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<ep-patent-document id="EP99124485B1" file="EP99124485NWB1.xml" lang="en" country="EP" doc-number="1008997" kind="B1" date-publ="20041027" status="n" dtd-version="ep-patent-document-v1-1">
<SDOBI lang="en"><B000><eptags><B001EP>......DE....FRGB................................................................</B001EP><B005EP>J</B005EP><B007EP>DIM350 (Ver 2.1 Jan 2001)
 2100000/0</B007EP></eptags></B000><B100><B110>1008997</B110><B120><B121>EUROPEAN PATENT SPECIFICATION</B121></B120><B130>B1</B130><B140><date>20041027</date></B140><B190>EP</B190></B100><B200><B210>99124485.6</B210><B220><date>19991208</date></B220><B240><B241><date>20000808</date></B241><B242><date>20030711</date></B242></B240><B250>en</B250><B251EP>en</B251EP><B260>en</B260></B200><B300><B310>35307898</B310><B320><date>19981211</date></B320><B330><ctry>JP</ctry></B330></B300><B400><B405><date>20041027</date><bnum>200444</bnum></B405><B430><date>20000614</date><bnum>200024</bnum></B430><B450><date>20041027</date><bnum>200444</bnum></B450><B452EP><date>20040422</date></B452EP></B400><B500><B510><B516>7</B516><B511> 7H 01F  17/00   A</B511></B510><B540><B541>de</B541><B542>Hochfrequenzinduktivität mit hohem Q-Faktor</B542><B541>en</B541><B542>High-Q inductor for high frequency</B542><B541>fr</B541><B542>Inductance à haute fréquence à grand coefficient de qualité</B542></B540><B560><B561><text>EP-A- 0 484 558</text></B561><B561><text>US-A- 4 494 100</text></B561><B561><text>US-A- 4 641 118</text></B561><B562><text>TSUJIMOTO H: "DESIGN AND SIMULATION OF FILM TRANSFORMER ON FLEXIBLE POLYAMIDE FILM IN VERY HIGH FREQUENCY RANGE" IEEE TRANSACTIONS ON MAGNETICS,US,IEEE INC. NEW YORK, vol. 34, no. 4, PART 01, July 1998 (1998-07), pages 1357-1359, XP000833108 ISSN: 0018-9464</text></B562></B560><B590><B598>1</B598></B590></B500><B700><B720><B721><snm>Andoh, Toshiakira</snm><adr><str>3-304, Myokenzaka 6-chome</str><city>Katano-shi,
Osaka 576-0021</city><ctry>JP</ctry></adr></B721><B721><snm>Sakakura, Makoto</snm><adr><str>401-303, 51-12, Motoyashiki,
Makishima-cho</str><city>Uji-shi,
Kyoto 611-0041</city><ctry>JP</ctry></adr></B721><B721><snm>Nakatani, Toshifumi</snm><adr><str>Syounryo 218, 2-26-3, Yagumo Kitamachi</str><city>Moriguchi-shi,
Osaka 570-0008</city><ctry>JP</ctry></adr></B721><B721><snm>Takinami, Kouji</snm><adr><str>4-9-304, Ikuno</str><city>Katano-shi,
Osaka 576-0054</city><ctry>JP</ctry></adr></B721><B721><snm>Hiraoka, Yukio</snm><adr><str>12-24, Koshienguchi 5-chome</str><city>Nishinomiya-shi,
Hyogo 663-8113</city><ctry>JP</ctry></adr></B721></B720><B730><B731><snm>Matsushita Electric Industrial Co., Ltd.</snm><iid>01855508</iid><irf>EP17985-50/kg</irf><syn>Electric Industrial Co., Ltd., Matsushita</syn><adr><str>1006, Oaza-Kadoma</str><city>Kadoma-shi,
Osaka 571-8501</city><ctry>JP</ctry></adr></B731></B730><B740><B741><snm>Grünecker, Kinkeldey, 
Stockmair &amp; Schwanhäusser
Anwaltssozietät</snm><iid>00100721</iid><adr><str>Maximilianstrasse 58</str><city>80538 München</city><ctry>DE</ctry></adr></B741></B740></B700><B800><B840><ctry>DE</ctry><ctry>FR</ctry><ctry>GB</ctry></B840></B800></SDOBI><!-- EPO <DP n="1"> -->
<description id="desc" lang="en">
<p id="p0001" num="0001">The present invention relates to an inductor having a high Q value for use in high frequency in a semiconductor integrated circuit (IC).</p>
<p id="p0002" num="0002">A conventional inductor will be described with reference to Figure 9. Referring to Figure 9, the reference numeral 1 denotes an inductor section, 2 denotes a drawing interconnect formed in the first layer, 3 denotes a drawing interconnect formed in the second layer, 5 denotes a connection between the first and second layers, 7 denotes an interlayer film, and 8 denotes a smoothing film.</p>
<p id="p0003" num="0003">That is, in the conventional inductor, the inductor section is constructed of a single layer and the second layer is used for the drawing interconnect for connection with other components.</p>
<p id="p0004" num="0004">As one of characteristics of an inductor, it is generally known that in order to obtain a large<!-- EPO <DP n="2"> --> inductance value, the line length of the inductor must be increased.</p>
