VACUUM DEPOSITION APPARATUS USING ELECTRON BEAMS - Patent 0977903

(19)

(11)

EP 0 977 903 A1

(12)

(43)	Date of publication:
	09.02.2000 Bulletin 2000/06

(21)	Application number: 99905319.2

(22)	Date of filing: 26.02.1999

(51)	International Patent Classification (IPC)⁷: C23C 14/30, H01J 37/317

(86)	International application number:
	PCT/JP9900/902

(87)	International publication number:
	WO 9943/864 (02.09.1999 Gazette 1999/35)

(84)	Designated Contracting States:
	BE DE GB NL

(30)

Priority:

27.02.1998 JP 4650398

(71)	Applicant: Applied Materials, Inc.
	Santa Clara,California 95054 (US)

(72)	Inventor:
	ONO, Masanori Sanbu-gun,Chiba 289-1212 (JP)

(74)	Representative: Kahler, Kurt, Dipl.-Ing. et al
	PatentanwälteKahler, Käck, Fiener et col.,Vorderer Anger 268 86899 Landsberg/Lech 86899 Landsberg/Lech (DE)

(54)	VACUUM DEPOSITION APPARATUS USING ELECTRON BEAMS