example #E1>

[0254] Electromagnetic Shielding Film #E1 and the bonding film obtained by applying Bonding Agent Composition #E1 over the surface of transparent PET film having the thickness of 50 µm to the dry thickness of approximately 20 µm and drying the assembly were bonded over two sides of a commercially available acrylic plate (marketed by KK Kurare under the tradename of Komoglass, thickness 1 mm) by using a roll laminator under the temperature and pressure condition of 110 °C and 1,96 x 10⁶ Pa (20 kgf/cm²) to obtain electromagnetic shielding material of Example #E1.

<Example #E2>

[0255] Electromagnetic Shielding Film #E2 and the bonding film obtained by applying Bonding Agent Composition #E2 over the surface of transparent PET film having the thickness of 50 µm to the dry thickness of approximately 20 µm and drying the assembly were bonded over two sides of a commercially available acrylic plate (marketed by KK Kurare under the tradename of Komoglass, thickness 1 mm) by using a roll laminator under the temperature and pressure condition of 110 °C and 9,81 x 10⁵ Pa (10 kgf/cm²) to obtain electromagnetic shielding material of Example #E2.

<Example #E3>

[0256] Example #E3 consisted of electromagnetic shielding material which was prepared in the same way as Example #E1 except for that Electromagnetic Shielding Film #E3 was used.

<Example #E4>

[0257] Electromagnetic Shielding Film #E4 covered by Bonding Agent Composition #E3 and the bonding film obtained by applying Bonding Agent Composition #E3 over the surface of transparent PET film having the thickness of 50 µm to the dry thickness of approximately 20 µm and drying the assembly were bonded over two sides of a commercially available acrylic plate (marketed by KK Kurare under the tradename of Komoglass, thickness 1 mm) by using a roll laminator under the temperature and pressure condition of 110 °C and 1,96 x 10⁶ Pa (20 kgf/cm²) to obtain electromagnetic shielding material of Example #E4.

<Example #E5>

[0258] Example #E5 consists of electromagnetic shielding material which was identically prepared as Example #E1 except for that the line width was 12 µm instead of 20 µm.

<Example #E6>

[0259] Example #E6 consists of electromagnetic shielding material which was identically prepared as Example #E2 except for that the line spacing was 0.5 mm instead of 2.0 mm.

<Example #E7>

[0260] Example #E7 consists of electromagnetic shielding material which was identically prepared as Example #E4 except for that the line spacing was 5.0 mm instead of 1.0 mm.

<Example #E8>

[0261] Example #E8 consists of electromagnetic shielding material which was identically prepared as Example #E2 except for that the line thickness was 18 µm instead of 12 µm.

<Example #E9>

[0262] Example #E9 consists of electromagnetic shielding material which was identically prepared as Example #E1 except for that the electroconductive material consisted of darkened copper.

<Example #E10>

[0263] Example #E10 consists of electromagnetic shielding material which was identically prepared as Example #E1 except for that the geometric pattern of copper foil consisted of a repetition of a right triangle instead of the grid pattern of Example #E1.

<Example #E11>

[0264] Example #E11 consists of electromagnetic shielding material which was identically prepared as Example #E2 except for that the geometric pattern consisted of a repetition of a right hexagon instead of the grid pattern of Example #E2.

<Example #E12>

[0265] Example #E12 consists of electromagnetic shielding material which was identically prepared as Example #E3 except for that the geometric pattern consisted of a repetition of a right octagon and a square instead of the grid pattern of Example #E3.

<Example #E13>

[0266] Example #E13 consists of electromagnetic shielding material which was identically prepared as Example #E1 except for that the plastic base member consisted of polysulfone (50 µm) instead of PET.

<Example #E14>

[0267] Electromagnetic Shielding Film #E1 and the bonding film obtained by applying Infrared Blocking Layer Composition #E1 over the surface of transparent PET film having the thickness of 50 µm to the dry thickness of approximately 20 µm and drying the assembly were bonded over two sides of a commercially available acrylic plate (marketed by KK Kurare under the tradename of Komoglass, thickness 1 mm) by using a roll laminator under the temperature and pressure condition of 110 °C and 1,96 x 10⁶ Pa (20 kgf/cm²) to obtain electromagnetic shielding material of Example #E14.

<Example #E15>

[0268] Example #E15 consists of electromagnetic shielding material which was identically prepared as Example #E14 except for that Infrared Blocking Layer Composition #E2 was used.

<Example #E 16>

[0269] Example #E15 consists of electromagnetic shielding material which was identically prepared as Example #E14 except for that Infrared Blocking Layer Composition #E3 was used.

<Comparative Example #E1>

[0270] ITO film was vapor deposited on the unprocessed surface of the transparent plastic film (thickness 50 µm) consisting of Surface Processed Film #E1 to the thickness of 2,000 Å by vapor deposition without geometric patterning. Bonding Agent Composition #E1 was directly applied over the vapor deposited side of the assembly to the dry thickness of 20 µm. Similarly as Example #E1, this assembly and the bonding film obtained by applying Bonding Agent Composition #E1 over the surface of transparent PET film having the thickness of 50 µm to the dry thickness of approximately 20 µm and drying the assembly were bonded over two sides of a commercially available acrylic plate (marketed by KK Kurare under the tradename of Komoglass, thickness 1 mm) under the temperature and pressure condition of 110 °C and 9,81 x 10⁵ Pa (10 kgf/cm²) to obtain electromagnetic shielding material of Comparative Example #E1.

<Comparative Example #E2>

[0271] Comparative Example #E2 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #E1 except for that aluminum, instead of ITO, was deposited on the entire surface of the assembly, and Bonding Agent Composition #E2 was directly applied.

<Comparative Example #E3>

[0272] Comparative Example #E3 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #E except for that the line width was 50 µm instead of 20 µm.

<Comparative Example #E4>

[0273] Comparative Example #E4 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #E2 except for that the line spacing was 0.25 mm instead of 2.0 mm.

<Comparative Example #E5>

[0274] Comparative Example #E5 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #E2 except for that the line thickness was 70 µm instead of 12 µm.

<Comparative Example #E6>

[0275] Comparative Example #E6 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #E1 except for that phenol-formaldehyde resin (Mw=50,000, n=1.73) was used instead of Bonding Agent Composition #E1.

< Comparative Example #E7>

[0276] Comparative Example #E7 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #E2 except for that polydimethylsiloxane (Mw=45,000, n=1.43) was used instead of Bonding Agent Composition #E1.

< Comparative Example #E8>

[0277] Comparative Example #E8 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #E1 except for that polyvinylidenefluoride (Mw=120,000, n=1.42) was used instead of Bonding Agent Composition #E1.