<p id="p0005" num="0005">With the above conventional construction, however, when the line length is increased in order to obtain a large inductance value, the serial resistance component increases due to the resistance of a wiring material constituting the inductor, resulting in lowering the Q value of the inductor.</p>
<p id="p0006" num="0006">Further, the increased line length of the inductor tends to increase the size of the entire inductor. EP-A-0 484 558 describes a high frequency inductor device comprising strip-like coil conductors formed on an insulating substrate. The inductor device includes a plurality of said strip-like coil conductors being arranged in plural layers and connected in parallel. The strip-like coil conductors are arranged such that an electric currents flowing through the conductors of the different layers has the same direction in corresponding conductor portions.</p>
<p id="p0007" num="0007">US-A-4 641 118 describes an electromagnet utilizing a coil consisting of a plurality of insulating substrates. On each substrate, a spiral conductor is formed. The spiral direction of conductors is reversed on each of successive substrates. The spiral centers and outer ends of successive conductors are connected in an alternating fashion, such that a serial connection of the conductors is obtained.</p>
<p id="p0008" num="0008">It is an object of the present invention to provide an improved high frequency inductor device.</p>
<p id="p0009" num="0009">This object is achieved by the features of claim 1, claim 3 and claim 4.</p>
<p id="p0010" num="0010">Further embodiments are subject-matter of dependent claims.<!-- EPO <DP n="3"> -->
<ul id="ul0001" list-style="none" compact="compact">
<li>Figure 1 shows an inductor of Embodiment 1 useful for the understanding of the present invention;</li>
<li>Figure 2 shows an inductor of Embodiment 2 useful for the understanding of the present invention;</li>
<li>Figure 3 shows an inductor of Embodiment 3 of the present invention;<!-- EPO <DP n="4"> --></li>
<li>Figure 4 shows an inductor of Embodiment 4 of the present invention;</li>
<li>Figure 5 is a schematic view illustrating another inductor according to the present invention;</li>
<li>Figure 6 is a schematic view illustrating yet another inductor according to the present invention;</li>
<li>Figure 7 is a graph showing comparison of the present invention with a conventional inductor;</li>
<li>Figure 8 is another graph showing comparison of the present invention with the conventional inductor; and</li>
<li>Figure 9 shows a conventional inductor.</li>
</ul></p>
<p id="p0011" num="0011">Embodiments of the present invention will be described with reference to the relevant drawings.</p>
<p id="p0012" num="0012">Figure 1 shows the first embodiment of the high-Q inductor for high frequency useful for the understanding of the present invention. Referring to Figure 1, the reference numeral 11 denotes a meander-type first-layer inductor section (the "inductor section" as used herein corresponds to an "inductor element" to be recited in the claims), 12 and 13 denote first-layer drawing interconnects, 14 denotes a second-layer inductor section, 15 and 16 denote connections between the first and second layers, 17<!-- EPO <DP n="5"> --> denotes an interlayer film, and 18 denotes a smoothing film.</p>
<p id="p0013" num="0013">Each of the connections 15 and 16 is composed of nine contact portions each having a size of about 1 µm square, for example.</p>
<p id="p0014" num="0014">In this embodiment, therefore, the inductor section, which is conventionally constructed using only one layer, is of a two-layer structure where two inductor sections are formed in the first and second layers and connected in parallel with each other.</p>
<p id="p0015" num="0015">The above construction makes it possible to obtain a high Q-value inductor for high frequency which overcomes the conventional problem of having a large serial resistance component in low frequency and high frequency and thus a lowered Q value, by increasing the cross section and suppressing lowering of the Q value which otherwise occurs due to a skin effect in high frequency.</p>
