REACTIVE ION ETCHING OF SILICA STRUCTURES - Patent 0968142

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EP 0 968 142 A1

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(43)	Date of publication:
	05.01.2000 Bulletin 2000/01

(21)	Application number: 97942702.8

(22)	Date of filing: 03.10.1997

(51)	International Patent Classification (IPC)⁷: C03C 15/00, C03C 17/32, C23C 14/04, C23C 14/12, C23C 14/32, C23C 14/54, G02B 6/136, G02B 6/13, G02B 6/12

(86)	International application number:
	PCT/AU9700/663

(87)	International publication number:
	WO 9815/504 (16.04.1998 Gazette 1998/15)

(84)	Designated Contracting States:
	DE FR GB IT

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Priority:

04.10.1996 AU PO281896

(71)	Applicant: UNISEARCH LIMITED
	Randwick, NSW 2031 (AU)

(72)	Inventors:
	BAZYLENKO, Michael Forestville, NSW 2087 (AU) GROSS, Mark Seaforth, NSW 2092 (AU)

(74)	Representative: Asquith, Julian Peter et al
	Marks & Clerk,Nash Court,Oxford Business Park South Oxfordshire OX4 2RU Oxfordshire OX4 2RU (GB)

(54)	REACTIVE ION ETCHING OF SILICA STRUCTURES