< Comparative Example #E9>

[0278] Comparative Example #E9 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #E1 except for that polyethylene film containing a filler (with a visible transmission factor of 20% or less) was used for the transparent plastic film.

<Comparative Example #E10>

[0279] Comparative Example #E10 consisted of electromagnetic shielding material which was prepared identically as the electromagnetic shielding material of Example #E2 except for that two layers of Electromagnetic Shielding Film #E2 were bonded to each other (without the PET film carrying the bonding agent on the other side).

[0280] The EMI shielding performance, visible light transmission factor, warp-resistance, invisibility, and bonding property before and after heating of the thus obtained electromagnetic shielding material were actually measured, and the measured results are summarized in Tables 9 and 10.

[0281] The EMI shielding performance was measured by placing the specimen between two flanges of a coaxial waveguide converter (marketed by Nihon Koshuha KK under the tradename of TWC-S-024), and using a spectro-analyzer (marketed by YHP under the tradename of 8510B Vector Network Analyzer) at the frequency of 1 GHz.

[0282] The visible light transmission factor was measured as an average value of the transmission factor over the wavelength range of 400 to 800 nm by using a double beam spectro-photoanalyzer (marketed by KK Hitachi under the tradename of Type 200-10).

[0283] The invisibility was measured by placing the display device at the distance of 0.5 m, and evaluating if the geometric pattern of the electroconductive metallic material is visible or not. The specimens were graded into "very good", and "good" depending on the degree of invisibility.

[0284] The bonding property was measured by using a tensile strength testing machine (marketed by Toyo Baldwin KK under the tradename of Tensilon UTM-4-100) with the width of 10 mm, 90 degree direction and peeling speed of 50 mm/minute.

[0285] The refraction index was measured by using a refraction meter (marketed by KK Atago Kogaku Kikai Seisakusho under the tradename of Abbe refraction meter) at the temperature of 25 °C.

[0286] The warping of the electromagnetic shielding material was measured by preparing a speciment of 650 mm by 100 mm, and measuring the amount of warping along the lengthwise direction of the speciment.

[0287] The haziness was measured by using a haze meter (marketed by Nihon Densyoku Kogyo KK under the tradename of COH-300A).

[0288] The reflective index was measured by using a spectro-chromatic meter (marketed by Minolta KK under the tradename of CM-508d).

[0289] Comparative Examples #E1 and #E2 used vapor deposited ITO and Al, respectively, as the electroconductive material, and lacks favorable electromagnetic shielding property. Comparative Example #E3 lacked a favorable visible light transmission factor and invisibility because the line width was 50 µm which is substantially larger than the upper limit of 25 µm which is required by the present invention. Similarly as Comparative Example #E3, Comparative Example #E4 lacked a favorable visible light transmission factor and invisibility because the line spacing was 250 µm which is substantially narrower than the lower limit of 500 µm which is required by the present invention. Comparative Example #E5 lacked a favorable invisibility because the line thickness was 70 µm which is substantially larger than the upper limit of 18 µm which is required by the present invention. Comparative Example #E9 had a poor visible light transmission factor of 20% or less because fairly opaque polyethylene film containing a filler (having a visible light transmission factor of 20% or less) was used instead of the transparent plastic film. Comparative Example #E10 had an undesired tendency to warp because the transparent plastic film was attached only to one side of the transparent plastic base sheet instead of attaching a pair of transparent plastic base sheet onto either side of the transparent plastic film each via a bonding agent layer. On the other hand, the present invention consists of electromagnetic shielding material, comprising a transparent plastic base sheet, and transparent plastic film layers attached to either side of the base sheet each via a bonding agent layer, one of the transparent plastic film layers carrying a geometrically patterned electroconductive material featuring a line width of 25 µm or less, a line spacing of 500 µm or more, and a line thickness of 18 µm or less. The electromagnetic shielding material of Examples #E1 to #E16 according to the present invention has a favorable electromagnetic shielding performance of 30 dB or more. According to the present invention, the visible transmission factor is 70% or better, and a favorable invisibility can be achieved. The values of haziness and reflective index are favorably low. Also, the initial bonding force is large and the bonding force drops very little even after 1,000 hours of aging test at 80 °C. Also, the electromagnetic shielding material according to the present invention does not tend to warp. According to Examples #E14 to 16 which include an infrared blocking layer, the infrared blocking ratio is favorably 90% or more.

[0290] As can be appreciated from the description of the examples, the electromagnetic shielding material according to the present invention has a high electromagnetic shielding property, free from leakage of electromagnetic radiation, and favorable optical properties in terms of visible light transmission factor, invisibility, and absence of distortion. It also is free from warping, and involves very little change in the optical properties at high temperatures over an extended period of time. Because the bonding film can be bonded onto the two sides of the transparent base sheet by using a roll laminator, the electromagnetic shielding material provided by the present invention allows a high productivity to be achieved. The electromagnetic shielding material may be given with an anti-reflection or anti-glare property by the anti-glare process or the anti-reflection process. The electromagnetic shielding material of the present invention may have an infrared blocking ratio of 90% or higher in the wavelength range of 900 to 1,100 nm by adding the infrared absorbing agent. A continuous production can be made possible by laminating the transparent plastic film over the transparent plastic base sheet by the roll laminating method. By using polyethylene-terephthalate film for the transparent plastic film, a highly transparent, heat-resistant, economical and easy handling electromagnetic shielding material can be obtained.

[0291] By using a layer of copper, aluminum or nickel having a thickness of 3 to 18 µm for the electroconductive material layer, a highly workable and economical electromagnetic shielding material which additionally provides a wide viewing angle can be obtained. By using copper having at least its outer surface darkened, a fade-resistant and high-contrast electromagnetic shielding material can be obtained. By geometrically patterning the electroconductive material over the transparent plastic base member with a chemical etching process, a highly workable electromagnetic shielding material can be obtained.

[0292] By using PMMA for the transparent plastic base sheet, a highly transparent and workable electromagnetic shielding material can be obtained.

[0293] By selecting the materials such that the difference in refraction index between the bonding layer and the transparent plastic base sheet (or the transparent plastic film or, in case the assembly attached to transparent plastic material, the bonding agent used for that purpose) is 0.14 or less, a highly transparent electromagnetic shielding material can be obtained.

[0294] When this electromagnetic shielding material is applied to a display device, a high EMI shielding effect can be obtained, and it becomes possible to allow the display device to be viewed comfortably with a high visible light transmission factor and a favorable invisibility, free from any haziness or reflection. Also, because the infrared radiation which may be emitted from the display device is effectively shut off, any faulty operation of equipment using remote controls can be avoided.

