Reflector substrate for illumination device and reflector for illumination device

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(11)

EP 0 947 763 A3

(12)	EUROPEAN PATENT APPLICATION

(88)	Date of publication A3:
	04.04.2001 Bulletin 2001/14

(43)	Date of publication A2:
	06.10.1999 Bulletin 1999/40

(21)	Application number: 99302275.5

(22)	Date of filing: 24.03.1999

(51)	International Patent Classification (IPC)⁷: F21V 7/22

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
	Designated Extension States:
	AL LT LV MK RO SI

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Priority:

25.03.1998 JP 9676598

(71)	Applicants:
	DU PONT-TORAY COMPANY, LTD. Chuo-ku, Tokyo 103-0023 (JP) O.S. Engineering Corporation Minato-Ku, Tokyo (JP)

(72)	Inventors:
	Togashi, Naoyuki Edogawaku, Tokyo (JP) Machida, Hideaki Konanku, Yokohama (JP)

(74)	Representative: Towler, Philip Dean
	Frank B. Dehn & Co., European Patent Attorneys, 179 Queen Victoria Street London EC4V 4EL London EC4V 4EL (GB)

(54)	Reflector substrate for illumination device and reflector for illumination device

(57) A reflector substrate 1 for an illumination device comprises an aromatic polyimide film or aromatic polyamide film molded article.
In addition, a reflector 8 for an illumination device is comprised of a reflecting layer 10 generated by vapor depositing a reflecting material on a reflector substrate comprising an aromatic polyimide film or an aromatic polyamide film molded article. The reflector substrate of the invention is light in weight and excellent in surface smoothness, safety, moldability, heat resistance, and handling characteristics. The reflector substrate requires no pre-treatment when the reflector layer is generated and it is suitable for mass production.

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