<p id="p0016" num="0016">It should be noted that the first and second layers may be connected in parallel over the entire inductor sections. This construction is also included in the present invention.</p>
<p id="p0017" num="0017">Figure 2 shows the second embodiment of the high-Q inductor for high frequency useful for the understanding of the present<!-- EPO <DP n="6"> --> invention. Referring to Figure 2, the reference numeral 21 denotes a spiral-shaped first-layer inductor section, 22 denotes a first-layer drawing interconnect, 23 denotes a spiral-shaped second-layer inductor section, 24 denotes a drawing interconnect from the second-layer inductor section 23 formed in the third layer, 25 and 26 denote connections between the first and second layers, 27 and 28 denote interlayer films, 29 denotes a smoothing film, and 210 denotes a connection between the second and third layers. The first-layer inductor section 22 and the second-layer inductor section 23 are spiraled in the same direction.</p>
<p id="p0018" num="0018">In this embodiment, therefore, the inductor section, which is conventionally constructed using only one layer, is of a two-layer structure where the inductor sections22 and 23 are respectively formed in the first and second layers and connected in parallel with each other. This construction makes it possible to obtain a high Q-value inductor for high frequency which overcomes the conventional problem of having a large serial resistance component in low frequency and high frequency and thus a lowered Q value, by increasing the cross section and suppressing lowering of the Q value which otherwise occurs due to a skin effect in high frequency.</p>
<p id="p0019" num="0019">It should be noted that the first and second layers<!-- EPO <DP n="7"> --> may be connected in parallel over the entire inductor sections. This construction is also included in the present invention.</p>
<p id="p0020" num="0020">In this embodiment, the three-layer inductor was exemplified. It is also possible to construct a similar structure composed of four or more layers with a drawing interconnect being formed in the bottom layer.</p>
<p id="p0021" num="0021">Figure 3 shows the third embodiment of the high-Q inductor for high frequency according to the present invention. Referring to Figure 3, the reference numeral 31 denotes a spiral-shaped first-layer inductor section, 32 denotes a first-layer drawing interconnect, 33 denotes a spiral-shaped second-layer inductor section, 34 denotes a second-layer drawing interconnect, 35 denotes connections between the first and second layers, 37 denotes an interlayer film, and 38 denotes a smoothing film.</p>
<p id="p0022" num="0022">The first and second inductor sections 31 and 33 are connected in parallel with each other.</p>
<p id="p0023" num="0023">Embodiment 3 is characterized in that the second-layer drawing interconnect 34 is formed using the layer in which the second-layer inductor section 33 is formed. In order to prevent the second-layer inductor section 33 from being in contact with the drawing interconnect 34 in<!-- EPO <DP n="8"> --> the same layer, the second-layer inductor section 33 is cut off at the positions where the drawing interconnect 34 crosses. The cut-off ends of the inductor section 33 are connected with the first-layer inductor section 31 via the connections 35. By this construction, the second-layer inductor section 33 can serve as one substantially spiral-shaped inductor section.</p>
<p id="p0024" num="0024">In this embodiment, therefore, the inductor section, which is conventionally constructed using only one layer, is of a two-layer structure where inductor sections are formed in the first and second layers and connected in parallel with each other. Furthermore, the inductor sections are formed in the layers in which the drawing interconnects are formed. As a result, it is possible, even in a process where a smaller number of wiring layers are used, to obtain a high Q-value inductor for high frequency which overcomes the conventional problem of having a large serial resistance component in low frequency and high frequency and thus a lowered Q value, by increasing the cross section and suppressing lowering of the Q value which otherwise occurs due to a skin effect in high frequency.</p>