Claims

1. A method for making an electromagnetic shielding bonding film, comprising the steps of:

a) forming a geometrically patterned electroconductive material at least on one side of a substantially transparent base film, whereby the geometrically patterned electroconductive material has a line width 40 µm or less, a line spacing of 200 µm or more, and a line thickness of 40 µm or less and the geometric pattern providing an aperture ratio of 80 % or more

b) coating a bonding layer having a refractive index similar to that of said base film, at least partly at least on one side of the said base film, whereby the said bonding layer is a surface layer of the base material including the geometrically patterned electroconductive material

c) said base film being prepared as a roll web, and at least most of said steps are carried out in a continuous manner.

2. A method according to claim 1, whereby a resin composition serving as the bonding layer is the part of the surface or the entire surface of the film carrying the geometrically patterned electroconductive material.

3. A method according to claim 1 or 2, whereby a bonding agent layer is interposed between the base film and the bonding layer and the differences in refraction index between the bonding agent layer and the bonding layer is 0,14 or less and the geometrically patterned electroconductive material is interposed between the bonding agent layer and the bonding layer.

4. A method for making electromagnetic shielding bonding film according to any one of claims 1 to 3, further comprising the step of forming an infrared blocking layer by using an infrared blocking composition having an absorption ratio of 50% or more for infrared light of 900 to 1,100 nm in wavelength at least on one side of said base film.

5. A method for making electromagnetic shielding bonding film according to claim 1, wherein said geometric patterned electroconductive material is formed by etching.

6. A method for making electromagnetic shielding bonding film according to claim 1, wherein said bonding layer created from a bonding agent composition has a refractive index of 1.45 to 1.60.

7. A method for making electromagnetic shielding bonding film according to claim 4, wherein said infrared blocking layer is incorporated in said coating of said bonding layer created from a bonding agent composition.

8. A method for making electromagnetic shielding bonding film according to claim 1, wherein said transparent base film consists of polyethylene-terephthalate film.

9. A method for making electromagnetic shielding bonding film according to claim 1, wherein said geometric patterned electroconductive material layer consists of a member selected from a group consisting of copper, aluminium and nickel layer.

10. A method for making electromagnetic shielding bonding film according to any one of claims 1 to 9, wherein said geometric patterned electroconductive material has a thickness of 3 to 40 µm, and a surface of said transparent base film carrying said electroconductive material consists of a coarse surface having a surface roughness of 1 µm or more.

11. A method for making electromagnetic shielding bonding film according to claim 9, wherein said electroconductive material consists of copper which has a darkened surface.

12. A method for making electromagnetic shielding bonding film according to claim 1, wherein said electroconductive material consists of paramagnetic metallic material.

13. A method for making an electromagnetic shielding bonding film according to any one of claims 1 to 12 comprising the steps of

- laminating an electroconductive foil being over the surface of a transparent base film via a bonding agent layer,

- geometrically patterning the electroconductive foil by a chemical etching process and

- evenly applying a resin material layer as surface bonding layer.

14. Bonding film which has an optically transparent and electromagnetically shielding property, comprising:

substantially transparent base film;

geometrically patterned electroconductive material formed at least one side of said transparent base film;

a bonding layer placed at least partly at least on one side of said base film;

   wherein said geometric patterned electroconductive material has a line width of 40 µm or less, a line spacing of 200 µm or more, and a line thickness of 40 µm or less; the geometric pattern providing an aperture ratio of 80% or more; and
   a difference in refraction index between said transparent base film and said bonding layer is 0.14 or less.

15. Bonding film according to claim 14, whereby the bonding layer is a resin material layer.

16. Bonding film which has an optically transparent and electromagnetically shielding property according to claim 14 or 15, further comprising a bonding agent layer interposed between said transparent base film and said bonding layer, and differences in refraction index between said bonding agent layer and said transparent base film, and between said bonding agent layer and said bonding layer are 0.14 or less and the geometrically patterned electroconductive material is interposed between the bonding agent layer and the bonding layer.

17. Bonding film which has an optically transparent and electromagnetically shielding property according to claim 14, wherein said transparent film consists of polyethylene-terephthalate film.

18. Bonding film which has an optically transparent and electromagnetically shielding property according to claim 14, wherein said electroconductive material consists of a member selected from a group consisting of copper, aluminium or nickel.

19. Bonding film which has an optically transparent and electromagnetically shielding property according to claim 14, wherein said electroconductive material has a thickness of 3 to 40 µm, and a surface thereof bonded to said transparent film consists of a coarse surface.

20. Bonding film which has an optically transparent and electromagnetically shielding property according to claim 18, wherein said electroconductive material consists of copper which having a darkened surface.

21. Bonding film which has an optically transparent and electromagnetically shielding property according to claim 14, wherein said electroconductive material layer is geometrically patterned by a chemical etching process.

22. Bonding film which has an optically transparent and electromagnetically shielding property according to claim 14, wherein said electroconductive material consists of paramagnetic metallic material.

23. Bonding film which has an optically transparent and electromagnetically shielding property according to any one of claims 14 to 22, wherein said bonding film is incorporated with an infrared blocking layer which has an overall infrared absorption ratio of 50 % or more in a wavelength range of 900 to 1,100 nm.

24. Use of a bonding film which has an optically transparent and electromagnetically shielding property according to any one of claims 14 to 23 in a display device.

25. Use of a bonding film which has an optically transparent and electromagnetically shielding property according to any one of claims 14 to 23 in an electromagnetic shielding assembly.

26. An electromagnetic shielding assembly comprising:

a bonding film according to any one of claims 14 to 23 and

a pair of substantially transparent base sheets attached to either side of said transparent plastic film, said plastic base sheets having a substantially identical thickness.

27. An electromagnetic shielding assembly according to claim 26, wherein said electromagnetic shielding film comprises substantially transparent base film, and geometrically patterned electroconductive material formed at least on one side of said transparent base film;
said geometric patterned electroconductive material having a line width of 40 µm or less, a line spacing of 200 µm or more, and a line thickness of 40 µm or less.

28. An electromagnetic shielding assembly according to claim 27, wherein said geometric patterned electroconductive material has a line width of 25 µm or less, a line spacing of 500 µm or more, and a line thickness of 18 µm or less.

29. An electromagnetic shielding assembly according to claim 26, further comprising a bonding layer formed at least partly at least on one side of said electromagnetic shielding film.

30. An electromagnetic shielding assembly according to claim 27, wherein said transparent base film consists of polyethylene-terephthalate film.

31. An electromagnetic shielding assembly according to claim 27, wherein said electroconductive material consists of a member selected from a group consisting of copper, aluminium and nickel.

32. An electromagnetic shielding assembly according to claim 28, wherein said electroconductive material has a thickness of 3 to 18 µm, and a surface thereof bonded to said transparent base film consists of a coarse surface.

33. An electromagnetic shielding assembly according to claim 31, wherein said electroconductive material consists of copper which at least has a darkened surface.

