(19)
(11) EP 0 998 751 A1

(12)

(43) Date of publication:
10.05.2000 Bulletin 2000/19

(21) Application number: 98937071.3

(22) Date of filing: 21.07.1998
(51) International Patent Classification (IPC)7H01L 21/00
(86) International application number:
PCT/US9815/358
(87) International publication number:
WO 9905/704 (04.02.1999 Gazette 1999/05)
(84) Designated Contracting States:
DE FR GB IT

(30) Priority: 22.07.1997 JP 19595997

(71) Applicant: MEMC Electronic Materials, Inc.
St. Peters,Missouri 63376 (US)

(72) Inventors:
  • IKEDA, Kiyotoshi
    Kawachi-gum,Tochigi-prefecture 329-0607 (JP)
  • KURODA, Kiyoshi
    Utsunomiya-city,Tochigi Pref. 321-0982 (JP)

(74) Representative: Eyles, Christopher Thomas 
W.P. THOMPSON & CO.Celcon House289-293 High Holborn
London WC1V 7HU
London WC1V 7HU (GB)

   


(54) METHOD FOR WASHING SILICON WAFER