<p id="p0025" num="0025">Thus, Embodiment 3 is characterized in that one of the drawing interconnects is formed using the wiring layer for the inductor section, which is different from<!-- EPO <DP n="9"> --> Embodiment 2 where the layer for forming the drawing interconnect is separately provided.</p>
<p id="p0026" num="0026">It should be noted that the first and second layers may be connected in parallel over the entire inductor sections. This construction is also included in the present invention.</p>
<p id="p0027" num="0027">In this embodiment, the two-layer inductor was exemplified. It is also possible to construct a similar structure composed of three or more layers with a drawing interconnect being formed in any of the layers. In this case, portions of an inductor section at which the drawing interconnect crosses can be connected with an adjacent upper or lower inductor section.</p>
<p id="p0028" num="0028">Figures 7 and 8 are graphs showing comparison of performances of the two-layer inductor according to the present invention and a conventional one-layer inductor.</p>
<p id="p0029" num="0029">Figure 7 is a graph obtained by plotting a variation of the resistance (R) with respect to the length (L). It is observed from this figure that R is smaller in the two-layer inductor according to the present invention.</p>
<p id="p0030" num="0030">Figure 8 is a graph obtained by plotting a variation of the Q value (Q) with respect to the length (L). It is observed from this figure that Q is greater in the two-layer inductor according to the present<!-- EPO <DP n="10"> --> invention.</p>
<p id="p0031" num="0031">Figure 4 shows the fourth embodiment of the high-Q inductor for high frequency according to the present invention. Referring to Figure 4, the reference numeral 41 denotes a spiral-shaped first-layer inductor section, 42 denotes a first-layer drawing interconnect, 43 denotes a connection between the first and second layers, 44 denotes a spiral-shaped second-layer inductor section, 45 denotes a connection between the second and third layers, 46 denotes a spiral-shaped third-layer inductor section, 47 denotes a connection between the third and fourth layers, 48 denotes a spiral-shaped fourth-layer inductor section, 49 denotes a fourth-layer drawing interconnect, 410, 411, and 412 denote interlayer films, and 413 denotes a smoothing film.</p>
<p id="p0032" num="0032">In this embodiment, the adjacent inductor sections are connected with each other. Specifically, the centers or the outer ends of the adjacent inductor sections are connected with each other. These inductor sections are therefore connected in series with each other.</p>
<p id="p0033" num="0033">In this embodiment, the second-layer and fourth-layer inductor sections have a shape inverted upside down from that of the first-layer and third-layer inductor sections. By this arrangement, the directions of the<!-- EPO <DP n="11"> --> magnetic fields generated by the respective inductor sections are the same, resulting in effective coupling.</p>
<p id="p0034" num="0034">In the conventional structure where the inductor section is constructed using only a single layer, when the entire length of the inductor section is increased to obtain a high Q value, the size of the inductor section also increases. On the contrary, in Embodiment 4, since the length of the inductor sections is increased stereoscopically as a whole, the resultant size is compact.</p>
<p id="p0035" num="0035">The four-layer structure was described in this embodiment. However, as shown in Figure 5, the number of layers may be increased to five or six, for example, in a similar structure. The structure is simpler when the number of layers is even, because the drawing interconnect can be formed to be connected with the outer end of the bottom inductor section.</p>