34. An electromagnetic shielding assembly according to claim 27, wherein said electroconductive material is geometrically patterned on said transparent base film by a chemical etching process.

35. An electromagnetic shielding assembly according to claim 27, wherein said electroconductive material consists of paramagnetic metallic material.

36. An electromagnetic shielding assembly according to claim 26, wherein said transparent base sheets are made of polymethylmethacrylate called PMMA.

37. An electromagnetic shielding assembly according to claim 29, wherein a difference in refraction index between said transparent base sheet and said bonding layer is 0.14 or less.

38. An electromagnetic shielding assembly according to claim 27, wherein a difference in refraction index between said transparent base sheet and said transparent base film is 0.14 or less.

39. Use of an electromagnetic shielding assembly according to any one of claims 26 to 38 in a display device.

40. An electromagnetic shielding assembly, comprising:

a substantially transparent base sheet;

substantially transparent base film placed on each side of said base sheet;

said base film placed at least on one side of said base sheet consisting of an electromagnetic shielding film according to any one of claims 14 to 23.

41. An electromagnetic shielding assembly according to claim 40, wherein said electromagnetic shielding film comprises substantially transparent base film, and geometrically patterned electroconductive material formed at least on one side of said transparent base film;
said geometric patterned electroconductive material having a line width of 40 µm or less, a line spacing of 200 µm or more and a line thickness of 40 µm or less.

42. An electromagnetic shielding assembly according to claim 41, wherein said geometric patterned electroconductive material has a line width of 25 µm or less, a line spacing of 500 µm or more, and a line thickness of 18 m or less.

43. An electromagnetic shielding assembly according to claim 40, wherein said base film placed at least on one side of said base sheet comprises an anti-glare or anti-reflective layer.

44. An electromagnetic shielding assembly according to claim 40, wherein said base film placed at least on one side of said base sheet comprises an infrared blocking layer.

45. An electromagnetic shielding assembly according to claim 40, wherein said base film is placed over the two sides of said transparent base sheet by a roll laminating method.

46. An electromagnetic shielding assembly according to claim 40, wherein said transparent base film consists of polyethylene-terephthalate film.

47. An electromagnetic shielding assembly according to claim 41, wherein said electroconductive material consists of a member selected from a group consisting of copper, aluminium and nickel.

48. An electromagnetic shielding assembly according to claim 47, wherein said electroconductive material has a thickness of 3 to 18 µm, and a surface thereof bonded to said transparent base film consists of a coarse surface.

49. An electromagnetic shielding assembly according to claim 47, wherein said electroconductive material consists of copper which at least has a darkened surface.

50. An electromagnetic shielding assembly according to claim 41, wherein said electroconductive material is geometrically patterned on said transparent base film by a chemical etching process.

51. An electromagnetic shielding assembly according to claim 41, wherein said electroconductive material consists of paramagnetic metallic material.

52. An electromagnetic shielding assembly according to claim 40, wherein said transparent base sheet is made of polymethylmethacrylate called PMMA.

53. An electromagnetic shielding assembly according to claim 40, further comprising a bonding layer for attaching a pair of mutually adjoining members.

54. An electromagnetic shielding assembly according to claim 53, wherein a difference in refraction index between said transparent base sheet and said bonding layer is 0.14 or less.

55. An electromagnetic shielding assembly according to claim 40, wherein a difference in refraction index between said transparent base sheet and said transparent base film is 0.14 or less.

56. Use of an electromagnetic shielding assembly according to any one of claims 40 to 55 in a display device.

Ansprüche

1. Verfahren zur Herstellung einer Klebefolie mit elektromagnetischer Abschirmung, umfassend die Schritte:

a) Bilden eines geometrisch strukturierten, elektrisch leitenden Materials auf wenigstens einer Seite einer im wesentlichen transparenten Trägerfolie, wobei das geometrisch strukturierte, elektrisch leitende Material eine Linienbreite von 40 µm oder weniger, einen Linienabstand von 200 µm oder mehr und eine Liniendicke von 40 µm oder weniger aufweist, und die geometrische Struktur ein Öffnungsverhältnis von 80% oder mehr ergibt;

b) zumindest teilweises Aufbringen einer Klebeschicht mit einem dem der Trägerfolie ähnlichen Brechungsindex auf wenigstens einer Seite der Trägerfolie, wobei die Klebeschicht eine Oberflächenschicht des Trägermaterials ist, das das geometrisch strukturierte, elektrisch leitende Material enthält;

c) wobei die Trägerfolie als Rollenbahn vorbereitet wird und zumindest die meisten der Schritte kontinuierlich durchgeführt werden.

2. Verfahren nach Anspruch 1, wobei eine Harz-Zusammensetzung, die als Klebeschicht dient, Teil der Oberfläche ist oder die gesamte Oberfläche der Folie ausmacht, die das geometrisch strukturierte, elektrisch leitende Material trägt.

3. Verfahren nach Anspruch 1 oder 2, wobei eine Klebemittelschicht zwischen der Trägerfolie und der Klebeschicht angeordnet ist und die Differenz der Brechungsindices zwischen der Klebemittelschicht und der Klebeschicht 0,14 oder weniger ist und das geometrisch strukturierte, elektrisch leitende Material zwischen der Klebemittelschicht und der Klebeschicht angeordnet ist.

4. Verfahren zur Herstellung einer Klebefolie mit elektromagnetischer Abschirmung nach einem der Ansprüche 1 bis 3, des Weiteren umfassend den Schritt des Bildens einer Infrarotsperrschicht durch Verwendung einer Infrarot sperrenden Zusammensetzung mit einem Absorptionsverhältnis von 50% oder mehr für Infrarotlicht einer Wellenlänge von 900 bis 1100 nm auf wenigstens einer Seite der Trägerfolie.

5. Verfahren zur Herstellung einer Klebefolie mit elektromagnetischer Abschirmung nach Anspruch 1, wobei das geometrisch strukturierte, elektrisch leitende Material durch Ätzen gebildet wird.

6. Verfahren zur Herstellung einer Klebefolie mit elektromagnetischer Abschirmung nach Anspruch 1, wobei die aus einer Klebemittelzusammensetzung erzeugte Klebeschicht einen Brechungsindex von 1,45 bis 1,60 aufweist.

7. Verfahren zur Herstellung einer Klebefolie mit elektromagnetischer Abschirmung nach Anspruch 4, wobei die Infrarotsperrschicht in die Beschichtung aus der aus einer Klebemittelzusammensetzung erzeugten Klebeschicht eingebracht wird.

8. Verfahren zur Herstellung einer Klebefolie mit elektromagnetischer Abschirmung nach Anspruch 1, wobei die transparente Trägerfolie aus Polyethylenterephthalat-Folie besteht.

