(19)
(11) EP 0 948 022 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
07.11.2001 Bulletin 2001/45

(43) Date of publication A2:
06.10.1999 Bulletin 1999/40

(21) Application number: 99302486.8

(22) Date of filing: 30.03.1999
(51) International Patent Classification (IPC)7: H01J 9/02
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 31.03.1998 JP 8764498
15.02.1999 JP 3651099
24.03.1999 JP 8048899

(71) Applicant: CANON KABUSHIKI KAISHA
Tokyo (JP)

(72) Inventors:
  • Oguchi, Takahiro
    Ohta-ku, Tokyo (JP)
  • Suzuki, Noritake
    Ohta-ku, Tokyo (JP)

(74) Representative: Beresford, Keith Denis Lewis et al
BERESFORD & Co. High Holborn 2-5 Warwick Court
London WC1R 5DJ
London WC1R 5DJ (GB)

   


(54) Method and apparatus for manufacturing electron source, and method of manufacturing image forming apparatus


(57) This invention discloses an electron source manufacturing method including the step of applying a voltage to a plurality of conductive members by applying a potential to first portions of the plurality of conductive members serving as at least part of electron-emitting devices via a wiring commonly connected to the plurality of conductive members, and applying a potential to second portions of the plurality of conductive members, wherein the potential applied to the second portions of the plurality of conductive members is set to relax the difference in voltage applied to the plurality of conductive members owing to the difference between potentials at portions respectively connected to the first portions of the plurality of conductive members in the wiring commonly connected to the plurality of conductive members. The method and apparatus is particularly suited to manufacturing surface-conduction electron emitters.






Search report