<p id="p0036" num="0036">When the number of layers is odd, the drawing interconnect can be arranged in a manner described in Figure 2 or 3.</p>
<p id="p0037" num="0037">Alternatively, as shown in Figure 6, a pair of adjacent inductor sectors may have the same spiral direction, and adjacent pairs of adjacent inductor sectors may have different spiral directions. In this case, one inductor sector of one pair is connected with<!-- EPO <DP n="12"> --> one of another pair as shown in Figure 6 so that all the inductor sectors are serially connected.</p>
<p id="p0038" num="0038">In the above case, also, the directions of the magnetic fields generated by the respective inductor sectors are the same, resulting in effective coupling.</p>
<p id="p0039" num="0039">Thus, according to the present invention, the inductor section, which is conventionally constructed of a single wiring layer, is of a multi-layer structure. As a result, a high Q-value inductor which has a reduced serial resistance component and is free from an influence of a skin effect can be fabricated in an IC.</p>
<p id="p0040" num="0040">Many modifications and variations of the present invention will be apparent to those skilled in the art without departing from the scope of the invention, as defined by the appended claims.</p>
</description><!-- EPO <DP n="13"> -->
<claims id="claims01" lang="en">
<claim id="c-en-01-0001" num="0001">
<claim-text>A high-Q inductor for high frequency, comprising a plurality of inductor elements (31, 33) formed in a plurality of IC wiring layers respectively, the directions of magnetic fields generated by the respective inductor elements (31, 33) being substantially the same,<br/>
wherein said inductor elements (31, 33) are in a spiral shape and connected in parallel to each other, and<br/>
a lead electrode (34) formed in an IC wiring layer is connected to a spiral center of one of said spiral-shaped inductor elements (31, 33),<br/>
<b>characterized in that</b><br/>
said lead electrode (34) is formed in an IC wiring layer in which one of said spiral-shaped inductor elements (33) is formed, and<br/>
the spiral-shaped inductor element (33) formed in said IC wiring layer in which said lead electrode (34) is formed is cut off at positions where the lead electrode (34) crosses, and cut-off ends of the inductor element (33) are connected with respective corresponding portions of the spiral-shaped inductor element (31) formed in another one of the IC wiring layers.</claim-text></claim>
<claim id="c-en-01-0002" num="0002">
<claim-text>A high-Q inductor for high frequency according to claim 1, wherein a connection (35) between the plurality of spiral-shaped inductor elements (31, 33) is formed in an interlayer film (37) disposed between the IC wiring layers in which the spiral-shaped inductor elements (31, 33) are formed.<!-- EPO <DP n="14"> --></claim-text></claim>
<claim id="c-en-01-0003" num="0003">
<claim-text>A high-Q inductor for high frequency, comprising a plurality of inductor elements (41, 44, 46, 48) formed in a plurality of IC wiring layers respectively,<br/>
wherein the plurality of inductor elements (41, 44, 46, 48) are formed in a spiral shape respectively, said each spiral shape is formed from plural groups of two pairs of straight lines which counter mutually,<br/>
adjacent inductor elements of the plurality of inductor elements (41, 44, 46, 48) are connected with each other in such manner that the adjacent inductor elements are serially connected by connecting the spiral centers (43, 47) thereof with each other and outer ends (45) thereof with each other, and<br/>
said inductor elements (41, 44, 46, 48) are arranged so that an area with which (a) a first group including plural one pairs of said two pairs of straight lines from which said inductor element arranged in one of said IC wiring layers is formed and (b) a second group including plural one pairs of said two pairs of straight lines from which said inductor element arranged in another one of said IC wiring layers is formed overlap may be smaller than an area with which (c) a third group including plural another one pairs of said two pairs of straight lines arranged in said one of said IC wiring layers and (d) a fourth group including plural another one pairs of said two pairs of straight lines arranged in said another one of said IC wiring layers overlap, said second group being corresponding to said first group and said fourth group being corresponding to said third group, and<br/>