9. Verfahren zur Herstellung einer Klebefolie mit elektromagnetischer Abschirmung nach Anspruch 1, wobei die geometrisch strukturierte, elektrisch leitende Materialschicht aus einem Bestandteil besteht, der ausgewählt ist aus der Gruppe bestehend aus Kupfer-, Aluminium- und Nickelschicht.

10. Verfahren zur Herstellung einer Klebefolie mit elektromagnetischer Abschirmung nach einem der Ansprüche 1 bis 9, wobei das geometrisch strukturierte, elektrisch leitende Material eine Dicke von 3 bis 40 µm aufweist, und eine Oberfläche der transparenten Trägerfolie, die das elektrisch leitende Material trägt, aus einer groben Oberfläche mit einer Oberflächenrauigkeit von 1 µm oder mehr besteht.

11. Verfahren zur Herstellung einer Klebefolie mit elektromagnetischer Abschirmung nach Anspruch 9, wobei das elektrisch leitende Material aus Kupfer besteht, das eine dunkel gefärbte Oberfläche aufweist.

12. Verfahren zur Herstellung einer Klebefolie mit elektromagnetischer Abschirmung nach Anspruch 1, wobei das elektrisch leitende Material aus einem paramagnetischen metallischen Material besteht.

13. Verfahren zur Herstellung einer Klebefolie mit elektromagnetischer Abschirmung nach einem der Ansprüche 1 bis 12, umfassend die Schritte

- Laminieren einer elektrisch leitenden Folie auf die Oberfläche einer transparenten Trägerfolie mit Hilfe einer Klebemittelschicht,

- geometrisches Strukturieren der elektrisch leitenden Folie mit Hilfe eines chemischen Ätzverfahrens und

- gleichmäßiges Auftragen einer Harzmaterialschicht als Oberflächenklebeschicht.

14. Klebefolie, die optisch transparente und elektromagnetisch abschirmende Eigenschaften aufweist, umfassend:

eine im Wesentlichen transparente Trägerfolie;

ein auf wenigstens einer Seite der transparenten Trägerfolie gebildetes geometrisch strukturiertes, elektrisch leitendes Material;

eine Klebeschicht, die zumindest teilweise auf wenigstens eine Seite der Trägerfolie aufgebracht ist;

wobei das geometrisch strukturierte, elektrisch leitende Material eine Linienbreite von 40 µm oder weniger, einen Linienabstand von 200 µm oder mehr und eine Liniendicke von 40 µm oder weniger aufweist;
die geometrische Struktur ein Öffnungsverhältnis von 80% oder mehr ergibt; und
die Differenz der Brechungsindices zwischen der transparenten Trägerfolie und der Klebeschicht 0,14 oder weniger ist.

15. Klebefolie nach Anspruch 14, wobei die Klebeschicht eine Harzmaterialschicht ist.

16. Klebefolie mit optisch transparenten und elektromagnetisch abschirmenden Eigenschaften nach Anspruch 14 oder 15, des Weiteren umfassend eine Klebemittelschicht, die zwischen der transparenten Trägerfolie und der Klebeschicht angeordnet ist, wobei die Differenz der Brechungsindices zwischen der Klebemittelschicht und der transparenten Trägerfolie und zwischen der Klebemittelschicht und der Klebeschicht 0,14 oder weniger ist und das geometrisch strukturierte, elektrisch leitende Material zwischen der Klebemittelschicht und der Klebeschicht angeordnet ist.

17. Klebefolie mit optisch transparenten und elektromagnetisch abschirmenden Eigenschaften nach Anspruch 14, wobei die transparente Folie aus Polyethylenterephthalat-Folie besteht.

18. Klebefolie mit optisch transparenten und elektromagnetisch abschirmenden Eigenschaften nach Anspruch 14, wobei das elektrisch leitende Material aus einem Bestandteil besteht, der ausgewählt ist aus der Gruppe bestehend aus Kupfer, Aluminium oder Nickel.

19. Klebefolie mit optisch transparenten und elektromagnetisch abschirmenden Eigenschaften nach Anspruch 14, wobei das elektrisch leitende Material eine Dicke von 3 bis 40 µm aufweist und die an die transparente Folie geklebte Oberfläche aus einer groben Oberfläche besteht.

20. Klebefolie mit optisch transparenten und elektromagnetisch abschirmenden Eigenschaften nach Anspruch 18, wobei das elektrisch leitende Material aus Kupfer mit dunkel gefärbter Oberfläche besteht.

21. Klebefolie mit optisch transparenten und elektromagnetisch abschirmenden Eigenschaften nach Anspruch 14, wobei die Schicht aus elektrisch leitendem Material mit Hilfe eines chemischen Ätzverfahrens geometrisch strukturiert wird.

22. Klebefolie mit optisch transparenten und elektromagnetisch abschirmenden Eigenschaften nach Anspruch 14, wobei das elektrisch leitende Material aus einem paramagnetischen metallischen Material besteht.

23. Klebefolie mit optisch transparenten und elektromagnetisch abschirmenden Eigenschaften nach einem der Ansprüche 14 bis 22, wobei eine Infrarotsperrschicht in die Klebefolie eingebracht ist, die in einem Wellenlängenbereich von 900 bis 1100 nm ein Gesamtinfrarotabsorptionsverhältnis von 50% oder mehr aufweist.

24. Verwendung einer Klebefolie mit optisch transparenten und elektromagnetisch abschirmenden Eigenschaften nach einem der Ansprüche 14 bis 23 bei einer Anzeigevorrichtung.

25. Verwendung einer Klebefolie mit optisch transparenten und elektromagnetisch abschirmenden Eigenschaften nach einem der Ansprüche 14 bis 23 bei einer Baueinheit mit elektromagnetischer Abschirmung.

26. Baueinheit mit elektromagnetischer Abschirmung, umfassend:
eine Klebefolie nach einem der Ansprüche 14 bis 23 und ein Paar im Wesentlichen transparente Trägerplatten, die an beiden Seiten der transparenten Kunststoff-Folie befestigt sind, wobei die Kunststoff-Trägerplatten eine im Wesentlichen identische Dicke aufweisen.

27. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 26, wobei die Folie mit elektromagnetischer Abschirmung eine im Wesentlichen transparente Trägerfolie und ein auf wenigstens einer Seite der transparenten Trägerfolie gebildetes geometrisch strukturiertes, elektrisch leitendes Material umfasst;
wobei das geometrisch strukturierte, elektrisch leitende Material eine Linienbreite von 40 µm oder weniger, einen Linienabstand von 200 µm oder mehr und eine Liniendicke von 40 µm oder weniger aufweist.

28. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 27, wobei das geometrisch strukturierte, elektrisch leitende Material eine Linienbreite von 25 µm oder weniger, einen Linienabstand von 500 µm oder mehr und eine Liniendicke von 18 µm oder weniger aufweist.

29. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 26, des Weiteren umfassend eine Klebeschicht, die zumindest teilweise auf wenigstens einer Seite der Folie mit elektromagnetischer Abschirmung gebildet ist.

30. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 27, wobei die transparente Trägerfolie aus Polyethylenterephthalat-Folie besteht.

31. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 27, wobei das elektrisch leitende Material aus einem Bestandteil besteht, der ausgewählt ist aus der Gruppe bestehend aus Kupfer, Aluminium und Nickel.

32. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 28, wobei das elektrisch leitende Material eine Dicke von 3 bis 18 µm aufweist und die an die transparente Trägerfolie geklebte Oberfläche aus einer groben Oberfläche besteht.

33. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 31, wobei das elektrisch leitende Material aus Kupfer besteht, das zumindest eine dunkel gefärbte Oberfläche aufweist.

34. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 27, wobei das elektrisch leitende Material auf der transparenten Trägerfolie mit Hilfe eines chemischen Ätzverfahrens geometrisch strukturiert wird.

35. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 27, wobei das elektrisch leitende Material aus einem paramagnetischen metallischen Material besteht.

36. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 26, wobei die transparenten Trägerplatten aus Polymethylmethacrylat sind, das als PMMA bezeichnet wird.

37. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 29, wobei die Differenz der Brechungsindices zwischen der transparenten Trägerplatte und der Klebeschicht 0,14 oder weniger ist.

38. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 27, wobei die Differenz der Brechungsindices zwischen der transparenten Trägerplatte und der transparenten Trägerfolie 0,14 oder weniger ist.

39. Verwendung der Baueinheit mit elektromagnetischer Abschirmung nach einem der Ansprüche 26 bis 38 bei einer Anzeigevorrichtung.

40. Baueinheit mit elektromagnetischer Abschirmung, umfassend:

eine im Wesentlichen transparente Trägerplatte;

auf jeder Seite der Trägerplatte aufgebrachte, im Wesentlichen transparente Trägerfolie;

wobei die auf wenigstens einer Seite der Trägerplatte aufgebrachte Trägerfolie aus einer Folie mit elektromagnetischer Abschirmung nach einem der Ansprüche 14 bis 23 besteht.

41. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 40, wobei die Folie mit elektromagnetischer Abschirmung eine im Wesentlichen transparente Trägerfolie umfasst und auf wenigstens einer Seite der transparenten Trägerfolie ein geometrisch strukturiertes, elektrisch leitendes Material gebildet ist;
wobei das geometrisch strukturierte, elektrisch leitende Material eine Linienbreite von 40 µm oder weniger, einen Linienabstand von 200 µm oder mehr und eine Liniendicke von 40 µm oder weniger aufweist.

42. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 41, wobei das geometrisch strukturierte, elektrisch leitende Material eine Linienbreite von 25 µm oder weniger, einen Linienabstand von 500 µm oder mehr und eine Liniendicke von 18 µm oder weniger aufweist.

43. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 40, wobei die auf wenigstens einer Seite der Trägerplatte aufgebrachte Trägerfolie eine Antiblend- oder Antireflexionsschicht umfasst.

44. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 40, wobei die auf wenigstens einer Seite der Trägerplatte aufgebrachte Trägerfolie eine Infrarotsperrschicht umfasst.

45. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 40, wobei die Trägerfolie mit Hilfe eines Walzenlaminierverfahrens auf beide Seiten der transparenten Trägerplatte aufgebracht wird.

46. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 40, wobei die transparente Trägerfolie aus Polyethylenterephthalat-Folie besteht.

47. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 41, wobei das elektrisch leitende Material aus einem Bestandteil besteht, der ausgewählt ist aus der Gruppe bestehend aus Kupfer, Aluminium und Nickel.

48. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 47, wobei das elektrisch leitende Material eine Dicke von 3 bis 18 µm aufweist und die an die transparente Folie geklebte Oberfläche desselben aus einer groben Oberfläche besteht.

49. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 47, wobei das elektrisch leitende Material aus Kupfer besteht, das zumindest eine dunkel gefärbte Oberfläche aufweist.

50. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 41, wobei das elektrisch leitende Material auf der transparenten Trägerfolie mit Hilfe eines chemischen Ätzverfahrens geometrisch strukturiert wird.

51. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 41, wobei das elektrisch leitende Material aus einem paramagnetischen metallischen Material besteht.

52. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 40, wobei die transparente Trägerplatte aus Polymethylmethacrylat ist, das als PMMA bezeichnet wird.

53. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 40, des Weiteren umfassend eine Klebeschicht zum Befestigen eines Paars einander benachbarter Elemente.

54. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 53, wobei die Differenz der Brechungsindices zwischen der transparenten Trägerplatte und der Klebeschicht 0,14 oder weniger beträgt.

55. Baueinheit mit elektromagnetischer Abschirmung nach Anspruch 40, wobei die Differenz der Brechungsindices zwischen der transparenten Trägerplatte und der transparenten Trägerfolie 0,14 oder weniger beträgt.

56. Verwendung der Baueinheit mit elektromagnetischer Abschirmung nach einem der Ansprüche 40 bis 55 bei einer Anzeigevorrichtung.

Revendications

1. Procédé de fabrication d'une pellicule adhésive à blindage électromagnétique comprenant les étapes suivantes:

a) façonner un matériau électroconducteur ayant un motif géométrique sur au moins une face d'une pellicule de base essentiellement transparente, ledit matériau électroconducteur ayant un motif géométrique a une largeur de ligne de 40 µm ou moins, un espacement entre les lignes de 200 µm ou plus, et une épaisseur de ligne de 40 µm ou moins, le motif géométrique fournissant un ratio d'ouverture de 80 % ou plus,

b) appliquer une couche adhésive ayant un indice de réfraction similaire à ladite pellicule de base sur celle-ci, au moins en partie sur au moins une face de ladite pellicule de base, ladite pellicule adhésive étant une couche superficielle du matériau de base comprenant le matériau électroconducteur ayant un motif géométrique,

c) la pellicule de base étant préparée sous forme de toile roulée, et au moins la plus grande partie desdites étapes sont réalisées de manière continue.

2. Procédé selon la revendication 1, dans lequel une composition de résine servant de pellicule adhésive constitue une partie de la surface ou la surface entière de la pellicule comportant le matériau électroconducteur ayant un motif géométrique.

3. Procédé selon la revendication 1 ou 2, dans lequel une couche d'agent adhésif est interposée entre la pellicule de base et la couche adhésive et la différence d'indice de réfraction entre la couche d'agent adhésif et la couche adhésive est de 0,14 ou moins et le matériau électroconducteur ayant un motif géométrique est interposé entre la couche d'agent adhésif et la couche adhésive.