spiral directions of the adjacent inductor elements are in reverse from each other, so that directions of the magnetic fields generated by the respective inductor elements (41, 44, 46, 48) are substantially the same.</claim-text></claim>
<claim id="c-en-01-0004" num="0004">
<claim-text>A high-Q inductor for high frequency, comprising a plurality of inductor elements formed in a plurality of IC wiring layers respectively,<br/>
wherein the plurality of inductor elements are in a spiral shape respectively ,<!-- EPO <DP n="15"> --> the plurality of inductor elements are alternately connected with each other in such manner that the inductor elements are serially connected by connecting the centers thereof with each other and outer ends thereof with each other, and<br/>
the spiral directions of adjacent inductor elements repeats the same and the reverse in order, so that the directions of the magnetic fields generated by the respective inductor elements are substantially the same.</claim-text></claim>
</claims><!-- EPO <DP n="16"> -->
<claims id="claims02" lang="de">
<claim id="c-de-01-0001" num="0001">
<claim-text>Hochfrequenzspule mit hohem Q-Wert, die eine Vielzahl von Spulenelementen (31, 33) umfasst, die jeweils in einer Vielzahl von IC-Verdrahtungsschichten gebildet sind, wobei die Richtungen von durch die jeweiligen Spulenelemente (31, 33) erzeugten Magnetfeldern im Wesentlichen gleich sind,<br/>
wobei die Spulenelemente (31, 33) eine Spiralform aufweisen und miteinander parallel geschaltet sind, und<br/>
eine in einer IC-Verdrahtungsschicht gebildete Anschlusselektrode (34) mit einer Spiralmitte eines der spiralförmigen Spulenelemente (31, 33) verbunden ist,<br/>
<b>dadurch gekennzeichnet, dass</b><br/>
die Anschlusselektrode (34) in einer IC-Verdrahtungsschicht gebildet ist, in der eines der spiralförmigen Spulenelemente (33) gebildet ist, und<br/>
das spiralförmige Spulenelement (33), das in der IC-Verdrahtungsschicht gebildet ist, in der die Anschlusselektrode (34) gebildet ist, an Stellen abgeschnitten wird, wo die Anschlusselektrode (34) kreuzt, und abgeschnittene Enden des Spulenelements (33) mit jeweiligen entsprechenden Stellen des in einer anderen der IC-Verdrahtungsschichten gebildeten spiralförmigen Spulenelements (31) verbunden sind.</claim-text></claim>
<claim id="c-de-01-0002" num="0002">
<claim-text>Hochfrequenzspule mit hohem Q-Wert nach Anspruch 1, wobei eine Verbindung (35) zwischen der Vielzahl von spiralförmigen Spulenelementen (31, 33) in einem Zwischenschichtfilm (37) gebildet ist, der zwischen den IC-Verdrahtungsschichten angeordnet ist, in denen die spiralförmigen Spulenelemente (31, 33) gebildet sind.</claim-text></claim>
<claim id="c-de-01-0003" num="0003">
<claim-text>Hochfrequenzspule mit hohem Q-Wert, die eine Vielzahl von Spulenelementen (41, 44, 46, 48) umfasst, die jeweils in einer Vielzahl von IC-Verdrahtungsschichten gebildet sind,<br/>
wobei die Vielzahl von Spulenelementen (41, 44, 46, 48) jeweils in einer Spiralform gebildet ist, wobei jede Spiralform aus einer Mehrzahl von Gruppen aus zwei Paaren von geraden Leitungen gebildet ist, die gegenseitig entgegenwirken.<br/>
<!-- EPO <DP n="17"> -->aneinandergrenzende Spulenelemente der Vielzahl von Spulenelementen (41, 44, 46, 48) in einer solchen Weise miteinander verbunden sind, dass die aneinandergrenzenden Spulenelemente durch Verbinden ihrer Spiral mitten (43, 47) miteinander und ihrer äußeren Enden (45) miteinander in Reihe geschaltet sind, und<br/>
die Spulenelemente (41, 44, 46, 48) so angeordnet sind, dass ein Bereich, mit dem (a) eine erste Gruppe, die eine Mehrzahl von Einpaaren der zwei Paare von geraden Leitungen enthält, aus denen das in einer der IC-Verdrahtungsschichten angeordnete Spulenelement gebildet ist, und (b) eine zweite Gruppe, die eine Mehrzahl von Einpaaren der zwei Paare von geraden Leitungen enthält, aus denen das in einer anderen der IC-Verdrahtungsschichten angeordnete Spulenelement gebildet ist, sich überlappen, kleiner sein kann als ein Bereich, mit dem (c) eine dritte Gruppe, die eine Mehrzahl von anderen Einpaaren der zwei Paare von geraden Leitungen enthält, die in der einen der IC-Verdrahtungsschichten angeordnet sind, und (d) eine vierte Gruppe, die eine Mehrzahl von anderen Einpaaren der zwei Paare von geraden Leitungen enthält, die in der anderen der IC-Verdrahtungsschichten angeordnet sind, sich überlappen, wobei die zweite Gruppe entsprechend der ersten Gruppe ist, und die vierte Gruppe entsprechend der dritten Gruppe ist, und<br/>
Spiralrichtungen der aneinandergrenzenden Spulenelemente umgekehrt voneinander sind, sodass die Richtungen der durch die jeweiligen Spulenelemente (41, 44, 46, 48) erzeugten Magnetfelder im Wesentlichen gleich sind.</claim-text></claim>
<claim id="c-de-01-0004" num="0004">
<claim-text>Hochfrequenzspule mit hohem Q-Wert, die eine Vielzahl von Spulenelementen umfasst, die jeweils in einer Vielzahl von IC-Verdrahtungsschichten gebildet sind,<br/>
wobei die Vielzahl von Spulenelementen jeweils eine Spiralform aufweist,<br/>
die Vielzahl von Spulenelementen abwechselnd miteinander in einer Weise verbunden ist, dass die Spulenelemente durch Verbinden ihrer Spiralmitten miteinander und ihrer äußeren Enden miteinander in Reihe geschaltet sind, und<br/>
die Spiralrichtungen von aneinandergrenzenden Spulenelementen sich in der gleichen und der umgekehrten Reihenfolge wiederholen, sodass die Richtungen der durch die jeweiligen Spulenelemente erzeugten Magnetfelder im Wesentlichen gleich sind.</claim-text></claim>
</claims><!-- EPO <DP n="18"> -->
<claims id="claims03" lang="fr">
<claim id="c-fr-01-0001" num="0001">
<claim-text>Bobine d'inductance à haute fréquence à facteur de qualité élevé, comprenant une pluralité d'éléments d'inductance (31, 33) formés dans une pluralité de couches de câblage de circuit intégré respectivement, les directions des champs magnétiques générés par les éléments d'inductance respectifs (31, 33) étant pratiquement les mêmes,<br/>
   où lesdits éléments d'inductance (31, 33) sont en forme de spirale et reliés en parallèle les uns aux autres, et<br/>
   une électrode conductrice (34) formée dans une couche de câblage de circuit intégré est reliée au centre de spirale de l'un desdits éléments d'inductance en forme de spirale (31, 33),<br/>
   <b>caractérisée en ce que</b><br/>
   ladite électrode conductrice (34) est formée dans une couche de câblage de circuit intégré dans laquelle l'un desdits éléments d'inductance en forme de spirale (33) est formé, et<br/>
   l'élément d'inductance en forme de spirale (33) formé dans ladite couche de câblage de circuit intégré, dans laquelle ladite électrode conductrice (34) est formée, est découpé à des positions où l'électrode conductrice (34) traverse, et les extrémités découpées de l'élément d'inductance (33) sont reliées à des parties correspondantes respectives de l'élément d'inductance en forme de spirale (31) formé dans une autre des couches de câblage de circuit intégré.</claim-text></claim>
<claim id="c-fr-01-0002" num="0002">
<claim-text>Bobine d'inductance à haute fréquence à facteur de qualité élevé selon la revendication 1, dans laquelle une liaison (35) entre la pluralité d'éléments d'inductance en.forme de spirale (31, 33) est formée dans un film inter-couches (37) disposé entre les couches de câblage de circuit intégré dans lesquelles sont formés les éléments d'inductance en forme de spirale (31, 33).</claim-text></claim>
<claim id="c-fr-01-0003" num="0003">
<claim-text>Bobine d'inductance à haute fréquence à facteur de qualité élevé, comprenant une pluralité d'éléments d'inductance (41, 44, 46, 48) formés dans une pluralité de couches de câblage de circuit intégré respectivement,<br/>
<!-- EPO <DP n="19"> -->   où la pluralité d'éléments d'inductance (41, 44, 46, 48) sont formés en forme de spirale respectivement, ladite chaque forme de spirale est formée de plusieurs groupes de deux paires de lignes droites qui s'opposent mutuellement,<br/>