4. Procédé de fabrication d'une pellicule adhésive à blindage électromagnétique selon une des revendications 1 à 3, comprenant en plus une étape de façonnement d'une couche bloquant les rayons infrarouges en utilisant une composition bloquant le rayonnement infrarouge ayant un ratio d'absorption de 50 % ou plus pour la lumière infrarouge à une longueur d'onde de 900 à 1100 nm, au moins sur une face de ladite pellicule de base.

5. Procédé de fabrication d'une pellicule adhésive à blindage électromagnétique selon la revendication 1, dans lequel le matériau électroconducteur ayant un motif géométrique est façonné par décapage.

6. Procédé de fabrication d'une pellicule adhésive à blindage électromagnétique selon la revendication 1, dans lequel ladite couche adhésive créée à partir d'une composition d'agent adhésif a un indice de réfraction de 1,45 à 1,60.

7. Procédé de fabrication d'une pellicule adhésive à blindage électromagnétique selon la revendication 4, dans lequel la couche bloquant les rayons infrarouge est incorporée dans ledit revêtement de ladite couche adhésive produite à partir d'une composition d'agent adhésif.

8. Procédé de fabrication d'une pellicule adhésive à blindage électromagnétique selon la revendication 1, dans lequel ladite pellicule de base transparente est constituée d'un film de polyéthylène-téréphthalate.

9. Procédé de fabrication d'une pellicule adhésive à blindage électromagnétique selon la revendication 1, dans lequel la couche de matériau électroconducteur ayant un motif géométrique est constituée d'un membre choisi dans le groupe comprenant une couche de cuivre, d'aluminium et de nickel.

10. Procédé de fabrication d'une pellicule adhésive à blindage électromagnétique selon une des revendications 1 à 9, dans lequel ledit matériau électroconducteur ayant un motif géométrique a une épaisseur de 3 à 40 µm, et une surface de ladite pellicule de base transparente portant ledit matériau électroconducteur est constituée d'une surface grossière ayant une rugosité de surface de 1µm ou plus.

11. Procédé de fabrication d'une pellicule adhésive à blindage électromagnétique selon la revendication 9, dans lequel ledit matériau électroconducteur est constitué de cuivre qui a une surface obscurcie.

12. Procédé de fabrication d'une pellicule adhésive à blindage électromagnétique selon la revendication 1, dans lequel ledit matériau électroconducteur est constitué d'un matériau métallique paramagnétique.

13. Procédé de fabrication d'une pellicule adhésive à blindage électromagnétique selon une des revendications 1 à 12, comprenant les étapes suivantes:

- laminer une feuille électroconductrice sur la surface d'une pellicule de base transparente au moyen une couche d'agent adhésif,

- donner un motif géométrique à la feuille électroconductrice par un procédé de décapage chimique et

- appliquer régulièrement une couche de matière de résine en tant que couche adhésive de surface.

14. Pellicule adhésive qui a une propriété de blindage électromagnétique et de transparence optique, comprenant :

une pellicule de base essentiellement transparente,

un matériau électroconducteur à motif géométrique façonné sur au moins une face de ladite pellicule de base transparente,

une couche adhésive disposée au moins en partie sur au moins une face de ladite pellicule de base,

dans laquelle le matériau électroconducteur à motif géométrique a une largeur de ligne de 40 µm ou moins, un espacement entre les lignes de 200 µm ou plus et une épaisseur de ligne de 40 µm ou moins, le motif géométrique fournissant un ratio d'ouverture de 80 % ou plus, et la différence concernant l'indice de réfraction entre ladite pellicule de base transparente et ladite couche adhésive est de 0,14 ou moins.

15. Pellicule adhésive selon la revendication 14, dans laquelle la couche adhésive est une couche de matière de résine.

16. Pellicule adhésive qui a une propriété de blindage électromagnétique et de transparence optique selon la revendication 14 ou 15, comprenant en plus une couche d'agent adhésif interposée entre ladite pellicule de base transparente et ladite couche adhésive, les différences concernant l'indice de réfraction entre ladite couche d'agent adhésif et ladite pellicule de base transparente, et entre ladite couche d'agent adhésif et ladite couche adhésive étant de 0,14 ou inférieures et le matériau électroconducteur à motif géométrique étant interposé entre la couche d'agent adhésif et la couche adhésive.

17. Pellicule adhésive qui a une propriété de blindage électromagnétique et de transparence optique selon la revendication 14, dans laquelle ladite pellicule transparente est constituée d'un film de polyéthylène-téréphthalate.

18. Pellicule adhésive qui a une propriété de blindage électromagnétique et de transparence optique selon la revendication 14 dans laquelle ledit matériau électroconducteur est constitué d'un membre choisi dans le groupe comprenant le cuivre, l'aluminium ou le nickel.

19. Pellicule adhésive qui a une propriété de blindage électromagnétique et de transparence optique selon la revendication 14, dans laquelle ledit matériau électroconducteur a une épaisseur de 3 à 40 µm, et dont une surface collée à ladite pellicule de base transparente est constituée d'une surface grossière.

20. Pellicule adhésive qui a une propriété de blindage électromagnétique et de transparence optique selon la revendication 18, dans laquelle ledit matériau électroconducteur est constitué de cuivre qui a une surface obscurcie.

21. Pellicule adhésive qui a une propriété de blindage électromagnétique et de transparence optique selon la revendication 14, dans laquelle on procure à ladite couche de matériau électroconducteur un motif géométrique par un procédé de décapage chimique.

22. Pellicule adhésive qui a une propriété de blindage électromagnétique et de transparence optique selon la revendication 14, dans laquelle ledit matériau électroconducteur est constitué d'un matériau métallique paramagnétique.

23. Pellicule adhésive qui a une propriété de blindage électromagnétique et de transparence optique selon une des revendications 14 à 22, dans laquelle ladite pellicule adhésive est incorporée avec une couche bloquant les rayons infrarouge qui a un ratio d'absorption total des rayons infrarouge de 50 % ou plus dans une gamme de longueur d'onde de 900 à 1100 nm.

24. Utilisation d'une pellicule adhésive qui a une propriété de blindage électromagnétique et de transparence optique selon une des revendications 14 à 23 dans un écran de visualisation.

25. Utilisation d'une pellicule adhésive qui a une propriété de blindage électromagnétique et de transparence optique selon une des revendications 14 à 23 dans un dispositif à blindage électromagnétique.

26. Dispositif à blindage électromagnétique comprenant :

une pellicule adhésive selon une des revendications 14 à 23 et

deux plaques de base essentiellement transparentes fixées sur chaque côté de ladite pellicule de plastique transparente, lesdites plaques de base en plastique ayant une épaisseur essentiellement identique.