   les éléments d'inductance adjacents de la pluralité d'éléments d'inductance (41, 44, 46, 48) sont reliés les uns aux autres d'une manière telle que les éléments d'inductance adjacents sont reliés en série en reliant les centres de spirales (43, 47) de ceux-ci les uns aux autres et les extrémités extérieures (45) de ceux-ci les unes avec les autres, et<br/>
   lesdits éléments d'inductance (41, 44, 46, 48) sont agencés de sorte qu'une zone sur laquelle se chevauchent (a) un premier groupe comprenant plusieurs premières paires desdites deux paires de lignes droites dont est formé ledit élément d'inductance agencé dans l'une desdites couches de câblage de circuit intégré et (b) un second groupe comprenant plusieurs premières paires desdites deux paires de lignes droites dont est formé ledit élément d'inductance agencé dans une autre desdites couches de câblage de circuit intégré, peut être plus petite qu'une zone avec laquelle se chevauchent (c) un troisième groupe comprenant plusieurs autres paires desdites deux paires de lignes droites agencées dans ladite une desdites couches de câblage de circuit intégré et (d) un quatrième groupe comprenant plusieurs autres paires desdites deux paires de lignes droites agencées dans ladite autre desdites couches de câblage de circuit intégré, ledit second groupe correspondant audit premier groupe et ledit quatrième groupe correspondant audit troisième groupe, et<br/>
   les sens de spirales des éléments d'inductance adjacents sont inverses les uns des autres, de sorte que les sens des champs magnétiques générés par les éléments d'inductance respectifs (41, 44, 46, 48) sont pratiquement les mêmes.</claim-text></claim>
<claim id="c-fr-01-0004" num="0004">
<claim-text>Bobine d'inductance à haute fréquence à facteur de qualité élevé, comprenant une pluralité d'éléments d'inductance formés dans une pluralité de couches de câblage de circuit intégré respectivement,<br/>
   où la pluralité d'éléments d'inductance sont en forme de spirale respectivement,<br/>
<!-- EPO <DP n="20"> -->   la pluralité d'éléments d'inductance sont reliés alternativement les uns aux autres de manière telle que les éléments d'inductance sont reliés en série en reliant les centres de ceux-ci les uns aux autres et les extrémités extérieures de ceux-ci les unes aux autres, et<br/>
   les sens de spirales des éléments d'inductance adjacents se répètent à l'identique et à l'inverse dans cet ordre, de sorte que les sens des champs magnétiques générés par les éléments d'inductance respectifs sont pratiquement les mêmes.</claim-text></claim>
</claims><!-- EPO <DP n="21"> -->
<drawings id="draw" lang="en">
<figure id="f0001" num=""><img id="if0001" file="imgf0001.tif" wi="169" he="155" img-content="drawing" img-format="tif"/></figure><!-- EPO <DP n="22"> -->
<figure id="f0002" num=""><img id="if0002" file="imgf0002.tif" wi="170" he="171" img-content="drawing" img-format="tif"/></figure><!-- EPO <DP n="23"> -->
<figure id="f0003" num=""><img id="if0003" file="imgf0003.tif" wi="172" he="201" img-content="drawing" img-format="tif"/></figure><!-- EPO <DP n="24"> -->
<figure id="f0004" num=""><img id="if0004" file="imgf0004.tif" wi="165" he="202" img-content="drawing" img-format="tif"/></figure><!-- EPO <DP n="25"> -->
<figure id="f0005" num=""><img id="if0005" file="imgf0005.tif" wi="142" he="191" img-content="drawing" img-format="tif"/></figure><!-- EPO <DP n="26"> -->
<figure id="f0006" num=""><img id="if0006" file="imgf0006.tif" wi="134" he="198" img-content="drawing" img-format="tif"/></figure><!-- EPO <DP n="27"> -->
<figure id="f0007" num=""><img id="if0007" file="imgf0007.tif" wi="137" he="179" img-content="drawing" img-format="tif"/></figure><!-- EPO <DP n="28"> -->
<figure id="f0008" num=""><img id="if0008" file="imgf0008.tif" wi="143" he="170" img-content="drawing" img-format="tif"/></figure><!-- EPO <DP n="29"> -->
<figure id="f0009" num=""><img id="if0009" file="imgf0009.tif" wi="155" he="91" img-content="drawing" img-format="tif"/></figure>
</drawings>
</ep-patent-document>