27. Dispositif à blindage électromagnétique selon la revendication 26, dans lequel ladite pellicule à blindage électromagnétique comprend une pellicule de base essentiellement transparente et un matériau électroconducteur à motif géométrique façonné sur au moins une face de ladite pellicule de base transparente,
le matériau électroconducteur à motif géométrique ayant une largeur de ligne de 40 µm ou moins, un espacement entre les lignes de 200 µm ou plus et une épaisseur de ligne de 40 µm ou moins.

28. Dispositif à blindage électromagnétique selon la revendication 27, dans lequel le matériau électroconducteur à motif géométrique a une largeur de ligne de 25 µm ou moins, un espacement entre les lignes de 500 µm ou plus et une épaisseur de ligne de 18 µm ou moins.

29. Dispositif à blindage électromagnétique selon la revendication 26, comprenant en plus une pellicule adhésive façonnée au moins en partie sur au moins une face de ladite pellicule à blindage électromagnétique.

30. Dispositif à blindage électromagnétique selon la revendication 27, dans lequel ladite pellicule de base transparente est constituée d'un film de polyéthylène-téréphthalate.

31. Dispositif à blindage électromagnétique selon la revendication 27, dans lequel ledit matériau électroconducteur est constitué d'un membre choisi dans le groupe comprenant le cuivre, l'aluminium et le nickel.

32. Dispositif à blindage électromagnétique selon la revendication 28, dans lequel ledit matériau électroconducteur a une épaisseur de 3 à 18 µm, et dont une surface collé à ladite pellicule de base transparente est constituée d'une surface grossière.

33. Dispositif à blindage électromagnétique selon la revendication 31, dans lequel ledit matériau électroconducteur est constitué de cuivre ayant au moins une surface obscurcie.

34. Dispositif à blindage électromagnétique selon la revendication 27, dans lequel on procure au dit matériau électroconducteur sur ladite pellicule de base transparente un motif géométrique par un procédé de décapage chimique.

35. Dispositif à blindage électromagnétique selon la revendication 27, dans lequel ledit matériau électroconducteur est constitué d'un matériau métallique paramagnétique.

36. Dispositif à blindage électromagnétique selon la revendication 26, dans lequel lesdites plaques de base transparentes sont constituées de polyméthylméthacrylate désigné PMMA.

37. Dispositif à blindage électromagnétique selon la revendication 29, dans lequel la différence concernant l'indice de réfraction entre ladite plaque de base transparente et ladite couche adhésive est de 0,14 ou inférieure.

38. Dispositif à blindage électromagnétique selon la revendication 27, dans lequel la différence concernant l'indice de réfraction entre ladite plaque de base transparente et ladite pellicule de base transparente est de 0,14 ou inférieure.

39. Utilisation d'un dispositif à blindage électromagnétique selon une des revendications 26 à 38 dans un écran de visualisation.

40. Dispositif à blindage électromagnétique, comprenant :

une plaque de base essentiellement transparente,

une pellicule de base essentiellement transparente disposée sur chaque face de ladite plaque de base,

ladite pellicule de base disposée au moins sur une face de ladite plaque de base étant constituée d'une pellicule à blindage électromagnétique selon une des revendications 14 à 23.

41. Dispositif à blindage électromagnétique selon la revendication 40, dans lequel ladite pellicule à blindage électromagnétique comprend une pellicule de base essentiellement transparente, et un matériau électroconducteur à motif géométrique façonné sur au moins une face de ladite pellicule de base transparente,
ledit matériau électroconducteur à motif géométrique ayant une largeur de ligne de 40 µm ou moins, un espacement entre les lignes de 200 µm ou plus et une épaisseur de ligne de 40 µm ou moins.

42. Dispositif à blindage électromagnétique selon la revendication 41, dans lequel ledit matériau électroconducteur à motif géométrique a une largeur de ligne de 25 µm ou moins, un espacement entre les lignes de 500 µm ou plus, et une épaisseur de ligne de 18 µm ou moins.

43. Dispositif à blindage électromagnétique selon la revendication 40, dans lequel ladite pellicule de base disposée au moins sur une face de ladite plaque de base comprend une couche anti-éblouissement ou anti-réfléchissante.

44. Dispositif à blindage électromagnétique selon la revendication 40, dans lequel ladite pellicule de base disposée au moins sur une face de ladite plaque de base comprend une couche bloquant les rayons infrarouge.

45. Dispositif à blindage électromagnétique selon la revendication 40, dans lequel ladite pellicule de base est disposée sur les deux faces de ladite plaque de base transparente par un procédé de laminage au rouleau.

46. Dispositif à blindage électromagnétique selon la revendication 40, dans lequel ladite pellicule de base transparente est constituée d'un film de polyéthylène-téréphthalate.

47. Dispositif à blindage électromagnétique selon la revendication 41, dans lequel ledit matériau électroconducteur est constitué d'un membre choisi dans le groupe comprenant le cuivre, l'aluminium et le nickel.

48. Dispositif à blindage électromagnétique selon la revendication 47, dans lequel ledit matériau électroconducteur a une épaisseur de 3 à 18 µm, et dont une surface de celui-ci collée à ladite pellicule de base transparente est constituée d'une surface grossière.

49. Dispositif à blindage électromagnétique selon la revendication 47, dans lequel ledit matériau électroconducteur est constitué de cuivre ayant au moins une surface obscurcie.

50. Dispositif à blindage électromagnétique selon la revendication 41, dans lequel on procure au dit matériau électroconducteur sur ladite pellicule de base transparente un motif géométrique par un procédé de décapage chimique.

51. Dispositif à blindage électromagnétique selon la revendication 41, dans lequel ledit matériau électroconducteur est constitué d'un matériau métallique paramagnétique.

52. Dispositif à blindage électromagnétique selon la revendication 40, dans lequel ladite plaque de base transparente est constituée de polyméthylméthacrylate désigné PMMA.

53. Dispositif à blindage électromagnétique selon la revendication 40, comprenant en plus une couche adhésive destinée à fixer deux éléments mutuellement contigus.

54. Dispositif à blindage électromagnétique selon la revendication 53, dans lequel la différence concernant l'indice de réfraction entre ladite plaque de base transparente et ladite couche adhésive est de 0,14 ou inférieure.

55. Dispositif à blindage électromagnétique selon la revendication 40, dans lequel la différence concernant l'indice de réfraction entre ladite plaque de base transparente et ladite pellicule de base transparente est de 0,14 ou inférieure.

56. Utilisation d'un dispositif à blindage électromagnétique selon une des revendications 40 à 55 dans un écran de visualisation.